JP2010501736A - 滑らかで緻密な光学膜を製造する方法 - Google Patents
滑らかで緻密な光学膜を製造する方法 Download PDFInfo
- Publication number
- JP2010501736A JP2010501736A JP2009526626A JP2009526626A JP2010501736A JP 2010501736 A JP2010501736 A JP 2010501736A JP 2009526626 A JP2009526626 A JP 2009526626A JP 2009526626 A JP2009526626 A JP 2009526626A JP 2010501736 A JP2010501736 A JP 2010501736A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- plasma
- film
- coating
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 5
- 239000012788 optical film Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 claims abstract description 64
- 239000000463 material Substances 0.000 claims abstract description 60
- 238000000576 coating method Methods 0.000 claims abstract description 56
- 238000000034 method Methods 0.000 claims abstract description 54
- 239000011248 coating agent Substances 0.000 claims abstract description 51
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 31
- 230000003287 optical effect Effects 0.000 claims abstract description 28
- 239000000203 mixture Substances 0.000 claims abstract description 20
- 230000003746 surface roughness Effects 0.000 claims abstract description 18
- 230000002441 reversible effect Effects 0.000 claims abstract description 13
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 9
- 239000010408 film Substances 0.000 claims description 80
- 238000000151 deposition Methods 0.000 claims description 58
- 230000008021 deposition Effects 0.000 claims description 50
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 34
- 150000002500 ions Chemical class 0.000 claims description 29
- 230000004907 flux Effects 0.000 claims description 23
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 19
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 16
- 229910052760 oxygen Inorganic materials 0.000 claims description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 15
- 239000001301 oxygen Substances 0.000 claims description 15
- 229910052786 argon Inorganic materials 0.000 claims description 14
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 13
- 239000007789 gas Substances 0.000 claims description 13
- 238000000869 ion-assisted deposition Methods 0.000 claims description 12
- 239000005350 fused silica glass Substances 0.000 claims description 11
- 239000010409 thin film Substances 0.000 claims description 10
- 238000010894 electron beam technology Methods 0.000 claims description 7
- 229910052724 xenon Inorganic materials 0.000 claims description 7
- -1 Ta 2 O 5 Inorganic materials 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 6
- 238000005137 deposition process Methods 0.000 claims description 6
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 6
- 229910004140 HfO Inorganic materials 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910001515 alkali metal fluoride Inorganic materials 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 239000005387 chalcogenide glass Substances 0.000 claims description 3
