FR3010412B1 - Procede d'obtention de films epais nano-structures obtenus a partir de copolymeres a blocs - Google Patents

Procede d'obtention de films epais nano-structures obtenus a partir de copolymeres a blocs

Info

Publication number
FR3010412B1
FR3010412B1 FR1358628A FR1358628A FR3010412B1 FR 3010412 B1 FR3010412 B1 FR 3010412B1 FR 1358628 A FR1358628 A FR 1358628A FR 1358628 A FR1358628 A FR 1358628A FR 3010412 B1 FR3010412 B1 FR 3010412B1
Authority
FR
France
Prior art keywords
block copolymers
films obtained
thick films
obtaining nano
structure thick
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1358628A
Other languages
English (en)
Other versions
FR3010412A1 (fr
Inventor
Christophe Navarro
Xavier Chevalier
Celia Nicolet
Ilias Iliopoulos
Raluca Tiron
Guillaume Fleury
Georges Hadziioannou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arkema France SA
Original Assignee
Arkema France SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France SA filed Critical Arkema France SA
Priority to FR1358628A priority Critical patent/FR3010412B1/fr
Priority to FR1451492A priority patent/FR3010414B1/fr
Priority to SG11201601687YA priority patent/SG11201601687YA/en
Priority to CN201480049607.7A priority patent/CN105518089B/zh
Priority to PCT/EP2014/068957 priority patent/WO2015032904A1/fr
Priority to EP14183748.4A priority patent/EP2845888A1/fr
Priority to TW106131044A priority patent/TW201823321A/zh
Priority to US14/481,421 priority patent/US20150073094A1/en
Priority to TW103131002A priority patent/TWI633135B/zh
Priority to JP2014182834A priority patent/JP6199263B2/ja
Priority to KR20140120316A priority patent/KR20150029599A/ko
Publication of FR3010412A1 publication Critical patent/FR3010412A1/fr
Priority to US14/809,722 priority patent/US20150328661A1/en
Application granted granted Critical
Publication of FR3010412B1 publication Critical patent/FR3010412B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/02—Stable Free Radical Polymerisation [SFRP]; Nitroxide Mediated Polymerisation [NMP] for, e.g. using 2,2,6,6-tetramethylpiperidine-1-oxyl [TEMPO]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Graft Or Block Polymers (AREA)
FR1358628A 2013-09-09 2013-09-09 Procede d'obtention de films epais nano-structures obtenus a partir de copolymeres a blocs Expired - Fee Related FR3010412B1 (fr)

Priority Applications (12)

Application Number Priority Date Filing Date Title
FR1358628A FR3010412B1 (fr) 2013-09-09 2013-09-09 Procede d'obtention de films epais nano-structures obtenus a partir de copolymeres a blocs
FR1451492A FR3010414B1 (fr) 2013-09-09 2014-02-25 Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs
CN201480049607.7A CN105518089B (zh) 2013-09-09 2014-09-05 用于制造由嵌段共聚物成分获得的厚的纳米结构化膜的方法
PCT/EP2014/068957 WO2015032904A1 (fr) 2013-09-09 2014-09-05 Procédé de fabrication de films nanostructurés épais obtenus à partir d'une composition de copolymères à blocs
EP14183748.4A EP2845888A1 (fr) 2013-09-09 2014-09-05 Procédé de production de films épais nanostructurés obtenus à partir d'une composition de copolymère bloc
SG11201601687YA SG11201601687YA (en) 2013-09-09 2014-09-05 Process for producing thick nanostructured films obtained from a block copolymer composition
TW106131044A TW201823321A (zh) 2013-09-09 2014-09-09 由嵌段共聚物組成物製備厚奈米結構化膜之方法
US14/481,421 US20150073094A1 (en) 2013-09-09 2014-09-09 Process for producing thick nanostructured films obtained from a block copolymer composition
TW103131002A TWI633135B (zh) 2013-09-09 2014-09-09 由嵌段共聚物組成物製備厚奈米結構化膜之方法
JP2014182834A JP6199263B2 (ja) 2013-09-09 2014-09-09 ブロックコポリマー組成物から得られる厚いナノ構造フィルムを製造するための方法
KR20140120316A KR20150029599A (ko) 2013-09-09 2014-09-11 블록 공중합체 조성물에서 수득한 후층 나노구조 필름의 제조 방법
US14/809,722 US20150328661A1 (en) 2013-09-09 2015-07-27 Process for producing thick nanostructured films obtained from a block copolymer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1358628A FR3010412B1 (fr) 2013-09-09 2013-09-09 Procede d'obtention de films epais nano-structures obtenus a partir de copolymeres a blocs

Publications (2)

Publication Number Publication Date
FR3010412A1 FR3010412A1 (fr) 2015-03-13
FR3010412B1 true FR3010412B1 (fr) 2016-10-21

Family

ID=49949798

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1358628A Expired - Fee Related FR3010412B1 (fr) 2013-09-09 2013-09-09 Procede d'obtention de films epais nano-structures obtenus a partir de copolymeres a blocs

Country Status (1)

Country Link
FR (1) FR3010412B1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3042794B1 (fr) * 2015-10-23 2020-03-27 Arkema France Procede permettant la creation de structures nanometriques par l'auto-assemblage de copolymeres di-blocs
FR3074180B1 (fr) * 2017-11-24 2021-01-01 Arkema France Procede de controle de la planeite d'un empilement polymerique

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7964107B2 (en) * 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
US8513356B1 (en) * 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition

Also Published As

Publication number Publication date
FR3010412A1 (fr) 2015-03-13

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