TWI539481B - 電子束光學系統、聚光透鏡配置及聚光透鏡的移動方法 - Google Patents
電子束光學系統、聚光透鏡配置及聚光透鏡的移動方法 Download PDFInfo
- Publication number
- TWI539481B TWI539481B TW102119802A TW102119802A TWI539481B TW I539481 B TWI539481 B TW I539481B TW 102119802 A TW102119802 A TW 102119802A TW 102119802 A TW102119802 A TW 102119802A TW I539481 B TWI539481 B TW I539481B
- Authority
- TW
- Taiwan
- Prior art keywords
- magnetic
- concentrating lens
- lens
- deflector
- concentrating
- Prior art date
Links
- 238000010894 electron beam technology Methods 0.000 title claims description 76
- 230000003287 optical effect Effects 0.000 title claims description 66
- 238000000034 method Methods 0.000 title claims description 26
- 239000002245 particle Substances 0.000 claims description 17
- 238000006073 displacement reaction Methods 0.000 claims 3
- 239000000523 sample Substances 0.000 description 17
- 230000004075 alteration Effects 0.000 description 15
- 238000013461 design Methods 0.000 description 6
- 238000005381 potential energy Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000007689 inspection Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 230000005347 demagnetization Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 238000005457 optimization Methods 0.000 description 3
- 206010010071 Coma Diseases 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000012369 In process control Methods 0.000 description 1
- 208000004160 Rasmussen subacute encephalitis Diseases 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010965 in-process control Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005389 semiconductor device fabrication Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/067—Replacing parts of guns; Mutual adjustment of electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06325—Cold-cathode sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP12171023.0A EP2672502B1 (en) | 2012-06-06 | 2012-06-06 | electron beam optical system comprising high brightness electron gun with moving axis condenser lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201401324A TW201401324A (zh) | 2014-01-01 |
| TWI539481B true TWI539481B (zh) | 2016-06-21 |
Family
ID=46506137
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102119802A TWI539481B (zh) | 2012-06-06 | 2013-06-04 | 電子束光學系統、聚光透鏡配置及聚光透鏡的移動方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8921804B2 (enExample) |
| EP (1) | EP2672502B1 (enExample) |
| JP (1) | JP5779614B2 (enExample) |
| TW (1) | TWI539481B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112014006978B4 (de) | 2014-10-20 | 2022-01-27 | Hitachi High-Tech Corporation | Rasterelektronenmikroskop |
| US9799484B2 (en) * | 2014-12-09 | 2017-10-24 | Hermes Microvision, Inc. | Charged particle source |
| JP6987233B2 (ja) * | 2018-05-22 | 2021-12-22 | 株式会社日立ハイテク | 荷電粒子線装置及びその軸調整方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0485643A (ja) | 1990-07-30 | 1992-03-18 | Matsushita Electric Ind Co Ltd | 情報処理装置 |
| JPH0485643U (enExample) * | 1990-11-30 | 1992-07-24 | ||
| JPH09223475A (ja) * | 1996-02-19 | 1997-08-26 | Nikon Corp | 電磁偏向器、及び該偏向器を用いた荷電粒子線転写装置 |
| JPH09245703A (ja) * | 1996-03-13 | 1997-09-19 | Jeol Ltd | 荷電粒子ビームの軸合わせ装置 |
| JPH1097979A (ja) * | 1996-09-25 | 1998-04-14 | Nikon Corp | 縮小投影装置 |
| US5708274A (en) * | 1996-12-18 | 1998-01-13 | International Business Machines Corporation | Curvilinear variable axis lens correction with crossed coils |
| US5793048A (en) * | 1996-12-18 | 1998-08-11 | International Business Machines Corporation | Curvilinear variable axis lens correction with shifted dipoles |
| KR20010031926A (ko) * | 1998-09-09 | 2001-04-16 | 요트.게.아. 롤페즈 | 충전 입자를 활용하는 투사형 리소그래피 장치 |
| DE60323909D1 (de) * | 2002-08-13 | 2008-11-20 | Zeiss Carl Nts Gmbh | Teilchenoptischer Apparat und seine Verwendung als elektronenmikroskopisches System |
| EP1777730B1 (en) * | 2005-10-19 | 2018-05-30 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Arrangement and method for compensating emitter tip vibrations |
| US8101911B2 (en) * | 2008-11-04 | 2012-01-24 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Method and device for improved alignment of a high brightness charged particle gun |
| KR101318592B1 (ko) * | 2009-11-26 | 2013-10-15 | 가부시키가이샤 히다치 하이테크놀로지즈 | 주사 전자 현미경 |
| EP2444990B1 (en) * | 2010-10-19 | 2014-06-25 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Simplified particle emitter and method of operating thereof |
-
2012
- 2012-06-06 EP EP12171023.0A patent/EP2672502B1/en active Active
- 2012-09-17 US US13/621,720 patent/US8921804B2/en active Active
-
2013
- 2013-06-04 TW TW102119802A patent/TWI539481B/zh active
- 2013-06-05 JP JP2013119000A patent/JP5779614B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2672502A1 (en) | 2013-12-11 |
| US20130327951A1 (en) | 2013-12-12 |
| TW201401324A (zh) | 2014-01-01 |
| JP5779614B2 (ja) | 2015-09-16 |
| EP2672502B1 (en) | 2017-08-09 |
| JP2013254736A (ja) | 2013-12-19 |
| US8921804B2 (en) | 2014-12-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI650550B (zh) | 用於高產量電子束檢測（ｅｂｉ）的多射束裝置 | |
| TWI732305B (zh) | 帶電粒子射束設備、場曲校正器、及操作帶電粒子射束設備的方法 | |
| TWI709992B (zh) | 用於檢查試樣之方法以及帶電粒子多束裝置 | |
| TWI751556B (zh) | 用於以初級帶電粒子小束陣列檢查樣本的帶電粒子束裝置 | |
| US8748841B2 (en) | Drawing apparatus and method of manufacturing article | |
| JP6955325B2 (ja) | 適応２次荷電粒子光学系を用いて２次荷電粒子ビームを画像化するシステムおよび方法 | |
| TW201921103A (zh) | 帶電粒子束裝置、用於帶電粒子束裝置的孔佈置和用於操作帶電粒子束裝置的方法 | |
| US6982427B2 (en) | Electron beam apparatus with aberration corrector | |
| KR102207766B1 (ko) | 이차 전자 광학계 ＆ 검출 디바이스 | |
| CN108885187A (zh) | 多个带电粒子束的装置 | |
| TWI622077B (zh) | 帶電粒子束裝置、用於帶電粒子束裝置的系統、及用於操作帶電粒子束裝置的方法 | |
| JP6265643B2 (ja) | 電子ビーム装置 | |
| WO2017168482A1 (ja) | 荷電粒子線装置、及び荷電粒子線装置の調整方法 | |
| KR20230079266A (ko) | 조정 가능한 작동 거리 주위에서 고속 오토포커스를 갖는 복수 입자 빔 현미경 및 관련 방법 | |
| JP4896877B2 (ja) | 収差補正装置及び収差補正装置を操作するための方法 | |
| TWI539481B (zh) | 電子束光學系統、聚光透鏡配置及聚光透鏡的移動方法 | |
| JP6002428B2 (ja) | 荷電粒子線装置 | |
| US8101911B2 (en) | Method and device for improved alignment of a high brightness charged particle gun | |
| CN117672786A (zh) | 磁多极器件、带电粒子束设备和影响沿光轴传播的带电粒子束的方法 | |
| TW202205336A (zh) | 具有多源系統和多射束粒子顯微鏡的粒子束系統 | |
| TWI889079B (zh) | 用於帶電粒子束裝置的透鏡、帶電粒子束裝置以及聚焦帶電粒子束的方法 | |
| EP2182543B1 (en) | Method and device for improved alignment of a high brightness charged particle gun |