JP5864359B2 - ペリクル用支持枠の製造方法 - Google Patents
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- 238000000034 method Methods 0.000 title claims description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000000463 material Substances 0.000 claims description 36
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 33
- 238000000151 deposition Methods 0.000 claims description 29
- 230000008021 deposition Effects 0.000 claims description 28
- 229910000838 Al alloy Inorganic materials 0.000 claims description 23
- 238000000137 annealing Methods 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 238000007743 anodising Methods 0.000 claims description 14
- 229910018571 Al—Zn—Mg Inorganic materials 0.000 claims description 13
- 150000003839 salts Chemical class 0.000 claims description 13
- 229910017706 MgZn Inorganic materials 0.000 claims description 12
- 238000007789 sealing Methods 0.000 claims description 12
- 239000007864 aqueous solution Substances 0.000 claims description 11
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- 238000002441 X-ray diffraction Methods 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052748 manganese Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 238000005137 deposition process Methods 0.000 claims 1
- 230000005684 electric field Effects 0.000 claims 1
- 239000010408 film Substances 0.000 description 26
- 229910052782 aluminium Inorganic materials 0.000 description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 229960004106 citric acid Drugs 0.000 description 9
- 150000002500 ions Chemical class 0.000 description 9
- -1 nitrate ions Chemical class 0.000 description 9
- 238000005868 electrolysis reaction Methods 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
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- 238000010828 elution Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 238000001556 precipitation Methods 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 5
- 239000010407 anodic oxide Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
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- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 4
- 239000004327 boric acid Substances 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
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- 239000011975 tartaric acid Substances 0.000 description 4
- 235000002906 tartaric acid Nutrition 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-L Oxalate Chemical compound [O-]C(=O)C([O-])=O MUBZPKHOEPUJKR-UHFFFAOYSA-L 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 238000002048 anodisation reaction Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000005496 tempering Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 102100025490 Slit homolog 1 protein Human genes 0.000 description 2
- 101710123186 Slit homolog 1 protein Proteins 0.000 description 2
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
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- 238000002474 experimental method Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N hydrochloric acid Substances Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229940078494 nickel acetate Drugs 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 230000002087 whitening effect Effects 0.000 description 2
- UGNSMKDDFAUGFT-UHFFFAOYSA-N 4,4-dimethyl-2-phenyl-5h-1,3-oxazole Chemical compound CC1(C)COC(C=2C=CC=CC=2)=N1 UGNSMKDDFAUGFT-UHFFFAOYSA-N 0.000 description 1
- 229910018569 Al—Zn—Mg—Cu Inorganic materials 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000003483 aging Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
