JP2014082028A5 - - Google Patents
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- Publication number
- JP2014082028A5 JP2014082028A5 JP2012227596A JP2012227596A JP2014082028A5 JP 2014082028 A5 JP2014082028 A5 JP 2014082028A5 JP 2012227596 A JP2012227596 A JP 2012227596A JP 2012227596 A JP2012227596 A JP 2012227596A JP 2014082028 A5 JP2014082028 A5 JP 2014082028A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- micro
- charged particle
- probe
- particle beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000523 sample Substances 0.000 claims 92
- 239000002245 particle Substances 0.000 claims 25
- 230000001678 irradiating effect Effects 0.000 claims 11
- 238000001514 detection method Methods 0.000 claims 9
- 238000007599 discharging Methods 0.000 claims 6
- 238000003754 machining Methods 0.000 claims 5
- 238000010894 electron beam technology Methods 0.000 claims 3
- 238000010884 ion-beam technique Methods 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 239000002131 composite material Substances 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012227596A JP5887247B2 (ja) | 2012-10-15 | 2012-10-15 | 荷電粒子線装置および試料作製法 |
| US14/434,687 US9362088B2 (en) | 2012-10-15 | 2013-10-09 | Charged particle beam device and sample preparation method |
| PCT/JP2013/077453 WO2014061524A1 (ja) | 2012-10-15 | 2013-10-09 | 荷電粒子線装置および試料作製法 |
| CN201380053492.4A CN104737266B (zh) | 2012-10-15 | 2013-10-09 | 带电粒子束装置以及试样制作方法 |
| DE112013004612.1T DE112013004612B4 (de) | 2012-10-15 | 2013-10-09 | Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Probenpräparationsverfahren |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012227596A JP5887247B2 (ja) | 2012-10-15 | 2012-10-15 | 荷電粒子線装置および試料作製法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014082028A JP2014082028A (ja) | 2014-05-08 |
| JP2014082028A5 true JP2014082028A5 (enExample) | 2015-11-05 |
| JP5887247B2 JP5887247B2 (ja) | 2016-03-16 |
Family
ID=50488092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012227596A Active JP5887247B2 (ja) | 2012-10-15 | 2012-10-15 | 荷電粒子線装置および試料作製法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9362088B2 (enExample) |
| JP (1) | JP5887247B2 (enExample) |
| CN (1) | CN104737266B (enExample) |
| DE (1) | DE112013004612B4 (enExample) |
| WO (1) | WO2014061524A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102383571B1 (ko) * | 2014-06-30 | 2022-04-06 | 가부시키가이샤 히다치 하이테크 사이언스 | 자동 시료 제작 장치 |
| JP6231461B2 (ja) * | 2014-10-31 | 2017-11-15 | アオイ電子株式会社 | 試料固定装置 |
| JP6689602B2 (ja) | 2014-12-22 | 2020-04-28 | カール ツァイス マイクロスコーピー エルエルシー | 荷電粒子ビームシステム及び方法 |
| CN105158516B (zh) * | 2015-08-20 | 2018-10-16 | 上海华力微电子有限公司 | 一种集成电路分析中透射电镜平面样品的制备方法 |
| CN106226134A (zh) * | 2016-07-29 | 2016-12-14 | 上海华力微电子有限公司 | 制备透射电子显微镜样品的方法 |
| JP6885576B2 (ja) * | 2017-01-19 | 2021-06-16 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
| JP6931214B2 (ja) * | 2017-01-19 | 2021-09-01 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
| JP6974820B2 (ja) * | 2017-03-27 | 2021-12-01 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置、試料加工方法 |
| US11315754B2 (en) * | 2020-04-27 | 2022-04-26 | Applied Materials Israel Ltd. | Adaptive geometry for optimal focused ion beam etching |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2774884B2 (ja) | 1991-08-22 | 1998-07-09 | 株式会社日立製作所 | 試料の分離方法及びこの分離方法で得た分離試料の分析方法 |
| JPH0582479A (ja) | 1991-09-19 | 1993-04-02 | Hitachi Ltd | 集束イオンビーム装置 |
| EP0927880A4 (en) * | 1997-07-22 | 2010-11-17 | Hitachi Ltd | METHOD AND DEVICE FOR PREPARING SAMPLES |
| JP3401426B2 (ja) | 1998-03-23 | 2003-04-28 | 日本電子株式会社 | Ｆｉｂ−ｓｅｍ装置における試料加工方法およびｆｉｂ−ｓｅｍ装置 |
| US6452174B1 (en) * | 1999-12-13 | 2002-09-17 | Mitsubishi Denki Kabushiki Kaisha | Charged particle beam apparatus and method of controlling same |
| JP2001235321A (ja) * | 1999-12-13 | 2001-08-31 | Mitsubishi Electric Corp | 集束イオンビーム装置，集束イオンビーム装置の制御方法及び接触検出方法 |
| JP4408538B2 (ja) * | 2000-07-24 | 2010-02-03 | 株式会社日立製作所 | プローブ装置 |
| JP4088533B2 (ja) * | 2003-01-08 | 2008-05-21 | 株式会社日立ハイテクノロジーズ | 試料作製装置および試料作製方法 |
| JP2004245660A (ja) * | 2003-02-13 | 2004-09-02 | Seiko Instruments Inc | 小片試料の作製とその壁面の観察方法及びそのシステム |
| US7112790B1 (en) * | 2003-08-13 | 2006-09-26 | Cypress Semiconductor Corp. | Method to prepare TEM samples |
| WO2008051880A2 (en) | 2006-10-20 | 2008-05-02 | Fei Company | Method and apparatus for sample extraction and handling |
| EP2106555B1 (en) * | 2006-10-20 | 2015-01-07 | FEI Company | Method for s/tem sample analysis |
| DE102009008166A1 (de) * | 2009-02-10 | 2010-09-02 | Carl Zeiss Nts Gmbh | Verfahren zur Abscheidung von Schutzstrukturen |
| JP4996648B2 (ja) * | 2009-04-27 | 2012-08-08 | 株式会社日立製作所 | プローブ装置 |
| CN202189227U (zh) * | 2011-07-26 | 2012-04-11 | 中国科学院物理研究所 | 纳米图形化和超宽频电磁特性测量系统 |
-
2012
- 2012-10-15 JP JP2012227596A patent/JP5887247B2/ja active Active
-
2013
- 2013-10-09 US US14/434,687 patent/US9362088B2/en active Active
- 2013-10-09 DE DE112013004612.1T patent/DE112013004612B4/de active Active
- 2013-10-09 CN CN201380053492.4A patent/CN104737266B/zh active Active
- 2013-10-09 WO PCT/JP2013/077453 patent/WO2014061524A1/ja not_active Ceased