JP2012504843A5 - - Google Patents

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Publication number
JP2012504843A5
JP2012504843A5 JP2011529560A JP2011529560A JP2012504843A5 JP 2012504843 A5 JP2012504843 A5 JP 2012504843A5 JP 2011529560 A JP2011529560 A JP 2011529560A JP 2011529560 A JP2011529560 A JP 2011529560A JP 2012504843 A5 JP2012504843 A5 JP 2012504843A5
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JP
Japan
Prior art keywords
electrostatic lens
insulating structure
insulating
conductive plate
aperture
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Application number
JP2011529560A
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English (en)
Japanese (ja)
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JP5420670B2 (ja
JP2012504843A (ja
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Priority claimed from PCT/EP2009/062788 external-priority patent/WO2010037832A2/en
Publication of JP2012504843A publication Critical patent/JP2012504843A/ja
Publication of JP2012504843A5 publication Critical patent/JP2012504843A5/ja
Application granted granted Critical
Publication of JP5420670B2 publication Critical patent/JP5420670B2/ja
Active legal-status Critical Current
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JP2011529560A 2008-10-01 2009-10-01 静電レンズ構造体 Active JP5420670B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10168208P 2008-10-01 2008-10-01
US61/101,682 2008-10-01
PCT/EP2009/062788 WO2010037832A2 (en) 2008-10-01 2009-10-01 Electrostatic lens structure

Publications (3)

Publication Number Publication Date
JP2012504843A JP2012504843A (ja) 2012-02-23
JP2012504843A5 true JP2012504843A5 (enExample) 2012-11-22
JP5420670B2 JP5420670B2 (ja) 2014-02-19

Family

ID=41466906

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011529560A Active JP5420670B2 (ja) 2008-10-01 2009-10-01 静電レンズ構造体

Country Status (7)

Country Link
US (3) US8198602B2 (enExample)
EP (1) EP2406810B1 (enExample)
JP (1) JP5420670B2 (enExample)
KR (1) KR101649106B1 (enExample)
CN (1) CN102232237B (enExample)
TW (1) TWI479530B (enExample)
WO (1) WO2010037832A2 (enExample)

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EP4214736A2 (en) * 2020-09-17 2023-07-26 ASML Netherlands B.V. Charged particle assessment tool, inspection method
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EP4020517A1 (en) * 2020-12-23 2022-06-29 ASML Netherlands B.V. Electron-optical device
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