KR101648996B1 - 광개시제 혼합물 - Google Patents

광개시제 혼합물 Download PDF

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Publication number
KR101648996B1
KR101648996B1 KR1020117012660A KR20117012660A KR101648996B1 KR 101648996 B1 KR101648996 B1 KR 101648996B1 KR 1020117012660 A KR1020117012660 A KR 1020117012660A KR 20117012660 A KR20117012660 A KR 20117012660A KR 101648996 B1 KR101648996 B1 KR 101648996B1
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KR
South Korea
Prior art keywords
alkyl
phenyl
substituted
halogen
optionally
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020117012660A
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English (en)
Korean (ko)
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KR20110091742A (ko
Inventor
카티아 스튀더
세바스티엥 빌뇌브
아키라 마츠모토
히사토시 구라
얀 쥘테메이어
Original Assignee
바스프 에스이
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Publication of KR20110091742A publication Critical patent/KR20110091742A/ko
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Publication of KR101648996B1 publication Critical patent/KR101648996B1/ko
Expired - Fee Related legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Indole Compounds (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Dental Preparations (AREA)
  • Materials For Photolithography (AREA)
KR1020117012660A 2008-11-03 2009-10-23 광개시제 혼합물 Expired - Fee Related KR101648996B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP08168145.4 2008-11-03
EP08168145 2008-11-03

Publications (2)

Publication Number Publication Date
KR20110091742A KR20110091742A (ko) 2011-08-12
KR101648996B1 true KR101648996B1 (ko) 2016-08-17

Family

ID=40512891

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117012660A Expired - Fee Related KR101648996B1 (ko) 2008-11-03 2009-10-23 광개시제 혼합물

Country Status (7)

Country Link
US (1) US8507726B2 (https=)
EP (1) EP2342237B1 (https=)
JP (1) JP5623416B2 (https=)
KR (1) KR101648996B1 (https=)
CN (1) CN102203136B (https=)
TW (1) TWI453184B (https=)
WO (1) WO2010060702A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190124072A (ko) * 2018-04-25 2019-11-04 (주)이노시아 포토리소그래피 컬러 잉크

