JP2015212417A5 - - Google Patents
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- Publication number
- JP2015212417A5 JP2015212417A5 JP2015090607A JP2015090607A JP2015212417A5 JP 2015212417 A5 JP2015212417 A5 JP 2015212417A5 JP 2015090607 A JP2015090607 A JP 2015090607A JP 2015090607 A JP2015090607 A JP 2015090607A JP 2015212417 A5 JP2015212417 A5 JP 2015212417A5
- Authority
- JP
- Japan
- Prior art keywords
- acid
- fatty alcohol
- mixture
- group
- electrolytic bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 30
- -1 benzoic acid sulfimide anion Chemical class 0.000 claims 25
- 239000000203 mixture Substances 0.000 claims 24
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 20
- 239000002253 acid Substances 0.000 claims 16
- 229910052759 nickel Inorganic materials 0.000 claims 15
- 239000000080 wetting agent Substances 0.000 claims 12
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 9
- 125000000217 alkyl group Chemical group 0.000 claims 8
- 238000000151 deposition Methods 0.000 claims 8
- 150000002191 fatty alcohols Chemical class 0.000 claims 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 7
- 229910052739 hydrogen Inorganic materials 0.000 claims 7
- 239000001257 hydrogen Substances 0.000 claims 7
- 238000000034 method Methods 0.000 claims 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims 6
- 230000005588 protonation Effects 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 5
- 230000008021 deposition Effects 0.000 claims 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 4
- 239000007864 aqueous solution Substances 0.000 claims 4
- 125000004432 carbon atom Chemical group C* 0.000 claims 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 4
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 claims 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 4
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 claims 3
- 150000007513 acids Chemical class 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims 2
- NJHVMXFNIZTTBV-UHFFFAOYSA-N 2,2,2-tribromoethane-1,1-diol Chemical compound OC(O)C(Br)(Br)Br NJHVMXFNIZTTBV-UHFFFAOYSA-N 0.000 claims 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims 2
- 239000004327 boric acid Substances 0.000 claims 2
- 229910052792 caesium Inorganic materials 0.000 claims 2
- RNFNDJAIBTYOQL-UHFFFAOYSA-N chloral hydrate Chemical compound OC(O)C(Cl)(Cl)Cl RNFNDJAIBTYOQL-UHFFFAOYSA-N 0.000 claims 2
- 229960002327 chloral hydrate Drugs 0.000 claims 2
- 235000015165 citric acid Nutrition 0.000 claims 2
- 239000004310 lactic acid Substances 0.000 claims 2
- 235000014655 lactic acid Nutrition 0.000 claims 2
- 229910052744 lithium Inorganic materials 0.000 claims 2
- 239000001630 malic acid Substances 0.000 claims 2
- 235000011090 malic acid Nutrition 0.000 claims 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims 2
- 150000007522 mineralic acids Chemical class 0.000 claims 2
- 229910001453 nickel ion Inorganic materials 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 2
- 229910052700 potassium Inorganic materials 0.000 claims 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims 2
- 229910052701 rubidium Inorganic materials 0.000 claims 2
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims 2
- 229910052708 sodium Inorganic materials 0.000 claims 2
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 claims 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims 1
