JP2016526183A5 - - Google Patents

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Publication number
JP2016526183A5
JP2016526183A5 JP2016513365A JP2016513365A JP2016526183A5 JP 2016526183 A5 JP2016526183 A5 JP 2016526183A5 JP 2016513365 A JP2016513365 A JP 2016513365A JP 2016513365 A JP2016513365 A JP 2016513365A JP 2016526183 A5 JP2016526183 A5 JP 2016526183A5
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JP
Japan
Prior art keywords
polymer
alkylene
acrylate
methacrylate
photoresist pattern
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JP2016513365A
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English (en)
Japanese (ja)
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JP2016526183A (ja
JP6342993B2 (ja
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Priority claimed from US13/896,936 external-priority patent/US9291909B2/en
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Publication of JP2016526183A5 publication Critical patent/JP2016526183A5/ja
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Publication of JP6342993B2 publication Critical patent/JP6342993B2/ja
Expired - Fee Related legal-status Critical Current
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JP2016513365A 2013-05-17 2014-05-15 ポリマー型熱酸発生剤を含む組成物及びそれの方法 Expired - Fee Related JP6342993B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/896,936 2013-05-17
US13/896,936 US9291909B2 (en) 2013-05-17 2013-05-17 Composition comprising a polymeric thermal acid generator and processes thereof
PCT/EP2014/059999 WO2014184308A1 (en) 2013-05-17 2014-05-15 A composition comprising a polymeric thermal acid generator and processes thereof

Publications (3)

Publication Number Publication Date
JP2016526183A JP2016526183A (ja) 2016-09-01
JP2016526183A5 true JP2016526183A5 (https=) 2017-04-27
JP6342993B2 JP6342993B2 (ja) 2018-06-13

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JP2016513365A Expired - Fee Related JP6342993B2 (ja) 2013-05-17 2014-05-15 ポリマー型熱酸発生剤を含む組成物及びそれの方法

Country Status (8)

Country Link
US (1) US9291909B2 (https=)
EP (1) EP2997058A1 (https=)
JP (1) JP6342993B2 (https=)
KR (1) KR20160011183A (https=)
CN (1) CN105164172B (https=)
SG (1) SG11201506923PA (https=)
TW (1) TWI617890B (https=)
WO (1) WO2014184308A1 (https=)

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JP6757623B2 (ja) * 2016-08-10 2020-09-23 東京応化工業株式会社 レジストパターン厚肉化用ポリマー組成物、及びレジストパターン形成方法
WO2018033559A1 (en) 2016-08-18 2018-02-22 AZ Electronic Materials (Luxembourg) S.à.r.l. Polymer compositions for self-assembly applications
JP6835969B2 (ja) 2016-12-21 2021-02-24 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ Ｇｅｓｅｌｌｓｃｈａｆｔ ｍｉｔ ｂｅｓｃｈｒａｅｎｋｔｅｒ Ｈａｆｔｕｎｇ ブロックコポリマーの自己組織化のための新規組成物及び方法
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WO2019131953A1 (ja) * 2017-12-27 2019-07-04 Jsr株式会社 パターン形成方法及び感放射線性組成物
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CN114585969B (zh) * 2019-09-19 2025-02-07 东京毅力科创株式会社 形成窄沟槽的方法
US11682559B2 (en) 2020-06-11 2023-06-20 Tokyo Electron Limited Method to form narrow slot contacts
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US20220291586A1 (en) * 2021-03-10 2022-09-15 Taiwan Semiconductor Manufacturing Company, Ltd. Underlayer composition and method of manufacturing a semiconductor device
CN113835296A (zh) * 2021-09-28 2021-12-24 之江实验室 一种飞秒激光直写光刻胶组合物
KR102845195B1 (ko) * 2024-09-03 2025-08-13 유한회사 디씨티머티리얼 포토레지스트 패턴을 개선하는 방법 및 이를 이용한 반도체 소자

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