- 230000005670 electromagnetic radiation Effects 0.000 claims description 3
- 239000005304 optical glass Substances 0.000 claims description 3
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 229910000449 hafnium oxide Inorganic materials 0.000 abstract description 3
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 abstract description 3
- 238000002360 preparation method Methods 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 238000009499 grossing Methods 0.000 description 26
- 230000008569 process Effects 0.000 description 14
- 239000002356 single layer Substances 0.000 description 13
- 238000001659 ion-beam spectroscopy Methods 0.000 description 12
- 239000010410 layer Substances 0.000 description 12
- 238000010521 absorption reaction Methods 0.000 description 8
- 230000003993 interaction Effects 0.000 description 6
- 230000006872 improvement Effects 0.000 description 5
- 230000000670 limiting effect Effects 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 238000010494 dissociation reaction Methods 0.000 description 4
- 230000005593 dissociations Effects 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 229910052756 noble gas Inorganic materials 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 238000000089 atomic force micrograph Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011065 in-situ storage Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 229910004261 CaF 2 Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 229910052743 krypton Inorganic materials 0.000 description 2
- 229910052752 metalloid Inorganic materials 0.000 description 2
- 150000002738 metalloids Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- 235000019592 roughness Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 238000000427 thin-film deposition Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000000825 ultraviolet detection Methods 0.000 description 2
- 229910016036 BaF 2 Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000007619 statistical method Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
真空チャンバを用意し、このチャンバ内に、
コーティングをその上に堆積すべき基板を提供し、
少なくとも1種類の選択されたコーティング材料源、またはコーティング材料源の混合物を提供し、電子ビームを用いて前記材料を蒸発させて、コーティング材料蒸気流束(flux)を提供する工程であって、その流束が、前記材料源から逆マスク(reversed mask)を通して前記基板に流れるものである工程、
プラズマ源からプラズマイオンを提供する工程、
前記基板を選択された回転数fで回転させる工程、および
この基板上にコーティング材料を堆積させ、材料の堆積プロセス前と間に、基板と堆積した材料にプラズマイオンを衝突させる工程、
を有してなる方法に関する。
堆積流束分布およびそのプラズマイオンとの相互作用が、膜の微小構造の改善のために重要な役割を果たすことが知られている。図1は、標的29に衝突して、基板21上の堆積のための逆マスク24を通る蒸気流束20を生成する電子ビーム28、基板21が中に配置されている真空チャンバ26を有する堆積設備10を示している。それに加え、プラズマ22を生成するプラズマ源23がある。図1に示したように、2つの区域αとβがあり、そこでは、プラズマイオンの堆積材料との相互作用の機構が互いに著しく異なっている。区域αにおいて、プラズマイオンは堆積原子と衝突すると同時に、運動量が移行されて、圧縮された緻密な層が形成される。区域βにおいて、プラズマイオンは、堆積表面と連続的に衝突し、ここで、堆積は起こらず、運動量が移行されて、滑らかなコーティング表面が得られる。コーティングプロセス全体は、等式(1):
