JP2011525708A5 - - Google Patents

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JP2011525708A5
JP2011525708A5 JP2011515085A JP2011515085A JP2011525708A5 JP 2011525708 A5 JP2011525708 A5 JP 2011525708A5 JP 2011515085 A JP2011515085 A JP 2011515085A JP 2011515085 A JP2011515085 A JP 2011515085A JP 2011525708 A5 JP2011525708 A5 JP 2011525708A5
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layer
stack
partial
forming
laminate
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JP2011515085A
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JP2011525708A (ja
JP5520942B2 (ja
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JP2011515085A 2008-06-27 2009-06-09 オプトエレクトロニクス部品の製造方法 Active JP5520942B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102008030584.7 2008-06-27
DE102008030584A DE102008030584A1 (de) 2008-06-27 2008-06-27 Verfahren zur Herstellung eines optoelektronischen Bauelementes und optoelektronisches Bauelement
PCT/DE2009/000810 WO2009155897A1 (de) 2008-06-27 2009-06-09 Verfahren zur herstellung eines optoelektronischen bauelementes und ein optoelektronisches bauelement

Publications (3)

Publication Number Publication Date
JP2011525708A JP2011525708A (ja) 2011-09-22
JP2011525708A5 true JP2011525708A5 (enExample) 2012-07-26
JP5520942B2 JP5520942B2 (ja) 2014-06-11

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JP2011515085A Active JP5520942B2 (ja) 2008-06-27 2009-06-09 オプトエレクトロニクス部品の製造方法

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US (2) US8283191B2 (enExample)
EP (1) EP2289115B1 (enExample)
JP (1) JP5520942B2 (enExample)
KR (1) KR101629984B1 (enExample)
CN (2) CN102067343B (enExample)
DE (1) DE102008030584A1 (enExample)
TW (1) TWI390773B (enExample)
WO (1) WO2009155897A1 (enExample)

