JP2013254736A5 - - Google Patents

Download PDF

Info

Publication number
JP2013254736A5
JP2013254736A5 JP2013119000A JP2013119000A JP2013254736A5 JP 2013254736 A5 JP2013254736 A5 JP 2013254736A5 JP 2013119000 A JP2013119000 A JP 2013119000A JP 2013119000 A JP2013119000 A JP 2013119000A JP 2013254736 A5 JP2013254736 A5 JP 2013254736A5
Authority
JP
Japan
Prior art keywords
condenser lens
deflector
magnetic
emitter
field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013119000A
Other languages
English (en)
Japanese (ja)
Other versions
JP5779614B2 (ja
JP2013254736A (ja
Filing date
Publication date
Priority claimed from EP12171023.0A external-priority patent/EP2672502B1/en
Application filed filed Critical
Publication of JP2013254736A publication Critical patent/JP2013254736A/ja
Publication of JP2013254736A5 publication Critical patent/JP2013254736A5/ja
Application granted granted Critical
Publication of JP5779614B2 publication Critical patent/JP5779614B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013119000A 2012-06-06 2013-06-05 可動コンデンサーレンズを備えた高輝度電子銃 Active JP5779614B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP12171023.0A EP2672502B1 (en) 2012-06-06 2012-06-06 electron beam optical system comprising high brightness electron gun with moving axis condenser lens
EP12171023.0 2012-06-06

Publications (3)

Publication Number Publication Date
JP2013254736A JP2013254736A (ja) 2013-12-19
JP2013254736A5 true JP2013254736A5 (enExample) 2015-07-02
JP5779614B2 JP5779614B2 (ja) 2015-09-16

Family

ID=46506137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013119000A Active JP5779614B2 (ja) 2012-06-06 2013-06-05 可動コンデンサーレンズを備えた高輝度電子銃

Country Status (4)

Country Link
US (1) US8921804B2 (enExample)
EP (1) EP2672502B1 (enExample)
JP (1) JP5779614B2 (enExample)
TW (1) TWI539481B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112014006978B4 (de) 2014-10-20 2022-01-27 Hitachi High-Tech Corporation Rasterelektronenmikroskop
US9799484B2 (en) * 2014-12-09 2017-10-24 Hermes Microvision, Inc. Charged particle source
JP6987233B2 (ja) * 2018-05-22 2021-12-22 株式会社日立ハイテク 荷電粒子線装置及びその軸調整方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0485643A (ja) 1990-07-30 1992-03-18 Matsushita Electric Ind Co Ltd 情報処理装置
JPH0485643U (enExample) * 1990-11-30 1992-07-24
JPH09223475A (ja) * 1996-02-19 1997-08-26 Nikon Corp 電磁偏向器、及び該偏向器を用いた荷電粒子線転写装置
JPH09245703A (ja) * 1996-03-13 1997-09-19 Jeol Ltd 荷電粒子ビームの軸合わせ装置
JPH1097979A (ja) * 1996-09-25 1998-04-14 Nikon Corp 縮小投影装置
US5708274A (en) * 1996-12-18 1998-01-13 International Business Machines Corporation Curvilinear variable axis lens correction with crossed coils
US5793048A (en) * 1996-12-18 1998-08-11 International Business Machines Corporation Curvilinear variable axis lens correction with shifted dipoles
KR20010031926A (ko) * 1998-09-09 2001-04-16 요트.게.아. 롤페즈 충전 입자를 활용하는 투사형 리소그래피 장치
DE60323909D1 (de) * 2002-08-13 2008-11-20 Zeiss Carl Nts Gmbh Teilchenoptischer Apparat und seine Verwendung als elektronenmikroskopisches System
EP1777730B1 (en) * 2005-10-19 2018-05-30 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Arrangement and method for compensating emitter tip vibrations
US8101911B2 (en) * 2008-11-04 2012-01-24 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Method and device for improved alignment of a high brightness charged particle gun
KR101318592B1 (ko) * 2009-11-26 2013-10-15 가부시키가이샤 히다치 하이테크놀로지즈 주사 전자 현미경
EP2444990B1 (en) * 2010-10-19 2014-06-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Simplified particle emitter and method of operating thereof

Similar Documents

Publication Publication Date Title
US10347460B2 (en) Patterned substrate imaging using multiple electron beams
EP4236045A3 (en) Optical adjusting apparatus
WO2016012425A3 (de) Abbildende optik für ein metrologiesystem zur untersuchung einer lithographiemaske
JP6117778B2 (ja) マルチコラム電子ビーム装置および方法
JP2016503589A5 (enExample)
EP2722867A3 (en) Configurable charged-particle beam apparatus
JP2017107106A5 (enExample)
JP2012243802A5 (enExample)
JP2012178347A5 (enExample)
JP2014054670A5 (enExample)
JP2014082211A5 (enExample)
TWI813760B (zh) 試料加工觀察方法
JP2013187729A5 (enExample)
JP2013254736A5 (enExample)
WO2013186179A3 (de) Vorrichtung und verfahren zur interferenzstrukturierung von proben unter verwendung von laserstrahlen; dergestalt strukturierte proben
JP2011238612A5 (enExample)
CN106463322B (zh) 利用双维恩过滤器单色器的电子束成像
CN103009390A (zh) 基于显微视觉的对准和抓取柱状微零件的方法与装置
JP2017199606A5 (enExample)
WO2017099107A3 (en) Microscope system
JP2016122049A5 (enExample)
KR101591154B1 (ko) 회절 수차 보정기를 적용한 하전 입자 빔 현미경
JP2016139466A (ja) 画像振動低減装置
JP2012253093A5 (enExample)
JP2014103171A5 (enExample)