- 229910001369 Brass Inorganic materials 0.000 claims 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 229910020366 ClO 4 Inorganic materials 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- 239000010951 brass Substances 0.000 claims 1
- 150000001768 cations Chemical class 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 235000019253 formic acid Nutrition 0.000 claims 1
- 239000004615 ingredient Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000007524 organic acids Chemical class 0.000 claims 1
- 235000005985 organic acids Nutrition 0.000 claims 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 239000000243 solution Substances 0.000 claims 1
- 125000000542 sulfonic acid group Chemical group 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 0 CC(C)(C(*)C(C)(C)OS(*)=O)N=O Chemical compound CC(C)(C(*)C(C)(C)OS(*)=O)N=O 0.000 description 2
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014207778.8 | 2014-04-25 | ||
| DE102014207778.8A DE102014207778B3 (de) | 2014-04-25 | 2014-04-25 | Verwendung einer Mischung zur Verwendung in einem galvanischen Bad oder eines galvanischen Bades zur Herstellung einer Glanznickelschicht sowie Verfahren zur Herstellung eines Artikels mit einer Glanznickelschicht |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015212417A JP2015212417A (ja) | 2015-11-26 |
| JP2015212417A5 true JP2015212417A5 (enExample) | 2018-03-01 |
| JP6687331B2 JP6687331B2 (ja) | 2020-04-22 |
Family
ID=52997919
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015090607A Active JP6687331B2 (ja) | 2014-04-25 | 2015-04-27 | 光沢ニッケル層の析出のための電解浴、または光沢ニッケル層の析出のための電解浴中での使用のための混合物、および光沢ニッケル層を有する物品の製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP2937450B1 (enExample) |
| JP (1) | JP6687331B2 (enExample) |
| DE (1) | DE102014207778B3 (enExample) |
| HU (1) | HUE035050T2 (enExample) |
| PL (1) | PL2937450T3 (enExample) |
| PT (1) | PT2937450T (enExample) |
| SI (1) | SI2937450T1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105170922B (zh) * | 2015-10-19 | 2017-12-01 | 重庆天春科技有限公司 | 一种具有单质镍过渡层的结晶器铜管 |
| CN105200462A (zh) * | 2015-10-19 | 2015-12-30 | 姜少群 | 一种结晶器铜管的单质镍过渡层电镀方法 |
| CN106245070B (zh) * | 2016-10-21 | 2019-03-05 | 湘潭大学 | 一种用于镁合金电镀镍的组合镀液及镁合金表面电镀镍的方法 |
| JP7536452B2 (ja) * | 2017-06-23 | 2024-08-20 | アトテック ドイチェランド ゲーエムベーハー ウント コ カーゲー | 基材上に装飾ニッケルコーティングを堆積させるためのニッケル電気メッキ浴 |
| WO2019215287A1 (en) * | 2018-05-09 | 2019-11-14 | Atotech Deutschland Gmbh | Nickel comprising layer array and a method for its manufacturing |
| JP6542437B1 (ja) * | 2018-06-19 | 2019-07-10 | 奥野製薬工業株式会社 | 光沢ニッケルめっき方法及び光沢ニッケルめっき皮膜の制御方法。 |
| JP7190280B2 (ja) * | 2018-08-10 | 2022-12-15 | 株式会社Lixil | 水道用器具 |
| TWI734362B (zh) * | 2019-01-31 | 2021-07-21 | 美商麥克達米德恩索龍股份有限公司 | 用於製造鎳互連之組成物及方法 |
| KR102293664B1 (ko) * | 2019-11-12 | 2021-08-26 | 주식회사엘콤 | 니켈인 합금 도금을 위한 조성물 |
| JP7141780B1 (ja) | 2022-05-19 | 2022-09-26 | 奥野製薬工業株式会社 | めっき皮膜の製造方法。 |
| CN115161722A (zh) * | 2022-08-25 | 2022-10-11 | 环晟光伏(江苏)有限公司 | 镀镍液及其制备方法、太阳能电池的制备方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3528894A (en) * | 1966-08-25 | 1970-09-15 | M & T Chemicals Inc | Method of electrodepositing corrosion resistant coating |
| US3898138A (en) * | 1974-10-16 | 1975-08-05 | Oxy Metal Industries Corp | Method and bath for the electrodeposition of nickel |
| DE2450527C2 (de) | 1974-10-24 | 1982-09-16 | Henkel KGaA, 4000 Düsseldorf | Wäßriges, saures Bad zur galvanischen Abscheidung von halbglänzenden Nickelüberzügen |