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8471288B2 (en) * 2009-09-15 2013-06-25 Toyoda Gosei Co., Ltd. Group III nitride semiconductor light-emitting device including an auxiliary electrode in contact with a back surface of an n-type layer
KR101039999B1 (ko) * 2010-02-08 2011-06-09 엘지이노텍 주식회사 반도체 발광소자 및 그 제조방법
KR100986560B1 (ko) * 2010-02-11 2010-10-07 엘지이노텍 주식회사 발광소자 및 그 제조방법
DE102010025320B4 (de) * 2010-06-28 2021-11-11 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronisches Bauelement und Verfahren zu dessen Herstellung
KR101252032B1 (ko) 2010-07-08 2013-04-10 삼성전자주식회사 반도체 발광소자 및 이의 제조방법
KR101761385B1 (ko) 2010-07-12 2017-08-04 엘지이노텍 주식회사 발광 소자
KR101692410B1 (ko) * 2010-07-26 2017-01-03 삼성전자 주식회사 발광소자 및 그 제조방법
DE102010033137A1 (de) 2010-08-03 2012-02-09 Osram Opto Semiconductors Gmbh Leuchtdiodenchip
DE102010044986A1 (de) * 2010-09-10 2012-03-15 Osram Opto Semiconductors Gmbh Leuchtdiodenchip und Verfahren zur Herstellung eines Leuchtdiodenchips
KR101114191B1 (ko) * 2010-09-17 2012-03-13 엘지이노텍 주식회사 발광소자
KR101761386B1 (ko) * 2010-10-06 2017-07-25 엘지이노텍 주식회사 발광 소자
KR101730152B1 (ko) * 2010-10-06 2017-04-25 엘지이노텍 주식회사 발광 소자
TWI532214B (zh) 2010-10-12 2016-05-01 Ｌｇ伊諾特股份有限公司 發光元件及其封裝
DE102011011140A1 (de) 2011-02-14 2012-08-16 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip und Verfahren zur Herstellung von optoelektronischen Halbleiterchips
JP5050109B2 (ja) 2011-03-14 2012-10-17 株式会社東芝 半導体発光素子
DE102011016302A1 (de) * 2011-04-07 2012-10-11 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip
TWI434405B (zh) 2011-06-07 2014-04-11 國立交通大學 具有積體電路與發光二極體之異質整合結構及其製作方法
KR101880445B1 (ko) * 2011-07-14 2018-07-24 엘지이노텍 주식회사 발광소자, 발광소자 제조방법, 발광소자 패키지, 및 라이트 유닛
CN108807626B (zh) * 2011-09-15 2020-02-21 晶元光电股份有限公司 发光元件
KR101827975B1 (ko) * 2011-10-10 2018-03-29 엘지이노텍 주식회사 발광소자
CN103050593A (zh) * 2011-10-17 2013-04-17 大连美明外延片科技有限公司 AlGaInP四元系发光二极管外延片及其生长方法
EP2597687B1 (en) * 2011-11-23 2016-02-03 Imec Method for producing a GaN LED device
KR102116152B1 (ko) * 2012-03-19 2020-05-28 루미리즈 홀딩 비.브이. 실리콘 기판 상에서 성장하는 발광 장치
JP5740350B2 (ja) * 2012-05-31 2015-06-24 株式会社東芝 半導体発光素子
WO2013182980A1 (en) * 2012-06-07 2013-12-12 Koninklijke Philips N.V. Chip scale light emitting device with metal pillars in a molding compound formed at wafer level
DE102012105176B4 (de) * 2012-06-14 2021-08-12 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronischer Halbleiterchip
TW201401552A (zh) * 2012-06-19 2014-01-01 High Power Optoelectronics Inc 發光二極體的熱應力釋放結構
US8552457B1 (en) * 2012-08-07 2013-10-08 High Power Opto. Inc. Thermal stress releasing structure of a light-emitting diode
JP5881560B2 (ja) * 2012-08-30 2016-03-09 株式会社東芝 半導体発光装置及びその製造方法
US9082692B2 (en) * 2013-01-02 2015-07-14 Micron Technology, Inc. Engineered substrate assemblies with epitaxial templates and related systems, methods, and devices
DE102013103409A1 (de) * 2013-04-05 2014-10-09 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip und optoelektronisches Modul
KR102188495B1 (ko) 2014-01-21 2020-12-08 삼성전자주식회사 반도체 발광소자의 제조 방법
JP5788046B2 (ja) * 2014-04-03 2015-09-30 株式会社東芝 半導体発光素子
EP3131129B1 (en) * 2014-04-07 2020-07-15 LG Innotek Co., Ltd. Light-emitting element
KR102163967B1 (ko) * 2014-04-16 2020-10-12 엘지이노텍 주식회사 발광소자 및 조명시스템
KR102163956B1 (ko) * 2014-04-07 2020-10-12 엘지이노텍 주식회사 발광소자 및 조명시스템
KR102153125B1 (ko) * 2014-06-11 2020-09-07 엘지이노텍 주식회사 발광소자 및 조명시스템
DE102014108373A1 (de) 2014-06-13 2015-12-17 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip
DE102015105509A1 (de) * 2015-04-10 2016-10-13 Osram Opto Semiconductors Gmbh Bauelement und Verfahren zur Herstellung eines Bauelements
DE102015111046B9 (de) * 2015-07-08 2022-09-22 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronischer Halbleiterchip
KR102432015B1 (ko) 2015-11-09 2022-08-12 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 자외선 발광소자 및 발광소자 패키지
CN105470359B (zh) * 2015-12-31 2018-05-08 天津三安光电有限公司 具有内嵌式电极结构的高功率led结构及其制备方法
DE102017103041B4 (de) 2017-02-15 2023-12-14 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Verfahren zur Herstellung einer Vielzahl von optoelektronischen Bauelementen und optoelektronisches Bauelement
US10892297B2 (en) 2017-11-27 2021-01-12 Seoul Viosys Co., Ltd. Light emitting diode (LED) stack for a display
US11527519B2 (en) 2017-11-27 2022-12-13 Seoul Viosys Co., Ltd. LED unit for display and display apparatus having the same
US12100696B2 (en) 2017-11-27 2024-09-24 Seoul Viosys Co., Ltd. Light emitting diode for display and display apparatus having the same
US10892296B2 (en) * 2017-11-27 2021-01-12 Seoul Viosys Co., Ltd. Light emitting device having commonly connected LED sub-units
US11282981B2 (en) 2017-11-27 2022-03-22 Seoul Viosys Co., Ltd. Passivation covered light emitting unit stack
US10748881B2 (en) 2017-12-05 2020-08-18 Seoul Viosys Co., Ltd. Light emitting device with LED stack for display and display apparatus having the same
US10886327B2 (en) 2017-12-14 2021-01-05 Seoul Viosys Co., Ltd. Light emitting stacked structure and display device having the same
US11552057B2 (en) 2017-12-20 2023-01-10 Seoul Viosys Co., Ltd. LED unit for display and display apparatus having the same
US11522006B2 (en) 2017-12-21 2022-12-06 Seoul Viosys Co., Ltd. Light emitting stacked structure and display device having the same
US11552061B2 (en) 2017-12-22 2023-01-10 Seoul Viosys Co., Ltd. Light emitting device with LED stack for display and display apparatus having the same
US11114499B2 (en) 2018-01-02 2021-09-07 Seoul Viosys Co., Ltd. Display device having light emitting stacked structure
US10784240B2 (en) 2018-01-03 2020-09-22 Seoul Viosys Co., Ltd. Light emitting device with LED stack for display and display apparatus having the same
DE102019106521A1 (de) * 2019-03-14 2020-09-17 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Aufwachsstruktur für ein Strahlung emittierendes Halbleiterbauelement und Strahlung emittierendes Halbleiterbauelement
US11296266B2 (en) * 2019-11-26 2022-04-05 Facebook Technologies, Llc LED array having transparent substrate with conductive layer for enhanced current spread
CN120615172A (zh) * 2022-12-30 2025-09-09 上海联影医疗科技股份有限公司 用于探测辐射线的光子计数探测器