斜角堆積は、多孔質微小構造を持つ薄膜を成長させるために使用できる方法であることも知られている。堆積プロセス中の自己遮蔽効果を利用することによって、ナノ構造形成の基本的理解を求める多数の団体によって[Robbie, J. Vac Sci. Technol. A, Vol. 15(3) (1997), pp. 1460-1465; Liu, J. Appl. Phys., Vol. 85(8) (1999), pp 5486-5488; Hodgkinson, Microelectronic Engineering, Vol. 57-58 (2001), pp. 833-836; Dick, J. Vac Sci. Technol. B, Vol.21(1) (2003), pp. 23-28, and Vol. 21(6) (2003), pp. 2569-2575; Smy, J. Vac Sci. Technol. A, Vol. 18(5) (2000), pp. 2507-2512; Horn, Nanotechnology, Vol. 15 (2004), pp. 303-310; _2004, )を参照のこと]、光学フィルタおよび偏光子[Hodgkinson, Optics & Laser Technology, Vol. 31 (1999), pp. 295-298; Hodgkinson, Optics Communications, Vol. 177 (2000), pp. 79-84 and Vol. 210 (2002), pp. 201-211参照のこと]、反射器[Kim, Appl. Phys Lett., Vol. 88 (2006), p. 13501]、フォトニック結晶[Toader, Science, Vol. 292 (2001), pp. 1133-1135; and Kennedy, J. Vac Sci. Technol. B, Vol. 22(3), pp. 1184-1190]などの様々な用途のために、ナノポーラス薄膜が開発されてきた。最近、Xi, Optics Letters, Vol. 31 (2006), pp. 601-601により、ナノポーラスシリカ薄膜の屈折率が、700nmの波長で、1.08ほど低くできることが示された。その上、本出願人の実施において、多層コーティングのナノポーラス構造体の除去が、低損失のUVおよびDUV光学部品にとって重大であることがよく理解されている。しかしながら、ここに開示されているように、斜角堆積におけるナノポーラス構造体の形成の機構により、それが適切に適用されれば、緻密で滑らかな多層コーティングを製造できることが分かった。図2は、原子拡散が制限された条件下で基板21の垂線からΦの角度[蒸気流束角]で到達する流束により、膜32が静止した基板21上に堆積されると仮定したときの、堆積蒸気流束22および膜の柱状方向の概略図である。その結果、堆積した膜の柱状微小構造が、図2に示したように、ψの入射角で形成される。柱の入射角ψは、膜の垂線と蒸気流束の入射角Φとの間にあり、堆積された材料、基板の温度、堆積流束の角度分布、バックグラウンドのガス圧と組成およびプラズマの運動量移行を含む多くの堆積パラメータに依存する。回転数fは4から20rpmの範囲の値を有する。好ましい範囲は12から15rpmである。例示の値は14rpmである。
等式(1)により記載されたように、プラズマの堆積された表面との相互作用は、堆積が行われず、プラズマ平滑化のみしか起こらない区域β内で継続する。プラズマの平滑化効果は、標準的なプラズマ支援膜上のプラズマ処理を延長させることによって実証できる。図4は、プラズマ平滑化(PS)時間の関数としてのHfO2単層の偏光モデル化表面粗さを示すグラフである。表面粗さは、プラズマ平滑化の2分以内に急激に減少するのが分かる。延長されたプラズマ平滑化(最初の2分後の時間)は、初期段階におけるほど効果的ではない。(全体的に、プラズマ平滑化時間は、>0〜10分の範囲、好ましくは1〜4分の範囲にある。プラズマ平滑化は、任意のコーティング材料または膜の堆積の前に基板に行っても差し支えなく、またコーティングまたは膜が基板に完全に堆積された後に、追加の平滑化を行っても差し支えない。)表1は、プラズマ平滑化(PS)時間の関数としてのHfO2層の厚さおよび表面粗さの両方を列記している。偏光モデル化により、プラズマ平滑化は、プラズマと表面との相互作用の結果として、材料を数ナノメートル除去することが示唆される。偏光モデル化とAFM測定の両方が、表面粗さの減少を示している。
逆マスクの取付けにより、区域α内の堆積角が制限されると同時に、区域β内でその場でのプラズマ平滑化が行われる。この区域βにおいて、プラズマ平滑化は、ほぼ原子層基準で堆積された膜の表面で連続的に起こる。
20 蒸気流束
21 基板
23 プラズマ源
24 逆マスク
26 真空チャンバ
28 電子ビーム
29 標的
Claims (10)
- プラズマイオン支援堆積を用いて基板の表面上に選択された材料の薄膜を堆積させる方法であって、
真空チャンバを用意し、このチャンバ内に、
コーティングをその上に堆積すべき基板を提供し、
少なくとも1種類の選択されたコーティング材料源、またはコーティング材料源の混合物を提供し、電子ビームを用いて前記材料を蒸発させて、コーティング材料蒸気流束を提供する工程であって、該流束が、前記材料源から逆マスクを通して前記基板に流れるものである工程、
プラズマ源からプラズマイオンを提供する工程、
前記基板を選択された回転数fで回転させる工程、および
前記基板上にコーティング膜としてコーティング材料を堆積させ、材料の堆積プロセス前と間に、前記基板と前記膜に前記プラズマイオンを衝突させる工程、
を有してなり、
前記流束が、20°以下の角度ψで前記基板に送達されることを特徴とする方法。 - 前記少なくとも1種類の選択されたコーティング材料源の提供が、Al2O3、SiO2、HfO2、Si3N4、TiO2、Ta2O5、ScO2、Y2O3およびZrO2、並びにそれらの混合物からなる群より選択される材料の提供を含むことを特徴とする請求項1記載の方法。
- 前記膜が、入射角ωで形成された柱状微小構造で堆積され、該入射角ωが0°から18°の範囲にある値であることを特徴とする請求項1記載の方法。
- 前記プラズマイオンがプラズマガスから形成され、該プラズマガスが、アルゴン、キセノン、およびアルゴンまたはキセノンと酸素との混合物から選択されることを特徴とする請求項1記載の方法。
- 前記基板が、シリコン(Si);混合アルカリ金属フッ化物単結晶を含むアルカリ金属フッ化物単結晶;溶融シリカ;フッ素ドープト溶融シリカ;TiO2、Al2O3、B2O3、SnOおよびZrO2からなる群より選択される少なくとも1種類の物質がドープされた溶融シリカ;シリカ(SiO2);TiO2、Al2O3、B2O3、SnOおよびZrO2からなる群より選択される少なくとも1種類の物質がドープされたシリカ;光学ガラス;およびZnS、ZnSeおよびAs2S3カルコゲニドガラス:からなる群より選択されることを特徴とする請求項1記載の方法。
