JP2015063523A5 - - Google Patents
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- Publication number
- JP2015063523A5 JP2015063523A5 JP2014179115A JP2014179115A JP2015063523A5 JP 2015063523 A5 JP2015063523 A5 JP 2015063523A5 JP 2014179115 A JP2014179115 A JP 2014179115A JP 2014179115 A JP2014179115 A JP 2014179115A JP 2015063523 A5 JP2015063523 A5 JP 2015063523A5
- Authority
- JP
- Japan
- Prior art keywords
- surface treatment
- composition
- organometallic
- film
- treatment agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/017,281 | 2013-09-03 | ||
| US14/017,281 US9296879B2 (en) | 2013-09-03 | 2013-09-03 | Hardmask |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015063523A JP2015063523A (ja) | 2015-04-09 |
| JP2015063523A5 true JP2015063523A5 (https=) | 2018-12-06 |
| JP6578092B2 JP6578092B2 (ja) | 2019-09-18 |
Family
ID=52583708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014179115A Active JP6578092B2 (ja) | 2013-09-03 | 2014-09-03 | ハードマスク |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9296879B2 (https=) |
| JP (1) | JP6578092B2 (https=) |
| KR (1) | KR102307612B1 (https=) |
| CN (1) | CN104635424B (https=) |
| TW (1) | TWI565762B (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102074697B1 (ko) * | 2015-09-29 | 2020-02-07 | 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 | 복합 다층 구조체의 제조 방법 |
| KR102082145B1 (ko) * | 2015-09-29 | 2020-02-27 | 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 | 다층 구조체의 제조 방법 |
| JP2018535170A (ja) * | 2015-09-29 | 2018-11-29 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 黒鉛状炭素シートを作製する方法 |
| KR102513862B1 (ko) * | 2018-06-01 | 2023-03-23 | 최상준 | 반사방지용 하드마스크 조성물 |
| KR102287507B1 (ko) * | 2018-08-16 | 2021-08-09 | 삼성에스디아이 주식회사 | 하드마스크 조성물 및 패턴 형성 방법 |
| KR102750860B1 (ko) * | 2018-08-30 | 2025-01-09 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 방법 및 기판 처리 장치 |
| KR102400603B1 (ko) | 2019-03-29 | 2022-05-19 | 삼성에스디아이 주식회사 | 레지스트 하층막용 조성물 및 이를 이용한 패턴 형성 방법 |
| US12607929B2 (en) * | 2022-08-29 | 2026-04-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and formation method thereof |
| JP2024122656A (ja) | 2023-02-28 | 2024-09-09 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002053669A (ja) * | 2000-06-01 | 2002-02-19 | Osaka Organic Chem Ind Ltd | 多次元有機・無機複合体化合物およびその製造方法 |
| US7067346B2 (en) | 2000-06-06 | 2006-06-27 | Simon Foster University | Titanium carboxylate films for use in semiconductor processing |
| US7427529B2 (en) * | 2000-06-06 | 2008-09-23 | Simon Fraser University | Deposition of permanent polymer structures for OLED fabrication |
| KR20030007904A (ko) * | 2000-06-06 | 2003-01-23 | 이케이씨 테크놀로지, 인코포레이티드 | 전자 재료 제조 방법 |
| US6740469B2 (en) | 2002-06-25 | 2004-05-25 | Brewer Science Inc. | Developer-soluble metal alkoxide coatings for microelectronic applications |
| US6872506B2 (en) * | 2002-06-25 | 2005-03-29 | Brewer Science Inc. | Wet-developable anti-reflective compositions |
| US20040048194A1 (en) | 2002-09-11 | 2004-03-11 | International Business Machines Corporation | Mehod for forming a tunable deep-ultraviolet dielectric antireflection layer for image transfer processing |
| US7172849B2 (en) * | 2003-08-22 | 2007-02-06 | International Business Machines Corporation | Antireflective hardmask and uses thereof |
| JP2005247595A (ja) * | 2004-03-01 | 2005-09-15 | Osaka Organic Chem Ind Ltd | 複合焼成体およびその製造方法 |
| JP2005289885A (ja) * | 2004-03-31 | 2005-10-20 | Osaka Organic Chem Ind Ltd | 多次元有機・無機複合体化合物、複合焼成体およびこれらの製造方法 |
| KR100713231B1 (ko) * | 2005-12-26 | 2007-05-02 | 제일모직주식회사 | 레지스트 하층막용 하드마스크 조성물 및 이를 이용한반도체 집적회로 디바이스의 제조방법 |
| FR2916199B1 (fr) | 2007-05-14 | 2012-10-19 | Inst Francais Du Petrole | Procede d'oligomerisation des olefines utilisant une composition catalytique comprenant un complexe organometallique contenant un ligand phenoxy fonctionnalise par un hetero-atome |
| JP5066471B2 (ja) * | 2008-03-26 | 2012-11-07 | 富士フイルム株式会社 | 平版印刷版原版の製版方法 |
| JP5660268B2 (ja) * | 2008-09-30 | 2015-01-28 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の製版方法及び重合性モノマー |
| JP5757749B2 (ja) * | 2010-05-19 | 2015-07-29 | 富士フイルム株式会社 | 重合性組成物 |
| US8647809B2 (en) | 2011-07-07 | 2014-02-11 | Brewer Science Inc. | Metal-oxide films from small molecules for lithographic applications |
| US9093279B2 (en) | 2011-07-20 | 2015-07-28 | Nissan Chemical Industries, Ltd. | Thin film forming composition for lithography containing titanium and silicon |
| US9070548B2 (en) | 2012-03-06 | 2015-06-30 | Rohm And Haas Electronic Materials Llc | Metal hardmask compositions |
| US8795774B2 (en) | 2012-09-23 | 2014-08-05 | Rohm And Haas Electronic Materials Llc | Hardmask |
| US9171720B2 (en) | 2013-01-19 | 2015-10-27 | Rohm And Haas Electronic Materials Llc | Hardmask surface treatment |
| US9136123B2 (en) | 2013-01-19 | 2015-09-15 | Rohm And Haas Electronic Materials Llc | Hardmask surface treatment |
| US20150024522A1 (en) | 2013-07-22 | 2015-01-22 | Rohm And Haas Electronic Materials Llc | Organometal materials and process |
| US8927439B1 (en) | 2013-07-22 | 2015-01-06 | Rohm And Haas Electronic Materials Llc | Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent |
-
2013
- 2013-09-03 US US14/017,281 patent/US9296879B2/en active Active
-
2014
- 2014-09-03 JP JP2014179115A patent/JP6578092B2/ja active Active
- 2014-09-03 TW TW103130352A patent/TWI565762B/zh active
- 2014-09-03 KR KR1020140117265A patent/KR102307612B1/ko active Active
- 2014-09-03 CN CN201410755864.4A patent/CN104635424B/zh not_active Expired - Fee Related
-
2015
- 2015-10-28 US US14/925,147 patent/US9563126B2/en active Active
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