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6121638A (en) * 1995-09-12 2000-09-19 Kabushiki Kaisha Toshiba Multi-layer structured nitride-based semiconductor devices
US5763941A (en) * 1995-10-24 1998-06-09 Tessera, Inc. Connection component with releasable leads
EP2169733B1 (de) 1997-09-29 2017-07-19 OSRAM Opto Semiconductors GmbH Halbleiterlichtquelle
US6465744B2 (en) * 1998-03-27 2002-10-15 Tessera, Inc. Graded metallic leads for connection to microelectronic elements
CN1292494C (zh) 2000-04-26 2006-12-27 奥斯兰姆奥普托半导体有限责任公司 发光半导体元件及其制造方法
DE10020464A1 (de) * 2000-04-26 2001-11-08 Osram Opto Semiconductors Gmbh Strahlungsemittierendes Halbleiterbauelement auf GaN-Basis
US20020017652A1 (en) 2000-08-08 2002-02-14 Stefan Illek Semiconductor chip for optoelectronics
DE10147886B4 (de) * 2001-09-28 2006-07-13 Osram Opto Semiconductors Gmbh Lumineszenzdiode mit vergrabenem Kontakt und Herstellungsverfahren
US6828596B2 (en) * 2002-06-13 2004-12-07 Lumileds Lighting U.S., Llc Contacting scheme for large and small area semiconductor light emitting flip chip devices
US7115896B2 (en) * 2002-12-04 2006-10-03 Emcore Corporation Semiconductor structures for gallium nitride-based devices
US7230292B2 (en) * 2003-08-05 2007-06-12 Micron Technology, Inc. Stud electrode and process for making same
US8835937B2 (en) 2004-02-20 2014-09-16 Osram Opto Semiconductors Gmbh Optoelectronic component, device comprising a plurality of optoelectronic components, and method for the production of an optoelectronic component
US20050205883A1 (en) * 2004-03-19 2005-09-22 Wierer Jonathan J Jr Photonic crystal light emitting device
DE102005016592A1 (de) 2004-04-14 2005-11-24 Osram Opto Semiconductors Gmbh Leuchtdiodenchip
WO2006035664A1 (ja) * 2004-09-27 2006-04-06 Matsushita Electric Industrial Co., Ltd. 半導体発光素子、その製造方法及びその実装方法、並びに発光装置
JP4826703B2 (ja) 2004-09-29 2011-11-30 サンケン電気株式会社 半導体素子の形成に使用するための板状基体
US20060124956A1 (en) 2004-12-13 2006-06-15 Hui Peng Quasi group III-nitride substrates and methods of mass production of the same
US7413918B2 (en) * 2005-01-11 2008-08-19 Semileds Corporation Method of making a light emitting diode
CN100372137C (zh) 2005-05-27 2008-02-27 晶能光电（江西）有限公司 具有上下电极结构的铟镓铝氮发光器件及其制造方法
US9406505B2 (en) 2006-02-23 2016-08-02 Allos Semiconductors Gmbh Nitride semiconductor component and process for its production
DE102006008929A1 (de) * 2006-02-23 2007-08-30 Azzurro Semiconductors Ag Nitridhalbleiter-Bauelement und Verfahren zu seiner Herstellung
EP1883141B1 (de) 2006-07-27 2017-05-24 OSRAM Opto Semiconductors GmbH LD oder LED mit Übergitter-Mantelschicht
DE102006046237A1 (de) * 2006-07-27 2008-01-31 Osram Opto Semiconductors Gmbh Halbleiter-Schichtstruktur mit Übergitter
DE102006043400A1 (de) * 2006-09-15 2008-03-27 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip
US7697584B2 (en) * 2006-10-02 2010-04-13 Philips Lumileds Lighting Company, Llc Light emitting device including arrayed emitters defined by a photonic crystal

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