CN102203136B - 光敏引发剂混合物 - Google Patents
光敏引发剂混合物 Download PDFInfo
- Publication number
- CN102203136B CN102203136B CN2009801436477A CN200980143647A CN102203136B CN 102203136 B CN102203136 B CN 102203136B CN 2009801436477 A CN2009801436477 A CN 2009801436477A CN 200980143647 A CN200980143647 A CN 200980143647A CN 102203136 B CN102203136 B CN 102203136B
- Authority
- CN
- China
- Prior art keywords
- alkyl
- phenyl
- meth
- halogen
- replaced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 0 CCN*CCC(C)C(C)(C)C Chemical compound CCN*CCC(C)C(C)(C)C 0.000 description 6
- BNGCYQKRGJSWIY-UHFFFAOYSA-N CC(C)(C)OC(c(cccc1)c1C(c1ccccc1)=O)=O Chemical compound CC(C)(C)OC(c(cccc1)c1C(c1ccccc1)=O)=O BNGCYQKRGJSWIY-UHFFFAOYSA-N 0.000 description 1
- GCPUWNGXWQTXSG-UHFFFAOYSA-N CCCC(C)N=O Chemical compound CCCC(C)N=O GCPUWNGXWQTXSG-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
- C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Indole Compounds (AREA)
- Heterocyclic Compounds Containing Sulfur Atoms (AREA)
- Dental Preparations (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08168145.4 | 2008-11-03 | ||
| EP08168145 | 2008-11-03 | ||
| PCT/EP2009/063963 WO2010060702A1 (en) | 2008-11-03 | 2009-10-23 | Photoinitiator mixtures |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102203136A CN102203136A (zh) | 2011-09-28 |
| CN102203136B true CN102203136B (zh) | 2013-11-13 |
Family
ID=40512891
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009801436477A Expired - Fee Related CN102203136B (zh) | 2008-11-03 | 2009-10-23 | 光敏引发剂混合物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8507726B2 (https=) |
| EP (1) | EP2342237B1 (https=) |
| JP (1) | JP5623416B2 (https=) |
| KR (1) | KR101648996B1 (https=) |
| CN (1) | CN102203136B (https=) |
| TW (1) | TWI453184B (https=) |
| WO (1) | WO2010060702A1 (https=) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8507725B2 (en) * | 2008-06-06 | 2013-08-13 | Basf Se | Oxime ester photoinitiators |
| CN102471150B (zh) * | 2010-06-30 | 2014-05-07 | 帝斯曼知识产权资产管理有限公司 | D1492液体双酰基氧化膦光引发剂及其在可辐射固化组合物中的用途 |
| US9051397B2 (en) | 2010-10-05 | 2015-06-09 | Basf Se | Oxime ester |
| JP5677036B2 (ja) * | 2010-11-08 | 2015-02-25 | キヤノン株式会社 | 有機発光素子 |
| JP5821401B2 (ja) * | 2011-08-19 | 2015-11-24 | 大日本印刷株式会社 | 光インプリント用感光性樹脂組成物、硬化物、レジスト基板及び半導体装置の製造方法 |
| US9365515B2 (en) | 2011-12-07 | 2016-06-14 | Basf Se | Oxime ester photoinitiators |
| US8878169B2 (en) * | 2012-02-07 | 2014-11-04 | Polyera Corporation | Photocurable polymeric materials and related electronic devices |
| JP6174674B2 (ja) | 2012-03-22 | 2017-08-02 | スリーエム イノベイティブ プロパティズ カンパニー | ポリメチルメタクリレート系ハードコート組成物及びコーティングされた物品 |
| US9050820B2 (en) | 2012-12-29 | 2015-06-09 | Atasheh Soleimani-Gorgani | Three-dimensional ink-jet printing by home and office ink-jet printer |
| KR102095542B1 (ko) * | 2013-02-15 | 2020-03-31 | 도레이첨단소재 주식회사 | 전사특성이 우수한 레이저광 열전사용 도너필름 및 그의 제조방법 |
| JP6573877B2 (ja) * | 2013-07-08 | 2019-09-11 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 液状ビスアシルホスフィンオキシド光開始剤 |