- 前記基板の表面を緻密化し、平滑化するために、前記コーティング材料の堆積の前に、前記基板に前記プラズマイオンを衝突させる追加の工程を含み、前記衝突工程が、1から4分の範囲の時間に亘ることを特徴とする請求項1記載の方法。
- それによって被覆基板を形成するために、基板および該基板上の選択された材料の滑らかで緻密な薄いコーティングを有してなる光学素子であって、
前記被覆基板が、約200nmから約400nmの範囲の電磁放射線に対して透明であり、
該被覆基板が、<1.0nm rmsの被覆表面粗さを有することを特徴とする光学素子。 - 前記被覆表面の表面粗さが<0.5nm rmsであることを特徴とする請求項7記載の光学素子。
- 前記基板が、シリコン、SiO2、溶融シリカ、光学ガラス、ゲルマニウム、フッ素ドープト溶融シリカ、TiO2ドープトシリカ、TiO2ドープト溶融シリカ、並びにZnSe、As2S3およびZnSカルコゲニドガラスからなる群より選択されることを特徴とする請求項7記載の光学素子。
- 前記コーティング材料が、Al2O3、SiO2、HfO2、TiO2およびZrO2、並びにこれらの内の少なくとも2つの混合物からなる群より選択される酸化物であることを特徴とする請求項7記載の光学素子。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/510,140 US7465681B2 (en) | 2006-08-25 | 2006-08-25 | Method for producing smooth, dense optical films |
US11/510,140 | 2006-08-25 | ||
PCT/US2007/018332 WO2008027225A1 (en) | 2006-08-25 | 2007-08-17 | Method for producing smooth, dense optical films |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010501736A true JP2010501736A (ja) | 2010-01-21 |
JP5265547B2 JP5265547B2 (ja) | 2013-08-14 |
Family
ID=39136234
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009526626A Active JP5265547B2 (ja) | 2006-08-25 | 2007-08-17 | 滑らかで緻密な光学膜を製造する方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US7465681B2 (ja) |
EP (2) | EP2054160B1 (ja) |
JP (1) | JP5265547B2 (ja) |
KR (1) | KR20090045382A (ja) |
TW (1) | TWI397949B (ja) |
WO (1) | WO2008027225A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013525610A (ja) * | 2010-04-30 | 2013-06-20 | コーニング インコーポレイテッド | Mo/Si多層プラズマアシスト蒸着 |
JP2015501001A (ja) * | 2011-05-31 | 2015-01-08 | コーニング インコーポレイテッド | 赤外光反射防止膜用耐久MgO−MgF2複合膜 |
JP2021036349A (ja) * | 2014-09-17 | 2021-03-04 | コーニング インコーポレイテッド | 誘電体強化ミラーを採用した高効率多波長ビームエキスパンダ |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101469404B (zh) * | 2007-12-27 | 2012-09-19 | 鸿富锦精密工业(深圳)有限公司 | 镀膜方法 |
US8399110B2 (en) * | 2008-05-29 | 2013-03-19 | Corning Incorporated | Adhesive, hermetic oxide films for metal fluoride optics and method of making same |
JP4823293B2 (ja) * | 2008-10-31 | 2011-11-24 | 株式会社シンクロン | 成膜方法及び成膜装置 |
US8153241B2 (en) * | 2009-02-26 | 2012-04-10 | Corning Incorporated | Wide-angle highly reflective mirrors at 193NM |
US8107070B2 (en) * | 2009-06-11 | 2012-01-31 | University Of Georgia Research Foundation, Inc. | Methods of melamine detection and quantification |
DE102009034532A1 (de) | 2009-07-23 | 2011-02-03 | Msg Lithoglas Ag | Verfahren zum Herstellen einer strukturierten Beschichtung auf einem Substrat, beschichtetes Substrat sowie Halbzeug mit einem beschichteten Substrat |
DE102010039779A1 (de) * | 2009-08-28 | 2011-03-24 | Corning Inc. | Glas mit geringer wärmeausdehnung für euvl-anwendungen |
JP2011100111A (ja) * | 2009-10-09 | 2011-05-19 | Seiko Epson Corp | 光学物品、光学物品の製造方法、電子機器 |
