JP2011518255A5 - - Google Patents

Download PDF

Info

Publication number
JP2011518255A5
JP2011518255A5 JP2011505129A JP2011505129A JP2011518255A5 JP 2011518255 A5 JP2011518255 A5 JP 2011518255A5 JP 2011505129 A JP2011505129 A JP 2011505129A JP 2011505129 A JP2011505129 A JP 2011505129A JP 2011518255 A5 JP2011518255 A5 JP 2011518255A5
Authority
JP
Japan
Prior art keywords
band
inches
cylindrical
deposition ring
ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011505129A
Other languages
English (en)
Japanese (ja)
Other versions
JP5916384B2 (ja
JP2011518255A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2009/040487 external-priority patent/WO2009154853A2/en
Publication of JP2011518255A publication Critical patent/JP2011518255A/ja
Publication of JP2011518255A5 publication Critical patent/JP2011518255A5/ja
Application granted granted Critical
Publication of JP5916384B2 publication Critical patent/JP5916384B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011505129A 2008-04-16 2009-04-14 ウェハ処理堆積物遮蔽構成材 Active JP5916384B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US4555608P 2008-04-16 2008-04-16
US61/045,556 2008-04-16
US4933408P 2008-04-30 2008-04-30
US61/049,334 2008-04-30
PCT/US2009/040487 WO2009154853A2 (en) 2008-04-16 2009-04-14 Wafer processing deposition shielding components

Publications (3)

Publication Number Publication Date
JP2011518255A JP2011518255A (ja) 2011-06-23
JP2011518255A5 true JP2011518255A5 (https=) 2012-06-07
JP5916384B2 JP5916384B2 (ja) 2016-05-11

Family

ID=41200217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011505129A Active JP5916384B2 (ja) 2008-04-16 2009-04-14 ウェハ処理堆積物遮蔽構成材

Country Status (6)

Country Link
US (3) US20090260982A1 (https=)
JP (1) JP5916384B2 (https=)
KR (6) KR20200067957A (https=)
CN (1) CN102007572B (https=)
TW (1) TWI502670B (https=)
WO (1) WO2009154853A2 (https=)

