JP2012234930A5 - - Google Patents
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- Publication number
- JP2012234930A5 JP2012234930A5 JP2011101645A JP2011101645A JP2012234930A5 JP 2012234930 A5 JP2012234930 A5 JP 2012234930A5 JP 2011101645 A JP2011101645 A JP 2011101645A JP 2011101645 A JP2011101645 A JP 2011101645A JP 2012234930 A5 JP2012234930 A5 JP 2012234930A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- tray
- mounting plate
- holding
- tray body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 claims description 171
- 239000010936 titanium Substances 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 239000000112 cooling gas Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 239000000696 magnetic material Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 230000004907 flux Effects 0.000 claims description 2
- 230000001105 regulatory effect Effects 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 230000000694 effects Effects 0.000 description 11
- 238000001816 cooling Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011101645A JP5873251B2 (ja) | 2011-04-28 | 2011-04-28 | 基板トレイ及び該トレイを用いた基板処理装置 |
| KR1020120041377A KR101366441B1 (ko) | 2011-04-28 | 2012-04-20 | 기판 트레이 및 상기 트레이를 이용한 기판 처리 장치 |
| TW101114162A TWI503921B (zh) | 2011-04-28 | 2012-04-20 | A substrate tray and a substrate processing device using the tray |
| CN201210128524.XA CN102760679B (zh) | 2011-04-28 | 2012-04-27 | 基板托架以及使用了该托架的基板处理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011101645A JP5873251B2 (ja) | 2011-04-28 | 2011-04-28 | 基板トレイ及び該トレイを用いた基板処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012234930A JP2012234930A (ja) | 2012-11-29 |
| JP2012234930A5 true JP2012234930A5 (enExample) | 2014-04-24 |
| JP5873251B2 JP5873251B2 (ja) | 2016-03-01 |
Family
ID=47055081
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011101645A Active JP5873251B2 (ja) | 2011-04-28 | 2011-04-28 | 基板トレイ及び該トレイを用いた基板処理装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5873251B2 (enExample) |
| KR (1) | KR101366441B1 (enExample) |
| CN (1) | CN102760679B (enExample) |
| TW (1) | TWI503921B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160002780A1 (en) * | 2013-03-15 | 2016-01-07 | Applied Materials, Inc. | Carrier for substrates |
| GB201402126D0 (en) * | 2014-02-07 | 2014-03-26 | Spts Technologies Ltd | Method of processing a substrate |
| US10916464B1 (en) | 2019-07-26 | 2021-02-09 | Applied Materials, Inc. | Method of pre aligning carrier, wafer and carrier-wafer combination for throughput efficiency |
| US11756816B2 (en) | 2019-07-26 | 2023-09-12 | Applied Materials, Inc. | Carrier FOUP and a method of placing a carrier |
| US11196360B2 (en) | 2019-07-26 | 2021-12-07 | Applied Materials, Inc. | System and method for electrostatically chucking a substrate to a carrier |
| KR102829388B1 (ko) * | 2020-01-14 | 2025-07-03 | 한국알박(주) | 트레이용 마그넷 클램프 |
| CN114054419B (zh) * | 2021-11-17 | 2023-04-11 | 新美光(苏州)半导体科技有限公司 | 硅电极的清洗装置、清洗方法 |
| WO2023158555A1 (en) * | 2022-02-18 | 2023-08-24 | Applied Materials, Inc. | Substrate carrier to control temperature of substrate |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02229421A (ja) * | 1989-03-02 | 1990-09-12 | Sumitomo Electric Ind Ltd | 露光装置 |
| JP4428799B2 (ja) * | 2000-04-03 | 2010-03-10 | キヤノン株式会社 | 磁気支持機構、位置決め装置および半導体デバイス製造方法 |
| JP4121763B2 (ja) * | 2002-04-08 | 2008-07-23 | Ｔｄｋ株式会社 | 薄膜形成装置に対する基板の交換ユニットおよび基板交換方法 |
| JP3927158B2 (ja) * | 2002-07-11 | 2007-06-06 | エーエスエムエル ネザーランズ ビー．ブイ． | 基板ホルダおよびデバイス製造方法 |
| JP2005120410A (ja) * | 2003-10-15 | 2005-05-12 | Renesas Technology Corp | 半導体装置の製造方法 |
| JP4386753B2 (ja) * | 2004-02-19 | 2009-12-16 | キヤノンアネルバ株式会社 | ウェハーステージ及びプラズマ処理装置 |
| KR100582036B1 (ko) * | 2004-04-12 | 2006-05-22 | 주식회사 테라세미콘 | 반도체 제조공법 및 반도체 제조장치의 기판홀더 |
| JP4576200B2 (ja) * | 2004-10-21 | 2010-11-04 | キヤノンアネルバ株式会社 | 基板処理装置及び基板処理装置におけるアーキング発生監視方法 |
| JP2007281050A (ja) * | 2006-04-04 | 2007-10-25 | Miraial Kk | 半導体ウエハのウエハトレイ |
| JP4699272B2 (ja) * | 2006-04-27 | 2011-06-08 | 株式会社フジクラ | 基板ホルダー |
| JP4990636B2 (ja) * | 2007-01-11 | 2012-08-01 | 株式会社アルバック | 搬送トレーを用いた真空処理装置 |
| JP4997141B2 (ja) * | 2008-02-21 | 2012-08-08 | 株式会社アルバック | 真空処理装置、基板の温度制御方法 |
| US20100151680A1 (en) * | 2008-12-17 | 2010-06-17 | Optisolar Inc. | Substrate carrier with enhanced temperature uniformity |
| JP2010177267A (ja) * | 2009-01-27 | 2010-08-12 | Ulvac Japan Ltd | 搬送トレー及びこの搬送トレーを用いた真空処理装置 |
| JP2011023425A (ja) * | 2009-07-13 | 2011-02-03 | Canon Inc | ステージ装置、露光装置及びデバイス製造方法 |
-
2011
- 2011-04-28 JP JP2011101645A patent/JP5873251B2/ja active Active
-
2012
- 2012-04-20 TW TW101114162A patent/TWI503921B/zh active
- 2012-04-20 KR KR1020120041377A patent/KR101366441B1/ko active Active
- 2012-04-27 CN CN201210128524.XA patent/CN102760679B/zh active Active
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