JP2014054670A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2014054670A5 JP2014054670A5 JP2013168166A JP2013168166A JP2014054670A5 JP 2014054670 A5 JP2014054670 A5 JP 2014054670A5 JP 2013168166 A JP2013168166 A JP 2013168166A JP 2013168166 A JP2013168166 A JP 2013168166A JP 2014054670 A5 JP2014054670 A5 JP 2014054670A5
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- workpiece
- vacuum chamber
- alignment
- charged particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims 2
Claims (1)
- 真空室と、
前記真空室内で加工物を支持する加工物支持体と、
前記加工物に向かって導かれる荷電粒子ビームを生成する荷電粒子ビーム・システムと、
前記真空室内で前記加工物を処理するレーザ・ビームを生成するレーザ・ビーム・システムと、
前記レーザ・ビームが対物レンズの中心を通り、前記加工物のユーセントリック点に入射するように、前記レーザ・ビームの位置合せをするレーザ・ビーム位置合せシステムであり、レーザ・ビーム位置合せ検出器を前記真空室内に有するレーザ・ビーム位置合せシステムと
を備えるマルチビーム・システム。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/607,329 US8766213B2 (en) | 2012-09-07 | 2012-09-07 | Automated method for coincident alignment of a laser beam and a charged particle beam |
| US13/607,329 | 2012-09-07 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014054670A JP2014054670A (ja) | 2014-03-27 |
| JP2014054670A5 true JP2014054670A5 (ja) | 2016-09-29 |
| JP6275412B2 JP6275412B2 (ja) | 2018-02-07 |
Family
ID=49111054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013168166A Active JP6275412B2 (ja) | 2012-09-07 | 2013-08-13 | レーザ・ビームと荷電粒子ビームの一致位置合せ方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (3) | US8766213B2 (ja) |
| EP (1) | EP2706556B1 (ja) |
| JP (1) | JP6275412B2 (ja) |
| CN (1) | CN103681190B (ja) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8766213B2 (en) * | 2012-09-07 | 2014-07-01 | Fei Company | Automated method for coincident alignment of a laser beam and a charged particle beam |
| US9991090B2 (en) | 2012-11-15 | 2018-06-05 | Fei Company | Dual laser beam system used with an electron microscope and FIB |
| KR20230107383A (ko) | 2014-12-05 | 2023-07-14 | 컨버전트 덴탈 인크 | 레이저 빔의 정렬을 위한 시스템들 및 방법들 |
| US9536697B2 (en) * | 2015-05-19 | 2017-01-03 | Hermes Microvision Inc. | System and method for calibrating charge-regulating module |
| US9978557B2 (en) | 2016-04-21 | 2018-05-22 | Fei Company | System for orienting a sample using a diffraction pattern |
| US10777383B2 (en) * | 2017-07-10 | 2020-09-15 | Fei Company | Method for alignment of a light beam to a charged particle beam |
| JP7308710B2 (ja) * | 2019-09-25 | 2023-07-14 | 株式会社日立ハイテクサイエンス | 集束イオンビーム装置 |
| US11257657B2 (en) * | 2020-02-18 | 2022-02-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device with interferometer for height measurement |
| US11875967B2 (en) * | 2020-05-21 | 2024-01-16 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
| US11538714B2 (en) * | 2020-05-21 | 2022-12-27 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
| WO2021236356A1 (en) * | 2020-05-21 | 2021-11-25 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
| US11315819B2 (en) | 2020-05-21 | 2022-04-26 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
| CN115917698A (zh) | 2020-06-10 | 2023-04-04 | Asml荷兰有限公司 | 带电粒子设备的可更换模块 |
| CN113964006B (zh) * | 2020-07-21 | 2023-09-12 | 聚束科技（北京）有限公司 | 一种粒子束装置束斑追踪方法及系统 |
| DE102021128117A1 (de) | 2021-10-28 | 2023-05-04 | Carl Zeiss Microscopy Gmbh | Verfahren zum Herstellen einer Probe an einem Objekt, Computerprogrammprodukt und Materialbearbeitungseinrichtung zum Durchführen des Verfahrens |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07232290A (ja) * | 1994-02-23 | 1995-09-05 | Matsushita Electric Ind Co Ltd | レーザ加工機用焦点調整装置 |
| JPH1123481A (ja) * | 1997-06-27 | 1999-01-29 | Advantest Corp | 微小物分析装置、および該微小物分析装置に用いられる微小物検出手段の調整装置 |
| US6828566B2 (en) * | 1997-07-22 | 2004-12-07 | Hitachi Ltd | Method and apparatus for specimen fabrication |
| JPH11179579A (ja) * | 1997-12-22 | 1999-07-06 | Sony Corp | 光軸補正方法、装置及びそれを利用した露光加工装置 |
| JP2002334818A (ja) * | 2001-05-08 | 2002-11-22 | Tokyo Electron Ltd | 半導体製造装置、および半導体装置の製造方法 |