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US8507725B2 (en) * 2008-06-06 2013-08-13 Basf Se Oxime ester photoinitiators
CN102471150B (zh) * 2010-06-30 2014-05-07 帝斯曼知识产权资产管理有限公司 D1492液体双酰基氧化膦光引发剂及其在可辐射固化组合物中的用途
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
JP5677036B2 (ja) * 2010-11-08 2015-02-25 キヤノン株式会社 有機発光素子
JP5821401B2 (ja) * 2011-08-19 2015-11-24 大日本印刷株式会社 光インプリント用感光性樹脂組成物、硬化物、レジスト基板及び半導体装置の製造方法
US9365515B2 (en) 2011-12-07 2016-06-14 Basf Se Oxime ester photoinitiators
US8878169B2 (en) * 2012-02-07 2014-11-04 Polyera Corporation Photocurable polymeric materials and related electronic devices
JP6174674B2 (ja) 2012-03-22 2017-08-02 スリーエム イノベイティブ プロパティズ カンパニー ポリメチルメタクリレート系ハードコート組成物及びコーティングされた物品
US9050820B2 (en) 2012-12-29 2015-06-09 Atasheh Soleimani-Gorgani Three-dimensional ink-jet printing by home and office ink-jet printer
KR102095542B1 (ko) * 2013-02-15 2020-03-31 도레이첨단소재 주식회사 전사특성이 우수한 레이저광 열전사용 도너필름 및 그의 제조방법
JP6573877B2 (ja) * 2013-07-08 2019-09-11 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 液状ビスアシルホスフィンオキシド光開始剤
JP6530410B2 (ja) 2013-09-10 2019-06-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
CN103819583B (zh) * 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 一种含硝基双肟酯类光引发剂及其制备方法和应用
WO2016092598A1 (ja) 2014-12-10 2016-06-16 互応化学工業株式会社 ソルダーレジスト組成物及び被覆プリント配線板
KR101685520B1 (ko) 2014-12-10 2016-12-12 고오 가가쿠고교 가부시키가이샤 액상 솔더 레지스트 조성물 및 피복 프린트 배선판
JP6741427B2 (ja) * 2015-01-13 2020-08-19 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 自発光感光性樹脂組成物、これから製造された色変換層を含む表示装置
CN106154358A (zh) * 2015-03-24 2016-11-23 陈国樑 具过滤降低蓝光穿透率的镜片成份及依该成份所制成的镜片
US9908990B2 (en) 2015-04-17 2018-03-06 Samsung Sdi Co., Ltd. Organic layer composition, organic layer, and method of forming patterns
CN107614485A (zh) * 2015-08-24 2018-01-19 株式会社艾迪科 肟酯化合物及含有该化合物的聚合引发剂
CN105116629A (zh) * 2015-09-16 2015-12-02 京东方科技集团股份有限公司 一种封框胶组合物、显示面板及其制备方法、显示装置
KR102545326B1 (ko) * 2017-03-16 2023-06-21 가부시키가이샤 아데카 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제
JP2018154717A (ja) * 2017-03-16 2018-10-04 富士ゼロックス株式会社 三次元造形材、三次元造形材カートリッジ、三次元造形装置、及び三次元造形物の製造方法
CN107129783B (zh) * 2017-06-02 2020-07-31 金祎 一种防伪感光胶、其制备方法、防伪标签及其制备方法
CN111032102B (zh) * 2017-08-17 2022-03-22 科洛普拉斯特公司 聚合物涂层
CN108192413B (zh) * 2017-12-28 2021-02-26 深圳市容大感光科技股份有限公司 一种快速uv光固化油墨及其应用方法
EP3774360B1 (en) 2018-03-27 2024-01-10 Sun Chemical Corporation Uv-curable compositions comprising cleavage type photoinitiators
KR102087885B1 (ko) * 2018-04-25 2020-03-12 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
WO2019209049A1 (ko) * 2018-04-25 2019-10-31 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102111789B1 (ko) * 2018-10-16 2020-05-18 주식회사 그래피 투명교정장치의 제조를 위한 3d 프린터용 광경화형 조성물
KR102115367B1 (ko) 2018-11-23 2020-05-26 주식회사 그래피 환자 맞춤형 깁스의 제조를 위한 3d 프린터용 광경화형 조성물
JP7201422B2 (ja) * 2018-12-21 2023-01-10 サカタインクス株式会社 活性エネルギー線硬化型フレキソ印刷インキ組成物
WO2020136522A1 (en) * 2018-12-28 2020-07-02 Igm Resins Italia S.R.L. Photoinitiators
CN110076867B (zh) * 2019-04-28 2020-12-15 福建农林大学 基于环氧树脂的木塑复合材料辐射固化方法
KR102275249B1 (ko) * 2019-11-25 2021-07-12 주식회사 케이씨씨 광경화성 수지 조성물
CN113126369A (zh) * 2021-04-09 2021-07-16 西京学院 一种液晶复合薄膜及其制备方法和液晶书写板
CN117170138B (zh) * 2023-05-31 2026-01-20 江苏双星彩塑新材料股份有限公司 一种cpp多层复合膜及其制备方法
WO2025054034A2 (en) * 2023-09-05 2025-03-13 Eastman Chemical Company Energy curable ink compositions and methods thereof
KR102818167B1 (ko) * 2023-09-20 2025-06-11 조광페인트주식회사 보안제품 스크린 인쇄용 바인더 조성물
KR20250088054A (ko) * 2023-12-08 2025-06-17 주식회사 동진쎄미켐 광경화성 조성물, 점착제 및 디스플레이 장치

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KR102087921B1 (ko) * 2018-04-25 2020-03-11 (주)이노시아 포토리소그래피 컬러 잉크

Also Published As

Publication number Publication date
JP2012507571A (ja) 2012-03-29
TWI453184B (zh) 2014-09-21
EP2342237A1 (en) 2011-07-13
CN102203136B (zh) 2013-11-13
US8507726B2 (en) 2013-08-13
KR20110091742A (ko) 2011-08-12
TW201033161A (en) 2010-09-16
CN102203136A (zh) 2011-09-28
WO2010060702A1 (en) 2010-06-03
JP5623416B2 (ja) 2014-11-12
EP2342237B1 (en) 2014-04-23
US20110218266A1 (en) 2011-09-08

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