JP2012253093A5 - - Google Patents

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Publication number
JP2012253093A5
JP2012253093A5 JP2011122742A JP2011122742A JP2012253093A5 JP 2012253093 A5 JP2012253093 A5 JP 2012253093A5 JP 2011122742 A JP2011122742 A JP 2011122742A JP 2011122742 A JP2011122742 A JP 2011122742A JP 2012253093 A5 JP2012253093 A5 JP 2012253093A5
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JP
Japan
Prior art keywords
focusing lens
charged particle
aperture
array
drawing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011122742A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012253093A (ja
JP5836646B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2011122742A priority Critical patent/JP5836646B2/ja
Priority claimed from JP2011122742A external-priority patent/JP5836646B2/ja
Priority to TW101109328A priority patent/TW201239943A/zh
Priority to US13/423,960 priority patent/US8610082B2/en
Priority to KR1020120029784A priority patent/KR20120110026A/ko
Publication of JP2012253093A publication Critical patent/JP2012253093A/ja
Publication of JP2012253093A5 publication Critical patent/JP2012253093A5/ja
Application granted granted Critical
Publication of JP5836646B2 publication Critical patent/JP5836646B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011122742A 2011-03-25 2011-05-31 描画装置、および、物品の製造方法 Expired - Fee Related JP5836646B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011122742A JP5836646B2 (ja) 2011-05-31 2011-05-31 描画装置、および、物品の製造方法
TW101109328A TW201239943A (en) 2011-03-25 2012-03-19 Drawing apparatus and method of manufacturing article
US13/423,960 US8610082B2 (en) 2011-03-25 2012-03-19 Drawing apparatus and method of manufacturing article
KR1020120029784A KR20120110026A (ko) 2011-03-25 2012-03-23 묘화 장치 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011122742A JP5836646B2 (ja) 2011-05-31 2011-05-31 描画装置、および、物品の製造方法

Publications (3)

Publication Number Publication Date
JP2012253093A JP2012253093A (ja) 2012-12-20
JP2012253093A5 true JP2012253093A5 (enExample) 2014-06-19
JP5836646B2 JP5836646B2 (ja) 2015-12-24

Family

ID=47525665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011122742A Expired - Fee Related JP5836646B2 (ja) 2011-03-25 2011-05-31 描画装置、および、物品の製造方法

Country Status (1)

Country Link
JP (1) JP5836646B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5430703B2 (ja) * 2012-03-30 2014-03-05 キヤノン株式会社 描画装置、および物品の製造方法
JP2016105428A (ja) * 2013-03-08 2016-06-09 株式会社クレステック 電子ビーム照射装置、マルチ電子ビーム照射装置、調整方法、および電子ビーム露光装置
US10216087B2 (en) 2014-06-13 2019-02-26 Intel Corporation Ebeam universal cutter
JP6772962B2 (ja) 2017-06-02 2020-10-21 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
DE102020115183A1 (de) * 2020-06-08 2021-12-09 Carl Zeiss Multisem Gmbh Teilchenstrahlsystem mit Multiquellensystem

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001332473A (ja) * 2000-05-23 2001-11-30 Canon Inc 荷電粒子線露光装置及び該装置を用いたデバイス製造方法
JP3803105B2 (ja) * 2004-09-07 2006-08-02 株式会社日立ハイテクノロジーズ 電子ビーム応用装置
TW201133534A (en) * 2009-09-18 2011-10-01 Mapper Lithography Ip Bv Multiple beam charged particle optical system

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