JP2012159671A - ペリクル枠体、ペリクル及びペリクル枠体の製造方法 - Google Patents
ペリクル枠体、ペリクル及びペリクル枠体の製造方法 Download PDFInfo
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
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Abstract
【解決手段】アルミニウム材で枠状に形成され、開口部4を覆うペリクル膜3を展張支持するペリクル枠体2は、アルミニウム材がCu:0.5〜3.0%、Mg:1.5〜4.5%、Zn:4.0〜7.0%を含み、このアルミニウム材には、リン酸化合物、ホウ酸化合物、飽和ジカルボン酸化合物、不飽和ジカルボン酸化合物、オキシモノカルボン酸化合物、リンゴ酸、タルトロン酸、及びそれらの塩からなる群から選択される少なくとも1つの電解液で陽極酸化処理されて陽極酸化皮膜Pが表面に形成されており、陽極酸化皮膜Pは、Ni、Co、Cu、Sn、Fe、Pb、Ca、Zn、Mgのうちの1種または2種以上が電解析出している。
【選択図】図1
Description
JIS A7075アルミニウム合金材を切断し、枠体外寸法149mm×122mm×5.8mm、枠体厚さ2mmとなるように切削研磨して枠材を用意した。陽極酸化処理に先駆けて、大気中で280℃、30分間の熱処理を行った。次いで、シュウ酸50g/Lの水溶液(C2O4 2−:48.9g/L)を電解液として、30℃で電解電圧20Vの定電圧電解を15分行い、上記枠材を陽極酸化処理した後、純水にて洗浄した。
実施例1で用意したものと同じ枠材を、熱処理しない以外は実施例1と同様にしてペリクル枠体及びペリクルを準備した。そして、図3に示す項目を実施例1と同様にしてそれぞれ評価した。
実施例1で用意したものと同じ枠材を、陽極酸化処理に先駆けて、大気中で280℃、30分間の熱処理を行った。ついで、陽極酸化処理での電解時間を20分にして、電解着色の金属塩を硫酸Niにした以外は実施例1と同様にしてペリクル枠体及びペリクルを準備した。そして、図3に示す項目を実施例1と同様にしてそれぞれ評価した。
実施例1で用意したものと同じ枠材を、熱処理しない以外は実施例3と同様にしてペリクル枠体及びペリクルを準備した。そして、図3に示す項目を実施例1と同様にしてそれぞれ評価した。
陽極酸化処理に用いる電解液を硫酸160g/Lの水溶液として、15℃で電解電圧20Vの定電圧電解を25分行った以外は実施例3と同様にしてペリクル枠体及びペリクルを準備した。そして、図3に示す項目を実施例1と同様にしてそれぞれ評価した。
陽極酸化処理前の熱処理を行わない以外は比較例1と同様にしてペリクル枠体及びペリクルを準備した。そして、図3に示す項目を実施例1と同様にしてそれぞれ評価した。
Claims (6)
- アルミニウム材で枠状に形成され、開口部を覆う光学的薄膜体を展張支持するペリクル枠体であって、
前記アルミニウム材は、Cu:0.5〜3.0%、Mg:1.5〜4.5%、Zn:4.0〜7.0%を含み、
前記アルミニウム材には、リン酸化合物、ホウ酸化合物、飽和ジカルボン酸化合物、不飽和ジカルボン酸化合物、オキシモノカルボン酸化合物、リンゴ酸、タルトロン酸、及びそれらの塩からなる群から選択される少なくとも1つの酸を含む電解液で陽極酸化処理されて表面に陽極酸化皮膜が形成されており、
前記陽極酸化皮膜は、Ni、Co、Cu、Sn、Fe、Pb、Ca、Zn、Mgのうちの1種または2種以上が電解析出している、ペリクル枠体。 - 前記電解液は、リン酸化合物、飽和ジカルボン酸化合物、リンゴ酸、タルトロン酸、及びそれらの塩からなる群から選択される少なくとも1つの酸を含む、請求項1に記載のペリクル枠体。
- 前記陽極酸化皮膜の色調のL値が40以下である、請求項1または2に記載のペリクル枠体。
- 前記陽極酸化皮膜の厚みが0.5μm〜10μmである、請求項1〜3のいずれか1項に記載のペリクル枠体。
- 請求項1〜4のいずれか1項に記載のペリクル枠体と、
前記ペリクル枠体の開口部を覆うように展張支持されたペリクル膜とを備えるペリクル。 - アルミニウム材で枠状に形成され、開口部を覆う光学的薄膜体を展張支持するペリクル枠体の製造方法であって、
Cu:0.5〜3.0%、Mg:1.5〜4.5%、Zn:4.0〜7.0%を含む前記アルミニウム材を枠体の形状に加工する工程と、
前記枠体に150℃〜350℃にて熱処理を行う工程と、
リン酸化合物、ホウ酸化合物、飽和ジカルボン酸化合物、不飽和ジカルボン酸化合物、オキシモノカルボン酸化合物、リンゴ酸、タルトロン酸、及びそれらの塩からなる群から選択される少なくとも1つの酸を含む電解液で前記枠体を陽極酸化処理し、前記枠体の表面に陽極酸化皮膜を形成する工程と、
Ni塩、Co塩、Cu塩、Sn塩、Fe塩、Pb塩、Ca塩、Zn塩、Mg塩のうちの1種または2種以上を添加した浴中で電解析出処理を行って前記陽極酸化皮膜を着色する工程と、を含むペリクル枠体の製造方法。
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JP2011018927A JP5657407B2 (ja) | 2011-01-31 | 2011-01-31 | ペリクル枠体、ペリクル及びペリクル枠体の製造方法 |
KR2020120000636U KR200482165Y1 (ko) | 2011-01-31 | 2012-01-27 | 펠리클 프레임 및 펠리클 |
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Cited By (7)
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JP2014206661A (ja) * | 2013-04-15 | 2014-10-30 | 信越化学工業株式会社 | ペリクルフレーム及びこれを用いたペリクル |
JP2016048307A (ja) * | 2014-08-27 | 2016-04-07 | 信越化学工業株式会社 | ペリクルフレーム及びペリクル |
US9581897B2 (en) | 2013-10-23 | 2017-02-28 | Nippon Light Metal Company, Ltd. | Pellicle frame and process for producing same |
US9598790B2 (en) | 2012-12-04 | 2017-03-21 | Nippon Light Metal Company, Ltd. | Pellicle frame and process for manufacturing same |
JP2018049044A (ja) * | 2016-09-20 | 2018-03-29 | 日本軽金属株式会社 | ペリクル用支持枠及びペリクル並びにその製造方法 |
WO2022030498A1 (ja) | 2020-08-05 | 2022-02-10 | 三井化学株式会社 | ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法 |
JP7488404B2 (ja) | 2018-04-03 | 2024-05-21 | 信越化学工業株式会社 | ペリクルフレーム、ペリクル、ペリクル付フォトマスク、露光方法、及び半導体デバイスの製造方法 |
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KR101427404B1 (ko) * | 2013-11-01 | 2014-08-07 | 주식회사 에프에스티 | 폴리오르가노실세스퀴옥산 코팅 층을 구비한 펠리클 프레임 및 그 제조방법 |
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JP7488404B2 (ja) | 2018-04-03 | 2024-05-21 | 信越化学工業株式会社 | ペリクルフレーム、ペリクル、ペリクル付フォトマスク、露光方法、及び半導体デバイスの製造方法 |
WO2022030498A1 (ja) | 2020-08-05 | 2022-02-10 | 三井化学株式会社 | ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法 |
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