| JP6530410B2 (ja) | 2013-09-10 | 2019-06-12 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | オキシムエステル光開始剤 |
| CN103819583B (zh) * | 2014-03-18 | 2016-05-18 | 常州强力电子新材料股份有限公司 | 一种含硝基双肟酯类光引发剂及其制备方法和应用 |
| WO2016092598A1 (ja) | 2014-12-10 | 2016-06-16 | 互応化学工業株式会社 | ソルダーレジスト組成物及び被覆プリント配線板 |
| KR101685520B1 (ko) | 2014-12-10 | 2016-12-12 | 고오 가가쿠고교 가부시키가이샤 | 액상 솔더 레지스트 조성물 및 피복 프린트 배선판 |
| JP6741427B2 (ja) * | 2015-01-13 | 2020-08-19 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | 自発光感光性樹脂組成物、これから製造された色変換層を含む表示装置 |
| CN106154358A (zh) * | 2015-03-24 | 2016-11-23 | 陈国樑 | 具过滤降低蓝光穿透率的镜片成份及依该成份所制成的镜片 |
| US9908990B2 (en) | 2015-04-17 | 2018-03-06 | Samsung Sdi Co., Ltd. | Organic layer composition, organic layer, and method of forming patterns |
| CN107614485A (zh) * | 2015-08-24 | 2018-01-19 | 株式会社艾迪科 | 肟酯化合物及含有该化合物的聚合引发剂 |
| CN105116629A (zh) * | 2015-09-16 | 2015-12-02 | 京东方科技集团股份有限公司 | 一种封框胶组合物、显示面板及其制备方法、显示装置 |
| KR102545326B1 (ko) * | 2017-03-16 | 2023-06-21 | 가부시키가이샤 아데카 | 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제 |
| JP2018154717A (ja) * | 2017-03-16 | 2018-10-04 | 富士ゼロックス株式会社 | 三次元造形材、三次元造形材カートリッジ、三次元造形装置、及び三次元造形物の製造方法 |
| CN107129783B (zh) * | 2017-06-02 | 2020-07-31 | 金祎 | 一种防伪感光胶、其制备方法、防伪标签及其制备方法 |
| CN111032102B (zh) * | 2017-08-17 | 2022-03-22 | 科洛普拉斯特公司 | 聚合物涂层 |
| CN108192413B (zh) * | 2017-12-28 | 2021-02-26 | 深圳市容大感光科技股份有限公司 | 一种快速uv光固化油墨及其应用方法 |
| EP3774360B1 (en) | 2018-03-27 | 2024-01-10 | Sun Chemical Corporation | Uv-curable compositions comprising cleavage type photoinitiators |
| KR102087885B1 (ko) * | 2018-04-25 | 2020-03-12 | (주)이노시아 | 스프레이용 포토리소그래피 컬러 잉크 |
| KR102087921B1 (ko) * | 2018-04-25 | 2020-03-11 | (주)이노시아 | 포토리소그래피 컬러 잉크 |
| WO2019209049A1 (ko) * | 2018-04-25 | 2019-10-31 | (주)이노시아 | 스프레이용 포토리소그래피 컬러 잉크 |
| KR102111789B1 (ko) * | 2018-10-16 | 2020-05-18 | 주식회사 그래피 | 투명교정장치의 제조를 위한 3d 프린터용 광경화형 조성물 |
| KR102115367B1 (ko) | 2018-11-23 | 2020-05-26 | 주식회사 그래피 | 환자 맞춤형 깁스의 제조를 위한 3d 프린터용 광경화형 조성물 |
| JP7201422B2 (ja) * | 2018-12-21 | 2023-01-10 | サカタインクス株式会社 | 活性エネルギー線硬化型フレキソ印刷インキ組成物 |
| WO2020136522A1 (en) * | 2018-12-28 | 2020-07-02 | Igm Resins Italia S.R.L. | Photoinitiators |
| CN110076867B (zh) * | 2019-04-28 | 2020-12-15 | 福建农林大学 | 基于环氧树脂的木塑复合材料辐射固化方法 |
| KR102275249B1 (ko) * | 2019-11-25 | 2021-07-12 | 주식회사 케이씨씨 | 광경화성 수지 조성물 |
| CN113126369A (zh) * | 2021-04-09 | 2021-07-16 | 西京学院 | 一种液晶复合薄膜及其制备方法和液晶书写板 |
| CN117170138B (zh) * | 2023-05-31 | 2026-01-20 | 江苏双星彩塑新材料股份有限公司 | 一种cpp多层复合膜及其制备方法 |
| WO2025054034A2 (en) * | 2023-09-05 | 2025-03-13 | Eastman Chemical Company | Energy curable ink compositions and methods thereof |
| KR102818167B1 (ko) * | 2023-09-20 | 2025-06-11 | 조광페인트주식회사 | 보안제품 스크린 인쇄용 바인더 조성물 |
| KR20250088054A (ko) * | 2023-12-08 | 2025-06-17 | 주식회사 동진쎄미켐 | 광경화성 조성물, 점착제 및 디스플레이 장치 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007071497A1 (en) * | 2005-12-20 | 2007-06-28 | Ciba Holding Inc. | Oxime ester photoinitiators |
