KR20130092387A - 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리 - Google Patents

플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리 Download PDF

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Publication number
KR20130092387A
KR20130092387A KR1020127027857A KR20127027857A KR20130092387A KR 20130092387 A KR20130092387 A KR 20130092387A KR 1020127027857 A KR1020127027857 A KR 1020127027857A KR 20127027857 A KR20127027857 A KR 20127027857A KR 20130092387 A KR20130092387 A KR 20130092387A
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KR
South Korea
Prior art keywords
slots
liner assembly
chamber
plasma
liner
Prior art date
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Ceased
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KR1020127027857A
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English (en)
Korean (ko)
Inventor
제임스 디. 카르두치
지강 첸
샤히드 라우프
케네스 에스. 콜린스
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
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Publication of KR20130092387A publication Critical patent/KR20130092387A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32495—Means for protecting the vessel against plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
KR1020127027857A 2010-07-21 2011-07-06 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리 Ceased KR20130092387A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36646210P 2010-07-21 2010-07-21
US61/366,462 2010-07-21
PCT/US2011/043083 WO2012012200A1 (en) 2010-07-21 2011-07-06 Plasma processing apparatus and liner assembly for tuning electrical skews

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020187007230A Division KR101970615B1 (ko) 2010-07-21 2011-07-06 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리

Publications (1)

Publication Number Publication Date
KR20130092387A true KR20130092387A (ko) 2013-08-20

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KR1020127027857A Ceased KR20130092387A (ko) 2010-07-21 2011-07-06 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리
KR1020187007230A Expired - Fee Related KR101970615B1 (ko) 2010-07-21 2011-07-06 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리

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KR1020187007230A Expired - Fee Related KR101970615B1 (ko) 2010-07-21 2011-07-06 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리

Country Status (6)

Country Link
US (2) US20120018402A1 (enExample)
JP (1) JP6025722B2 (enExample)
KR (2) KR20130092387A (enExample)
CN (2) CN102860138A (enExample)
TW (1) TWI502617B (enExample)
WO (1) WO2012012200A1 (enExample)

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Also Published As

Publication number Publication date
US20150279633A1 (en) 2015-10-01
TW201205639A (en) 2012-02-01
US10242847B2 (en) 2019-03-26
JP2013539159A (ja) 2013-10-17
CN108538695B (zh) 2021-01-29
KR20180030729A (ko) 2018-03-23
WO2012012200A1 (en) 2012-01-26
KR101970615B1 (ko) 2019-04-19
TWI502617B (zh) 2015-10-01
CN108538695A (zh) 2018-09-14
JP6025722B2 (ja) 2016-11-16
US20120018402A1 (en) 2012-01-26
CN102860138A (zh) 2013-01-02

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Appeal kind category: Appeal against decision to decline refusal

Request date: 20180313

Decision date: 20191023

Appeal identifier: 2018101001136