TWI503921B - A substrate tray and a substrate processing device using the tray - Google Patents

A substrate tray and a substrate processing device using the tray Download PDF

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Publication number
TWI503921B
TWI503921B TW101114162A TW101114162A TWI503921B TW I503921 B TWI503921 B TW I503921B TW 101114162 A TW101114162 A TW 101114162A TW 101114162 A TW101114162 A TW 101114162A TW I503921 B TWI503921 B TW I503921B
Authority
TW
Taiwan
Prior art keywords
substrate
tray
mounting plate
magnet
holding
Prior art date
Application number
TW101114162A
Other languages
English (en)
Chinese (zh)
Other versions
TW201306164A (zh
Inventor
戶田哲郎
高城信二
大阪知子
Original Assignee
佳能安內華股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 佳能安內華股份有限公司 filed Critical 佳能安內華股份有限公司
Publication of TW201306164A publication Critical patent/TW201306164A/zh
Application granted granted Critical
Publication of TWI503921B publication Critical patent/TWI503921B/zh

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Classifications

    • H10P72/16—
    • H10P72/1904—
    • H10P72/1918—
    • H10P72/7618—

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
TW101114162A 2011-04-28 2012-04-20 A substrate tray and a substrate processing device using the tray TWI503921B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011101645A JP5873251B2 (ja) 2011-04-28 2011-04-28 基板トレイ及び該トレイを用いた基板処理装置

Publications (2)

Publication Number Publication Date
TW201306164A TW201306164A (zh) 2013-02-01
TWI503921B true TWI503921B (zh) 2015-10-11

Family

ID=47055081

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101114162A TWI503921B (zh) 2011-04-28 2012-04-20 A substrate tray and a substrate processing device using the tray

Country Status (4)

Country Link
JP (1) JP5873251B2 (enExample)
KR (1) KR101366441B1 (enExample)
CN (1) CN102760679B (enExample)
TW (1) TWI503921B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2971224B1 (en) * 2013-03-15 2018-01-31 Applied Materials, Inc. Carrier for substrates
GB201402126D0 (en) * 2014-02-07 2014-03-26 Spts Technologies Ltd Method of processing a substrate
US10916464B1 (en) 2019-07-26 2021-02-09 Applied Materials, Inc. Method of pre aligning carrier, wafer and carrier-wafer combination for throughput efficiency
US11756816B2 (en) 2019-07-26 2023-09-12 Applied Materials, Inc. Carrier FOUP and a method of placing a carrier
US11196360B2 (en) 2019-07-26 2021-12-07 Applied Materials, Inc. System and method for electrostatically chucking a substrate to a carrier
KR102829388B1 (ko) * 2020-01-14 2025-07-03 한국알박(주) 트레이용 마그넷 클램프
CN114054419B (zh) * 2021-11-17 2023-04-11 新美光(苏州)半导体科技有限公司 硅电极的清洗装置、清洗方法
WO2023158555A1 (en) * 2022-02-18 2023-08-24 Applied Materials, Inc. Substrate carrier to control temperature of substrate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200305875A (en) * 2002-04-08 2003-11-01 Tdk Corp Replacement unit and replacement method for substrate in thin-film forming device
TW200408912A (en) * 2002-07-11 2004-06-01 Asml Netherlands Bv Substrate holder and device manufacturing method

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02229421A (ja) * 1989-03-02 1990-09-12 Sumitomo Electric Ind Ltd 露光装置
JP4428799B2 (ja) * 2000-04-03 2010-03-10 キヤノン株式会社 磁気支持機構、位置決め装置および半導体デバイス製造方法
JP2005120410A (ja) * 2003-10-15 2005-05-12 Renesas Technology Corp 半導体装置の製造方法
JP4386753B2 (ja) * 2004-02-19 2009-12-16 キヤノンアネルバ株式会社 ウェハーステージ及びプラズマ処理装置
KR100582036B1 (ko) * 2004-04-12 2006-05-22 주식회사 테라세미콘 반도체 제조공법 및 반도체 제조장치의 기판홀더
JP4576200B2 (ja) * 2004-10-21 2010-11-04 キヤノンアネルバ株式会社 基板処理装置及び基板処理装置におけるアーキング発生監視方法
JP2007281050A (ja) * 2006-04-04 2007-10-25 Miraial Kk 半導体ウエハのウエハトレイ
JP4699272B2 (ja) * 2006-04-27 2011-06-08 株式会社フジクラ 基板ホルダー
JP4990636B2 (ja) * 2007-01-11 2012-08-01 株式会社アルバック 搬送トレーを用いた真空処理装置
JP4997141B2 (ja) * 2008-02-21 2012-08-08 株式会社アルバック 真空処理装置、基板の温度制御方法
US20100151680A1 (en) * 2008-12-17 2010-06-17 Optisolar Inc. Substrate carrier with enhanced temperature uniformity
JP2010177267A (ja) * 2009-01-27 2010-08-12 Ulvac Japan Ltd 搬送トレー及びこの搬送トレーを用いた真空処理装置
JP2011023425A (ja) * 2009-07-13 2011-02-03 Canon Inc ステージ装置、露光装置及びデバイス製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200305875A (en) * 2002-04-08 2003-11-01 Tdk Corp Replacement unit and replacement method for substrate in thin-film forming device
TW200408912A (en) * 2002-07-11 2004-06-01 Asml Netherlands Bv Substrate holder and device manufacturing method

Also Published As

Publication number Publication date
JP2012234930A (ja) 2012-11-29
CN102760679B (zh) 2015-07-15
CN102760679A (zh) 2012-10-31
KR20120122905A (ko) 2012-11-07
JP5873251B2 (ja) 2016-03-01
KR101366441B1 (ko) 2014-02-21
TW201306164A (zh) 2013-02-01

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