Family Cites Families (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4038164A (en) | 1975-09-18 | 1977-07-26 | Stauffer Chemical Company | Photopolymerizable aryl and heterocyclic glyoxylate compositions and process |
| DE2722264C2 (de) | 1977-05-17 | 1984-06-28 | Merck Patent Gmbh, 6100 Darmstadt | Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren |
| EP0003002B1 (de) | 1977-12-22 | 1984-06-13 | Ciba-Geigy Ag | Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone |
| DE2830927A1 (de) | 1978-07-14 | 1980-01-31 | Basf Ag | Acylphosphinoxidverbindungen und ihre verwendung |
| DE3020092A1 (de) | 1980-05-27 | 1981-12-10 | Basf Ag, 6700 Ludwigshafen | Acylphosphinverbindungen und ihre verwendung |
| US4475999A (en) | 1983-06-06 | 1984-10-09 | Stauffer Chemical Company | Sensitization of glyoxylate photoinitiators |
| IT1176018B (it) | 1984-04-12 | 1987-08-12 | Lamberti Flli Spa | Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione |
| DE3443221A1 (de) | 1984-11-27 | 1986-06-05 | ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld | Bisacylphosphinoxide, ihre herstellung und verwendung |
| US4950581A (en) | 1987-07-06 | 1990-08-21 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
| US5008302A (en) | 1987-12-01 | 1991-04-16 | Ciba-Geigy Corporation | Titanocenes, the use thereof, and N-substituted pyrroles |
| US5176984A (en) | 1989-10-25 | 1993-01-05 | The Mead Corporation | Photohardenable compositions containing a borate salt |
| EP0441232A3 (en) | 1990-02-09 | 1992-10-14 | Basf Aktiengesellschaft | Cationic photopolymerisation process |
| US4987159A (en) | 1990-04-11 | 1991-01-22 | Fratelli Lamberti S.P.A. | Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use |
| JP2999274B2 (ja) | 1991-01-28 | 2000-01-17 | 三菱化学株式会社 | エチレン重合体の製造法 |
| RU2091385C1 (ru) | 1991-09-23 | 1997-09-27 | Циба-Гейги АГ | Бисацилфосфиноксиды, состав и способ нанесения покрытий |
| TW237456B (https=) | 1992-04-09 | 1995-01-01 | Ciba Geigy | |
| AU717137B2 (en) | 1995-11-24 | 2000-03-16 | Ciba Specialty Chemicals Holding Inc. | Borate coinitiators for photopolymerization |
| JP3587413B2 (ja) | 1995-12-20 | 2004-11-10 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
| CH691970A5 (de) | 1996-03-04 | 2001-12-14 | Ciba Sc Holding Ag | Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen. |
| DK0956280T3 (da) | 1997-01-30 | 2003-02-24 | Ciba Sc Holding Ag | Ikke-flygtige phenylglyoxylsyreestere |
| IT1303775B1 (it) | 1998-11-19 | 2001-02-23 | Lamberti Spa | Fotoiniziatori impiegabili nella fotopolimerizzazione, e relativeformulazioni. |
| JP4265871B2 (ja) | 1998-11-30 | 2009-05-20 | チバ ホールディング インコーポレーテッド | アシルホスフィン類、アシルオキシド類およびアシルスルフィド類の製造方法 |
| ITVA20010011A1 (it) | 2001-04-24 | 2002-10-24 | Lamberti Spa | Miscele solide di derivati alfa-idrossicarbonilici di oligomeri dell'alfa-metilstirene e loro uso. |
| EP1395615B1 (en) | 2001-06-11 | 2009-10-21 | Basf Se | Oxime ester photoinitiators having a combined structure |