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- 230000005611 electricity Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229940071264 lithium citrate Drugs 0.000 description 1
- WJSIUCDMWSDDCE-UHFFFAOYSA-K lithium citrate (anhydrous) Chemical compound [Li+].[Li+].[Li+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O WJSIUCDMWSDDCE-UHFFFAOYSA-K 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229940005654 nitrite ion Drugs 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000001508 potassium citrate Substances 0.000 description 1
- 229960002635 potassium citrate Drugs 0.000 description 1
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 1
- 235000011082 potassium citrates Nutrition 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
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- 150000004685 tetrahydrates Chemical class 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Description
焼鈍による黒色化の効果を確認するために、JIS H0001に示された調質記号T6で処理したJIS A7075アルミニウム合金(JIS A7075−T6)の中空押出し材を表1に示した温度と時間で熱処理したものについて、それぞれ陽極酸化処理及び電解析出処理を行って実験用の表面処理アルミ合金材を得て、L*値を測定した。
上記JIS A7075−T6の中空押出し材を切断して、支持枠外寸法149mm×122mm×高さ5.8mm、支持枠厚さ2mmとなるように切削研磨し、枠材形状に加工してアルミフレームを用意した。これを大気中で熱処理温度250℃、熱処理時間120分の焼鈍を行った。次に、平均直径約100μmのステンレスを用いて焼鈍後のアルミフレームの表面をショットブラスト処理して、クエン酸ナトリウム2水和物(Na3(C6H5O7)・2H2O)50g/L、及び水酸化ナトリウム4g/Lが溶解したアルカリ性水溶液(pH=12.9)を電解液として、浴温度5℃、電解電圧70V、及び電気量7C/cm2の条件でアルミフレームを陽極酸化処理した。純水にて洗浄した後、アルミフレームの表面に形成された陽極酸化皮膜を渦電流式膜厚計(株式会社フィッシャー・インストルメンツ社製)にて確認したところ、膜厚は3.5μmであった。
実施例1と同様に電解着色まで処理した後、水蒸気封孔にかわり、花見化学社製シーリングXを40ml/L含有する溶液に電解着色後のアルミフレームを入れ、90℃で20分間封孔処理を行ない、その後純水で水洗して実施例2に係るペリクル用支持枠を得た。実施例2のペリクル用支持枠のL*値、及び抽出結果を表4に示す。
A7075−T6材を350℃で30分熱処理した以外は実施例1と同様にして、実施例3に係るペリクル用支持枠を得た。得られたペリクル用支持枠のL*値、及び抽出結果を表4に示す。
A7075−T6材を用いて焼鈍を行わなかった以外は実施例1と同様にして、比較例1に係るペリクル用支持枠を得た。得られたペリクル用支持枠のL*値、及び抽出結果を表4に示す。
焼鈍せずに、かつ、A7075−T6材を20℃、15質量%の硫酸の電解浴を用いて20Vで10C/cm2の陽極酸化を行った以外は実施例2と同様にして、比較例2に係るペリクル用支持枠を得た。得られたペリクル用支持枠のL*値、及び抽出結果を表4に示す。
Claims (9)
- 光学的薄膜体を備えてペリクルとして使用されるペリクル用支持枠の製造方法であって、Al−Zn−Mg系アルミニウム合金のT6調質材を100〜400℃の温度で焼鈍した後、クエン酸を含んだアルカリ性水溶液を用いて陽極酸化処理し、Ni、Co、Cu、Sn、Mn及びFeからなる群から選ばれた1種又は2種以上を電解析出処理により析出させて黒色化することを特徴とするペリクル用支持枠の製造方法。
- X線回折法により測定したT6調質材におけるMgZn2の積分回折強度が40.0以上になるように焼鈍する請求項1に記載のペリクル用支持枠の製造方法。
- 電界析出処理により黒色化した後のX線回折法により測定されるMgZn2の積分回折強度が19.5以上である請求項1又は2に記載のペリクル用支持枠の製造方法。
- 焼鈍を30〜120分の時間で行う請求項1〜3のいずれかに記載のペリクル用支持枠の製造方法。
- アルカリ性水溶液がクエン酸を20〜300g/L含有し、かつ、pHが12.25〜13.5である請求項1〜4のいずれかに記載のペリクル用支持枠の製造方法。
- 電解析出処理には、Ni塩、Co塩、Cu塩、Sn塩、Mn塩及びFe塩からなる群から選ばれた1種又は2種以上を添加した電解析出浴を使用する請求項1〜5のいずれかに記載のペリクル用支持枠の製造方法。
- 陽極酸化処理に先駆けて、Al−Zn−Mg系アルミニウム合金のT6調質材の表面を粗面化処理する請求項1〜6のいずれかに記載のペリクル用支持枠の製造方法。
- Al−Zn−Mg系アルミニウム合金が、JIS規定のA7075アルミニウム合金である請求項1〜7のいずれかに記載のペリクル用支持枠の製造方法。
- 電解析出処理後に水蒸気により封孔処理を行う請求項1〜8のいずれかに記載のペリクル用支持枠の製造方法。
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KR101694665B1 (ko) | 2013-10-23 | 2017-01-09 | 니폰게이긴조쿠가부시키가이샤 | 펠리클 프레임 및 그 제조 방법 |
JP6446177B2 (ja) * | 2014-01-10 | 2018-12-26 | 旭化成株式会社 | ペリクル枠体及びペリクル |
JP6844443B2 (ja) | 2017-06-23 | 2021-03-17 | 信越化学工業株式会社 | フォトリソグラフィ用ペリクル膜、ペリクル及びフォトマスク、露光方法並びに半導体デバイス又は液晶ディスプレイの製造方法 |
JP7330245B2 (ja) * | 2018-04-03 | 2023-08-21 | 信越化学工業株式会社 | ペリクルフレーム、ペリクル、ペリクル付フォトマスク、露光方法、及び半導体デバイスの製造方法 |
JP7139133B2 (ja) | 2018-04-03 | 2022-09-20 | 信越化学工業株式会社 | ペリクルフレーム、ペリクル、及びペリクルフレームの製造方法 |
WO2020257992A1 (zh) * | 2019-06-24 | 2020-12-30 | 广东兴发铝业有限公司 | 一种7000系铝合金电子产品外观件的氧化着色方法 |
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JP5666388B2 (ja) * | 2011-05-20 | 2015-02-12 | 日本軽金属株式会社 | ペリクル用支持枠の製造方法及びペリクル用支持枠並びにペリクル |
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