JP2015212417A5 - - Google Patents
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- JP2015212417A5 JP2015212417A5 JP2015090607A JP2015090607A JP2015212417A5 JP 2015212417 A5 JP2015212417 A5 JP 2015212417A5 JP 2015090607 A JP2015090607 A JP 2015090607A JP 2015090607 A JP2015090607 A JP 2015090607A JP 2015212417 A5 JP2015212417 A5 JP 2015212417A5
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- JP
- Japan
- Prior art keywords
- acid
- fatty alcohol
- mixture
- group
- electrolytic bath
- Prior art date
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- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 30
- -1 benzoic acid sulfimide anion Chemical class 0.000 claims 26
- 239000000203 mixture Substances 0.000 claims 24
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 20
- 239000002253 acid Substances 0.000 claims 16
- 229910052759 nickel Inorganic materials 0.000 claims 15
- 239000000080 wetting agent Substances 0.000 claims 12
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 9
- 125000000217 alkyl group Chemical group 0.000 claims 8
- 150000002191 fatty alcohols Chemical class 0.000 claims 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 6
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 239000001257 hydrogen Substances 0.000 claims 6
- 230000005588 protonation Effects 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 5
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N HCl Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 4
- 239000007864 aqueous solution Substances 0.000 claims 4
- 125000004432 carbon atoms Chemical group C* 0.000 claims 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 4
- 150000007513 acids Chemical class 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 3
- BDAGIHXWWSANSR-UHFFFAOYSA-N formic acid Chemical compound OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- BDAGIHXWWSANSR-UHFFFAOYSA-M methanoate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 claims 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N Boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims 2
- 229960002327 Chloral Hydrate Drugs 0.000 claims 2
- RNFNDJAIBTYOQL-UHFFFAOYSA-N Chloral hydrate Chemical compound OC(O)C(Cl)(Cl)Cl RNFNDJAIBTYOQL-UHFFFAOYSA-N 0.000 claims 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N Isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 claims 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N Malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims 2
- CVHZOJJKTDOEJC-UHFFFAOYSA-N Saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims 2
- IIACRCGMVDHOTQ-UHFFFAOYSA-N Sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 claims 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 239000004327 boric acid Substances 0.000 claims 2
- 229910052792 caesium Inorganic materials 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- 235000015165 citric acid Nutrition 0.000 claims 2
- 230000000875 corresponding Effects 0.000 claims 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims 2
- 239000004310 lactic acid Substances 0.000 claims 2
- 235000014655 lactic acid Nutrition 0.000 claims 2
- 229910052744 lithium Inorganic materials 0.000 claims 2
- 239000001630 malic acid Substances 0.000 claims 2
- 229940099690 malic acid Drugs 0.000 claims 2
- 235000011090 malic acid Nutrition 0.000 claims 2
- 150000007522 mineralic acids Chemical class 0.000 claims 2
- 229910001453 nickel ion Inorganic materials 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 150000002829 nitrogen Chemical group 0.000 claims 2
