JP2011518255A5 - - Google Patents

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Publication number
JP2011518255A5
JP2011518255A5 JP2011505129A JP2011505129A JP2011518255A5 JP 2011518255 A5 JP2011518255 A5 JP 2011518255A5 JP 2011505129 A JP2011505129 A JP 2011505129A JP 2011505129 A JP2011505129 A JP 2011505129A JP 2011518255 A5 JP2011518255 A5 JP 2011518255A5
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band
inches
cylindrical
deposition ring
ring
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JP2011505129A
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JP2011518255A (ja
JP5916384B2 (ja
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Priority claimed from PCT/US2009/040487 external-priority patent/WO2009154853A2/en
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JP2011505129A 2008-04-16 2009-04-14 ウェハ処理堆積物遮蔽構成材 Active JP5916384B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US4555608P 2008-04-16 2008-04-16
US61/045,556 2008-04-16
US4933408P 2008-04-30 2008-04-30
US61/049,334 2008-04-30
PCT/US2009/040487 WO2009154853A2 (en) 2008-04-16 2009-04-14 Wafer processing deposition shielding components

Publications (3)

Publication Number Publication Date
JP2011518255A JP2011518255A (ja) 2011-06-23
JP2011518255A5 true JP2011518255A5 (https=) 2012-06-07
JP5916384B2 JP5916384B2 (ja) 2016-05-11

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JP2011505129A Active JP5916384B2 (ja) 2008-04-16 2009-04-14 ウェハ処理堆積物遮蔽構成材

Country Status (6)

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US (3) US20090260982A1 (https=)
JP (1) JP5916384B2 (https=)
KR (6) KR101939640B1 (https=)
CN (1) CN102007572B (https=)
TW (1) TWI502670B (https=)
WO (1) WO2009154853A2 (https=)

