JP2013501345A5 - - Google Patents
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- Publication number
- JP2013501345A5 JP2013501345A5 JP2012521917A JP2012521917A JP2013501345A5 JP 2013501345 A5 JP2013501345 A5 JP 2013501345A5 JP 2012521917 A JP2012521917 A JP 2012521917A JP 2012521917 A JP2012521917 A JP 2012521917A JP 2013501345 A5 JP2013501345 A5 JP 2013501345A5
- Authority
- JP
- Japan
- Prior art keywords
- layers
- buildup
- layer
- core
- height
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 14
- 229910000679 solder Inorganic materials 0.000 claims 13
- 238000005553 drilling Methods 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 7
- 239000004065 semiconductor Substances 0.000 claims 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 230000003014 reinforcing effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/533,569 US20110024898A1 (en) | 2009-07-31 | 2009-07-31 | Method of manufacturing substrates having asymmetric buildup layers |
| US12/533,569 | 2009-07-31 | ||
| PCT/CA2010/001174 WO2011011880A1 (en) | 2009-07-31 | 2010-07-28 | A method of manufacturing substrates having asymmetric buildup layers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013501345A JP2013501345A (ja) | 2013-01-10 |
| JP2013501345A5 true JP2013501345A5 (enExample) | 2013-08-22 |
| JP5723363B2 JP5723363B2 (ja) | 2015-05-27 |
Family
ID=43526212
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012521917A Active JP5723363B2 (ja) | 2009-07-31 | 2010-07-28 | 非対称なビルドアップ層を有する基板を製造する方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20110024898A1 (enExample) |
| EP (1) | EP2460393B1 (enExample) |
| JP (1) | JP5723363B2 (enExample) |
| KR (1) | KR101633839B1 (enExample) |
| CN (1) | CN102656955B (enExample) |
| WO (1) | WO2011011880A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8598698B1 (en) * | 2010-07-21 | 2013-12-03 | Altera Corporation | Package substrate with an embedded stiffener |
| JP6211510B2 (ja) * | 2011-04-08 | 2017-10-11 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | 画像処理システム及び方法 |
| US8945329B2 (en) * | 2011-06-24 | 2015-02-03 | Ibiden Co., Ltd. | Printed wiring board and method for manufacturing printed wiring board |
| JP2013048205A (ja) * | 2011-07-25 | 2013-03-07 | Ngk Spark Plug Co Ltd | 配線基板の製造方法 |
| US9159649B2 (en) * | 2011-12-20 | 2015-10-13 | Intel Corporation | Microelectronic package and stacked microelectronic assembly and computing system containing same |
| US9059179B2 (en) * | 2011-12-28 | 2015-06-16 | Broadcom Corporation | Semiconductor package with a bridge interposer |
| US20130181359A1 (en) * | 2012-01-13 | 2013-07-18 | TW Semiconductor Manufacturing Company, Ltd. | Methods and Apparatus for Thinner Package on Package Structures |
| JP5941735B2 (ja) | 2012-04-10 | 2016-06-29 | 新光電気工業株式会社 | 配線基板の製造方法及び配線基板 |
| KR101921258B1 (ko) | 2012-05-09 | 2018-11-22 | 삼성전자주식회사 | 배선 기판 및 이를 포함하는 반도체 패키지 |
| JP2014086651A (ja) * | 2012-10-26 | 2014-05-12 | Ibiden Co Ltd | プリント配線板及びプリント配線板の製造方法 |
| KR101431911B1 (ko) * | 2012-12-06 | 2014-08-26 | 삼성전기주식회사 | 인쇄회로기판 및 그 제조방법 |
| US9299649B2 (en) | 2013-02-08 | 2016-03-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | 3D packages and methods for forming the same |
| US8802504B1 (en) | 2013-03-14 | 2014-08-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | 3D packages and methods for forming the same |
| KR20150083278A (ko) * | 2014-01-09 | 2015-07-17 | 삼성전기주식회사 | 다층기판 및 다층기판의 제조방법 |
| KR102250997B1 (ko) | 2014-05-02 | 2021-05-12 | 삼성전자주식회사 | 반도체 패키지 |
| CN104883810B (zh) * | 2015-05-15 | 2018-07-06 | 江门崇达电路技术有限公司 | 一种具有密集散热孔的pcb的制作方法 |
| US11277922B2 (en) | 2016-10-06 | 2022-03-15 | Advanced Micro Devices, Inc. | Circuit board with bridge chiplets |