MX2012010842A (es) * | 2010-03-22 | 2013-04-03 | Luxxotica Us Holdings Corp | Deposicion auxliada por haz ionico de recubrimientos para lentes oftalmicas. |
US8741394B2 (en) | 2010-03-25 | 2014-06-03 | Novellus Systems, Inc. | In-situ deposition of film stacks |
US9028924B2 (en) | 2010-03-25 | 2015-05-12 | Novellus Systems, Inc. | In-situ deposition of film stacks |
US20140199493A1 (en) * | 2011-09-30 | 2014-07-17 | Shincron Co., LTD | Film formation method and film formation apparatus |
US8810789B2 (en) | 2011-11-07 | 2014-08-19 | University Of Georgia Research Foundation, Inc. | Thin layer chromatography-surfaced enhanced Raman spectroscopy chips and methods of use |
US20130135712A1 (en) | 2011-11-29 | 2013-05-30 | Horst Schreiber | Yttrium oxide coated optical elements with improved mid-infrared performance |
US9165788B2 (en) | 2012-04-06 | 2015-10-20 | Novellus Systems, Inc. | Post-deposition soft annealing |
TWI588517B (zh) * | 2012-05-15 | 2017-06-21 | Hoya Corp | 光學元件 |
WO2013172791A1 (en) * | 2012-05-16 | 2013-11-21 | National University Of Singapore | A method and an apparatus for depositing a layer onto a workpiece using plasma |
US9117668B2 (en) | 2012-05-23 | 2015-08-25 | Novellus Systems, Inc. | PECVD deposition of smooth silicon films |
US9482790B2 (en) | 2012-05-31 | 2016-11-01 | Corning Incorporated | Silica-modified-fluoride broad angle anti-reflection coatings |
US9388491B2 (en) | 2012-07-23 | 2016-07-12 | Novellus Systems, Inc. | Method for deposition of conformal films with catalysis assisted low temperature CVD |
US9932664B2 (en) * | 2012-11-06 | 2018-04-03 | Purdue Research Foundation | Methods for directed irradiation synthesis with ion and thermal beams |
US9581742B2 (en) | 2012-11-20 | 2017-02-28 | Corning Incorporated | Monolithic, linear glass polarizer and attenuator |
US8895415B1 (en) | 2013-05-31 | 2014-11-25 | Novellus Systems, Inc. | Tensile stressed doped amorphous silicon |
US10295707B2 (en) | 2014-02-27 | 2019-05-21 | Corning Incorporated | Durability coating for oxide films for metal fluoride optics |
MX2016014265A (es) | 2014-06-30 | 2017-02-06 | Halliburton Energy Services Inc | Sistema y metodo para depositar de elementos informaticos integrados (ice, por su sigla en ingles) utilizando una etapa de traslado. |
WO2018013757A2 (en) | 2016-07-14 | 2018-01-18 | Corning Incorporated | Methods of reducing surface roughness of reflectance coatings for duv mirrors |
US20180024276A1 (en) | 2016-07-21 | 2018-01-25 | Corning Incorporated | Optical elements with stress-balancing coatings |
US10995624B2 (en) * | 2016-08-01 | 2021-05-04 | General Electric Company | Article for high temperature service |
JP7146370B2 (ja) | 2017-05-19 | 2022-10-04 | 新明和工業株式会社 | 特装車両 |
KR102248000B1 (ko) * | 2019-10-24 | 2021-05-04 | 권순영 | 플라즈마 저항성을 갖는 코팅층 형성방법 |
US20220364221A1 (en) * | 2019-10-24 | 2022-11-17 | Soon Young Kwon | Method for forming coating layer having plasma resistance |
