JP2014054670A5 - - Google Patents

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Publication number
JP2014054670A5
JP2014054670A5 JP2013168166A JP2013168166A JP2014054670A5 JP 2014054670 A5 JP2014054670 A5 JP 2014054670A5 JP 2013168166 A JP2013168166 A JP 2013168166A JP 2013168166 A JP2013168166 A JP 2013168166A JP 2014054670 A5 JP2014054670 A5 JP 2014054670A5
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JP
Japan
Prior art keywords
laser beam
workpiece
vacuum chamber
alignment
charged particle
Prior art date
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Application number
JP2013168166A
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English (en)
Japanese (ja)
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JP6275412B2 (ja
JP2014054670A (ja
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Publication date
Priority claimed from US13/607,329 external-priority patent/US8766213B2/en
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Publication of JP2014054670A publication Critical patent/JP2014054670A/ja
Publication of JP2014054670A5 publication Critical patent/JP2014054670A5/ja
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Publication of JP6275412B2 publication Critical patent/JP6275412B2/ja
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JP2013168166A 2012-09-07 2013-08-13 レーザ・ビームと荷電粒子ビームの一致位置合せ方法 Active JP6275412B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/607,329 2012-09-07
US13/607,329 US8766213B2 (en) 2012-09-07 2012-09-07 Automated method for coincident alignment of a laser beam and a charged particle beam

Publications (3)

Publication Number Publication Date
JP2014054670A JP2014054670A (ja) 2014-03-27
JP2014054670A5 true JP2014054670A5 (enExample) 2016-09-29
JP6275412B2 JP6275412B2 (ja) 2018-02-07

Family

ID=49111054

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013168166A Active JP6275412B2 (ja) 2012-09-07 2013-08-13 レーザ・ビームと荷電粒子ビームの一致位置合せ方法

Country Status (4)

Country Link
US (3) US8766213B2 (enExample)
EP (1) EP2706556B1 (enExample)
JP (1) JP6275412B2 (enExample)
CN (1) CN103681190B (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8766213B2 (en) * 2012-09-07 2014-07-01 Fei Company Automated method for coincident alignment of a laser beam and a charged particle beam
US9991090B2 (en) 2012-11-15 2018-06-05 Fei Company Dual laser beam system used with an electron microscope and FIB
KR102695912B1 (ko) 2014-12-05 2024-08-14 컨버전트 덴탈 인크 레이저 빔의 정렬을 위한 시스템들 및 방법들
US9536697B2 (en) * 2015-05-19 2017-01-03 Hermes Microvision Inc. System and method for calibrating charge-regulating module
US9978557B2 (en) 2016-04-21 2018-05-22 Fei Company System for orienting a sample using a diffraction pattern
US10777383B2 (en) * 2017-07-10 2020-09-15 Fei Company Method for alignment of a light beam to a charged particle beam
JP7308710B2 (ja) * 2019-09-25 2023-07-14 株式会社日立ハイテクサイエンス 集束イオンビーム装置
CN114729868A (zh) * 2019-11-22 2022-07-08 粒子监测系统有限公司 先进的用于干涉测量颗粒检测和具有小大小尺寸的颗粒的检测的系统和方法
US11257657B2 (en) * 2020-02-18 2022-02-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with interferometer for height measurement
EP4097271A1 (en) * 2020-04-09 2022-12-07 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Thermal laser evaporation system and method of providing a thermal laser beam at a source
JP7536891B2 (ja) * 2020-05-21 2024-08-20 アプライド マテリアルズ インコーポレイテッド 光照射を使用した基板の電気的クランプを強化するためのシステム装置及び方法
US11315819B2 (en) 2020-05-21 2022-04-26 Applied Materials, Inc. System apparatus and method for enhancing electrical clamping of substrates using photo-illumination
US11538714B2 (en) * 2020-05-21 2022-12-27 Applied Materials, Inc. System apparatus and method for enhancing electrical clamping of substrates using photo-illumination
US11875967B2 (en) * 2020-05-21 2024-01-16 Applied Materials, Inc. System apparatus and method for enhancing electrical clamping of substrates using photo-illumination
CN115917698A (zh) * 2020-06-10 2023-04-04 Asml荷兰有限公司 带电粒子设备的可更换模块
CN113964006B (zh) * 2020-07-21 2023-09-12 聚束科技（北京）有限公司 一种粒子束装置束斑追踪方法及系统
KR20240034830A (ko) * 2021-07-22 2024-03-14 에이에스엠엘 네델란즈 비.브이. 하전 입자 시스템의 전자 소스 안정화를 위한 시스템 및 장치
DE102021128117B4 (de) 2021-10-28 2025-02-13 Carl Zeiss Microscopy Gmbh Verfahren zum Herstellen einer Probe an einem Objekt, Computerprogrammprodukt und Materialbearbeitungseinrichtung zum Durchführen des Verfahrens
CN115083869B (zh) * 2022-06-06 2025-09-26 惠然科技有限公司 机械对中装置及电子显微镜
US12444022B2 (en) * 2023-06-30 2025-10-14 Fei Company Focus stacking applications for sample preparation

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JPH07232290A (ja) * 1994-02-23 1995-09-05 Matsushita Electric Ind Co Ltd レーザ加工機用焦点調整装置
JPH1123481A (ja) * 1997-06-27 1999-01-29 Advantest Corp 微小物分析装置、および該微小物分析装置に用いられる微小物検出手段の調整装置
US6828566B2 (en) * 1997-07-22 2004-12-07 Hitachi Ltd Method and apparatus for specimen fabrication
JPH11179579A (ja) * 1997-12-22 1999-07-06 Sony Corp 光軸補正方法、装置及びそれを利用した露光加工装置
JP2002334818A (ja) * 2001-05-08 2002-11-22 Tokyo Electron Ltd 半導体製造装置、および半導体装置の製造方法
US6661009B1 (en) * 2002-05-31 2003-12-09 Fei Company Apparatus for tilting a beam system
WO2009089499A2 (en) 2008-01-09 2009-07-16 Fei Company Multibeam system
US7880151B2 (en) 2008-02-28 2011-02-01 Fei Company Beam positioning for beam processing
WO2010006067A2 (en) 2008-07-09 2010-01-14 Fei Company Method and apparatus for laser machining
US8168961B2 (en) 2008-11-26 2012-05-01 Fei Company Charged particle beam masking for laser ablation micromachining
US8524139B2 (en) 2009-08-10 2013-09-03 FEI Compay Gas-assisted laser ablation
DE102010008296A1 (de) * 2010-02-17 2011-08-18 Carl Zeiss NTS GmbH, 73447 Laserbearbeitungssystem, Objekthalter und Laserbearbeitungsverfahren
JP5756585B2 (ja) * 2010-04-07 2015-07-29 エフ・イ−・アイ・カンパニー 組合せレーザおよび荷電粒子ビーム・システム
CN102364329A (zh) * 2011-09-19 2012-02-29 华东师范大学 激光诱导击穿光谱自动采集系统
EP2610889A3 (en) 2011-12-27 2015-05-06 Fei Company Drift control in a charged particle beam system
US8766213B2 (en) * 2012-09-07 2014-07-01 Fei Company Automated method for coincident alignment of a laser beam and a charged particle beam

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