JP2013507274A5 - - Google Patents

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Publication number
JP2013507274A5
JP2013507274A5 JP2012533601A JP2012533601A JP2013507274A5 JP 2013507274 A5 JP2013507274 A5 JP 2013507274A5 JP 2012533601 A JP2012533601 A JP 2012533601A JP 2012533601 A JP2012533601 A JP 2012533601A JP 2013507274 A5 JP2013507274 A5 JP 2013507274A5
Authority
JP
Japan
Prior art keywords
layer
coated product
product according
nanoparticles
tio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012533601A
Other languages
English (en)
Japanese (ja)
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JP2013507274A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2010/065204 external-priority patent/WO2011045275A1/de
Publication of JP2013507274A publication Critical patent/JP2013507274A/ja
Publication of JP2013507274A5 publication Critical patent/JP2013507274A5/ja
Pending legal-status Critical Current

Links

JP2012533601A 2009-10-16 2010-10-11 単一および複層における高反射率、耐引っ掻き性TiO2被膜 Pending JP2013507274A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102009049604.1 2009-10-16
DE102009049604 2009-10-16
PCT/EP2010/065204 WO2011045275A1 (de) 2009-10-16 2010-10-11 Hochbrechende, kratzfeste tio2-beschichtungen in mono- und multischichten

Publications (2)

Publication Number Publication Date
JP2013507274A JP2013507274A (ja) 2013-03-04
JP2013507274A5 true JP2013507274A5 (https=) 2013-11-21

Family

ID=43301892

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012533601A Pending JP2013507274A (ja) 2009-10-16 2010-10-11 単一および複層における高反射率、耐引っ掻き性TiO2被膜

Country Status (5)

Country Link
US (1) US20120219788A1 (https=)
EP (1) EP2488590A1 (https=)
JP (1) JP2013507274A (https=)
CN (1) CN102549081A (https=)
WO (1) WO2011045275A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011088154A1 (de) * 2011-12-09 2013-06-13 CFC Europe GmbH Schichtförmiges Produkt, insbesondere zur Verstärkung von optischen Effekten, und Verfahren zu seiner Herstellung
CN103730601A (zh) * 2013-12-26 2014-04-16 京东方科技集团股份有限公司 分布布拉格反射镜结构及制备方法和有机发光二极管结构
US10319878B2 (en) * 2014-10-31 2019-06-11 eLux, Inc. Stratified quantum dot phosphor structure

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GB1159551A (en) 1965-08-13 1969-07-30 Ford Motor Co Painting
US3610729A (en) 1969-06-18 1971-10-05 Polaroid Corp Multilayered light polarizer
JPS5034964B1 (https=) 1970-03-30 1975-11-12
DE2737406A1 (de) 1977-08-19 1979-02-22 Bayer Ag Strahlenhaertbare bindemittel
US5122905A (en) 1989-06-20 1992-06-16 The Dow Chemical Company Relective polymeric body
US5094788A (en) 1990-12-21 1992-03-10 The Dow Chemical Company Interfacial surface generator
JPH05234138A (ja) * 1992-02-25 1993-09-10 Ricoh Co Ltd 光情報記録媒体
US5269995A (en) 1992-10-02 1993-12-14 The Dow Chemical Company Coextrusion of multilayer articles using protective boundary layers and apparatus therefor
JPH06155921A (ja) * 1992-11-25 1994-06-03 Pioneer Electron Corp 光記録媒体
US5389324A (en) 1993-06-07 1995-02-14 The Dow Chemical Company Layer thickness gradient control in multilayer polymeric bodies
DE19823732A1 (de) 1998-05-27 1999-12-02 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung optischer Mehrschichtsysteme
JP3068562B2 (ja) 1998-06-12 2000-07-24 ホーヤ株式会社 光学部材用コーティング組成物、それを用いて得られる薄膜層及びそれを有する光学部材
GB9815271D0 (en) 1998-07-14 1998-09-09 Cambridge Display Tech Ltd Particles and devices comprising particles
US6777070B1 (en) * 1998-10-14 2004-08-17 Tomoegawa Paper Co., Ltd. Antireflection material and polarizing film using the same
JP2000285516A (ja) * 1999-03-30 2000-10-13 Hitachi Maxell Ltd 光記録媒体
JP2001164117A (ja) * 1999-12-07 2001-06-19 Toppan Printing Co Ltd 高屈折率組成物および反射防止積層体
JP2001255403A (ja) * 2000-03-13 2001-09-21 Fuji Photo Film Co Ltd 帯電防止反射防止フィルムおよびそれを用いた陰極線管表示装置
JP4008203B2 (ja) 2001-03-28 2007-11-14 リンテック株式会社 光学用フィルム
CN1276934C (zh) * 2002-07-22 2006-09-27 三井化学株式会社 含有无机超微粒子的树脂组合物
DE10325436A1 (de) * 2003-06-05 2004-12-23 Bayer Materialscience Ag Verfahren zur Herstellung von beschlagsfreien Kratzfest-Schichtsystemen
JP2005283730A (ja) * 2004-03-29 2005-10-13 Fuji Photo Film Co Ltd 反射防止フイルム、偏光板、および画像表示装置
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JP4622896B2 (ja) * 2006-03-14 2011-02-02 Jsr株式会社 高密度記録光ディスク表面保護層用組成物、硬化膜および表面保護層を有する光ディスク
JP2007323743A (ja) * 2006-06-01 2007-12-13 Victor Co Of Japan Ltd 相変化型光記録媒体
JP4692630B2 (ja) * 2006-05-29 2011-06-01 東洋インキ製造株式会社 金属酸化物分散体の製造方法、積層体および分散剤
DE102006046160A1 (de) 2006-09-29 2008-04-03 Bayer Materialscience Ag Beschichtetes Erzeugnis enthaltend eine hochbrechende und kratzfeste Schicht
DE102007032886A1 (de) * 2007-07-14 2009-01-15 Bayer Materialscience Ag Hydrophile Hardcoatbeschichtungen
JP2009048710A (ja) * 2007-08-21 2009-03-05 Hitachi Maxell Ltd 光情報記録媒体

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