JP2015501001A - 赤外光反射防止膜用耐久ＭｇＯ−ＭｇＦ２複合膜 - Google Patents

赤外光反射防止膜用耐久ＭｇＯ−ＭｇＦ２複合膜 Download PDF

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Publication number
JP2015501001A
JP2015501001A JP2014513578A JP2014513578A JP2015501001A JP 2015501001 A JP2015501001 A JP 2015501001A JP 2014513578 A JP2014513578 A JP 2014513578A JP 2014513578 A JP2014513578 A JP 2014513578A JP 2015501001 A JP2015501001 A JP 2015501001A
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Prior art keywords
film
mgf
range
optical element
mgo
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JP2014513578A
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English (en)
Japanese (ja)
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JP2015501001A5 (enExample
Inventor
シュライバー，ホルスト
ワン，ジュエ
ジェイ ウィルキンソン，スコット
ジェイ ウィルキンソン，スコット
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Corning Inc
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Corning Inc
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Publication of JP2015501001A5 publication Critical patent/JP2015501001A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0026—Activation or excitation of reactive gases outside the coating chamber
    • C23C14/0031—Bombardment of substrates by reactive ion beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
JP2014513578A 2011-05-31 2012-05-24 赤外光反射防止膜用耐久ＭｇＯ−ＭｇＦ２複合膜 Pending JP2015501001A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161491667P 2011-05-31 2011-05-31
US61/491,667 2011-05-31
PCT/US2012/039230 WO2012166484A1 (en) 2011-05-31 2012-05-24 DURABLE MgO-MgF2 COMPOSITE FILM FOR INFRARED ANTI-REFLECTION COATINGS

Related Child Applications (1)

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JP2017001061A Division JP6381687B2 (ja) 2011-05-31 2017-01-06 赤外光反射防止膜用耐久ＭｇＯ−ＭｇＦ２複合膜を形成する方法

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Publication Number Publication Date
JP2015501001A true JP2015501001A (ja) 2015-01-08
JP2015501001A5 JP2015501001A5 (enExample) 2015-06-18

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JP2014513578A Pending JP2015501001A (ja) 2011-05-31 2012-05-24 赤外光反射防止膜用耐久ＭｇＯ−ＭｇＦ２複合膜
JP2017001061A Expired - Fee Related JP6381687B2 (ja) 2011-05-31 2017-01-06 赤外光反射防止膜用耐久ＭｇＯ−ＭｇＦ２複合膜を形成する方法

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Country Status (4)

Country Link
US (2) US20120307353A1 (enExample)
EP (1) EP2715412B1 (enExample)
JP (2) JP2015501001A (enExample)
WO (1) WO2012166484A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022065000A1 (enExample) * 2020-09-23 2022-03-31
JP2022084788A (ja) * 2016-05-03 2022-06-07 アプライド マテリアルズ インコーポレイテッド 保護金属オキシフッ化物コーティング

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Publication number Priority date Publication date Assignee Title
US10502965B2 (en) 2014-09-17 2019-12-10 Corning Incorporated High-efficiency multiwavelength beam expander employing dielectric-enhanced mirrors
US20170066684A1 (en) * 2015-09-08 2017-03-09 Corning Incorporated Optical coatings including buffer layers
DE102021206788A1 (de) * 2021-06-30 2023-01-05 Carl Zeiss Smt Gmbh Verfahren zum Abscheiden einer Schicht, optisches Element und optische Anordnung für den DUV-Wellenlängenbereich

Citations (10)

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US4057316A (en) * 1975-02-18 1977-11-08 Balzers Patent- Und Beteiligungs-Aktiengesellschaft Reflection reducing multilayer system on a highly refractive infrared transmitting substrate
JPH06313802A (ja) * 1993-04-28 1994-11-08 Topcon Corp 赤外域多層膜
JPH08114701A (ja) * 1994-10-14 1996-05-07 Topcon Corp 赤外反射防止膜
JPH08310840A (ja) * 1995-05-16 1996-11-26 Nippon Sheet Glass Co Ltd 反射防止膜
JPH10282304A (ja) * 1998-05-22 1998-10-23 Nikon Corp 光学薄膜
JPH11106899A (ja) * 1997-10-02 1999-04-20 Olympus Optical Co Ltd 光学薄膜の製造方法
JP2002047565A (ja) * 2000-03-13 2002-02-15 Canon Inc 薄膜の製造方法および光学装置
JP2005281726A (ja) * 2004-03-26 2005-10-13 Ntt Afty Corp プラズマ成膜方法及びその装置
WO2009150855A1 (ja) * 2008-06-13 2009-12-17 パナソニック株式会社 情報記録媒体とそれを用いた記録再生方法
JP2010501736A (ja) * 2006-08-25 2010-01-21 コーニング インコーポレイテッド 滑らかで緻密な光学膜を製造する方法

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JP3625876B2 (ja) * 1994-11-14 2005-03-02 オリンパス株式会社 光学薄膜の製造方法および該光学薄膜を有する光学部品
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JP4184706B2 (ja) * 2002-04-30 2008-11-19 浜松ホトニクス株式会社 反射防止膜の製造方法
JP2006065140A (ja) * 2004-08-30 2006-03-09 Canon Inc 反射防止膜、当該反射防止膜を有する光学系、露光装置、並びに、デバイス製造方法
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JPH06313802A (ja) * 1993-04-28 1994-11-08 Topcon Corp 赤外域多層膜
JPH08114701A (ja) * 1994-10-14 1996-05-07 Topcon Corp 赤外反射防止膜
JPH08310840A (ja) * 1995-05-16 1996-11-26 Nippon Sheet Glass Co Ltd 反射防止膜
JPH11106899A (ja) * 1997-10-02 1999-04-20 Olympus Optical Co Ltd 光学薄膜の製造方法
JPH10282304A (ja) * 1998-05-22 1998-10-23 Nikon Corp 光学薄膜
JP2002047565A (ja) * 2000-03-13 2002-02-15 Canon Inc 薄膜の製造方法および光学装置
JP2005281726A (ja) * 2004-03-26 2005-10-13 Ntt Afty Corp プラズマ成膜方法及びその装置
JP2010501736A (ja) * 2006-08-25 2010-01-21 コーニング インコーポレイテッド 滑らかで緻密な光学膜を製造する方法
WO2009150855A1 (ja) * 2008-06-13 2009-12-17 パナソニック株式会社 情報記録媒体とそれを用いた記録再生方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022084788A (ja) * 2016-05-03 2022-06-07 アプライド マテリアルズ インコーポレイテッド 保護金属オキシフッ化物コーティング
JP7576057B2 (ja) 2016-05-03 2024-10-30 アプライド マテリアルズ インコーポレイテッド 保護金属オキシフッ化物コーティング
JPWO2022065000A1 (enExample) * 2020-09-23 2022-03-31
WO2022065000A1 (ja) * 2020-09-23 2022-03-31 Ａｇｃ株式会社 遠赤外線透過部材及び遠赤外線透過部材の製造方法
JP7719337B2 (ja) 2020-09-23 2025-08-06 Ａｇｃ株式会社 車両用ガラス及び車両用ガラスの製造方法

Also Published As

Publication number Publication date
US20120307353A1 (en) 2012-12-06
EP2715412B1 (en) 2019-09-04
US9963773B2 (en) 2018-05-08
WO2012166484A1 (en) 2012-12-06
US20170175245A1 (en) 2017-06-22
EP2715412A1 (en) 2014-04-09
JP2017095805A (ja) 2017-06-01
JP6381687B2 (ja) 2018-08-29

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