JP2013539159A5 - - Google Patents

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Publication number
JP2013539159A5
JP2013539159A5 JP2013520730A JP2013520730A JP2013539159A5 JP 2013539159 A5 JP2013539159 A5 JP 2013539159A5 JP 2013520730 A JP2013520730 A JP 2013520730A JP 2013520730 A JP2013520730 A JP 2013520730A JP 2013539159 A5 JP2013539159 A5 JP 2013539159A5
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JP
Japan
Prior art keywords
liner assembly
processing apparatus
plasma processing
slots
wall
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JP2013520730A
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English (en)
Japanese (ja)
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JP6025722B2 (ja
JP2013539159A (ja
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Priority claimed from PCT/US2011/043083 external-priority patent/WO2012012200A1/en
Publication of JP2013539159A publication Critical patent/JP2013539159A/ja
Publication of JP2013539159A5 publication Critical patent/JP2013539159A5/ja
Application granted granted Critical
Publication of JP6025722B2 publication Critical patent/JP6025722B2/ja
Expired - Fee Related legal-status Critical Current
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JP2013520730A 2010-07-21 2011-07-06 電気的な偏りを調整するためのプラズマ処理装置及びライナーアセンブリ、プラズマ処理方法 Expired - Fee Related JP6025722B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36646210P 2010-07-21 2010-07-21
US61/366,462 2010-07-21
PCT/US2011/043083 WO2012012200A1 (en) 2010-07-21 2011-07-06 Plasma processing apparatus and liner assembly for tuning electrical skews

Publications (3)

Publication Number Publication Date
JP2013539159A JP2013539159A (ja) 2013-10-17
JP2013539159A5 true JP2013539159A5 (enExample) 2016-02-18
JP6025722B2 JP6025722B2 (ja) 2016-11-16

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JP2013520730A Expired - Fee Related JP6025722B2 (ja) 2010-07-21 2011-07-06 電気的な偏りを調整するためのプラズマ処理装置及びライナーアセンブリ、プラズマ処理方法

Country Status (6)

Country Link
US (2) US20120018402A1 (enExample)
JP (1) JP6025722B2 (enExample)
KR (2) KR20130092387A (enExample)
CN (2) CN102860138A (enExample)
TW (1) TWI502617B (enExample)
WO (1) WO2012012200A1 (enExample)

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