| WO2018181857A1 (ja) | 2017-03-31 | 2018-10-04 | Jxtgエネルギー株式会社 | 硬化樹脂用組成物、該組成物の硬化物、該組成物および該硬化物の製造方法、ならびに半導体装置 |
| US10510721B2 (en) | 2017-08-11 | 2019-12-17 | Advanced Micro Devices, Inc. | Molded chip combination |
| EP3470681B1 (de) * | 2017-10-10 | 2021-09-22 | Pfeiffer Vacuum Gmbh | Elektrische durchführung für ein vakuumgerät, in der form einer dichtungsplatine |
| US20190287872A1 (en) | 2018-03-19 | 2019-09-19 | Intel Corporation | Multi-use package architecture |
| US10593628B2 (en) | 2018-04-24 | 2020-03-17 | Advanced Micro Devices, Inc. | Molded die last chip combination |
| US10672712B2 (en) | 2018-07-30 | 2020-06-02 | Advanced Micro Devices, Inc. | Multi-RDL structure packages and methods of fabricating the same |
| US10923430B2 (en) | 2019-06-30 | 2021-02-16 | Advanced Micro Devices, Inc. | High density cross link die with polymer routing layer |
| US20230086356A1 (en) * | 2021-09-21 | 2023-03-23 | Intel Corporation | Glass core substrate including buildups with different numbers of layers |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100393271B1 (ko) * | 1997-11-19 | 2003-07-31 | 이비덴 가부시키가이샤 | 다층 전자부품탑재용 기판의 제조 방법 |
| JP4128649B2 (ja) * | 1998-03-26 | 2008-07-30 | 富士通株式会社 | 薄膜多層回路基板の製造方法 |
| JPH11340610A (ja) * | 1998-05-26 | 1999-12-10 | Ibiden Co Ltd | スルーホール充填用樹脂組成物及び多層プリント配線板 |
| KR100642167B1 (ko) * | 1998-09-18 | 2006-11-02 | 훈츠만 어드밴스트 머티리얼스(스위처랜드)게엠베하 | 다층 회로의 제조방법 |
| JP3577421B2 (ja) * | 1999-01-25 | 2004-10-13 | 新光電気工業株式会社 | 半導体装置用パッケージ |
| WO2000079849A1 (en) * | 1999-06-18 | 2000-12-28 | Isola Laminate Systems Corp. | High performance ball grid array substrates |
| TW512653B (en) * | 1999-11-26 | 2002-12-01 | Ibiden Co Ltd | Multilayer circuit board and semiconductor device |
| US6720644B2 (en) * | 2000-10-10 | 2004-04-13 | Sony Corporation | Semiconductor device using interposer substrate and manufacturing method therefor |
| JP2002290031A (ja) * | 2001-03-23 | 2002-10-04 | Ngk Spark Plug Co Ltd | 配線基板およびその製造方法 |
| JP4243117B2 (ja) * | 2002-08-27 | 2009-03-25 | 新光電気工業株式会社 | 半導体パッケージとその製造方法および半導体装置 |
| US20060289203A1 (en) * | 2003-05-19 | 2006-12-28 | Dai Nippon Printing Co., Ltd. | Double-sided wiring board, double sided wiring board manufacturing method, and multilayer wiring board |
| CN1792126A (zh) * | 2003-05-19 | 2006-06-21 | 大日本印刷株式会社 | 双面布线基板和双面布线基板的制造方法以及多层布线基板 |
| JP2005159201A (ja) * | 2003-11-28 | 2005-06-16 | Ngk Spark Plug Co Ltd | 配線基板およびその製造方法 |
| TWI295089B (en) * | 2004-12-28 | 2008-03-21 | Ngk Spark Plug Co | Wiring substrate and the manufacturing method of the same |
| US7355283B2 (en) * | 2005-04-14 | 2008-04-08 | Sandisk Corporation | Rigid wave pattern design on chip carrier substrate and printed circuit board for semiconductor and electronic sub-system packaging |
| US20070020908A1 (en) * | 2005-07-18 | 2007-01-25 | Tessera, Inc. | Multilayer structure having a warpage-compensating layer |
| JP4452222B2 (ja) * | 2005-09-07 | 2010-04-21 | 新光電気工業株式会社 | 多層配線基板及びその製造方法 |
| JP2008098570A (ja) * | 2006-10-16 | 2008-04-24 | Sharp Corp | 多層プリント配線基板の製造方法 |
| JP5105378B2 (ja) * | 2007-12-26 | 2012-12-26 | パナソニック株式会社 | 半導体装置および多層配線基板 |
-
2009
- 2009-07-31 US US12/533,569 patent/US20110024898A1/en not_active Abandoned
-
2010
- 2010-07-28 CN CN201080034121.8A patent/CN102656955B/zh active Active
- 2010-07-28 KR KR1020117031056A patent/KR101633839B1/ko active Active
- 2010-07-28 WO PCT/CA2010/001174 patent/WO2011011880A1/en not_active Ceased
- 2010-07-28 EP EP10803777.1A patent/EP2460393B1/en active Active
- 2010-07-28 JP JP2012521917A patent/JP5723363B2/ja active Active
-
2011
- 2011-06-03 US US13/152,918 patent/US8298945B2/en active Active
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