- 229910052700 potassium Inorganic materials 0.000 claims 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims 2
- 229910052701 rubidium Inorganic materials 0.000 claims 2
- 229910052708 sodium Inorganic materials 0.000 claims 2
- NJHVMXFNIZTTBV-UHFFFAOYSA-N 2,2,2-tribromoethane-1,1-diol Chemical compound OC(O)C(Br)(Br)Br NJHVMXFNIZTTBV-UHFFFAOYSA-N 0.000 claims 1
- 229910001369 Brass Inorganic materials 0.000 claims 1
- 229910020366 ClO 4 Inorganic materials 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- 239000010951 brass Substances 0.000 claims 1
- 150000001768 cations Chemical class 0.000 claims 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- 235000019253 formic acid Nutrition 0.000 claims 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 1
- 239000004615 ingredient Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000007524 organic acids Chemical class 0.000 claims 1
- 235000005985 organic acids Nutrition 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 239000011780 sodium chloride Substances 0.000 claims 1
- 239000000243 solution Substances 0.000 claims 1
- 125000000542 sulfonic acid group Chemical group 0.000 claims 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 0 CC(C)(C(*)C(C)(C)OS(*)=O)N=O Chemical compound CC(C)(C(*)C(C)(C)OS(*)=O)N=O 0.000 description 2
Claims (15)
(c)安息香酸スルフィミドおよび/または安息香酸スルフィミド陰イオン
ならびに
(h)抱水クロラール、抱水ブロマール、ギ酸、ホルマート、酢酸、アセタート、置換もしくは非置換脂肪族アルデヒドから成る群から選択される1種、2種、2種を超えるまたは全ての化合物
を含み、
前記電解浴が以下の成分を追加的に含むか、または前記混合物が以下の成分を追加的に含む、上記電解浴または混合物:
(a)ニッケルイオン、
(b)1種または複数の酸、
(e)式(I)
(式中、
R1は、ヒドロキシ、アミノ、C1−C4−アルキルアミノもしくはジ(C1−C4−アルキル)アミノによって置換されたC1−C4−アルキルまたは水素またはC1−C4−アルキルを意味し、
R2は、ヒドロキシ、アミノ、C1−C4−アルキルアミノもしくはジ(C1−C4−アルキル)アミノによって置換されたC1−C4−アルキルを意味する)
の1種または複数のアセチレン系不飽和化合物、
(f)式(II)
(式中、それぞれ相互に独立して、
窒素原子は、ピリジン、キノリンおよびイソキノリンからなる群から選択される芳香族環系の一部であり、
mは、1〜24の範囲内の整数を意味し、
各R3は、独立して、炭素原子1〜20個を有する分枝もしくは非分枝アルキル基または水素またはヒドロキシを意味する)
の1種または複数のベタイン、
(g)1種または複数の湿潤剤。 Electrolytic bath for the deposition of bright nickel layer, or a mixture for use in an electrolytic bath for the deposition of bright nickel layer, wherein the mixture is an aqueous solution, or the electrolytic bath is an aqueous solution,
(C) benzoic acid sulfimide and / or benzoic acid sulfimide anion and (h) one selected from the group consisting of chloral hydrate, bromal hydrate, formic acid, formate, acetic acid, acetate, substituted or unsubstituted aliphatic aldehyde Including two, more than two or all compounds,
Wherein either electrolytic bath additionally comprises the following ingredients, or the mixture additionally comprises the following components, the electrolytic bath or mixtures:
(A) nickel ions,
(B) one or more acids,
(E) Formula (I)
(Where
R 1 represents C 1 -C 4 -alkyl or hydrogen or C 1 -C 4 -alkyl substituted by hydroxy, amino, C 1 -C 4 -alkylamino or di (C 1 -C 4 -alkyl) amino. Means
R 2 is hydroxy, amino, C 1 -C 4 - refers to an alkyl) - alkylamino or di (C 1 -C 4 - alkyl) C 1 -C 4 substituted by amino
One or more acetylenically unsaturated compounds of
(F) Formula (II)
(In the formula, each independently,
Nitrogen atom is part of an aromatic ring system pyridine, Ru is selected from the group consisting of quinoline and isoquinoline,
m means an integer in the range of 1-24,
Each R 3 independently represents a branched or unbranched alkyl group having 1 to 20 carbon atoms or hydrogen or hydroxy)
One or more betaines of
(G) one or more wetting agents.
