JP2012507571A5 - - Google Patents

Download PDF

Info

Publication number
JP2012507571A5
JP2012507571A5 JP2011535068A JP2011535068A JP2012507571A5 JP 2012507571 A5 JP2012507571 A5 JP 2012507571A5 JP 2011535068 A JP2011535068 A JP 2011535068A JP 2011535068 A JP2011535068 A JP 2011535068A JP 2012507571 A5 JP2012507571 A5 JP 2012507571A5
Authority
JP
Japan
Prior art keywords
alkyl
phenyl
substituted
optionally
halogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011535068A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012507571A (ja
JP5623416B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2009/063963 external-priority patent/WO2010060702A1/en
Publication of JP2012507571A publication Critical patent/JP2012507571A/ja
Publication of JP2012507571A5 publication Critical patent/JP2012507571A5/ja
Application granted granted Critical
Publication of JP5623416B2 publication Critical patent/JP5623416B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011535068A 2008-11-03 2009-10-23 光開始剤混合物 Expired - Fee Related JP5623416B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08168145.4 2008-11-03
EP08168145 2008-11-03
PCT/EP2009/063963 WO2010060702A1 (en) 2008-11-03 2009-10-23 Photoinitiator mixtures

Publications (3)

Publication Number Publication Date
JP2012507571A JP2012507571A (ja) 2012-03-29
JP2012507571A5 true JP2012507571A5 (https=) 2012-12-06
JP5623416B2 JP5623416B2 (ja) 2014-11-12

Family

ID=40512891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011535068A Expired - Fee Related JP5623416B2 (ja) 2008-11-03 2009-10-23 光開始剤混合物

Country Status (7)

Country Link
US (1) US8507726B2 (https=)
EP (1) EP2342237B1 (https=)
JP (1) JP5623416B2 (https=)
KR (1) KR101648996B1 (https=)
CN (1) CN102203136B (https=)
TW (1) TWI453184B (https=)
WO (1) WO2010060702A1 (https=)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8507725B2 (en) * 2008-06-06 2013-08-13 Basf Se Oxime ester photoinitiators
CN102471150B (zh) * 2010-06-30 2014-05-07 帝斯曼知识产权资产管理有限公司 D1492液体双酰基氧化膦光引发剂及其在可辐射固化组合物中的用途
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
JP5677036B2 (ja) * 2010-11-08 2015-02-25 キヤノン株式会社 有機発光素子
JP5821401B2 (ja) * 2011-08-19 2015-11-24 大日本印刷株式会社 光インプリント用感光性樹脂組成物、硬化物、レジスト基板及び半導体装置の製造方法
US9365515B2 (en) 2011-12-07 2016-06-14 Basf Se Oxime ester photoinitiators
US8878169B2 (en) * 2012-02-07 2014-11-04 Polyera Corporation Photocurable polymeric materials and related electronic devices
JP6174674B2 (ja) 2012-03-22 2017-08-02 スリーエム イノベイティブ プロパティズ カンパニー ポリメチルメタクリレート系ハードコート組成物及びコーティングされた物品
US9050820B2 (en) 2012-12-29 2015-06-09 Atasheh Soleimani-Gorgani Three-dimensional ink-jet printing by home and office ink-jet printer
KR102095542B1 (ko) * 2013-02-15 2020-03-31 도레이첨단소재 주식회사 전사특성이 우수한 레이저광 열전사용 도너필름 및 그의 제조방법
JP6573877B2 (ja) * 2013-07-08 2019-09-11 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 液状ビスアシルホスフィンオキシド光開始剤
JP6530410B2 (ja) 2013-09-10 2019-06-12 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se オキシムエステル光開始剤
CN103819583B (zh) * 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 一种含硝基双肟酯类光引发剂及其制备方法和应用
WO2016092598A1 (ja) 2014-12-10 2016-06-16 互応化学工業株式会社 ソルダーレジスト組成物及び被覆プリント配線板
KR101685520B1 (ko) 2014-12-10 2016-12-12 고오 가가쿠고교 가부시키가이샤 액상 솔더 레지스트 조성물 및 피복 프린트 배선판
JP6741427B2 (ja) * 2015-01-13 2020-08-19 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. 自発光感光性樹脂組成物、これから製造された色変換層を含む表示装置
CN106154358A (zh) * 2015-03-24 2016-11-23 陈国樑 具过滤降低蓝光穿透率的镜片成份及依该成份所制成的镜片
US9908990B2 (en) 2015-04-17 2018-03-06 Samsung Sdi Co., Ltd. Organic layer composition, organic layer, and method of forming patterns
CN107614485A (zh) * 2015-08-24 2018-01-19 株式会社艾迪科 肟酯化合物及含有该化合物的聚合引发剂
CN105116629A (zh) * 2015-09-16 2015-12-02 京东方科技集团股份有限公司 一种封框胶组合物、显示面板及其制备方法、显示装置
KR102545326B1 (ko) * 2017-03-16 2023-06-21 가부시키가이샤 아데카 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제
JP2018154717A (ja) * 2017-03-16 2018-10-04 富士ゼロックス株式会社 三次元造形材、三次元造形材カートリッジ、三次元造形装置、及び三次元造形物の製造方法
CN107129783B (zh) * 2017-06-02 2020-07-31 金祎 一种防伪感光胶、其制备方法、防伪标签及其制备方法
CN111032102B (zh) * 2017-08-17 2022-03-22 科洛普拉斯特公司 聚合物涂层
CN108192413B (zh) * 2017-12-28 2021-02-26 深圳市容大感光科技股份有限公司 一种快速uv光固化油墨及其应用方法
EP3774360B1 (en) 2018-03-27 2024-01-10 Sun Chemical Corporation Uv-curable compositions comprising cleavage type photoinitiators
KR102087885B1 (ko) * 2018-04-25 2020-03-12 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102087921B1 (ko) * 2018-04-25 2020-03-11 (주)이노시아 포토리소그래피 컬러 잉크
WO2019209049A1 (ko) * 2018-04-25 2019-10-31 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102111789B1 (ko) * 2018-10-16 2020-05-18 주식회사 그래피 투명교정장치의 제조를 위한 3d 프린터용 광경화형 조성물
KR102115367B1 (ko) 2018-11-23 2020-05-26 주식회사 그래피 환자 맞춤형 깁스의 제조를 위한 3d 프린터용 광경화형 조성물
JP7201422B2 (ja) * 2018-12-21 2023-01-10 サカタインクス株式会社 活性エネルギー線硬化型フレキソ印刷インキ組成物
WO2020136522A1 (en) * 2018-12-28 2020-07-02 Igm Resins Italia S.R.L. Photoinitiators
CN110076867B (zh) * 2019-04-28 2020-12-15 福建农林大学 基于环氧树脂的木塑复合材料辐射固化方法
KR102275249B1 (ko) * 2019-11-25 2021-07-12 주식회사 케이씨씨 광경화성 수지 조성물
CN113126369A (zh) * 2021-04-09 2021-07-16 西京学院 一种液晶复合薄膜及其制备方法和液晶书写板
CN117170138B (zh) * 2023-05-31 2026-01-20 江苏双星彩塑新材料股份有限公司 一种cpp多层复合膜及其制备方法
WO2025054034A2 (en) * 2023-09-05 2025-03-13 Eastman Chemical Company Energy curable ink compositions and methods thereof
KR102818167B1 (ko) * 2023-09-20 2025-06-11 조광페인트주식회사 보안제품 스크린 인쇄용 바인더 조성물
KR20250088054A (ko) * 2023-12-08 2025-06-17 주식회사 동진쎄미켐 광경화성 조성물, 점착제 및 디스플레이 장치