US11661650B2 (en) | 2020-04-10 | 2023-05-30 | Applied Materials, Inc. | Yttrium oxide based coating composition |
US20220049345A1 (en) * | 2020-08-17 | 2022-02-17 | Kla Corporation | Fluorine-doped optical materials for optical components |
WO2022117130A1 (en) | 2020-12-03 | 2022-06-09 | Univerzita Palackého v Olomouci | Device for deposition of dielectric optical thin films by the help of sputtering plasma sources and sources of energy ions |
CN112505803A (zh) * | 2020-12-08 | 2021-03-16 | 云南北方驰宏光电有限公司 | 一种ZnSe基底7.7-9.5μm波段高耐用性减反膜及制备方法 |
CN112877648B (zh) * | 2021-01-14 | 2022-07-26 | 北方夜视技术股份有限公司 | 一种微孔光学元件输入增强膜镀膜工装 |
KR102349212B1 (ko) * | 2021-04-28 | 2022-01-07 | 권순영 | 조성 조절이 가능한 코팅층 형성방법 |
DE102022133621A1 (de) | 2022-12-16 | 2024-06-27 | TechIFab GmbH | Vorrichtungen und verfahren zum sputtern von mindestens zwei elementen |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05341122A (ja) * | 1992-06-04 | 1993-12-24 | Asahi Optical Co Ltd | 紫外線照射装置の多層膜フィルタ |
JP2000265261A (ja) * | 1999-03-18 | 2000-09-26 | Sony Corp | 真空蒸着装置 |
JP2001074931A (ja) * | 1999-08-31 | 2001-03-23 | Nikon Corp | 光学薄膜及び光学素子及び光学装置 |
JP2004170757A (ja) * | 2002-11-21 | 2004-06-17 | Victor Co Of Japan Ltd | 液晶プロジェクタ装置用偏光板及びその製造方法 |
JP2004240168A (ja) * | 2003-02-06 | 2004-08-26 | Nikon Corp | 光学素子および露光装置 |
JP2006072364A (ja) * | 2004-08-31 | 2006-03-16 | Corning Inc | 金属フッ化物エキシマ光学素子の表面形成の改良 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4793908A (en) | 1986-12-29 | 1988-12-27 | Rockwell International Corporation | Multiple ion source method and apparatus for fabricating multilayer optical films |
US4910043A (en) * | 1987-07-16 | 1990-03-20 | Texas Instruments Incorporated | Processing apparatus and method |
US5098737A (en) | 1988-04-18 | 1992-03-24 | Board Of Regents The University Of Texas System | Amorphic diamond material produced by laser plasma deposition |
US5368942A (en) | 1993-01-15 | 1994-11-29 | The United States Of America As Represented By The Secreatary Of Commerce | Method of adhering substrates |
DE4430363A1 (de) * | 1994-08-26 | 1996-02-29 | Leybold Ag | Optische Linse aus einem klarsichtigen Kunststoff |
JP3548327B2 (ja) | 1995-03-17 | 2004-07-28 | キヤノン株式会社 | 電子写真用光受容部材 |
US6280838B1 (en) * | 1997-01-10 | 2001-08-28 | U. S. Philips Corporation | Optical element, a display device provided with said optical element, and a method of manufacturing the optical element |
WO2002032588A1 (en) * | 2000-10-17 | 2002-04-25 | Neophotonics Corporation | Coating formation by reactive deposition |
WO1999046421A1 (en) | 1998-03-13 | 1999-09-16 | Honeywell Inc. | Ion assisted electron beam deposition of ring laser gyro mirrors |
US6039806A (en) * | 1998-04-20 | 2000-03-21 | E-Tek Dynamics, Inc. | Precision thickness optical coating system and method of operation thereof |
US6468598B1 (en) | 1998-10-02 | 2002-10-22 | Ebara Corporation | Magnetic disk and method of making thereof |
US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
