JP2015071756A - ブロックコポリマー組成物から得られる厚いナノ構造フィルムを製造するための方法 - Google Patents
ブロックコポリマー組成物から得られる厚いナノ構造フィルムを製造するための方法 Download PDFInfo
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- JP2015071756A JP2015071756A JP2014182834A JP2014182834A JP2015071756A JP 2015071756 A JP2015071756 A JP 2015071756A JP 2014182834 A JP2014182834 A JP 2014182834A JP 2014182834 A JP2014182834 A JP 2014182834A JP 2015071756 A JP2015071756 A JP 2015071756A
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- block copolymer
- copolymer composition
- composition
- methacrylate
- film
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- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- RSVDRWTUCMTKBV-UHFFFAOYSA-N sbb057044 Chemical compound C12CC=CC2C2CC(OCCOC(=O)C=C)C1C2 RSVDRWTUCMTKBV-UHFFFAOYSA-N 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
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- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
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Abstract
Description
− ブロックコポリマー組成物の分散度の値が1.1から2までの範囲である場合には、表面へのブロックコポリマーの沈着によって得られるフィルムは、欠陥なしで垂直に、このため、フィルムの厚さとは無関係に組織化させることができる。
− このようなブロックコポリマー組成物の使用は、典型的には40nmを超える高い厚さのフィルムの形成を可能にし、かくしてこれらのフィルムがリソグラフィーのためのマスクとして使用され得るために特に有利にする。
− 分散度が1.1から2の間の値であるブロックコポリマー組成物を調製する段階と、
− この組成物を溶解させて又は溶解させずに表面に沈着させる段階と、
− アニールする段階と、
を含む、方法に関する。
好ましくは、ジブロック又はトリブロックコポリマー組成物、より好ましくはジブロックコポリマー組成物が含まれる。これらの組成物は、当業者に公知の任意の技術によって合成することができ、これらの技術としては、重縮合、開環重合又はアニオン、カチオン若しくはラジカル重合、あるいはこれらの技術の組合せを挙げることができ、これらの技術は制御されることも制御されないこともあり得る。コポリマーがラジカル重合によって調製されるとき、そのラジカル重合は、任意の既知の技術、例えば、NMP(「ニトロキシド媒介重合」)、RAFT(「可逆的付加−開裂連鎖移動」)、ATRP(「原子移動ラジカル重合」)、INIFERTER(「開始剤−連鎖移動剤−停止反応」)、RITP(「逆ヨウ素移動重合」)又はITP(「ヨウ素移動重合」)などによって制御することができる。
本発明のこれらの好ましい形態の両方において、ブロックコポリマー組成物の分散度が、1.1から2の間、好ましくは1.1から1.6の間(両端の数値を含む)であるように注意が払われる。
1000から300000g/molの間、好ましくは10000から250000の間、より好ましくは32000から15000の間の数平均分子量及び1から3の間、好ましくは1.1から2の間、さらにより好ましくは1.1から1.5の間の分散度指数。
本発明との関連で使用されるブロックコポリマー組成物は、プロピレングリコールモノメチルエーテルアセテート(PGMEA)、エトキシエチルプロピオネート、アニソール又はトルエンが挙げられ得る中の1つ又は複数の溶媒中に溶解された考慮中のブロックコポリマー組成物の溶液から表面に沈着させることができる。好ましくは、その溶媒はPGMEAである。
ブロックコポリマーの溶液は、以下の方法で表面に沈着される:
SiO2にグラフトする表面の調製:
シリコンウェハ(結晶方位{100})が、手作業で3×4cmの断片に切り離され、15分間のピラニア処理(H2SO4/H2O2 2:1(v:v))により清浄にされ、次いで脱イオン水ですすがれ、機能化の直前に窒素の流れの下で乾燥される。この手順の続きは、1か所だけ修正されている(アニールは、真空下ではない周囲雰囲気の下で行われる)Mansky等により記載されているもの(Science,1997,1458)である。国際公開第20121400383号、実施例1及び実施例2(コポリマー11)に記載されているプロトコルに従って、NMP技術を用いて制御されるラジカル重合によって調製された12280g/molの分子量及び74/26のPS/PMMA比を有する、表面の中性化を可能にするランダムPS−r−PMMAコポリマーが、1.5重量%の溶液を得るためにトルエン中に溶解される。この溶液は、新たに清浄にしたウェハ上に手で施され、次いで、約90nmの厚さを有するフィルムを得るために700回転/分のスピンコーティングによって広げられる。基板は次に、周囲雰囲気下の可変時間、事前に所望の温度にされた加熱板上で簡単に沈着される。基板は次に、グラフトされていないポリマーを表面から取り除くために、数分間いくつかのトルエン浴中で超音波処理により洗浄され、その後窒素の流れの下で乾燥される。この手順を通して、トルエンはPGMEAによって差異なく置き換えることができることに注目されたい。
それらは以下の特徴を示す:
PS/PMMA重量比=69/31
C23:C50及びC23:C35:C50は、容量で、最初の溶液が全て同じ濃度であるブロックコポリマーの溶液を混合することによって得られる。
分子量及び重量平均分子量(Mw)対数平均分子量(Mn)の比に相当する分散度指数は、1g/lの濃度の試料について、Easical PS−2調製済みパックを用いるポリスチレンの段階的試料による事前の較正により、BHTで安定化されたTHF媒体中、1ml/分の流速、40℃で、連続の2つのAgilent 3μm ResiPoreカラムを用いるSEC(サイズ排除クロマトグラフィー)によって得られる。
配位数の71個の欠陥及び間隔の11個の欠陥が数えられる。
配位数の140個の欠陥及び間隔の16個の欠陥が数えられる。
Claims (21)
- 分散度が1.1から2の間の値であるブロックコポリマー組成物から得られる、欠陥が最小限である厚いナノ構造フィルムを製造するための方法であって、
− 分散度が1.1から2の間の値を示すブロックコポリマー組成物を調製する段階と、
