JP2009004755A5 - - Google Patents

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Publication number
JP2009004755A5
JP2009004755A5 JP2008127472A JP2008127472A JP2009004755A5 JP 2009004755 A5 JP2009004755 A5 JP 2009004755A5 JP 2008127472 A JP2008127472 A JP 2008127472A JP 2008127472 A JP2008127472 A JP 2008127472A JP 2009004755 A5 JP2009004755 A5 JP 2009004755A5
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JP
Japan
Prior art keywords
gas
chamber
workpiece
pedestal
workpiece support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2008127472A
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English (en)
Japanese (ja)
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JP2009004755A (ja
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Publication date
Priority claimed from US11/748,783 external-priority patent/US7691755B2/en
Application filed filed Critical
Publication of JP2009004755A publication Critical patent/JP2009004755A/ja
Publication of JP2009004755A5 publication Critical patent/JP2009004755A5/ja
Ceased legal-status Critical Current

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JP2008127472A 2007-05-15 2008-05-14 トロイダルソースリアクタのための極めて均一なチャンバシーズニングプロセスにおけるプラズマ浸漬イオン注入 Ceased JP2009004755A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/748,783 US7691755B2 (en) 2007-05-15 2007-05-15 Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor

Publications (2)

Publication Number Publication Date
JP2009004755A JP2009004755A (ja) 2009-01-08
JP2009004755A5 true JP2009004755A5 (enExample) 2011-06-30

Family

ID=40027953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008127472A Ceased JP2009004755A (ja) 2007-05-15 2008-05-14 トロイダルソースリアクタのための極めて均一なチャンバシーズニングプロセスにおけるプラズマ浸漬イオン注入

Country Status (5)

Country Link
US (1) US7691755B2 (enExample)
JP (1) JP2009004755A (enExample)
KR (1) KR100993104B1 (enExample)
CN (1) CN101308784B (enExample)
TW (1) TW200915396A (enExample)

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Publication number Priority date Publication date Assignee Title
JPWO2008050596A1 (ja) * 2006-10-25 2010-02-25 パナソニック株式会社 プラズマドーピング方法及びプラズマドーピング装置
US8320191B2 (en) 2007-08-30 2012-11-27 Infineon Technologies Ag Memory cell arrangement, method for controlling a memory cell, memory array and electronic device
US7968439B2 (en) * 2008-02-06 2011-06-28 Applied Materials, Inc. Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces
US8642128B2 (en) * 2009-04-20 2014-02-04 Applied Materials, Inc. Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber walls
JP2011054376A (ja) 2009-09-01 2011-03-17 Ihi Corp Ｌｐｐ方式のｅｕｖ光源とその発生方法
KR101415886B1 (ko) 2009-09-01 2014-07-04 가부시키가이샤 아이에이치아이 플라즈마 광원
CN102296275B (zh) * 2010-06-25 2013-10-16 中国科学院微电子研究所 基片离子均匀注入的方法
US10658161B2 (en) * 2010-10-15 2020-05-19 Applied Materials, Inc. Method and apparatus for reducing particle defects in plasma etch chambers
US8309474B1 (en) * 2011-06-07 2012-11-13 Ultratech, Inc. Ultrafast laser annealing with reduced pattern density effects in integrated circuit fabrication
US9302348B2 (en) 2011-06-07 2016-04-05 Ultratech Inc. Ultrafast laser annealing with reduced pattern density effects in integrated circuit fabrication
CN103165377B (zh) * 2011-12-12 2016-02-03 中国科学院微电子研究所 一种等离子体浸没注入电极结构
CN103915307B (zh) * 2012-12-31 2016-08-17 中微半导体设备(上海)有限公司 等离子体处理室及用于该等离子体处理室的气体注入装置
KR102104018B1 (ko) * 2013-03-12 2020-04-23 어플라이드 머티어리얼스, 인코포레이티드 방위각 및 방사상 분배 제어되는 다중-구역 가스 주입 조립체
SG11201506564RA (en) * 2013-03-15 2015-09-29 Plasmability Llc Toroidal plasma processing apparatus
CN104576280B (zh) * 2013-10-23 2017-10-20 中微半导体设备(上海)有限公司 等离子体处理腔室及其去夹持装置和方法
CN104810238A (zh) * 2014-01-23 2015-07-29 北京北方微电子基地设备工艺研究中心有限责任公司 匀气结构及等离子体系统
JP6242288B2 (ja) * 2014-05-15 2017-12-06 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
US9613819B2 (en) * 2014-06-06 2017-04-04 Taiwan Semiconductor Manufacturing Company, Ltd. Process chamber, method of preparing a process chamber, and method of operating a process chamber
CN105529237B (zh) * 2014-10-23 2018-05-01 中微半导体设备(上海)有限公司 气体导流环、气体供应装置及等离子体处理装置
US9828672B2 (en) 2015-03-26 2017-11-28 Lam Research Corporation Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma
US10023956B2 (en) * 2015-04-09 2018-07-17 Lam Research Corporation Eliminating first wafer metal contamination effect in high density plasma chemical vapor deposition systems
CN114551206A (zh) * 2015-12-04 2022-05-27 应用材料公司 用以防止hdp-cvd腔室电弧放电的先进涂层方法及材料
JP6804280B2 (ja) * 2016-12-07 2020-12-23 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
US10211099B2 (en) 2016-12-19 2019-02-19 Lam Research Corporation Chamber conditioning for remote plasma process
JP6270191B1 (ja) * 2017-05-17 2018-01-31 日本新工芯技株式会社 保護材用リング
US20190051495A1 (en) * 2017-08-10 2019-02-14 Qiwei Liang Microwave Reactor For Deposition or Treatment of Carbon Compounds
US11761079B2 (en) 2017-12-07 2023-09-19 Lam Research Corporation Oxidation resistant protective layer in chamber conditioning
US10760158B2 (en) 2017-12-15 2020-09-01 Lam Research Corporation Ex situ coating of chamber components for semiconductor processing
KR20250110938A (ko) 2018-10-19 2025-07-21 램 리써치 코포레이션 반도체 프로세싱을 위한 챔버 컴포넌트들의 인 시츄 (in situ) 보호 코팅
WO2020101838A1 (en) * 2018-11-16 2020-05-22 Mattson Technology, Inc. Chamber seasoning to improve etch uniformity by reducing chemistry
CN112376029B (zh) * 2020-11-11 2022-10-21 北京北方华创微电子装备有限公司 等离子体浸没离子注入设备
CN114597145A (zh) * 2022-03-09 2022-06-07 盛吉盛半导体科技(北京)有限公司 一种硅反应装置

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US5744049A (en) * 1994-07-18 1998-04-28 Applied Materials, Inc. Plasma reactor with enhanced plasma uniformity by gas addition, and method of using same
TW422892B (en) * 1997-03-27 2001-02-21 Applied Materials Inc Technique for improving chucking reproducibility
US6197123B1 (en) * 1997-12-18 2001-03-06 Texas Instruments Incorporated Method for cleaning a process chamber used for manufacturing substrates during nonproduction intervals
US7288491B2 (en) * 2000-08-11 2007-10-30 Applied Materials, Inc. Plasma immersion ion implantation process
US7094670B2 (en) 2000-08-11 2006-08-22 Applied Materials, Inc. Plasma immersion ion implantation process
US6589868B2 (en) * 2001-02-08 2003-07-08 Applied Materials, Inc. Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput
US20050260354A1 (en) * 2004-05-20 2005-11-24 Varian Semiconductor Equipment Associates, Inc. In-situ process chamber preparation methods for plasma ion implantation systems

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