(b)硫酸、ホウ酸および塩酸
から成る群から選択される1種もしくは複数の無機酸
および/または
リンゴ酸、クエン酸、乳酸およびアミドスルホン酸
から成る群から選択される1種もしくは複数の有機酸
ならびに/あるいは
(g)1種または複数の湿潤剤であって、1種の湿潤剤または複数の湿潤剤の1種もしくは複数もしくは全てが、
(i)脂肪アルコールエーテルスルファート
および/または
それからプロトン化によって生成する酸、
(ii)脂肪アルコールスルファート
および/または
それからプロトン化によって生成する酸、
(iii)脂肪アルコールエーテルスルファート
および
脂肪アルコールスルファート
を含む、またはそれらから成る混合物、
(iv)脂肪アルコールエーテルスルファートの酸
および
脂肪アルコールスルファートの酸
を含む、またはそれらから成る混合物、
(v)脂肪アルコールエーテルスルファート
および
脂肪アルコールスルファートの酸
を含む、またはそれらから成る混合物、
ならびに
(vi)脂肪アルコールエーテルスルファートの酸
および
脂肪アルコールスルファート
を含む、またはそれらから成る混合物
から成る群から選択され、
選択された1種の湿潤剤が、炭素鎖として分枝もしくは非分枝アルキル基を担持するか、または選択された複数の湿潤剤が、炭素鎖として、それぞれ相互に独立して、分枝もしくは非分枝アルキル基を担持する湿潤剤。 The electrolytic bath or mixture according to claim 1, wherein the electrolytic bath comprises the following components or the mixture comprises one, more than one or all of the following components in an aqueous solution:
(B) one or more inorganic acids selected from the group consisting of sulfuric acid, boric acid and hydrochloric acid and / or one or more organics selected from the group consisting of malic acid, citric acid, lactic acid and amidosulfonic acid An acid and / or (g) one or more wetting agents, wherein one or more or all of the one wetting agent or the plurality of wetting agents are:
(I) fatty alcohol ether sulfates and / or
Then acid formed by protonation,
(Ii) fatty alcohol sulfate and / or
Then acid formed by protonation,
(Iii) a mixture comprising or consisting of a fatty alcohol ether sulfate and a fatty alcohol sulfate,
(Iv) a mixture comprising or consisting of fatty alcohol ether sulfate acid and fatty alcohol sulfate acid;
(V) a mixture comprising or consisting of fatty alcohol ether sulfate and fatty alcohol sulfate acid,
And (vi) selected from the group consisting of a mixture comprising or consisting of an acid of a fatty alcohol ether sulfate and a fatty alcohol sulfate,
One selected wetting agent carries a branched or unbranched alkyl group as a carbon chain, or a plurality of selected wetting agents as a carbon chain, each independently, branched or A wetting agent bearing an unbranched alkyl group.
(a)全量1.12〜1.67mol/Lのニッケルイオン、ならびに/あるいは
(b)全量0.485〜0.97mol/Lの、
硫酸、ホウ酸および塩酸
から成る群から選択される1種もしくは複数の無機酸、および/または
リンゴ酸、クエン酸、乳酸およびアミドスルホン酸
から成る群から選択される1種もしくは複数の有機酸、ならびに/あるいは
(c)全量0.0055〜0.0274mol/Lの安息香酸スルフィミドおよび安息香酸スルフィミド陰イオン、ならびに/あるいは
(d)全量0.006〜0.025mol/Lのアリルスルホン酸およびアリルスルホナート、ならびに/あるいは
(e)全量0.00036〜0.1438mol/Lの、式(I)
(式中、
R1は、ヒドロキシ、アミノ、C1−C4−アルキルアミノもしくはジ(C1−C4−アルキル)アミノによって置換されたC1−C4−アルキルまたは水素またはC1−C4−アルキルを意味し、
R2は、ヒドロキシ、アミノ、C1−C4−アルキルアミノもしくはジ(C1−C4−アルキル)アミノによって置換されたC1−C4−アルキルを意味する)
の1種または複数のアセチレン系不飽和化合物、ならびに/あるいは
(f)全量0.00025〜0.0025mol/Lの、式(II)
(式中、それぞれ相互に独立して、
窒素原子は、ピリジン、キノリンおよびイソキノリンからなる群から選択される芳香族環系の一部であり、
mは、1〜24の範囲内の整数を意味し、
各R3は、独立して、炭素原子1〜20個を有する分枝もしくは非分枝アルキル基または水素またはヒドロキシを意味する)
の1種または複数のベタイン、ならびに/あるいは
(g)全量0.0006〜0.025mol/Lの、1種または複数の湿潤剤であって、1種の湿潤剤または複数の湿潤剤の1種もしくは複数もしくは全てが、
(i)脂肪アルコールエーテルスルファート
および/または
それからプロトン化によって生成する酸、
(ii)脂肪アルコールスルファート
および/または
それからプロトン化によって生成する酸、