Families Citing this family (110)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9062379B2 (en) * 2008-04-16 2015-06-23 Applied Materials, Inc. Wafer processing deposition shielding components
US9123511B2 (en) * 2008-05-02 2015-09-01 Applied Materials, Inc. Process kit for RF physical vapor deposition
US8900471B2 (en) * 2009-02-27 2014-12-02 Applied Materials, Inc. In situ plasma clean for removal of residue from pedestal surface without breaking vacuum
US20110036709A1 (en) * 2009-08-11 2011-02-17 Applied Materials, Inc. Process kit for rf physical vapor deposition
KR200482327Y1 (ko) 2010-01-29 2017-01-11 어플라이드 머티어리얼스, 인코포레이티드 물리 기상 증착 챔버를 위한 실드, 스퍼터링 타겟의 스퍼터링 표면을 에워싸기 위한 실드, 및 프로세스 키트
US9834840B2 (en) * 2010-05-14 2017-12-05 Applied Materials, Inc. Process kit shield for improved particle reduction
WO2012024061A2 (en) * 2010-08-20 2012-02-23 Applied Materials, Inc. Extended life deposition ring
CN103140913B (zh) * 2010-10-29 2016-09-28 应用材料公司 用于物理气相沉积腔室的沉积环及静电夹盘
GB201102447D0 (en) * 2011-02-11 2011-03-30 Spp Process Technology Systems Uk Ltd Composite shielding
EP2487275B1 (en) * 2011-02-11 2016-06-15 SPTS Technologies Limited Composite shielding
US9905443B2 (en) * 2011-03-11 2018-02-27 Applied Materials, Inc. Reflective deposition rings and substrate processing chambers incorporating same
EP2748349A1 (en) * 2011-08-25 2014-07-02 Applied Materials, Inc. Corner cut mask
JP5860063B2 (ja) * 2011-12-22 2016-02-16 キヤノンアネルバ株式会社 基板処理装置
TWM431893U (en) * 2012-02-10 2012-06-21 Well Thin Technology Ltd Deposition ring
US9376752B2 (en) * 2012-04-06 2016-06-28 Applied Materials, Inc. Edge ring for a deposition chamber
US20130277203A1 (en) * 2012-04-24 2013-10-24 Applied Materials, Inc. Process kit shield and physical vapor deposition chamber having same
WO2014035957A1 (en) * 2012-08-30 2014-03-06 Applied Materials, Inc. Reflective deposition rings and substrate processing chambers incorporating same
CN103911585A (zh) * 2013-01-08 2014-07-09 旭晖应用材料股份有限公司 遮罩
KR102072044B1 (ko) * 2013-09-26 2020-01-31 주성엔지니어링(주) 기판 처리 장치
KR102449103B1 (ko) * 2014-03-12 2022-09-28 어플라이드 머티어리얼스, 인코포레이티드 반도체 챔버에서의 웨이퍼 회전
US10053777B2 (en) * 2014-03-19 2018-08-21 Applied Materials, Inc. Thermal processing chamber
US20150354054A1 (en) * 2014-06-06 2015-12-10 Applied Materials, Inc. Cooled process tool adapter for use in substrate processing chambers
US10283334B2 (en) * 2014-08-22 2019-05-07 Applied Materials, Inc. Methods and apparatus for maintaining low non-uniformity over target life
CN105624634B (zh) * 2014-11-04 2018-05-08 北京北方华创微电子装备有限公司 反应腔室及半导体加工设备
CN105779932B (zh) * 2014-12-26 2018-08-24 北京北方华创微电子装备有限公司 用于处理腔室的工艺内衬和物理气相沉积设备
US10658222B2 (en) 2015-01-16 2020-05-19 Lam Research Corporation Moveable edge coupling ring for edge process control during semiconductor wafer processing
EP3247818B1 (de) * 2015-01-19 2025-01-08 Oerlikon Surface Solutions AG, Pfäffikon Beschichtungskammer zur durchführung eines vakuum gestützten beschichtungsverfahrens, sowie beschichtungsverfahren
US10903055B2 (en) 2015-04-17 2021-01-26 Applied Materials, Inc. Edge ring for bevel polymer reduction
KR102424818B1 (ko) 2015-05-27 2022-07-25 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치 및 포커스 링
CN107636211B (zh) * 2015-05-27 2021-07-09 应用材料公司 用于高生长速率外延腔室的热屏蔽环
WO2017007729A1 (en) * 2015-07-03 2017-01-12 Applied Materials, Inc. Process kit having tall deposition ring and deposition ring clamp
US10103012B2 (en) 2015-09-11 2018-10-16 Applied Materials, Inc. One-piece process kit shield for reducing the impact of an electric field near the substrate
US9953812B2 (en) 2015-10-06 2018-04-24 Applied Materials, Inc. Integrated process kit for a substrate processing chamber
KR102695398B1 (ko) 2015-10-27 2024-08-13 어플라이드 머티어리얼스, 인코포레이티드 Pvd 스퍼터 챔버를 위한 바이어스가능 플럭스 최적화기/콜리메이터
US10431440B2 (en) * 2015-12-20 2019-10-01 Applied Materials, Inc. Methods and apparatus for processing a substrate
CN116110846A (zh) 2016-01-26 2023-05-12 应用材料公司 晶片边缘环升降解决方案
CN108369922B (zh) 2016-01-26 2023-03-21 应用材料公司 晶片边缘环升降解决方案
CN108779548B (zh) * 2016-07-06 2020-09-08 株式会社爱发科 成膜装置及压板环
US10446420B2 (en) 2016-08-19 2019-10-15 Applied Materials, Inc. Upper cone for epitaxy chamber
USD836572S1 (en) 2016-09-30 2018-12-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US20190252166A1 (en) * 2016-10-14 2019-08-15 Evatec Ag Sputtering source
US10923385B2 (en) * 2016-11-03 2021-02-16 Lam Research Corporation Carrier plate for use in plasma processing systems
KR102534091B1 (ko) * 2016-11-18 2023-05-17 어플라이드 머티어리얼스, 인코포레이티드 물리 기상 증착 챔버에서 사용하기 위한 콜리메이터
US10648071B2 (en) * 2016-11-19 2020-05-12 Applied Materials, Inc. Process kit having a floating shadow ring
US10886113B2 (en) * 2016-11-25 2021-01-05 Applied Materials, Inc. Process kit and method for processing a substrate
US9773665B1 (en) * 2016-12-06 2017-09-26 Applied Materials, Inc. Particle reduction in a physical vapor deposition chamber
US9947517B1 (en) 2016-12-16 2018-04-17 Applied Materials, Inc. Adjustable extended electrode for edge uniformity control
US10553404B2 (en) 2017-02-01 2020-02-04 Applied Materials, Inc. Adjustable extended electrode for edge uniformity control
CN108456860B (zh) * 2017-02-22 2020-12-08 北京北方华创微电子装备有限公司 一种沉积腔室和膜层沉积装置
US11043364B2 (en) * 2017-06-05 2021-06-22 Applied Materials, Inc. Process kit for multi-cathode processing chamber
