JP5836646B2 - 描画装置、および、物品の製造方法 - Google Patents

描画装置、および、物品の製造方法 Download PDF

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Publication number
JP5836646B2
JP5836646B2 JP2011122742A JP2011122742A JP5836646B2 JP 5836646 B2 JP5836646 B2 JP 5836646B2 JP 2011122742 A JP2011122742 A JP 2011122742A JP 2011122742 A JP2011122742 A JP 2011122742A JP 5836646 B2 JP5836646 B2 JP 5836646B2
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Japan
Prior art keywords
array
aperture
focusing lens
electron beam
charged particle
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Expired - Fee Related
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JP2011122742A
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English (en)
Japanese (ja)
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JP2012253093A (ja
JP2012253093A5 (enExample
Inventor
健太郎 佐野
健太郎 佐野
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011122742A priority Critical patent/JP5836646B2/ja
Priority to TW101109328A priority patent/TW201239943A/zh
Priority to US13/423,960 priority patent/US8610082B2/en
Priority to KR1020120029784A priority patent/KR20120110026A/ko
Publication of JP2012253093A publication Critical patent/JP2012253093A/ja
Publication of JP2012253093A5 publication Critical patent/JP2012253093A5/ja
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Publication of JP5836646B2 publication Critical patent/JP5836646B2/ja
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JP2011122742A 2011-03-25 2011-05-31 描画装置、および、物品の製造方法 Expired - Fee Related JP5836646B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011122742A JP5836646B2 (ja) 2011-05-31 2011-05-31 描画装置、および、物品の製造方法
TW101109328A TW201239943A (en) 2011-03-25 2012-03-19 Drawing apparatus and method of manufacturing article
US13/423,960 US8610082B2 (en) 2011-03-25 2012-03-19 Drawing apparatus and method of manufacturing article
KR1020120029784A KR20120110026A (ko) 2011-03-25 2012-03-23 묘화 장치 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011122742A JP5836646B2 (ja) 2011-05-31 2011-05-31 描画装置、および、物品の製造方法

Publications (3)

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JP2012253093A JP2012253093A (ja) 2012-12-20
JP2012253093A5 JP2012253093A5 (enExample) 2014-06-19
JP5836646B2 true JP5836646B2 (ja) 2015-12-24

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JP2011122742A Expired - Fee Related JP5836646B2 (ja) 2011-03-25 2011-05-31 描画装置、および、物品の製造方法

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JP (1) JP5836646B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5430703B2 (ja) * 2012-03-30 2014-03-05 キヤノン株式会社 描画装置、および物品の製造方法
JP2016105428A (ja) * 2013-03-08 2016-06-09 株式会社クレステック 電子ビーム照射装置、マルチ電子ビーム照射装置、調整方法、および電子ビーム露光装置
US10216087B2 (en) 2014-06-13 2019-02-26 Intel Corporation Ebeam universal cutter
JP6772962B2 (ja) 2017-06-02 2020-10-21 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
DE102020115183A1 (de) * 2020-06-08 2021-12-09 Carl Zeiss Multisem Gmbh Teilchenstrahlsystem mit Multiquellensystem

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001332473A (ja) * 2000-05-23 2001-11-30 Canon Inc 荷電粒子線露光装置及び該装置を用いたデバイス製造方法
JP3803105B2 (ja) * 2004-09-07 2006-08-02 株式会社日立ハイテクノロジーズ 電子ビーム応用装置
TW201133534A (en) * 2009-09-18 2011-10-01 Mapper Lithography Ip Bv Multiple beam charged particle optical system

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JP2012253093A (ja) 2012-12-20

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