(iii)脂肪アルコールエーテルスルファート
および
脂肪アルコールスルファート
を含む、またはそれらから成る混合物、
(iv)脂肪アルコールエーテルスルファートの酸
および
脂肪アルコールスルファートの酸
を含む、またはそれらから成る混合物、
(v)脂肪アルコールエーテルスルファート
および
脂肪アルコールスルファートの酸
を含む、またはそれらから成る混合物、
ならびに
(vi)脂肪アルコールエーテルスルファートの酸
および
脂肪アルコールスルファート
を含む、またはそれらから成る混合物
から成る群から選択される湿潤剤であり、
上記脂肪アルコールエーテルスルファートが、式(III)
(式中、それぞれ相互に独立して、
nは、1〜24の範囲内の整数を意味し、
R4は、炭素原子1〜20個を有する分枝もしくは非分枝アルキル基を意味し、および
Xは、Li、Na、K、Rb、CsおよびNH4から成る群から選択される)
の脂肪アルコールエーテルスルファート
および/もしくは
それからプロトン化によって生成する酸
から成る群から選択され、
かつ/または
脂肪アルコールスルファートが、式(IV)
(式中、それぞれ相互に独立して、
nは、1〜24の範囲内の整数を意味し、
R4は、炭素原子1〜20個を有する分枝もしくは非分枝アルキル基を意味し、および
Xは、Li、Na、K、Rb、CsおよびNH4から成る群から選択される)の脂肪アルコールスルファート
および/もしくは
それからプロトン化によって生成する酸
から成る群から選択される、上記湿潤剤、ならびに/あるいは
(h)全量0.003〜0.018mol/Lの、
抱水クロラール、抱水ブロマール、ギ酸、ホルマート、酢酸、アセタート、置換もしくは非置換脂肪族アルデヒドから成る群から選択される、1種、2種、2種を超えるまたは全ての化合物、ならびに/あるいは
(i)全量0〜0.0025mol/Lの、式(V)
(式中、
R5は、ヒドロキシによって置換されたC1−C4−アルキルまたは水素またはCH2OR6を意味し、および
R6は、ヒドロキシによって置換されたC1−C4−アルキルまたは水素またはスルホン酸基もしくはその塩を意味するが、
但し、R5およびR6は、同時には水素を意味せず、かつ
但し、破線は単結合を意味する)
の1種または複数の化合物。 The electrolytic bath or mixture according to claim 1 or 2, wherein the electrolytic bath comprises the following components or the mixture comprises one, more than one or all of the following components in an aqueous solution:
(A) a total amount of 1.12 to 1.67 mol / L nickel ions, and / or (b) a total amount of 0.485 to 0.97 mol / L,
One or more inorganic acids selected from the group consisting of sulfuric acid, boric acid and hydrochloric acid, and / or one or more organic acids selected from the group consisting of malic acid, citric acid, lactic acid and amidosulfonic acid, And / or (c) a total amount of 0.0055 to 0.0274 mol / L of benzoic acid sulfimide and benzoic acid sulfimide anion, and / or (d) a total amount of 0.006 to 0.025 mol / L of allyl sulfonic acid and allyl sulfo And (e) a total amount of 0.00036 to 0.1438 mol / L of formula (I)
(Where
R 1 represents C 1 -C 4 -alkyl or hydrogen or C 1 -C 4 -alkyl substituted by hydroxy, amino, C 1 -C 4 -alkylamino or di (C 1 -C 4 -alkyl) amino. Means
R 2 is hydroxy, amino, C 1 -C 4 - refers to an alkyl) - alkylamino or di (C 1 -C 4 - alkyl) C 1 -C 4 substituted by amino
One or more acetylenically unsaturated compounds and / or (f) a total amount of 0.00025-0.0025 mol / L of formula (II)
(In the formula, each independently,
Nitrogen atom is part of an aromatic ring system pyridine, Ru is selected from the group consisting of quinoline and isoquinoline,
m means an integer in the range of 1-24,
Each R 3 independently represents a branched or unbranched alkyl group having 1 to 20 carbon atoms or hydrogen or hydroxy)
One or more betaines and / or (g) one or more wetting agents in a total amount of 0.0006 to 0.025 mol / L , one wetting agent or one wetting agent Or some or all
(I) fatty alcohol ether sulfates and / or
Then acid formed by protonation,
(Ii) fatty alcohol sulfate and / or
Then acid formed by protonation,
(Iii) a mixture comprising or consisting of a fatty alcohol ether sulfate and a fatty alcohol sulfate,