JP3951514B2 (ja) | 1999-08-11 | 2007-08-01 | 日本電気硝子株式会社 | シリカリン酸スズ系ガラス及び封着材料 |
US6866255B2 (en) | 2002-04-12 | 2005-03-15 | Xerox Corporation | Sputtered spring films with low stress anisotropy |
DE10222609B4 (de) | 2002-04-15 | 2008-07-10 | Schott Ag | Verfahren zur Herstellung strukturierter Schichten auf Substraten und verfahrensgemäß beschichtetes Substrat |
US20060051584A1 (en) | 2002-04-15 | 2006-03-09 | Florian Bieck | Process for producing a product having a structured surface |
AU2003245876A1 (en) | 2002-04-15 | 2003-10-27 | Schott Ag | Method for forming housings for electronic components and electronic components that are hermetically encapsulated thereby |
US7863200B2 (en) | 2002-04-15 | 2011-01-04 | Schott Ag | Process of vapor depositing glass layers for wafer-level hermetic encapsulation of electronic modules |
JP2005528783A (ja) | 2002-04-15 | 2005-09-22 | ショット アーゲー | 電子回路用のコピー防止を作成する方法 |
CA2485185A1 (en) | 2002-05-23 | 2003-12-04 | Schott Ag | Method for producing a component comprising a conductor structure that is suitable for use at high frequencies |
WO2004043691A1 (en) | 2002-11-12 | 2004-05-27 | University Of Virginia Patent Foundation | Extremely strain tolerant thermal protection coating and related method and apparatus thereof |
WO2005079385A2 (en) * | 2004-02-13 | 2005-09-01 | Coronado Technology Group, L.L.C. | Fabrication of narrow-band thin-film optical filters |
US8741550B2 (en) | 2004-06-09 | 2014-06-03 | Schott Ag | Building up diffractive optics by structured glass coating |
JP5324784B2 (ja) * | 2004-10-21 | 2013-10-23 | コーニング インコーポレイテッド | 開口部を有する不透明クロム被膜を備えた光学素子およびその作成方法 |
US7491431B2 (en) * | 2004-12-20 | 2009-02-17 | Nanogram Corporation | Dense coating formation by reactive deposition |
DE102004063703A1 (de) | 2004-12-28 | 2006-07-06 | Schott Ag | Vakuumbeschichtungssystem |
-
2006
- 2006-08-25 US US11/510,140 patent/US7465681B2/en active Active
-
2007
- 2007-08-17 WO PCT/US2007/018332 patent/WO2008027225A1/en active Application Filing
- 2007-08-17 JP JP2009526626A patent/JP5265547B2/ja active Active
- 2007-08-17 EP EP07837042A patent/EP2054160B1/en active Active
- 2007-08-17 KR KR1020097006072A patent/KR20090045382A/ko active Search and Examination
- 2007-08-17 EP EP12166194.6A patent/EP2484453B1/en active Active
- 2007-08-22 TW TW096131183A patent/TWI397949B/zh active
-
2008
- 2008-11-07 US US12/267,005 patent/US7683450B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05341122A (ja) * | 1992-06-04 | 1993-12-24 | Asahi Optical Co Ltd | 紫外線照射装置の多層膜フィルタ |
JP2000265261A (ja) * | 1999-03-18 | 2000-09-26 | Sony Corp | 真空蒸着装置 |
JP2001074931A (ja) * | 1999-08-31 | 2001-03-23 | Nikon Corp | 光学薄膜及び光学素子及び光学装置 |
JP2004170757A (ja) * | 2002-11-21 | 2004-06-17 | Victor Co Of Japan Ltd | 液晶プロジェクタ装置用偏光板及びその製造方法 |
JP2004240168A (ja) * | 2003-02-06 | 2004-08-26 | Nikon Corp | 光学素子および露光装置 |