| CA2505893A1 (en) * | 2002-12-03 | 2004-06-17 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators with heteroaromatic groups |
| WO2004074328A1 (en) | 2003-02-20 | 2004-09-02 | Ciba Specialty Chemicals Holding Inc. | Photocurable compositions |
| WO2004092287A1 (en) | 2003-04-16 | 2004-10-28 | Ciba Specialty Chemicals Holding Inc. | Radiation curable ink-jet ink containing an alpha hydroxy ketone as photoinitiator |
| WO2005014605A1 (en) | 2003-07-18 | 2005-02-17 | Ciba Specialty Chemicals Holding Inc. | Process for preparing acylphosphanes and derivatives thereof |
| EP1868698A1 (de) | 2005-04-01 | 2007-12-26 | Basf Aktiengesellschaft | Verwendung von proteinen als demulgatoren |
| ITVA20050032A1 (it) | 2005-05-13 | 2006-11-14 | Lamberti Spa | Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore |
| DE102005029704A1 (de) | 2005-06-24 | 2007-01-11 | Basf Ag | Verwendung von Hydrophobin-Polypeptiden sowie Konjugaten aus Hydrophobin-Polypeptiden mit Wirk-oder Effektstoffen und ihre Herstellung sowie deren Einsatz in der Kosmetik |
| DE102005033002A1 (de) | 2005-07-14 | 2007-01-18 | Basf Ag | Wässrige Monomeremulsionen enthaltend Hydrophobin |
| CN102702073B (zh) | 2007-05-11 | 2015-06-10 | 巴斯夫欧洲公司 | 肟酯光引发剂 |
| JP5535065B2 (ja) | 2007-05-11 | 2014-07-02 | ビーエーエスエフ ソシエタス・ヨーロピア | オキシムエステル光重合開始剤 |
| CN101679394B (zh) | 2007-05-11 | 2013-10-16 | 巴斯夫欧洲公司 | 肟酯光引发剂 |
| CN101679063A (zh) | 2007-05-24 | 2010-03-24 | 巴斯夫欧洲公司 | 疏水蛋白在固体结晶中作为添加剂的用途 |
| JP2010539125A (ja) | 2007-09-13 | 2010-12-16 | ビーエーエスエフ ソシエタス・ヨーロピア | 浸透増強剤としてのハイドロフォビンポリペプチドの使用 |
| CN102112497B (zh) | 2008-06-06 | 2013-04-10 | 巴斯夫欧洲公司 | 光引发剂混合物 |
| US8507725B2 (en) * | 2008-06-06 | 2013-08-13 | Basf Se | Oxime ester photoinitiators |
| WO2010003811A1 (en) | 2008-07-11 | 2010-01-14 | Basf Se | Amphiphilic proteins as morphology modifiers |
-
2009
- 2009-10-23 EP EP09737002.7A patent/EP2342237B1/en not_active Not-in-force
- 2009-10-23 KR KR1020117012660A patent/KR101648996B1/ko not_active Expired - Fee Related
- 2009-10-23 WO PCT/EP2009/063963 patent/WO2010060702A1/en not_active Ceased
- 2009-10-23 CN CN2009801436477A patent/CN102203136B/zh not_active Expired - Fee Related
- 2009-10-23 US US13/127,068 patent/US8507726B2/en not_active Expired - Fee Related
- 2009-10-23 JP JP2011535068A patent/JP5623416B2/ja not_active Expired - Fee Related
- 2009-11-02 TW TW098137142A patent/TWI453184B/zh not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007071497A1 (en) * | 2005-12-20 | 2007-06-28 | Ciba Holding Inc. | Oxime ester photoinitiators |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012507571A (ja) | 2012-03-29 |
| TWI453184B (zh) | 2014-09-21 |
| EP2342237A1 (en) | 2011-07-13 |
| KR101648996B1 (ko) | 2016-08-17 |
| US8507726B2 (en) | 2013-08-13 |
| KR20110091742A (ko) | 2011-08-12 |
| TW201033161A (en) | 2010-09-16 |
| CN102203136A (zh) | 2011-09-28 |
| WO2010060702A1 (en) | 2010-06-03 |
| JP5623416B2 (ja) | 2014-11-12 |
| EP2342237B1 (en) | 2014-04-23 |
| US20110218266A1 (en) | 2011-09-08 |
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