(Iv) a mixture comprising or consisting of fatty alcohol ether sulfate acid and fatty alcohol sulfate acid;
(V) a mixture comprising or consisting of fatty alcohol ether sulfate and fatty alcohol sulfate acid,
And (vi) an acid and fatty alcohol sulfates of fatty alcohol ether sulfates, or a wetting agent that will be selected from the group consisting of a mixture consisting,
The fatty alcohol ether sulfate has the formula (III)
(In the formula, each independently,
n represents an integer within the range of 1 to 24;
R 4 represents a branched or unbranched alkyl group having 1 to 20 carbon atoms, and X is selected from the group consisting of Li, Na, K, Rb, Cs and NH 4 )
Fatty alcohol ether sulfates and / or
Then it is selected from the group consisting of generating acids by protonation,
And / or the fatty alcohol sulfate is of the formula (IV)
(In the formula, each independently,
n represents an integer within the range of 1 to 24;
R 4 represents a branched or unbranched alkyl group having 1 to 20 carbon atoms, and X is selected from the group consisting of Li, Na, K, Rb, Cs and NH 4 ) Alcohol sulfate and / or
Then selected from the group consisting of generating acids by protonation, of the wetting agent, and / or (h) the total amount 0.003~0.018Mol / L,
One, two, more than two or all compounds selected from the group consisting of chloral hydrate, bromaric hydrate, formate, formate, acetic acid, acetate, substituted or unsubstituted aliphatic aldehydes and / or ( i) Formula (V) with a total amount of 0-0.0025 mol / L
(Where
R 5 means C 1 -C 4 -alkyl or hydrogen or CH 2 OR 6 substituted by hydroxy, and R 6 is C 1 -C 4 -alkyl or hydrogen or sulfonic acid group substituted by hydroxy Or its salt,
R 5 and R 6 do not mean hydrogen at the same time, and the broken line means a single bond)
One or more compounds of
F-、Cl-、Br-、I-、SO4 2-、OH-およびClO4 -
から成る群から選択される1種、2種、2種を超えるもしくは全ての陰イオンを含有し、かつ/または
追加的に、
Li+、Na+、K+、Rb+、Cs+、Mg2+、Ca2+およびSr2+
から成る群から選択される1種、2種、2種を超えるもしくは全ての陽イオンを含有する、請求項1から3までの1項に記載の電解浴または混合物。 In addition,
F − , Cl − , Br − , I − , SO 4 2− , OH − and ClO 4 −
Containing one, two, more than two or all anions selected from the group consisting of and / or additionally,
Li + , Na + , K + , Rb + , Cs + , Mg 2+ , Ca 2+ and Sr 2+
4. The electrolytic bath or mixture according to claim 1, comprising one, two, more or all cations selected from the group consisting of:
(a)請求項1から6までの1項に記載の電解浴または混合物を準備および/または製造するステップ、
(b)準備または製造された電解浴または混合物から被加工物上にニッケルを電気析出させて光沢ニッケル層を製造するステップ
を含む、方法。 A method for producing an article having a bright nickel layer by depositing nickel on a corresponding workpiece, comprising the following steps:
(A) preparing and / or producing an electrolytic bath or mixture according to one of claims 1 to 6;
(B) producing a bright nickel layer by electrodepositing nickel onto the work piece from a prepared or produced electrolytic bath or mixture.