CN107227448B (zh) * 2017-06-30 2023-10-13 北京北方华创微电子装备有限公司 基座以及物理气相沉积装置
KR102591660B1 (ko) 2017-07-24 2023-10-19 램 리써치 코포레이션 이동가능한 에지 링 설계들
US11075105B2 (en) 2017-09-21 2021-07-27 Applied Materials, Inc. In-situ apparatus for semiconductor process module
USD851613S1 (en) 2017-10-05 2019-06-18 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
TWI722257B (zh) * 2017-11-21 2021-03-21 美商蘭姆研究公司 底部和中間邊緣環
TWI760111B (zh) * 2017-11-21 2022-04-01 美商蘭姆研究公司 底部和中間邊緣環
WO2019103722A1 (en) 2017-11-21 2019-05-31 Lam Research Corporation Bottom and middle edge rings
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11043400B2 (en) 2017-12-21 2021-06-22 Applied Materials, Inc. Movable and removable process kit
CN111602235B (zh) * 2018-01-29 2025-03-14 应用材料公司 用于在pvd处理中减少颗粒的处理配件几何形状
USD877101S1 (en) 2018-03-09 2020-03-03 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
JP7404268B2 (ja) * 2018-04-18 2023-12-25 アプライド マテリアルズ インコーポレイテッド 自己センタリング特徴を有するツーピースシャッタディスクアセンブリ
US11201037B2 (en) 2018-05-28 2021-12-14 Applied Materials, Inc. Process kit with adjustable tuning ring for edge uniformity control
US11935773B2 (en) 2018-06-14 2024-03-19 Applied Materials, Inc. Calibration jig and calibration method
KR102067820B1 (ko) * 2018-07-24 2020-01-17 (주)선익시스템 가변형 아크억제수단이 마련된 증착장비
CN118398464A (zh) 2018-08-13 2024-07-26 朗姆研究公司 可更换和/或可折叠的用于等离子鞘调整的并入边缘环定位和定心功能的边缘环组件
CN110838429B (zh) * 2018-08-15 2022-07-22 北京北方华创微电子装备有限公司 腔体内衬、等离子体反应腔室和等离子体设备
US11289310B2 (en) 2018-11-21 2022-03-29 Applied Materials, Inc. Circuits for edge ring control in shaped DC pulsed plasma process device
US11551965B2 (en) 2018-12-07 2023-01-10 Applied Materials, Inc. Apparatus to reduce polymers deposition
US11961723B2 (en) 2018-12-17 2024-04-16 Applied Materials, Inc. Process kit having tall deposition ring for PVD chamber
WO2020126175A1 (en) * 2018-12-19 2020-06-25 Evatec Ag Vacuum system and method to deposit a compound layer
US11486038B2 (en) 2019-01-30 2022-11-01 Applied Materials, Inc. Asymmetric injection for better wafer uniformity
JP7329940B2 (ja) * 2019-03-22 2023-08-21 株式会社アルバック 成膜装置及びその製造方法。
WO2020214327A1 (en) 2019-04-19 2020-10-22 Applied Materials, Inc. Ring removal from processing chamber
US12009236B2 (en) 2019-04-22 2024-06-11 Applied Materials, Inc. Sensors and system for in-situ edge ring erosion monitor
CN110066981B (zh) * 2019-06-17 2023-11-28 浙江晶驰光电科技有限公司 正装基片定位装置及基片装载方法
CN110273134B (zh) * 2019-07-25 2024-06-21 深圳清华大学研究院 全口径薄膜沉积夹具
TWM602283U (zh) * 2019-08-05 2020-10-01 美商蘭姆研究公司 基板處理系統用之具有升降銷溝槽的邊緣環
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
TWI861210B (zh) 2019-09-09 2024-11-11 美商應用材料股份有限公司 輸送反應氣體之處理系統與方法
KR102776948B1 (ko) * 2019-11-20 2025-03-05 캐논 톡키 가부시키가이샤 성막 장치, 이를 사용한 성막 방법 및 전자 디바이스 제조 방법
CN111235535B (zh) * 2020-01-22 2021-11-16 北京北方华创微电子装备有限公司 一种溅射反应腔室的工艺组件及其溅射反应腔室
US11339466B2 (en) * 2020-03-20 2022-05-24 Applied Materials, Inc. Heated shield for physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
CN115315775A (zh) 2020-03-23 2022-11-08 朗姆研究公司 衬底处理系统中的中环腐蚀补偿
US12446141B2 (en) * 2020-05-06 2025-10-14 Asml Netherlands B.V. Contamination shield for mechanically insulating device
US11581166B2 (en) * 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
CN116349002A (zh) 2020-10-05 2023-06-27 朗姆研究公司 用于等离子体处理系统的可移动边缘环
US11670493B2 (en) * 2020-11-13 2023-06-06 Applied Materials, Inc. Isolator ring clamp and physical vapor deposition chamber incorporating same
US12100579B2 (en) * 2020-11-18 2024-09-24 Applied Materials, Inc. Deposition ring for thin substrate handling via edge clamping
US11996315B2 (en) * 2020-11-18 2024-05-28 Applied Materials, Inc. Thin substrate handling via edge clamping
USD1038049S1 (en) 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
CN114763602B (zh) * 2021-01-13 2023-09-29 台湾积体电路制造股份有限公司 晶圆处理设备与制造半导体装置的方法
USD1072774S1 (en) 2021-02-06 2025-04-29 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
CN115110042B (zh) * 2021-03-22 2024-03-01 台湾积体电路制造股份有限公司 物理气相沉积反应室及其使用方法
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11581167B2 (en) * 2021-06-18 2023-02-14 Applied Materials, Inc. Process kit having tall deposition ring and smaller diameter electrostatic chuck (ESC) for PVD chamber
US11915918B2 (en) 2021-06-29 2024-02-27 Applied Materials, Inc. Cleaning of sin with CCP plasma or RPS clean
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
CN114672780B (zh) * 2022-03-22 2023-09-19 颀中科技(苏州)有限公司 晶圆托盘及晶圆片溅渡设备
USD1053230S1 (en) 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
CN120380193A (zh) 2022-07-08 2025-07-25 东曹Smd有限公司 用于物理气相沉积溅射应用的动态真空密封系统
US20240021417A1 (en) * 2022-07-15 2024-01-18 Samsung Electronics Co., Ltd. Focus ring, substrate processing apparatus including the same, and semiconductor fabrication method using the same
US12371790B2 (en) * 2022-08-17 2025-07-29 Sky Tech Inc. Wafer carrier with adjustable alignment devices and deposition equipment using the same
CN116092910A (zh) * 2022-12-01 2023-05-09 长鑫存储技术有限公司 一种聚焦环及晶边刻蚀装置
KR102847491B1 (ko) * 2023-02-06 2025-08-20 주식회사 트리버스시스템 전자 소멸 방지 쉴드를 구비한 반도체 프로세스 챔버
USD1109856S1 (en) 2023-07-07 2026-01-20 Tosoh Smd, Inc. Dynamic vacuum seal system isolation ring for physical vapor deposition sputter applications
KR102649810B1 (ko) * 2023-08-30 2024-03-21 주식회사 코미코 증착 공정용 챔버의 코팅방법
CN121065637B (zh) * 2025-11-06 2026-02-27 陛通半导体设备(苏州)有限公司 沉积件及沉积设备

