JP6381687B2 - 赤外光反射防止膜用耐久MgO−MgF2複合膜を形成する方法 - Google Patents
赤外光反射防止膜用耐久MgO−MgF2複合膜を形成する方法 Download PDFInfo
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- JP6381687B2 JP6381687B2 JP2017001061A JP2017001061A JP6381687B2 JP 6381687 B2 JP6381687 B2 JP 6381687B2 JP 2017001061 A JP2017001061 A JP 2017001061A JP 2017001061 A JP2017001061 A JP 2017001061A JP 6381687 B2 JP6381687 B2 JP 6381687B2
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- G02B1/113—Anti-reflection coatings using inorganic layer materials only
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Description
1.フッ素を欠損させ、フッ素を酸素で置換する−プラズマイオンによるMgO-MgF2複合膜の形成、
2.改良PIAD(プラズマイオン支援蒸着)を反転マスク法とともに用いるMgO-MgF2複合膜の緻密化、
3.その場プラズマ平滑化とプラズマ支援蒸着の比の調節によるMgO-MgF2複合膜の光学特性及び機械的特性の最適化、
の工程を用いて達成できることが本明細書に示される。
式(1)に基づけば、膜組成に与えられるプラズマ運動量転移量Pβは式(2):
上で論じたような高い膜充填密度及び改変された膜組成に加えて、平滑な膜表面が膜の耐久性を強化することを認識することも重要である。プラズマ平滑化に用いられるプラズマ運動量転移Pβは式(3):
改良MgO-MgF2複合膜には、IR光学素子に、特に改良MgO-MgF2複合膜がキャッピング層としてはたらき、高められた耐摩耗性及び環境安定性をもたらす、IR反射防止膜に、多くの可能な用途がある。例えば、MgO-MgF2複合膜はLWIR広帯域AR用途のためのキャッピング層として用いることができる。図4はLWIR広帯域AR膜の入射角12°における反射率(Rx)を、MgO-MgF2複合キャッピング層が無い場合(参照数字30)及びMgO-MgF2複合キャッピング層がある場合(参照数字32)について、グラフで示す。図4に示されるように、MgO-MgF2複合キャッピングコーティング層を有する光学素子の反射率は7.25μmから11.75μmの波長範囲において2%より低い。7.5μmから11.5μmの波長範囲において、反射率Rxは1%より低い。対照的に、MgO-MgF2複合キャッピングコーティング層をもたない膜の反射率は同じ波長範囲において2%より高い。
真空チャンバを提供する工程、及び
真空チャンバ内に、
膜がその上に蒸着されるべき基板を提供する工程、
MgF2材料源を提供する工程及び、膜材料蒸気束を供給するために、電子ビームを用いてMgF2材料を蒸発させる工程、
−蒸気束はMgF2材料源から反転マスクを通って基板に達する、
プラズマ源からのプラズマ内に酸素イオンを含むプラズマイオンを供給する工程、
基板を選ばれた回転周波数fで回転させる工程、
MgF2材料を基板上に被膜として蒸着する工程、及び
MgF2材料蒸着前及び蒸着中、基板及び被膜をプラズマイオンで衝撃する工程、
を含み、
方法は平滑で緻密であり、一様な複合MgO-MgF2被膜を形成する。
10 電子ビーム
12 反転マスク
16 プラズマ源
18 ターゲット
20 蒸気束
21 プラズマ
22 基板キャリア
24 基板
28 真空チャンバ
Claims (4)
- プラズマイオン支援蒸着を用いて基板の表面上に選ばれた材料の薄膜を蒸着する方法において、前記方法が、
真空チャンバを提供する工程、及び
前記チャンバ内に、
膜がその上に蒸着されるべき基板を提供する工程、
MgF2材料源を提供し、電子ビームを用いて前記MgF2材料を蒸発させて、膜材料の蒸気束を供給する工程であって、前記蒸気束は前記材料源から反転マスクを通って前記基板に達する工程、
プラズマ源からのプラズマ内の酸素イオンを含むプラズマイオンを供給する工程、
前記基板を選ばれた回転周波数fで回転させる工程、
前記MgF2材料を前記基板上に被膜として蒸着する工程、及び
前記MgF2材料の蒸着前及び蒸着中、前記基板及び前記被膜を前記プラズマイオンで衝撃する工程、
を含み、
前記方法が、平滑で緻密であり、一様な複合MgO-MgF2被膜を形成し、
前記複合MgO−MgF 2 被膜が、Mg原子がF原子及びO原子のいずれとも結合している結合構造を有するものである、
ことを特徴とする方法。 - 前記基板上に蒸着された前記膜材料が2ポンド(0.907kg)から2.5ポンド(1.134kg)の間の押付力を用いる磨耗試験に合格することを特徴とする請求項1に記載の方法。
- 前記複合MgO−MgF 2 被膜が100nmから1500nmの範囲の厚さを有することを特徴とする請求項1または2に記載の方法。
- 前記蒸着された前記膜材料に前記プラズマイオンを衝撃したときに、フッ素の欠損が起こることを特徴とする請求項1から3いずれか一項に記載の方法。