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038164A (en) 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
DE2722264C2 (de) 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
EP0003002B1 (de) 1977-12-22 1984-06-13 Ciba-Geigy Ag Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone
DE2830927A1 (de) 1978-07-14 1980-01-31 Basf Ag Acylphosphinoxidverbindungen und ihre verwendung
DE3020092A1 (de) 1980-05-27 1981-12-10 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen und ihre verwendung
US4475999A (en) 1983-06-06 1984-10-09 Stauffer Chemical Company Sensitization of glyoxylate photoinitiators
IT1176018B (it) 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
DE3443221A1 (de) 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
US4950581A (en) 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US5008302A (en) 1987-12-01 1991-04-16 Ciba-Geigy Corporation Titanocenes, the use thereof, and N-substituted pyrroles
US5176984A (en) 1989-10-25 1993-01-05 The Mead Corporation Photohardenable compositions containing a borate salt
EP0441232A3 (en) 1990-02-09 1992-10-14 Basf Aktiengesellschaft Cationic photopolymerisation process
US4987159A (en) 1990-04-11 1991-01-22 Fratelli Lamberti S.P.A. Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use
JP2999274B2 (ja) 1991-01-28 2000-01-17 三菱化学株式会社 エチレン重合体の製造法
RU2091385C1 (ru) 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
TW237456B (https=) 1992-04-09 1995-01-01 Ciba Geigy
AU717137B2 (en) 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
JP3587413B2 (ja) 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
CH691970A5 (de) 1996-03-04 2001-12-14 Ciba Sc Holding Ag Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen.
DK0956280T3 (da) 1997-01-30 2003-02-24 Ciba Sc Holding Ag Ikke-flygtige phenylglyoxylsyreestere
IT1303775B1 (it) 1998-11-19 2001-02-23 Lamberti Spa Fotoiniziatori impiegabili nella fotopolimerizzazione, e relativeformulazioni.
JP4265871B2 (ja) 1998-11-30 2009-05-20 チバ ホールディング インコーポレーテッド アシルホスフィン類、アシルオキシド類およびアシルスルフィド類の製造方法
ITVA20010011A1 (it) 2001-04-24 2002-10-24 Lamberti Spa Miscele solide di derivati alfa-idrossicarbonilici di oligomeri dell'alfa-metilstirene e loro uso.
EP1395615B1 (en) 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
CA2505893A1 (en) * 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
WO2004074328A1 (en) 2003-02-20 2004-09-02 Ciba Specialty Chemicals Holding Inc. Photocurable compositions
WO2004092287A1 (en) 2003-04-16 2004-10-28 Ciba Specialty Chemicals Holding Inc. Radiation curable ink-jet ink containing an alpha hydroxy ketone as photoinitiator
WO2005014605A1 (en) 2003-07-18 2005-02-17 Ciba Specialty Chemicals Holding Inc. Process for preparing acylphosphanes and derivatives thereof
EP1868698A1 (de) 2005-04-01 2007-12-26 Basf Aktiengesellschaft Verwendung von proteinen als demulgatoren
ITVA20050032A1 (it) 2005-05-13 2006-11-14 Lamberti Spa Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore
DE102005029704A1 (de) 2005-06-24 2007-01-11 Basf Ag Verwendung von Hydrophobin-Polypeptiden sowie Konjugaten aus Hydrophobin-Polypeptiden mit Wirk-oder Effektstoffen und ihre Herstellung sowie deren Einsatz in der Kosmetik
DE102005033002A1 (de) 2005-07-14 2007-01-18 Basf Ag Wässrige Monomeremulsionen enthaltend Hydrophobin
ATE458010T1 (de) * 2005-12-20 2010-03-15 Basf Se Oximester-photoinitiatoren
CN102702073B (zh) 2007-05-11 2015-06-10 巴斯夫欧洲公司 肟酯光引发剂
JP5535065B2 (ja) 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光重合開始剤
CN101679394B (zh) 2007-05-11 2013-10-16 巴斯夫欧洲公司 肟酯光引发剂
CN101679063A (zh) 2007-05-24 2010-03-24 巴斯夫欧洲公司 疏水蛋白在固体结晶中作为添加剂的用途
JP2010539125A (ja) 2007-09-13 2010-12-16 ビーエーエスエフ ソシエタス・ヨーロピア 浸透増強剤としてのハイドロフォビンポリペプチドの使用
CN102112497B (zh) 2008-06-06 2013-04-10 巴斯夫欧洲公司 光引发剂混合物
US8507725B2 (en) * 2008-06-06 2013-08-13 Basf Se Oxime ester photoinitiators
WO2010003811A1 (en) 2008-07-11 2010-01-14 Basf Se Amphiphilic proteins as morphology modifiers

