JP2014506172A5 - - Google Patents

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Publication number
JP2014506172A5
JP2014506172A5 JP2013547584A JP2013547584A JP2014506172A5 JP 2014506172 A5 JP2014506172 A5 JP 2014506172A5 JP 2013547584 A JP2013547584 A JP 2013547584A JP 2013547584 A JP2013547584 A JP 2013547584A JP 2014506172 A5 JP2014506172 A5 JP 2014506172A5
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JP
Japan
Prior art keywords
perforated plate
holes
diameter
cavity
mask
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JP2013547584A
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English (en)
Japanese (ja)
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JP6235905B2 (ja
JP2014506172A (ja
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Priority claimed from PCT/US2011/067106 external-priority patent/WO2012092163A1/en
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Publication of JP2014506172A5 publication Critical patent/JP2014506172A5/ja
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Publication of JP6235905B2 publication Critical patent/JP6235905B2/ja
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JP2013547584A 2010-12-28 2011-12-23 光画成有孔プレートおよびそれを生産する方法 Active JP6235905B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201061427715P 2010-12-28 2010-12-28
US61/427,715 2010-12-28
PCT/US2011/067106 WO2012092163A1 (en) 2010-12-28 2011-12-23 Photodefined aperture plate and method for producing the same

Publications (3)

Publication Number Publication Date
JP2014506172A JP2014506172A (ja) 2014-03-13
JP2014506172A5 true JP2014506172A5 (enExample) 2015-02-05
JP6235905B2 JP6235905B2 (ja) 2017-11-22

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JP2013547584A Active JP6235905B2 (ja) 2010-12-28 2011-12-23 光画成有孔プレートおよびそれを生産する方法

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US (6) US9719184B2 (enExample)
EP (3) EP3795361A1 (enExample)
JP (1) JP6235905B2 (enExample)
CN (1) CN103415398B (enExample)
BR (1) BR112013016671B1 (enExample)
RU (1) RU2593254C2 (enExample)
WO (1) WO2012092163A1 (enExample)

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