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US201161491667P | 2011-05-31 | 2011-05-31 | |
US61/491,667 | 2011-05-31 |
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JP2014513578A Division JP2015501001A (ja) | 2011-05-31 | 2012-05-24 | 赤外光反射防止膜用耐久MgO−MgF2複合膜 |
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JP2017001061A Expired - Fee Related JP6381687B2 (ja) | 2011-05-31 | 2017-01-06 | 赤外光反射防止膜用耐久MgO−MgF2複合膜を形成する方法 |
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US (2) | US20120307353A1 (ja) |
EP (1) | EP2715412B1 (ja) |
JP (2) | JP2015501001A (ja) |
WO (1) | WO2012166484A1 (ja) |
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WO2016044212A1 (en) | 2014-09-17 | 2016-03-24 | Corning Incorporated | High-efficiency multiwavelength beam expander employing dielectric-enhanced mirrors |
US20170066684A1 (en) * | 2015-09-08 | 2017-03-09 | Corning Incorporated | Optical coatings including buffer layers |
CN106271009B (zh) * | 2016-08-31 | 2018-08-24 | 中国工程物理研究院材料研究所 | 一种电子束焊机真空室内部辅助照明装置 |
EP4220244A1 (en) * | 2020-09-23 | 2023-08-02 | Agc Inc. | Far-infrared ray transmitting member and method for manufacturing far-infrared ray transmitting member |
DE102021206788A1 (de) * | 2021-06-30 | 2023-01-05 | Carl Zeiss Smt Gmbh | Verfahren zum Abscheiden einer Schicht, optisches Element und optische Anordnung für den DUV-Wellenlängenbereich |
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EP1134303B1 (en) * | 2000-03-13 | 2010-06-09 | Canon Kabushiki Kaisha | Thin film production process |
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-
2012
- 2012-05-18 US US13/475,009 patent/US20120307353A1/en not_active Abandoned
- 2012-05-24 JP JP2014513578A patent/JP2015501001A/ja active Pending
- 2012-05-24 WO PCT/US2012/039230 patent/WO2012166484A1/en active Application Filing
- 2012-05-24 EP EP12725241.9A patent/EP2715412B1/en active Active
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- 2017-01-06 JP JP2017001061A patent/JP6381687B2/ja not_active Expired - Fee Related
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EP2715412B1 (en) | 2019-09-04 |
EP2715412A1 (en) | 2014-04-09 |
US9963773B2 (en) | 2018-05-08 |
WO2012166484A1 (en) | 2012-12-06 |
US20120307353A1 (en) | 2012-12-06 |
JP2015501001A (ja) | 2015-01-08 |
US20170175245A1 (en) | 2017-06-22 |
JP2017095805A (ja) | 2017-06-01 |
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