| US4150232A (en) * | 1977-07-15 | 1979-04-17 | Cilag-Chemie A.G. | 1-Carboxymethyl-3-sulfoloweralkyl pyridinium betaine inner salts |
| DE2825966A1 (de) * | 1978-06-14 | 1980-01-03 | Basf Ag | Saures galvanisches nickelbad, das sulfobetaine als glanz- und einebnungsmittel enthaelt |
| US4430171A (en) | 1981-08-24 | 1984-02-07 | M&T Chemicals Inc. | Electroplating baths for nickel, iron, cobalt and alloys thereof |
| US4421611A (en) | 1982-09-30 | 1983-12-20 | Mcgean-Rohco, Inc. | Acetylenic compositions and nickel plating baths containing same |
| DE3722778A1 (de) | 1987-07-09 | 1989-03-09 | Raschig Ag | Polyalkylenglykol-naphthyl-3-sulfopropyl- diether und deren salze, verfahren zur herstellung dieser verbindungen und ihre verwendung als netzmittel in der galvanotechnik |
| DE3817722A1 (de) * | 1988-05-25 | 1989-12-14 | Raschig Ag | Verwendung von 2-substituierten ethansulfon-verbindungen als galvanotechnische hilfsstoffe |
| DE4013349A1 (de) * | 1990-04-23 | 1991-10-24 | Schering Ag | 1-(2-sulfoaethyl)pyridiniumbetain, verfahren zu dessen herstellung sowie saure nickelbaeder enthaltend diese verbindung |
| US5164069A (en) * | 1990-11-05 | 1992-11-17 | Shipley Company Inc. | Nickel electroplating solution and acetylenic compounds therefor |
| JP2962598B2 (ja) * | 1991-06-20 | 1999-10-12 | 荏原ユージライト株式会社 | マイクロポーラスクロムめっき方法 |
| DE59300569D1 (de) * | 1992-01-25 | 1995-10-12 | Basf Ag | Verfahren zur herstellung vernickelter formteile. |
| DE19610361A1 (de) * | 1996-03-15 | 1997-09-18 | Basf Ag | Bad und Verfahren für die galvanische Abscheidung von Halbglanznickel |
| JP2003138396A (ja) * | 2001-08-24 | 2003-05-14 | Toto Ltd | ニッケルクロムめっき方法及びそのめっきを施した水道用器具 |
| DE10327374B4 (de) | 2003-06-18 | 2006-07-06 | Raschig Gmbh | Verwendung von propansulfonierten und 2-Hydroxy-propansulfonierten Alkylaminaloxylaten als Hilfsmittel zur elektrolytischen Abscheidung von metallischen Schichten und galvanische Bäder enthaltend diese |
| US7442286B2 (en) * | 2004-02-26 | 2008-10-28 | Atotech Deutschland Gmbh | Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys |
| DE602008000878D1 (de) * | 2008-07-15 | 2010-05-06 | Atotech Deutschland Gmbh | Lösung und Verfahren zur elektrochemischen Abscheidung eines Metalls auf ein Substrat |
| DE102008056470B3 (de) * | 2008-11-05 | 2010-04-22 | Atotech Deutschland Gmbh | Verfahren zum Untersuchen einer Metallschicht und Verfahren zur analytischen Kontrolle eines zum Abscheiden der Metallschicht dienenden Abscheideelektrolyten |
| WO2010092622A1 (en) | 2009-02-13 | 2010-08-19 | Nissan Motor Co., Ltd. | Chrome-plated part and manufacturing method of the same |
| DE102011106099B4 (de) * | 2011-06-09 | 2016-06-02 | Keuco Gmbh & Co. Kg | Verfahren zur Beschichtung von Bauteilen |
| EP2801640A1 (en) | 2013-05-08 | 2014-11-12 | ATOTECH Deutschland GmbH | Galvanic nickel or nickel alloy electroplating bath for depositing a semi-bright nickel or nickel alloy |
-
2014
- 2014-04-25 DE DE102014207778.8A patent/DE102014207778B3/de active Active
-
2015
- 2015-04-21 PL PL15164491T patent/PL2937450T3/pl unknown
- 2015-04-21 SI SI201530067A patent/SI2937450T1/sl unknown
- 2015-04-21 EP EP15164491.1A patent/EP2937450B1/de not_active Revoked
- 2015-04-21 PT PT151644911T patent/PT2937450T/pt unknown
- 2015-04-21 HU HUE15164491A patent/HUE035050T2/en unknown
- 2015-04-27 JP JP2015090607A patent/JP6687331B2/ja active Active
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