JP2015501001A5 - - Google Patents

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Publication number
JP2015501001A5
JP2015501001A5 JP2014513578A JP2014513578A JP2015501001A5 JP 2015501001 A5 JP2015501001 A5 JP 2015501001A5 JP 2014513578 A JP2014513578 A JP 2014513578A JP 2014513578 A JP2014513578 A JP 2014513578A JP 2015501001 A5 JP2015501001 A5 JP 2015501001A5
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JP
Japan
Prior art keywords
film
optical element
range
mgf
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014513578A
Other languages
English (en)
Japanese (ja)
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JP2015501001A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2012/039230 external-priority patent/WO2012166484A1/en
Publication of JP2015501001A publication Critical patent/JP2015501001A/ja
Publication of JP2015501001A5 publication Critical patent/JP2015501001A5/ja
Pending legal-status Critical Current

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JP2014513578A 2011-05-31 2012-05-24 赤外光反射防止膜用耐久MgO−MgF2複合膜 Pending JP2015501001A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161491667P 2011-05-31 2011-05-31
US61/491,667 2011-05-31
PCT/US2012/039230 WO2012166484A1 (en) 2011-05-31 2012-05-24 DURABLE MgO-MgF2 COMPOSITE FILM FOR INFRARED ANTI-REFLECTION COATINGS

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017001061A Division JP6381687B2 (ja) 2011-05-31 2017-01-06 赤外光反射防止膜用耐久MgO−MgF2複合膜を形成する方法

Publications (2)

Publication Number Publication Date
JP2015501001A JP2015501001A (ja) 2015-01-08
JP2015501001A5 true JP2015501001A5 (enExample) 2015-06-18

Family

ID=46201852

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2014513578A Pending JP2015501001A (ja) 2011-05-31 2012-05-24 赤外光反射防止膜用耐久MgO−MgF2複合膜
JP2017001061A Expired - Fee Related JP6381687B2 (ja) 2011-05-31 2017-01-06 赤外光反射防止膜用耐久MgO−MgF2複合膜を形成する方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2017001061A Expired - Fee Related JP6381687B2 (ja) 2011-05-31 2017-01-06 赤外光反射防止膜用耐久MgO−MgF2複合膜を形成する方法

Country Status (4)

Country Link
US (2) US20120307353A1 (enExample)
EP (1) EP2715412B1 (enExample)
JP (2) JP2015501001A (enExample)
WO (1) WO2012166484A1 (enExample)

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US10502965B2 (en) 2014-09-17 2019-12-10 Corning Incorporated High-efficiency multiwavelength beam expander employing dielectric-enhanced mirrors
US20170066684A1 (en) * 2015-09-08 2017-03-09 Corning Incorporated Optical coatings including buffer layers
US11572617B2 (en) * 2016-05-03 2023-02-07 Applied Materials, Inc. Protective metal oxy-fluoride coatings
EP4220244A4 (en) * 2020-09-23 2024-11-20 Agc Inc. Far-infrared ray transmitting member and method for manufacturing far-infrared ray transmitting member
DE102021206788A1 (de) * 2021-06-30 2023-01-05 Carl Zeiss Smt Gmbh Verfahren zum Abscheiden einer Schicht, optisches Element und optische Anordnung für den DUV-Wellenlängenbereich

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CH588711A5 (enExample) * 1975-02-18 1977-06-15 Balzers Patent Beteilig Ag
US5165960A (en) * 1991-07-29 1992-11-24 Ford Motor Company Deposition of magnesium fluoride films
JPH06313802A (ja) * 1993-04-28 1994-11-08 Topcon Corp 赤外域多層膜
JP3526922B2 (ja) * 1994-10-14 2004-05-17 株式会社トプコン 赤外反射防止膜
JP3625876B2 (ja) * 1994-11-14 2005-03-02 オリンパス株式会社 光学薄膜の製造方法および該光学薄膜を有する光学部品
JPH08310840A (ja) * 1995-05-16 1996-11-26 Nippon Sheet Glass Co Ltd 反射防止膜
JP3987169B2 (ja) * 1997-10-02 2007-10-03 オリンパス株式会社 光学薄膜の製造方法
JPH10282304A (ja) * 1998-05-22 1998-10-23 Nikon Corp 光学薄膜
TW469465B (en) * 1998-12-10 2001-12-21 Mitsubishi Materials Corp Protective film for FPD and manufacture thereof, and FPD using the same
EP1134303B1 (en) 2000-03-13 2010-06-09 Canon Kabushiki Kaisha Thin film production process
JP3639795B2 (ja) * 2000-03-13 2005-04-20 キヤノン株式会社 薄膜の製造方法
JP2001262317A (ja) * 2000-03-17 2001-09-26 Olympus Optical Co Ltd 光学薄膜及びその製造方法
JP4184706B2 (ja) * 2002-04-30 2008-11-19 浜松ホトニクス株式会社 反射防止膜の製造方法
JP2005281726A (ja) * 2004-03-26 2005-10-13 Ntt Afty Corp プラズマ成膜方法及びその装置
JP2006065140A (ja) * 2004-08-30 2006-03-09 Canon Inc 反射防止膜、当該反射防止膜を有する光学系、露光装置、並びに、デバイス製造方法
US7465681B2 (en) 2006-08-25 2008-12-16 Corning Incorporated Method for producing smooth, dense optical films
EP1965229A3 (en) 2007-02-28 2008-12-10 Corning Incorporated Engineered fluoride-coated elements for laser systems
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US20110014398A1 (en) * 2008-04-09 2011-01-20 Ulvac, Inc. Film deposition apparatus and film deposition method
US8399110B2 (en) 2008-05-29 2013-03-19 Corning Incorporated Adhesive, hermetic oxide films for metal fluoride optics and method of making same
US8526293B2 (en) * 2008-06-13 2013-09-03 Panasonic Corporation Information recording medium and recording/reproducing method for the same
US8153241B2 (en) 2009-02-26 2012-04-10 Corning Incorporated Wide-angle highly reflective mirrors at 193NM
US8382823B2 (en) * 2009-05-28 2013-02-26 Snu R&Db Foundation Biodegradable stent and method for manufacturing the same
US8526104B2 (en) 2010-04-30 2013-09-03 Corning Incorporated Plasma ion assisted deposition of Mo/Si multilayer EUV coatings
JP5932251B2 (ja) * 2011-06-17 2016-06-08 キヤノン株式会社 フッ化膜形成方法及び光学素子の製造方法
US20140154510A1 (en) * 2011-07-11 2014-06-05 Panasonic Corporation Film structure and method for producing same

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