Similar Documents

Publication Publication Date Title
JP2012507571A5 (https=)
JP2011525480A5 (https=)
JP2010526846A5 (https=)
JP2004534797A5 (https=)
KR100997398B1 (ko) 무기 필러 및 유기 필러 함유 경화성 수지 조성물, 레지스트막 피복 프린트배선판, 및 그 제조방법
TWI426347B (zh) A photosensitive resin composition, and a flexible circuit board using the same
JP5181224B2 (ja) 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及び、プリント配線板の製造方法
JP2008509967A5 (https=)
KR101276951B1 (ko) 감광성 도전 페이스트 및 전극 패턴
TW200422356A (en) Process
KR101247912B1 (ko) 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 제조방법, 및 프린트 배선판의 제조방법
JP2004536352A5 (https=)
DK200001878A (da) Oximesterfotoinitiatorer
JP2000330276A (ja) 紫外線硬化性樹脂組成物、フォトソルダーレジストインク、予備乾燥被膜、基板及びプリント配線板
CN116917108A (zh) 阻燃构建材料和相关的3d印刷制品
WO2007097306A1 (ja) 感光性樹脂組成物、レジストパターンの形成方法、プリント配線板の製造方法及びプラズマディスプレイパネル用基板の製造方法
US20230350292A1 (en) Photosensitive resin composition, dry film using same, printed wiring board, and printed wiring board manufacturing method
US20090087775A1 (en) Inorganic filler and organic filler-containing curable resin composition, resist film coated printed wiring board, and method for producing the same
KR20130032397A (ko) 감광성 수지 조성물, 및 이를 이용한 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법
US20060019077A1 (en) Process
KR101350547B1 (ko) 감광성 수지 조성물, 이를 이용한 감광성 엘리먼트, 레지스트 패턴의 형성 방법, 및 프린트 배선판의 제조 방법
US20130164679A1 (en) Inorganic filler and organic filler-containing curable resin composition, resist film coated printed wiring board, and method for producing the same
JPWO2019189190A1 (ja) 硬化性組成物、その硬化物およびこれを有する電子部品
TW200302954A (en) UV curable powder suitable for use as photoresist
WO1992006412A1 (en) Photopolymerizable composition and photopolymerizable element