| US6661009B1 (en) * | 2002-05-31 | 2003-12-09 | Fei Company | Apparatus for tilting a beam system |
| US20110163068A1 (en) | 2008-01-09 | 2011-07-07 | Mark Utlaut | Multibeam System |
| US7880151B2 (en) | 2008-02-28 | 2011-02-01 | Fei Company | Beam positioning for beam processing |
| US10493559B2 (en) | 2008-07-09 | 2019-12-03 | Fei Company | Method and apparatus for laser machining |
| US8168961B2 (en) | 2008-11-26 | 2012-05-01 | Fei Company | Charged particle beam masking for laser ablation micromachining |
| US8524139B2 (en) | 2009-08-10 | 2013-09-03 | FEI Compay | Gas-assisted laser ablation |
| DE102010008296A1 (de) * | 2010-02-17 | 2011-08-18 | Carl Zeiss NTS GmbH, 73447 | Laserbearbeitungssystem, Objekthalter und Laserbearbeitungsverfahren |
| EP2556526A4 (en) | 2010-04-07 | 2014-04-16 | Fei Co | COMBINATION OF A LASER AND A CHARGED PARTICLE BEAM SYSTEM |
| CN102364329A (zh) * | 2011-09-19 | 2012-02-29 | 华东师范大学 | 激光诱导击穿光谱自动采集系统 |
| EP2610889A3 (en) | 2011-12-27 | 2015-05-06 | Fei Company | Drift control in a charged particle beam system |
| US8766213B2 (en) * | 2012-09-07 | 2014-07-01 | Fei Company | Automated method for coincident alignment of a laser beam and a charged particle beam |
-
2012
- 2012-09-07 US US13/607,329 patent/US8766213B2/en active Active
-
2013
- 2013-08-13 JP JP2013168166A patent/JP6275412B2/ja active Active
- 2013-09-06 EP EP13183272.7A patent/EP2706556B1/en active Active
- 2013-09-06 CN CN201310404108.2A patent/CN103681190B/zh active Active
-
2014
- 2014-06-12 US US14/303,227 patent/US9263235B2/en active Active
-
2016
- 2016-01-08 US US14/991,507 patent/US9754764B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2014054670A5 (ja) | ||
| GB201305018D0 (en) | Apparatus and methods for additive-layer manufacturing of an article | |
| EP2873088A4 (en) | DEFINITION OF END POINT FOR FOCUSED ION BEAM TREATMENT | |
| EP3542209A4 (en) | OPTICAL RECTIFIER | |
| EP3427553A4 (en) | STATIONARY / PROGRESSIVE WAVE HYBRID LINEAR ACCELERATORS TO PROVIDE ACCELERATED CHARGED PARTICLES OR RADIATION BEAMS | |
| EP3395404A4 (en) | Beam shaper for neutron capture therapy | |
| WO2015043769A8 (en) | Charged particle beam system and method of operating the same | |
| IL259733B (en) | Laser beam projection system with dynamic phase compensation | |
| EP3417515A4 (en) | HIGHLY EFFICIENT LASER SYSTEM FOR GENERATING A THIRD HARMONIOUS | |
| JP2015153889A5 (ja) | ||
| EP3252797A4 (en) | Charged particle beam device and scanning electron microscope | |
| MX360069B (es) | Modificacion de las propiedades opticas de un elemento informatico integrado mediante implantacion de iones. | |
| JP2013004680A5 (ja) | ||
| EP3342458A4 (en) | Beam shaper for neutron capture therapy | |
| JP2015518628A5 (ja) | イオン注入装置、およびイオン注入装置の動作方法 | |
| EP3324421A4 (en) | ELECTROSTATIC LENS, AND PARALLEL BEAM GENERATING DEVICE, AND PARALLEL BEAM CONVERGENCE DEVICE USING THE ELECTROSTATIC LENS AND A COLLIMATOR | |
| EP2662880A3 (en) | Electron beam device | |
| EP3517020A4 (en) | SCAN LASER MICROSCOPE | |
| EP3152536A4 (en) | Beam focusing and beam collecting optics | |
| IL266363B (en) | Beam director with improved optics | |
| EP3267464A4 (en) | Spherical aberration correction device for charged particle beam electromagnetic lens | |
| GB2549891A (en) | Dynamically adjustable focal spot | |
| EP3456159A4 (en) | ION RAY FILTER FOR A NEUTRON GENERATOR | |
| CL2016000719A1 (es) | Un sistema para el recubrimiento de lentes ópticos, que comprende: una carcasa que tiene al menos dos caras a través de la cual se forma una abertura; y un soporte de lente que tiene una apertura del lente que acepta un lente óptico y que tiene una forma exterior y tamaño que es complementario y está aceptado dentro de la abertura de la carcasa. | |
| EP3563399A4 (en) | OPTICALLY ADDRESSED THERMIONIC ELECTRON BEAM DEVICE |