JP2014131043A - 漏れ電流を低減するように改良されたチャネルコアを有する電界効果トランジスタおよび製造方法 - Google Patents
漏れ電流を低減するように改良されたチャネルコアを有する電界効果トランジスタおよび製造方法 Download PDFInfo
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Abstract
【解決手段】半導体装置は、基板の表面に形成されたチャネル構造を含み、該チャネル構造303、304は、半導体材料で形成されている。ゲート構造は、該チャネル構造の表面の少なくとも一部を覆っており、絶縁材料から成る膜305とゲート電極306、307から構成されている。ソース構造は、該チャネル構造の一方の端部に接続され、ドレイン構造は、該チャネル構造の他方の端部に接続されている。該チャネル構造は、該半導体装置の漏れ電流を低減する構造成分303を含む。
【選択図】図3
Description
Claims (10)
- 基板の表面に形成され、半導体材料から構成されるチャネル構造と、
前記チャネル構造の表面の少なくとも一部を覆い、絶縁材料から成る膜とゲート電極とから構成されるゲート構造と、
前記チャネル構造の一方の端部に接続されたソース構造と、
前記チャネル構造の他方の端部に接続されたドレイン構造と、
を備える半導体装置であって、前記チャネル構造は、前記半導体装置の漏れ電流を低減する改良を含む、半導体装置。 - 請求項1に記載の半導体装置において、
前記チャネル構造を形成する半導体材料に空洞を備えることで、漏れ電流を低減させることを特徴とする、半導体装置。 - 請求項1に記載の半導体装置において、
誘電体材料から成る中央コアを備えることで、漏れ電流を低減させることを特徴とする、半導体装置。 - 請求項3に記載の半導体装置において、
前記誘電体材料は、SiO2から構成されることを特徴とする、半導体装置。 - 請求項1に記載の半導体装置において、更に、
絶縁材料から成り、前記ソース構造、前記ドレイン構造および前記ゲート構造の各々に対して開口部を有する第2の膜と、
前記開口部の各々を充填し、前記ソース構造、前記ドレイン構造および前記ゲート構造の各々と接触して、前記半導体装置の電気的接続部として機能する導電性材料と、
を有することを特徴とする、半導体装置。 - 請求項1に記載の半導体装置において、
前記チャネル構造は、ナノワイヤから構成されることを特徴とする、半導体装置。 - 請求項6に記載の半導体装置において、
前記半導体装置は、ナノワイヤ電界効果トランジスタ(NWFET)から構成されることを特徴とする、半導体装置。 - 請求項1に記載の半導体装置において、
前記チャネル構造は、フィン構造から構成されることを特徴とする、半導体装置。 - 請求項8に記載の半導体装置において、
前記半導体装置は、フィン電界効果トランジスタ(finFET)から構成されることを特徴とする、半導体装置。 - 請求項1に記載の半導体装置において、
前記チャネル構造の前記半導体材料は、シリコンから構成され、ソースおよびドレイン構造はSiGeから構成され、ゲート絶縁膜はSiO2から構成されることを特徴とする、半導体装置。
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- 2013-12-19 US US14/134,694 patent/US9196715B2/en active Active
- 2013-12-25 JP JP2013267187A patent/JP6310695B2/ja active Active
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2015
- 2015-09-30 US US14/870,229 patent/US20160020312A1/en not_active Abandoned
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KR20180050817A (ko) * | 2016-11-07 | 2018-05-16 | 삼성전자주식회사 | 반도체 장치 및 그 제조 방법 |
KR102490696B1 (ko) | 2016-11-07 | 2023-01-19 | 삼성전자주식회사 | 반도체 장치 및 그 제조 방법 |
JP2020521319A (ja) * | 2017-05-23 | 2020-07-16 | インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Machines Corporation | Vfetアーキテクチャ内の超長チャネル・デバイス |
JP7018963B2 (ja) | 2017-05-23 | 2022-02-14 | インターナショナル・ビジネス・マシーンズ・コーポレーション | Vfetアーキテクチャ内の超長チャネル・デバイス |
KR20220170228A (ko) * | 2021-06-22 | 2022-12-29 | 인하대학교 산학협력단 | 전계 효과 트랜지스터의 채널 개선 구조 |
KR102545297B1 (ko) * | 2021-06-22 | 2023-06-20 | 인하대학교 산학협력단 | 전계 효과 트랜지스터의 채널 개선 구조 |
Also Published As
Publication number | Publication date |
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JP6310695B2 (ja) | 2018-04-11 |
CN103915483A (zh) | 2014-07-09 |
US20140183451A1 (en) | 2014-07-03 |
US20160020312A1 (en) | 2016-01-21 |
CN103915483B (zh) | 2019-06-14 |
US9196715B2 (en) | 2015-11-24 |
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