− この組成物を溶解させて又は溶解させずに表面に沈着させる段階と、
− アニールする段階と
を含む、方法。 - 得られるフィルムが、配向、配位数又は間隔の最小限の欠陥を示すと共に、大きい単結晶表面を示す、請求項1に記載の方法。
- ブロックコポリマー組成物の数平均分子量が、1000から300000g/molの間である、請求項1又は2に記載の方法。
- ブロックコポリマー組成物の数平均分子量が、1000から300000g/molの間である、請求項1又は2に記載の方法。
- 組成物が多峰性のクロマトグラムを示す、請求項1又は2に記載の方法。
- ブロックコポリマー組成物が、ジブロックコポリマー組成物である、請求項1又は2に記載の方法。
- ブロックコポリマー組成物が、PS−PMMAジブロックコポリマーからなる、請求項6に記載の方法。
- ブロックコポリマー組成物が、制御ラジカル重合によって調製される、請求項1又は2に記載の方法。
- ニトロキシドを介したラジカル重合が行われる、請求項8に記載の方法。
- ニトロキシドを介したラジカル重合が行われ、ニトロキシドが、N−(tert−ブチル)−1−ジエチルホスホノ−2,2−ジメチルプロピルニトロキシドである、請求項9に記載の方法。
- ブロックコポリマー組成物が、アニオン重合によって調製される、請求項1又は2に記載の方法。
- ブロックコポリマー組成物が、開環重合によって調製される、請求項1又は2に記載の方法。
- ブロックコポリマー組成物が、いくつかのブロックコポリマーをブレンドすることによって調製される、請求項1又は2に記載の方法。
- フィルムの厚さが20nmから300nmの間である、請求項1又は2に記載の方法。
- 表面がフリーである、請求項1又は2に記載の方法。
- 表面がガイダンス構造を示す、請求項1又は2に記載の方法。
- アニールが、熱処理によって行われる、請求項1又は2に記載の方法。
- アニールが、溶媒蒸気処理によって行われる、請求項1又は2に記載の方法。
- アニールが、熱処理及び溶媒蒸気処理の組合せによって行われる、請求項1又は2に記載の方法。
- ナノメートルスケールでリソグラフィーマスク又はナノ構造フィルムを生成するための、請求項1から19の何れか一項に記載の方法の使用。
- 請求項20によって得られるリソグラフィーマスク。
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FR1358628A FR3010412B1 (fr) | 2013-09-09 | 2013-09-09 | Procede d'obtention de films epais nano-structures obtenus a partir de copolymeres a blocs |
FR1451492A FR3010414B1 (fr) | 2013-09-09 | 2014-02-25 | Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs |
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JP2018534132A (ja) * | 2015-10-23 | 2018-11-22 | アルケマ フランス | ジブロックコポリマーの自己組織化によりナノメートル構造の作成を可能にする方法 |
EP3800253A2 (en) | 2014-06-12 | 2021-04-07 | Toray Industries, Inc. | Prostate cancer detection kit or device, and detection method |
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FR3032713A1 (fr) * | 2015-02-18 | 2016-08-19 | Arkema France | Procede de reduction des defauts dans un film ordonne de copolymeres a blocs |
FR3032712A1 (fr) * | 2015-02-18 | 2016-08-19 | Arkema France | Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs |
FR3032714A1 (fr) * | 2015-02-18 | 2016-08-19 | Arkema France | Procede de reduction du temps d'assemblage des films ordonnes de copolymeres a blocs |
JP2018154760A (ja) * | 2017-03-17 | 2018-10-04 | 東芝メモリ株式会社 | パターン形成材料及びパターン形成方法 |
FR3075800B1 (fr) * | 2017-12-21 | 2020-10-09 | Arkema France | Couches anti adhesives pour les procedes d'impression par transfert |
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Cited By (2)
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EP3800253A2 (en) | 2014-06-12 | 2021-04-07 | Toray Industries, Inc. | Prostate cancer detection kit or device, and detection method |
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Publication number | Publication date |
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FR3010414B1 (fr) | 2015-09-25 |
TW201823321A (zh) | 2018-07-01 |
US20150328661A1 (en) | 2015-11-19 |
CN105518089B (zh) | 2020-11-10 |
KR20150029599A (ko) | 2015-03-18 |
TWI633135B (zh) | 2018-08-21 |
WO2015032904A1 (en) | 2015-03-12 |
US20150073094A1 (en) | 2015-03-12 |
EP2845888A1 (en) | 2015-03-11 |
JP6199263B2 (ja) | 2017-09-20 |
FR3010414A1 (fr) | 2015-03-13 |
CN105518089A (zh) | 2016-04-20 |
TW201520247A (zh) | 2015-06-01 |
SG11201601687YA (en) | 2016-04-28 |
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