JP2016520951A5 - - Google Patents

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Publication number
JP2016520951A5
JP2016520951A5 JP2016503455A JP2016503455A JP2016520951A5 JP 2016520951 A5 JP2016520951 A5 JP 2016520951A5 JP 2016503455 A JP2016503455 A JP 2016503455A JP 2016503455 A JP2016503455 A JP 2016503455A JP 2016520951 A5 JP2016520951 A5 JP 2016520951A5
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Japan
Prior art keywords
implantation system
ion implantation
ions
ion
opening
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JP2016503455A
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Japanese (ja)
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JP6500009B2 (ja
JP2016520951A (ja
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Priority claimed from PCT/US2014/030744 external-priority patent/WO2014145898A2/en
Publication of JP2016520951A publication Critical patent/JP2016520951A/ja
Publication of JP2016520951A5 publication Critical patent/JP2016520951A5/ja
Application granted granted Critical
Publication of JP6500009B2 publication Critical patent/JP6500009B2/ja
Expired - Fee Related legal-status Critical Current
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JP2016503455A 2013-03-15 2014-03-17 調節可能な質量分析アパーチャ Expired - Fee Related JP6500009B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361800855P 2013-03-15 2013-03-15
US61/800,855 2013-03-15
PCT/US2014/030744 WO2014145898A2 (en) 2013-03-15 2014-03-17 Adjustable mass resolving aperture

Publications (3)

Publication Number Publication Date
JP2016520951A JP2016520951A (ja) 2016-07-14
JP2016520951A5 true JP2016520951A5 (enExample) 2017-06-01
JP6500009B2 JP6500009B2 (ja) 2019-04-10

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ID=51521619

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JP2016503455A Expired - Fee Related JP6500009B2 (ja) 2013-03-15 2014-03-17 調節可能な質量分析アパーチャ

Country Status (7)

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US (4) US9401260B2 (enExample)
EP (1) EP2973663B1 (enExample)
JP (1) JP6500009B2 (enExample)
KR (1) KR20150130557A (enExample)
CN (1) CN105247660B (enExample)
HK (1) HK1220287A1 (enExample)
WO (1) WO2014145898A2 (enExample)

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