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784162B2 (ja) 1988-07-25 1995-09-13 東海興業株式会社 ウェザーストリップ、及びその成形方法
US5803977A (en) * 1992-09-30 1998-09-08 Applied Materials, Inc. Apparatus for full wafer deposition
JP3563095B2 (ja) * 1993-10-28 2004-09-08 株式会社ルネサステクノロジ 半導体装置の製造方法
US5632873A (en) 1995-05-22 1997-05-27 Stevens; Joseph J. Two piece anti-stick clamp ring
US5690795A (en) * 1995-06-05 1997-11-25 Applied Materials, Inc. Screwless shield assembly for vacuum processing chambers
JP3545123B2 (ja) * 1996-01-26 2004-07-21 アプライド マテリアルズ インコーポレイテッド ウエハ加熱器用成膜防護具
US5914018A (en) * 1996-08-23 1999-06-22 Applied Materials, Inc. Sputter target for eliminating redeposition on the target sidewall
US5942042A (en) * 1997-05-23 1999-08-24 Applied Materials, Inc. Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system
US6051122A (en) * 1997-08-21 2000-04-18 Applied Materials, Inc. Deposition shield assembly for a semiconductor wafer processing system
US6034863A (en) * 1997-11-12 2000-03-07 Applied Materials, Inc. Apparatus for retaining a workpiece in a process chamber within a semiconductor wafer processing system
WO2000026939A1 (en) * 1998-10-29 2000-05-11 Applied Materials, Inc. Apparatus for coupling power through a workpiece in a semiconductor wafer processing system
US6398929B1 (en) * 1999-10-08 2002-06-04 Applied Materials, Inc. Plasma reactor and shields generating self-ionized plasma for sputtering
JP2001140054A (ja) * 1999-11-15 2001-05-22 Nec Kagoshima Ltd 真空成膜装置のクリーニング方法及び真空成膜装置
KR100342395B1 (ko) * 2000-06-28 2002-07-02 황인길 반도체 소자 제조 장치
US6699375B1 (en) * 2000-06-29 2004-03-02 Applied Materials, Inc. Method of extending process kit consumable recycling life
US20020090464A1 (en) * 2000-11-28 2002-07-11 Mingwei Jiang Sputter chamber shield
US7041201B2 (en) 2001-11-14 2006-05-09 Applied Materials, Inc. Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith
US6899798B2 (en) * 2001-12-21 2005-05-31 Applied Materials, Inc. Reusable ceramic-comprising component which includes a scrificial surface layer
US6743340B2 (en) * 2002-02-05 2004-06-01 Applied Materials, Inc. Sputtering of aligned magnetic materials and magnetic dipole ring used therefor
US6730174B2 (en) * 2002-03-06 2004-05-04 Applied Materials, Inc. Unitary removable shield assembly
US7026009B2 (en) * 2002-03-27 2006-04-11 Applied Materials, Inc. Evaluation of chamber components having textured coatings
US7041200B2 (en) * 2002-04-19 2006-05-09 Applied Materials, Inc. Reducing particle generation during sputter deposition
US6797131B2 (en) * 2002-11-12 2004-09-28 Applied Materials, Inc. Design of hardware features to facilitate arc-spray coating applications and functions
KR20050069452A (ko) * 2003-12-31 2005-07-05 동부아남반도체 주식회사 스퍼터링 장치의 실드구조
US20060054090A1 (en) 2004-09-15 2006-03-16 Applied Materials, Inc. PECVD susceptor support construction
US7670436B2 (en) * 2004-11-03 2010-03-02 Applied Materials, Inc. Support ring assembly
KR20070045060A (ko) * 2005-10-26 2007-05-02 삼성전자주식회사 증착 링 및 이를 세정하는 방법
US9127362B2 (en) * 2005-10-31 2015-09-08 Applied Materials, Inc. Process kit and target for substrate processing chamber
JP4954542B2 (ja) 2005-12-09 2012-06-20 三菱マテリアル株式会社 掘削ロッド、掘削ビット及び掘削工具
US7520969B2 (en) 2006-03-07 2009-04-21 Applied Materials, Inc. Notched deposition ring
US7981262B2 (en) * 2007-01-29 2011-07-19 Applied Materials, Inc. Process kit for substrate processing chamber