(c)更なる金属層を、光沢ニッケル層上に析出させるステップ、好ましくは電気析出させるステップ、好ましくはクロム層を光沢ニッケル層上に電気析出させるステップ
を含む、請求項7から11までの1項に記載の方法。 The following additional steps:
12. A method according to claim 7, comprising (c) depositing a further metal layer on the bright nickel layer, preferably electrodepositing, preferably electrodepositing a chromium layer on the bright nickel layer. The method according to item.
請求項1から6までの1項に記載の電解浴または混合物の使用下で対応する被加工物上にニッケルを析出させることによって、
または
請求項7から12の1項に記載の方法を用いて
製造可能である、光沢ニッケル層を含む物品、好ましくは導管の構成要素または導水導管用の部品の構成要素。 A bright nickel layer
Depositing nickel on the corresponding workpiece using the electrolytic bath or mixture according to one of claims 1 to 6;
Or an article comprising a bright nickel layer, preferably a component of a conduit or a component of a conduit for a conduit, which can be produced using the method according to one of claims 7-12.
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DE102014207778.8 | 2014-04-25 | ||
DE102014207778.8A DE102014207778B3 (en) | 2014-04-25 | 2014-04-25 | Use of a mixture for use in a plating bath or plating bath to produce a bright nickel plating, and to a method of making an article having a bright nickel plating |
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JP2015212417A JP2015212417A (en) | 2015-11-26 |
JP2015212417A5 true JP2015212417A5 (en) | 2018-03-01 |
JP6687331B2 JP6687331B2 (en) | 2020-04-22 |
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EP (1) | EP2937450B1 (en) |
JP (1) | JP6687331B2 (en) |
DE (1) | DE102014207778B3 (en) |
HU (1) | HUE035050T2 (en) |
PL (1) | PL2937450T3 (en) |
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SI (1) | SI2937450T1 (en) |
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CN105170922B (en) * | 2015-10-19 | 2017-12-01 | 重庆天春科技有限公司 | A kind of crystallizer copper pipe with elemental nickel transition zone |
CN105200462A (en) * | 2015-10-19 | 2015-12-30 | 姜少群 | Electroplating method for elemental nickel transition layer of mould copper tube |
CN106245070B (en) * | 2016-10-21 | 2019-03-05 | 湘潭大学 | A method of combination plating solution and electroplating nickel on surface of magnesium alloy for magnesium alloy plating nickel |
DK3642396T3 (en) * | 2017-06-23 | 2021-10-11 | Atotech Deutschland Gmbh | NICKEL ELECTROGALVANIZATION BATH FOR SETTING A DECORATIVE NICKEL COATING ON A SURFACE |
WO2019215287A1 (en) * | 2018-05-09 | 2019-11-14 | Atotech Deutschland Gmbh | Nickel comprising layer array and a method for its manufacturing |
JP6542437B1 (en) * | 2018-06-19 | 2019-07-10 | 奥野製薬工業株式会社 | Bright nickel plating method and control method of bright nickel plating film. |
JP7190280B2 (en) | 2018-08-10 | 2022-12-15 | 株式会社Lixil | plumbing fixtures |
TWI734362B (en) * | 2019-01-31 | 2021-07-21 | 美商麥克達米德恩索龍股份有限公司 | Composition and method for fabrication of nickel interconnects |
KR102293664B1 (en) * | 2019-11-12 | 2021-08-26 | 주식회사엘콤 | Composition for nickel-phosphorus alloy plating |
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