WO2009066633A1 - アークイオンプレーティング装置用の蒸発源及びアークイオンプレーティング装置 - Google Patents
アークイオンプレーティング装置用の蒸発源及びアークイオンプレーティング装置 Download PDFInfo
- Publication number
- WO2009066633A1 WO2009066633A1 PCT/JP2008/070861 JP2008070861W WO2009066633A1 WO 2009066633 A1 WO2009066633 A1 WO 2009066633A1 JP 2008070861 W JP2008070861 W JP 2008070861W WO 2009066633 A1 WO2009066633 A1 WO 2009066633A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ion plating
- arc ion
- plating device
- cathode
- magnetic field
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
アークイオンプレーティング装置用の蒸発源において、陰極の利用効率を飛躍的に向上させ、かつ表面平滑性が高く、残留応力が小さい薄膜を形成する。 陰極2の外周に配置されたリング状の磁石3と、陰極2の背面に配置されたソレノイドコイル4とを有する磁界形成手段5を備えたアークイオンプレーティング装置用の蒸発源1において、磁界形成手段5は、リング状の磁石3の極性の向きとソレノイドコイル4の極性の向きとが反対となるように構成され、陰極2を構成する物質を蒸発させる蒸発面の中心部から周縁に向かって延びた任意の線分上における磁束密度の最小値が45Gauss(ガウス)以上、その平均値が80Gauss以上である磁界を形成する。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-301792 | 2007-11-21 | ||
JP2007301792 | 2007-11-21 | ||
JP2008109148A JP2009144236A (ja) | 2007-11-21 | 2008-04-18 | アークイオンプレーティング装置用の蒸発源及びアークイオンプレーティング装置 |
JP2008-109148 | 2008-04-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009066633A1 true WO2009066633A1 (ja) | 2009-05-28 |
Family
ID=40667455
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/070861 WO2009066633A1 (ja) | 2007-11-21 | 2008-11-17 | アークイオンプレーティング装置用の蒸発源及びアークイオンプレーティング装置 |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2009066633A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012115203A1 (ja) * | 2011-02-23 | 2012-08-30 | 株式会社神戸製鋼所 | アーク式蒸発源 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11269634A (ja) * | 1998-03-20 | 1999-10-05 | Kobe Steel Ltd | 真空アーク蒸発源 |
JP2000328236A (ja) * | 1999-05-21 | 2000-11-28 | Kobe Steel Ltd | アーク蒸発源及び真空蒸着装置 |
JP2002212711A (ja) * | 2001-01-16 | 2002-07-31 | Kobe Steel Ltd | 真空アーク蒸発源 |
JP2005307288A (ja) * | 2004-04-22 | 2005-11-04 | Nissin Electric Co Ltd | 炭素系膜及び炭素系膜形成装置 |
JP2006104512A (ja) * | 2004-10-04 | 2006-04-20 | Nissin Electric Co Ltd | 成膜方法及び成膜装置 |
JP2007056347A (ja) * | 2005-08-26 | 2007-03-08 | Nachi Fujikoshi Corp | アーク式イオンプレーティング装置用蒸発源 |
-
2008
- 2008-11-17 WO PCT/JP2008/070861 patent/WO2009066633A1/ja active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11269634A (ja) * | 1998-03-20 | 1999-10-05 | Kobe Steel Ltd | 真空アーク蒸発源 |
JP2000328236A (ja) * | 1999-05-21 | 2000-11-28 | Kobe Steel Ltd | アーク蒸発源及び真空蒸着装置 |
JP2002212711A (ja) * | 2001-01-16 | 2002-07-31 | Kobe Steel Ltd | 真空アーク蒸発源 |
JP2005307288A (ja) * | 2004-04-22 | 2005-11-04 | Nissin Electric Co Ltd | 炭素系膜及び炭素系膜形成装置 |
JP2006104512A (ja) * | 2004-10-04 | 2006-04-20 | Nissin Electric Co Ltd | 成膜方法及び成膜装置 |
JP2007056347A (ja) * | 2005-08-26 | 2007-03-08 | Nachi Fujikoshi Corp | アーク式イオンプレーティング装置用蒸発源 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012115203A1 (ja) * | 2011-02-23 | 2012-08-30 | 株式会社神戸製鋼所 | アーク式蒸発源 |
US10982318B2 (en) | 2011-02-23 | 2021-04-20 | Kobe Steel, Ltd. | Arc evaporation source |
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