JP2006072364A (ja) * | 2004-08-31 | 2006-03-16 | Corning Inc | 金属フッ化物エキシマ光学素子の表面形成の改良 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013525610A (ja) * | 2010-04-30 | 2013-06-20 | コーニング インコーポレイテッド | Mo/Si多層プラズマアシスト蒸着 |
JP2015501001A (ja) * | 2011-05-31 | 2015-01-08 | コーニング インコーポレイテッド | 赤外光反射防止膜用耐久MgO−MgF2複合膜 |
US9963773B2 (en) | 2011-05-31 | 2018-05-08 | Corning Incorporated | Durable MgO—MgF2 composite film for infrared anti-reflection coatings |
JP2021036349A (ja) * | 2014-09-17 | 2021-03-04 | コーニング インコーポレイテッド | 誘電体強化ミラーを採用した高効率多波長ビームエキスパンダ |
Also Published As
Publication number | Publication date |
---|---|
TWI397949B (zh) | 2013-06-01 |
EP2484453B1 (en) | 2017-07-12 |
EP2054160B1 (en) | 2012-07-18 |
US20080050910A1 (en) | 2008-02-28 |
TW200830369A (en) | 2008-07-16 |
US7465681B2 (en) | 2008-12-16 |
WO2008027225A1 (en) | 2008-03-06 |
US7683450B2 (en) | 2010-03-23 |
EP2054160A1 (en) | 2009-05-06 |
EP2484453A1 (en) | 2012-08-08 |
JP5265547B2 (ja) | 2013-08-14 |
KR20090045382A (ko) | 2009-05-07 |
EP2054160A4 (en) | 2011-05-18 |
US20090097105A1 (en) | 2009-04-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5265547B2 (ja) | 滑らかで緻密な光学膜を製造する方法 | |
US8153241B2 (en) | Wide-angle highly reflective mirrors at 193NM | |
JP3808917B2 (ja) | 薄膜の製造方法及び薄膜 | |
US8399110B2 (en) | Adhesive, hermetic oxide films for metal fluoride optics and method of making same | |
US8526104B2 (en) | Plasma ion assisted deposition of Mo/Si multilayer EUV coatings | |
KR20050076827A (ko) | 초 고투과율 위상편이 마스크 블랭크 | |
US20060023311A1 (en) | Method for obtaining a thin, stabilized fluorine-doped silica layer, resulting thin layer, and use thereof in ophthalmic optics | |
US20190169739A1 (en) | An interference coating or its part consisting layers with different porosity | |
US6797649B2 (en) | Method for depositing a fluorine-doped silica film | |
Goikhman et al. | Ion beam deposition for novel thin film materials and coatings | |
JP6366263B2 (ja) | 光学多層膜、光学レンズ及び光学多層膜の製造方法 | |
JP2009093068A (ja) | 耐擦傷性物品の製造方法 | |
CHAO | Coating technology | |
Khemasiri et al. | Tantalum oxide bio-photonics thin film grown by Gas-timing innovation technique | |
JP2004027268A (ja) | TiO2の成膜方法及びその装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100817 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110316 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120813 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120828 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20121128 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20121205 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20121225 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130107 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130128 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130402 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130501 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5265547 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |