JP2012513042A5 - - Google Patents
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- JP2012513042A5 JP2012513042A5 JP2011542147A JP2011542147A JP2012513042A5 JP 2012513042 A5 JP2012513042 A5 JP 2012513042A5 JP 2011542147 A JP2011542147 A JP 2011542147A JP 2011542147 A JP2011542147 A JP 2011542147A JP 2012513042 A5 JP2012513042 A5 JP 2012513042A5
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- alkyl
- acrylamide
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- -1 polysiloxane Polymers 0.000 claims 16
- 239000000178 monomer Substances 0.000 claims 15
- 125000000217 alkyl group Chemical group 0.000 claims 11
- 239000000203 mixture Substances 0.000 claims 11
- 239000007983 Tris buffer Substances 0.000 claims 9
- 238000000465 moulding Methods 0.000 claims 9
- HRPVXLWXLXDGHG-UHFFFAOYSA-N acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims 8
- 229920001296 polysiloxane Polymers 0.000 claims 8
- FQPSGWSUVKBHSU-UHFFFAOYSA-N Methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 claims 7
- 239000006096 absorbing agent Substances 0.000 claims 6
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 6
- 125000003161 (C1-C6) alkylene group Chemical group 0.000 claims 4
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Tris Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims 4
- 229910052799 carbon Inorganic materials 0.000 claims 4
- 239000000017 hydrogel Substances 0.000 claims 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 4
- 239000003211 photoinitiator Substances 0.000 claims 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims 4
- 150000001408 amides Chemical class 0.000 claims 3
- 229920000728 polyester Polymers 0.000 claims 3
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 claims 2
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Acrylamido-2-methylpropane sulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 2
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 claims 2
- AFXKUUDFKHVAGI-UHFFFAOYSA-N 1-methyl-3-methylidenepyrrolidin-2-one Chemical compound CN1CCC(=C)C1=O AFXKUUDFKHVAGI-UHFFFAOYSA-N 0.000 claims 1
- NEYTXADIGVEHQD-UHFFFAOYSA-N 2-hydroxy-2-(prop-2-enoylamino)acetic acid Chemical group OC(=O)C(O)NC(=O)C=C NEYTXADIGVEHQD-UHFFFAOYSA-N 0.000 claims 1
- UONHUHQHBAPBJS-UHFFFAOYSA-N C[Si](C)(C)OC(O[Si](C)(C)C)[SiH2]CCCOCC(O)CN(C(=O)C(=C)C)CC(O)COCCC[SiH2]C(O[Si](C)(C)C)O[Si](C)(C)C Chemical compound C[Si](C)(C)OC(O[Si](C)(C)C)[SiH2]CCCOCC(O)CN(C(=O)C(=C)C)CC(O)COCCC[SiH2]C(O[Si](C)(C)C)O[Si](C)(C)C UONHUHQHBAPBJS-UHFFFAOYSA-N 0.000 claims 1
- QMGSWHWVTKQYNL-UHFFFAOYSA-N C[Si](C)(C)OC(O[Si](C)(C)C)[SiH2]CCCOCC(O)CN(C(=O)C=C)CC(O)COCCC[SiH2]C(O[Si](C)(C)C)O[Si](C)(C)C Chemical compound C[Si](C)(C)OC(O[Si](C)(C)C)[SiH2]CCCOCC(O)CN(C(=O)C=C)CC(O)COCCC[SiH2]C(O[Si](C)(C)C)O[Si](C)(C)C QMGSWHWVTKQYNL-UHFFFAOYSA-N 0.000 claims 1
- MEEXKBYFINUCHB-UHFFFAOYSA-N C[Si](C)(C)OC(O[Si](C)(C)C)[SiH2]CCCOCC(O)CNC(=O)C=C Chemical compound C[Si](C)(C)OC(O[Si](C)(C)C)[SiH2]CCCOCC(O)CNC(=O)C=C MEEXKBYFINUCHB-UHFFFAOYSA-N 0.000 claims 1
- QRWZCJXEAOZAAW-UHFFFAOYSA-N N,N,2-trimethylprop-2-enamide Chemical compound CN(C)C(=O)C(C)=C QRWZCJXEAOZAAW-UHFFFAOYSA-N 0.000 claims 1
- CZYCGAZGQQOBPI-UHFFFAOYSA-N N,N-bis[2-hydroxy-3-[3-tris(trimethylsilyloxy)silylpropoxy]propyl]prop-2-enamide Chemical compound C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)CCCOCC(O)CN(C(=O)C=C)CC(O)COCCC[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C CZYCGAZGQQOBPI-UHFFFAOYSA-N 0.000 claims 1
- 229940088644 N,N-dimethylacrylamide Drugs 0.000 claims 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N N,N-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 claims 1
- UUORTJUPDJJXST-UHFFFAOYSA-N N-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 claims 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N N-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 claims 1
- KCTMTGOHHMRJHZ-UHFFFAOYSA-N N-(2-methylpropoxymethyl)prop-2-enamide Chemical compound CC(C)COCNC(=O)C=C KCTMTGOHHMRJHZ-UHFFFAOYSA-N 0.000 claims 1
- ZEMHQYNMVKDBFJ-UHFFFAOYSA-N N-(3-hydroxypropyl)prop-2-enamide Chemical compound OCCCNC(=O)C=C ZEMHQYNMVKDBFJ-UHFFFAOYSA-N 0.000 claims 1
- UTSYWKJYFPPRAP-UHFFFAOYSA-N N-(butoxymethyl)prop-2-enamide Chemical compound CCCCOCNC(=O)C=C UTSYWKJYFPPRAP-UHFFFAOYSA-N 0.000 claims 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 claims 1
- MVBJSQCJPSRKSW-UHFFFAOYSA-N N-[1,3-dihydroxy-2-(hydroxymethyl)propan-2-yl]prop-2-enamide Chemical compound OCC(CO)(CO)NC(=O)C=C MVBJSQCJPSRKSW-UHFFFAOYSA-N 0.000 claims 1
- MRDPSMYETIZHSQ-UHFFFAOYSA-N N-[2-hydroxy-3-[3-tris(trimethylsilyloxy)silylpropoxy]propyl]-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCC(O)COCCC[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C MRDPSMYETIZHSQ-UHFFFAOYSA-N 0.000 claims 1
- GDFCSMCGLZFNFY-UHFFFAOYSA-N N-[3-(dimethylamino)propyl]-2-methylprop-2-enamide Chemical compound CN(C)CCCNC(=O)C(C)=C GDFCSMCGLZFNFY-UHFFFAOYSA-N 0.000 claims 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N N-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 claims 1
- QNILTEGFHQSKFF-UHFFFAOYSA-N N-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 claims 1
- XFHJDMUEHUHAJW-UHFFFAOYSA-N N-tert-butylprop-2-enamide Chemical compound CC(C)(C)NC(=O)C=C XFHJDMUEHUHAJW-UHFFFAOYSA-N 0.000 claims 1
- HGWVOVNPEHCJNN-UHFFFAOYSA-N OC(CC=C(C(=O)N)C)COCCC[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C Chemical compound OC(CC=C(C(=O)N)C)COCCC[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C HGWVOVNPEHCJNN-UHFFFAOYSA-N 0.000 claims 1
- CXQXSVUQTKDNFP-UHFFFAOYSA-N Simethicone Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000000278 alkyl amino alkyl group Chemical group 0.000 claims 1
- 125000002877 alkyl aryl group Chemical group 0.000 claims 1
- 125000005119 alkyl cycloalkyl group Chemical group 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 125000004103 aminoalkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 claims 1
- 239000004205 dimethyl polysiloxane Substances 0.000 claims 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 1
- 230000001678 irradiating Effects 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 1
- 230000035699 permeability Effects 0.000 claims 1
- MXMXVHAQJOTPSZ-UHFFFAOYSA-N phenyl(phosphoroso)methanone Chemical group O=PC(=O)C1=CC=CC=C1 MXMXVHAQJOTPSZ-UHFFFAOYSA-N 0.000 claims 1
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 claims 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 239000011780 sodium chloride Substances 0.000 claims 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 claims 1
- GETQZCLCWQTVFV-UHFFFAOYSA-O trimethylammonium Chemical compound C[NH+](C)C GETQZCLCWQTVFV-UHFFFAOYSA-O 0.000 claims 1
Claims (14)
- シリコーンハイドロゲルコンタクトレンズの製造方法であって、
(I)ソフトコンタクトレンズを製造するための型を準備する工程(ここで、この型は、コンタクトレンズの前面を画定する第1の成形面を持つ第1の型半と、コンタクトレンズの後面を画定する第2の成形面を持つ第2の型半とを有しており、そして該第1及び第2の型半は、該第1の成形面と第2の成形面との間に空洞が形成されるよう相互に受けとめるように構成されている);
(II)レンズ形成材料のモノマー混合物をこの空洞に導入する工程(ここで、モノマー混合物は、
(a)5〜60重量%の親水性アミド型ビニルモノマー;
(b)5〜50重量%の、式(1):
[式中、Rは、H又はCH 3 であり、R 3 及びR 4 は、相互に独立に、H、C 1 −C 6 アルキル、又は式(2):
〔式中、Yは、C 1 −C 6 アルキレン二価基又は1個以上のヒドロキシル基を含有するC 1 −C 6 アルキレン二価基であり、mは、0〜5の整数であり、pは、1〜6の整数であり、そしてA 1 、A 2 及びA 3 は、相互に独立に、C 1 −C 6 アルキル、フェニル、ベンジル、又は式(3):
(式中、B 1 、B 2 及びB 3 は、相互に独立に、C 1 −C 6 アルキル、フェニル、又はベンジルである)で示される基である〕で示される一価基である(ただし、R 3 及びR 4 の少なくとも一方は、式(2)の基であり、そしてA 1 、A 2 及びA 3 の少なくとも2個は、式(3)の基である)]により表されるシロキサン含有(メタ)アクリルアミドモノマー;
(c)5〜50重量%の、式(4):
[式中、
rは、0又は1の整数であり;
G 1 及びG 2 は、相互に独立に、直鎖若しくは分岐のC 1 −C 10 アルキレン二価基、下記式:
(式中、qは、1〜5の整数であり、そしてalk及びalk’は、相互に独立にC 1 −C 6 アルキレン二価基である)で示される二価基、又は−R’ 1 −X 4 −E−X 5 −R’ 2 −〔ここで、R’ 1 及びR’ 2 は、相互に独立に、直鎖若しくは分岐のC 1 −C 10 アルキレン二価基又は上記と同義の下記式:
で示される二価基であり、X 4 及びX 5 は、相互に独立に下記式:
(式中、R’は、H又はC 1 −C 8 アルキルである)よりなる群から選択される連結部であり、Eは、主鎖にエーテル、チオ、又はアミン連結部を有していてもよい、40個以下の炭素原子を持つ、アルキルジラジカル、シクロアルキルジラジカル、アルキルシクロアルキルジラジカル、アルキルアリールジラジカル、又はアリールジラジカルである〕の二価基であり;
X 1 及びX 2 は、相互に独立に、直接結合、下記式:
(式中、R’は、H又はC 1 −C 8 アルキルである)よりなる群から選択される連結部であり;
PDMSは、式(5):
〔式中、vは、0又は1であり、ωは、0〜5の整数であり、U 1 及びU 2 は、相互に独立に、上記と同義の−R’ 1 −X 4 −E−X 5 −R’ 2 −の二価基又は上記と同義の下記式:
で示される二価基を表し、D 1 、D 2 及びD 3 は、相互に独立に、−(CH 2 CH 2 O) t −CH 2 CH 2 −(ここで、tは、3〜40の整数である)、−CF 2 −(OCF 2 ) a −(OCF 2 CF 2 ) b −OCF 2 −{ここで、a及びbは、相互に独立に0〜10の整数である(ただし、a+bは10〜30の範囲の数である)}、及び式(6):
{式中、R 3 、R 4 、R 5 ’、R 6 、R 7 、R 8 、R 9 及びR 10 は、相互に独立に、C 1 −C 8 −アルキル、C 1 −C 4 −アルキル−若しくはC 1 −C 4 −アルコキシ−置換フェニル、フルオロ(C 1 −C 18 −アルキル)、シアノ(C 1 −C 12 −アルキル)、−alk−(OCH 2 CH 2 ) n −OR 11 (ここで、alkは、C 1 −C 6 −アルキレン二価基であり、R 11 は、C 1 −C 6 −アルキルであり、そしてnは、1〜10の整数である)であり、m及びpは、相互に独立に2〜698の整数であり、かつ(m+p)は、5〜700である}で示される二価基よりなる群から選択される二価基である(ただし、D 1 、D 2 及びD 3 の少なくとも1個は、式(6)により表される)〕で示されるポリシロキサン二価基であり;そして
Qは、式(7):
〔式中、Z 1 及びZ 2 は、相互に独立に、直鎖若しくは分岐のC 1 −C 12 アルキレン二価基、1個以上のヒドロキシル基を有する直鎖若しくは分岐のC 1 −C 12 アルキレン二価基、−(CH 2 CH 2 O) d −CH 2 CH 2 −(ここで、dは、1〜10の整数である)の基、非置換フェニレン二価基、C 1 −C 4 アルキル若しくはC 1 −C 4 アルコキシ置換フェニレン二価基又はC 7 −C 12 アラルキレン二価基であり;A 5 は、−O−又は下記式:
(式中、R’は、H又はC 1 −C 8 アルキルである)で示される基であり;q 1 及びq 2 は、相互に独立に0又は1の整数であり;R 14 は、水素、C 1 −C 4 アルキル又はハロゲンであり;R 15 及びR 16 は、相互に独立に、水素、C 1 −C 4 アルキル、フェニル、カルボキシ、ハロゲン、又は下記式:
(式中、X 3 は、−O−、上記と同義の下記式:
で示される基又は−S−であり、そしてR 17 は、C 1 −C 12 アルキル、ヒドロキシアルキル、アミノアルキル、アルキルアミノアルキル又はジアルキルアミノアルキルラジカルである)で示される基である〕で示されるエチレン不飽和基である]で示されるポリシロキサンビニルモノマー又はマクロマー、及び
(d)0.05〜1.5重量%の光開始剤
を含み、ただし、(a)〜(d)の成分及び任意の追加成分は、合計100重量%になる);及び
(III)化学線の空間的制限下で型中のモノマー混合物を120秒以内の時間照射することにより、モノマー混合物を架橋してシリコーンハイドロゲルコンタクトレンズを形成する工程(ここで、製造されるコンタクトレンズは、第1の成形面により画定される前面、第2の成形面により画定される反対側の後面、及び化学線の空間的制限により画定されるレンズエッジを含む)
を含む方法。 - 親水性アミド型ビニルモノマーが、2−アクリルアミドグリコール酸、2−アクリルアミド−2−メチル−1−プロパンスルホン酸、2−アクリルアミド−2−メチル−1−プロパンスルホン酸又はこれらの塩、塩化(3−アクリルアミドプロピル)トリメチルアンモニウム、3−アクリロイルアミノ−1−プロパノール、N−(ブトキシメチル)アクリルアミド、N−tert−ブチルアクリルアミド、ジアセトンアクリルアミド、N,N−ジメチルアクリルアミド、N,N−ジメチルメタクリルアミド、N−[3−(ジメチルアミノ)プロピル]メタクリルアミド、N−ヒドロキシエチルアクリルアミド、N−(ヒドロキシメチル)アクリルアミド、N−(イソブトキシメチル)アクリルアミド、N−イソプロピルアクリルアミド、N−イソプロピルメタクリルアミド、メタクリルアミド、N−フェニルアクリルアミド、N−[トリス(ヒドロキシメチル)メチル]アクリルアミド、N−メチル−3−メチレン−2−ピロリドン、並びにこれらの混合物よりなる群から選択される、請求項1に記載の方法。
- シロキサン含有(メタ)アクリルアミドモノマーが、N−[トリス(トリメチルシロキシ)シリルプロピル]メタクリルアミド、N−[トリス(トリメチルシロキシ)シリルプロピル]アクリルアミド、N−[トリス(ジメチルプロピルシロキシ)シリルプロピル]アクリルアミド、N−[トリス(ジメチルプロピルシロキシ)シリルプロピル]メタクリルアミド、N−[トリス(ジメチルフェニルシロキシ)シリルプロピル]アクリルアミド、N−[トリス(ジメチルフェニルシロキシ)シリルプロピル)メタクリルアミド、N−[トリス(ジメチルエチルシロキシ)シリルプロピル]アクリルアミド、N−[トリス(ジメチルエチルシロキシ)シリルプロピル]メタクリルアミド、N−(2−ヒドロキシ−3−(3−(ビス(トリメチルシリルオキシ)メチルシリル)プロピルオキシ)プロピル)−2−メチルアクリルアミド;N−(2−ヒドロキシ−3−(3−(ビス(トリメチルシリルオキシ)メチルシリル)プロピルオキシ)プロピル)アクリルアミド;N,N−ビス[2−ヒドロキシ−3−(3−(ビス(トリメチルシリルオキシ)メチルシリル)プロピルオキシ)プロピル]−2−メチルアクリルアミド;N,N−ビス[2−ヒドロキシ−3−(3−(ビス(トリメチルシリルオキシ)メチルシリル)プロピルオキシ)プロピル]アクリルアミド;N−(2−ヒドロキシ−3−(3−(トリス(トリメチルシリルオキシ)シリル)プロピルオキシ)プロピル)−2−メチルアクリルアミド;N−(2−ヒドロキシ−3−(3−(トリス(トリメチルシリルオキシ)シリル)プロピルオキシ)プロピル)アクリルアミド;N,N−ビス[2−ヒドロキシ−3−(3−(トリス(トリメチルシリルオキシ)シリル)プロピルオキシ)プロピル]−2−メチルアクリルアミド;N,N−ビス[2−ヒドロキシ−3−(3−(トリス(トリメチルシリルオキシ)シリル)プロピルオキシ)プロピル]アクリルアミド;N−[2−ヒドロキシ−3−(3−(t−ブチルジメチルシリル)プロピルオキシ)プロピル]−2−メチルアクリルアミド;N−[2−ヒドロキシ−3−(3−(t−ブチルジメチルシリル)プロピルオキシ)プロピル]アクリルアミド;N,N−ビス[2−ヒドロキシ−3−(3−(t−ブチルジメチルシリル)プロピルオキシ)プロピル]−2−メチルアクリルアミド;N,N−ビス[2−ヒドロキシ−3−(3−(t−ブチルジメチルシリル)プロピルオキシ)プロピル]アクリルアミドよりなる群から選択される、請求項1又は2に記載の方法。
- モノマー混合物が、D1、D2及びD3が相互に独立に式(6)の二価基である、式(4)のポリシロキサン含有ビニルマクロマーを含む、請求項1、2又は3に記載の方法。
- モノマー混合物が、重合性UV吸収剤又は重合性潜在性UV吸収剤を0.2〜5.0重量%の量で含む、請求項1、2又は3に記載の方法。
- モノマー混合物が、ベンゾトリアゾール−及び/又はベンゾフェノン−部分を含む重合性UV吸収剤を含む、請求項1〜5の何れか1項に記載の方法。
- 光開始剤が、ベンゾイルホスフィンオキシド光開始剤である、請求項6に記載の方法。
- モノマー混合物が、重合性潜在性UV吸収剤を含む、請求項1〜5の何れか1項に記載の方法。
- 第1及び第2の成形面の少なくとも一方は、UV線に透過性であり、そして場合によりもう一方の成形面は、UV線を透過しにくい、請求項1〜5の何れか1項に記載の方法。
- 型が、放射線透過性成形面を有する型半に、型において、又は型上に固定、構築又は配置されているマスクを含む、再利用可能な型である(ここで、このマスクは、放射線透過性成形面に比較してUV不透過性であるか、又は少なくともUV透過性が乏しく、そしてこのマスクは、型空洞に至るまで内側に伸び、かつ型空洞を囲むため、型空洞を除いてマスクの背後の全ての領域を遮蔽する)、請求項9に記載の方法。
- 型中のモノマー混合物が、化学線の空間的制限下で50秒以内の時間照射される、請求項10に記載の方法。
- モノマー混合物が、(1)10〜50重量%の親水性アミド型ビニルモノマー;(2)10〜40重量%のシロキサン含有アクリルアミド又はメタクリルアミドモノマー;(3)10〜40重量%のポリシロキサン含有ビニルマクロマー;(4)0.1〜1.3重量%の光開始剤;及び(5)0.2〜5重量%の重合性UV吸収剤又は重合性潜在性UV吸収剤を含む(ただし、(1)〜(5)の成分及び任意の追加成分は、合計100重量%になる)、請求項3又は4に記載の方法。
- 請求項1〜10の何れか1項により得られる、シリコーンハイドロゲルコンタクトレンズ。
- コンタクトレンズが、少なくとも40barrerの酸素透過度、2.0MPa以下の弾性率、少なくとも1.5×10−6mm2/分のイオノフラックス拡散係数、D、及び15〜70%の含水率よりなる群から選択される、少なくとも1つの性質を有する、請求項13に記載のシリコーンハイドロゲルコンタクトレンズ。
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- 2009-06-16 CN CN200980150636.1A patent/CN102257408B/zh active Active
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