Similar Documents

Publication Publication Date Title
JP2011518255A5 (https=)
JP2011520034A5 (https=)
JP2007321244A5 (https=)
TW201139714A (en) Adjustable process spacing, centering, and improved gas conductance
JP2006140473A5 (https=)
WO2009154853A3 (en) Wafer processing deposition shielding components
JP2010513722A5 (https=)
US5879523A (en) Ceramic coated metallic insulator particularly useful in a plasma sputter reactor
TWD121115S1 (zh) 遮護環
TWI494454B (zh) 用於射頻物理氣相沉積之製程套組
US20090050272A1 (en) Deposition ring and cover ring to extend process components life and performance for process chambers
WO2012024061A2 (en) Extended life deposition ring
JP2009529249A5 (https=)
JP2008261047A5 (https=)
KR200497559Y1 (ko) 다중-캐소드 프로세싱 챔버를 위한 프로세스 키트
WO2008133876A3 (en) Cooling shield for substrate processing chamber
WO2008079722A3 (en) Non-contact process kit
TW201107515A (en) Process kit for RF physical vapor deposition
JP2019220688A5 (https=)
JP2009517541A5 (https=)
JP2001516948A5 (https=)
US20090283037A1 (en) Edge Profiling For Process Chamber Shields
US20080264340A1 (en) Moving interleaved sputter chamber shields
US9799497B2 (en) Patterned processing kits for material processing
TWI616550B (zh) 用於物理氣相沉積之濺射系統的靶材