Families Citing this family (110)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9062379B2 (en) * 2008-04-16 2015-06-23 Applied Materials, Inc. Wafer processing deposition shielding components
CN102017077B (zh) * 2008-05-02 2012-09-19 应用材料公司 用于射频物理气相沉积的处理套组
US8900471B2 (en) 2009-02-27 2014-12-02 Applied Materials, Inc. In situ plasma clean for removal of residue from pedestal surface without breaking vacuum
JP5611350B2 (ja) * 2009-08-11 2014-10-22 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Rf物理気相堆積用のプロセスキット
KR200483057Y1 (ko) 2010-01-29 2017-03-30 어플라이드 머티어리얼스, 인코포레이티드 물리 기상 증착 챔버를 위한 실드, 스퍼터링 타겟의 스퍼터링 표면을 에워싸기 위한 실드, 및 프로세스 키트
US9834840B2 (en) * 2010-05-14 2017-12-05 Applied Materials, Inc. Process kit shield for improved particle reduction
WO2012024061A2 (en) * 2010-08-20 2012-02-23 Applied Materials, Inc. Extended life deposition ring
CN108359957A (zh) * 2010-10-29 2018-08-03 应用材料公司 用于物理气相沉积腔室的沉积环及静电夹盘
EP2487275B1 (en) * 2011-02-11 2016-06-15 SPTS Technologies Limited Composite shielding
GB201102447D0 (en) * 2011-02-11 2011-03-30 Spp Process Technology Systems Uk Ltd Composite shielding
US9905443B2 (en) * 2011-03-11 2018-02-27 Applied Materials, Inc. Reflective deposition rings and substrate processing chambers incorporating same
JP5911958B2 (ja) * 2011-08-25 2016-04-27 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated 長方形基板に層を堆積させるためのマスク構造体、装置および方法
JP5860063B2 (ja) * 2011-12-22 2016-02-16 キヤノンアネルバ株式会社 基板処理装置
TWM431893U (en) * 2012-02-10 2012-06-21 Well Thin Technology Ltd Deposition ring
US9376752B2 (en) * 2012-04-06 2016-06-28 Applied Materials, Inc. Edge ring for a deposition chamber
US20130277203A1 (en) * 2012-04-24 2013-10-24 Applied Materials, Inc. Process kit shield and physical vapor deposition chamber having same
WO2014035957A1 (en) * 2012-08-30 2014-03-06 Applied Materials, Inc. Reflective deposition rings and substrate processing chambers incorporating same
CN103911585A (zh) * 2013-01-08 2014-07-09 旭晖应用材料股份有限公司 遮罩
KR102072044B1 (ko) * 2013-09-26 2020-01-31 주성엔지니어링(주) 기판 처리 장치
WO2015138094A1 (en) * 2014-03-12 2015-09-17 Applied Materials, Inc. Wafer rotation in a semiconductor chamber
US10053777B2 (en) * 2014-03-19 2018-08-21 Applied Materials, Inc. Thermal processing chamber
US20150354054A1 (en) * 2014-06-06 2015-12-10 Applied Materials, Inc. Cooled process tool adapter for use in substrate processing chambers
US10283334B2 (en) 2014-08-22 2019-05-07 Applied Materials, Inc. Methods and apparatus for maintaining low non-uniformity over target life
CN105624634B (zh) * 2014-11-04 2018-05-08 北京北方华创微电子装备有限公司 反应腔室及半导体加工设备
CN105779932B (zh) * 2014-12-26 2018-08-24 北京北方华创微电子装备有限公司 用于处理腔室的工艺内衬和物理气相沉积设备
US10658222B2 (en) 2015-01-16 2020-05-19 Lam Research Corporation Moveable edge coupling ring for edge process control during semiconductor wafer processing
WO2016116383A1 (de) * 2015-01-19 2016-07-28 Oerlikon Surface Solutions Ag, Pfäffikon Beschichtungskammer zur durchführung eines vakuum gestützten beschichtungsverfahrens, wärmeschild, sowie beschichtungsverfahren
US10903055B2 (en) 2015-04-17 2021-01-26 Applied Materials, Inc. Edge ring for bevel polymer reduction
WO2016191448A1 (en) * 2015-05-27 2016-12-01 Applied Materials, Inc. Heat shield ring for high growth rate epi chamber
US10755902B2 (en) 2015-05-27 2020-08-25 Tokyo Electron Limited Plasma processing apparatus and focus ring
JP6976925B2 (ja) * 2015-07-03 2021-12-08 アプライド マテリアルズ インコーポレイテッドApplied Materials, Incorporated 背高の堆積リングと堆積リングクランプとを有するプロセスキット
US10103012B2 (en) * 2015-09-11 2018-10-16 Applied Materials, Inc. One-piece process kit shield for reducing the impact of an electric field near the substrate
US9953812B2 (en) 2015-10-06 2018-04-24 Applied Materials, Inc. Integrated process kit for a substrate processing chamber
SG10202003396PA (en) * 2015-10-27 2020-06-29 Applied Materials Inc Biasable flux optimizer/collimator for pvd sputter chamber
US10431440B2 (en) * 2015-12-20 2019-10-01 Applied Materials, Inc. Methods and apparatus for processing a substrate
CN108369922B (zh) 2016-01-26 2023-03-21 应用材料公司 晶片边缘环升降解决方案
JP6888007B2 (ja) 2016-01-26 2021-06-16 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated ウェハエッジリングの持ち上げに関する解決
KR102161986B1 (ko) * 2016-07-06 2020-10-06 가부시키가이샤 아루박 성막 장치, 플래턴 링
US10446420B2 (en) 2016-08-19 2019-10-15 Applied Materials, Inc. Upper cone for epitaxy chamber
USD836572S1 (en) 2016-09-30 2018-12-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
JP7270540B2 (ja) * 2016-10-14 2023-05-10 エヴァテック・アーゲー スパッタリングソース
US10923385B2 (en) * 2016-11-03 2021-02-16 Lam Research Corporation Carrier plate for use in plasma processing systems
US10697057B2 (en) * 2016-11-18 2020-06-30 Applied Materials, Inc. Collimator for use in a physical vapor deposition chamber
JP7117300B2 (ja) * 2016-11-19 2022-08-12 アプライド マテリアルズ インコーポレイテッド 浮遊シャドウリングを有するプロセスキット
US10886113B2 (en) * 2016-11-25 2021-01-05 Applied Materials, Inc. Process kit and method for processing a substrate
US9773665B1 (en) * 2016-12-06 2017-09-26 Applied Materials, Inc. Particle reduction in a physical vapor deposition chamber
US9947517B1 (en) * 2016-12-16 2018-04-17 Applied Materials, Inc. Adjustable extended electrode for edge uniformity control
US10553404B2 (en) 2017-02-01 2020-02-04 Applied Materials, Inc. Adjustable extended electrode for edge uniformity control
CN108456860B (zh) * 2017-02-22 2020-12-08 北京北方华创微电子装备有限公司 一种沉积腔室和膜层沉积装置
US11043364B2 (en) * 2017-06-05 2021-06-22 Applied Materials, Inc. Process kit for multi-cathode processing chamber
CN107227448B (zh) * 2017-06-30 2023-10-13 北京北方华创微电子装备有限公司 基座以及物理气相沉积装置
KR102258054B1 (ko) 2017-07-24 2021-05-28 램 리써치 코포레이션 이동가능한 에지 링 설계들
US11075105B2 (en) 2017-09-21 2021-07-27 Applied Materials, Inc. In-situ apparatus for semiconductor process module
USD851613S1 (en) 2017-10-05 2019-06-18 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
TWI760111B (zh) * 2017-11-21 2022-04-01 美商蘭姆研究公司 底部和中間邊緣環
TWI722257B (zh) * 2017-11-21 2021-03-21 美商蘭姆研究公司 底部和中間邊緣環
CN118380372A (zh) * 2017-11-21 2024-07-23 朗姆研究公司 底部边缘环和中部边缘环
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11043400B2 (en) 2017-12-21 2021-06-22 Applied Materials, Inc. Movable and removable process kit
CN111602235B (zh) * 2018-01-29 2025-03-14 应用材料公司 用于在pvd处理中减少颗粒的处理配件几何形状
USD877101S1 (en) 2018-03-09 2020-03-03 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
WO2019204185A1 (en) * 2018-04-18 2019-10-24 Applied Materials, Inc. Two piece shutter disk assembly with self-centering feature
US11201037B2 (en) 2018-05-28 2021-12-14 Applied Materials, Inc. Process kit with adjustable tuning ring for edge uniformity control
US11935773B2 (en) 2018-06-14 2024-03-19 Applied Materials, Inc. Calibration jig and calibration method
KR102067820B1 (ko) * 2018-07-24 2020-01-17 (주)선익시스템 가변형 아크억제수단이 마련된 증착장비
CN118398464A (zh) 2018-08-13 2024-07-26 朗姆研究公司 可更换和/或可折叠的用于等离子鞘调整的并入边缘环定位和定心功能的边缘环组件
CN110838429B (zh) * 2018-08-15 2022-07-22 北京北方华创微电子装备有限公司 腔体内衬、等离子体反应腔室和等离子体设备
US11289310B2 (en) 2018-11-21 2022-03-29 Applied Materials, Inc. Circuits for edge ring control in shaped DC pulsed plasma process device
US11551965B2 (en) 2018-12-07 2023-01-10 Applied Materials, Inc. Apparatus to reduce polymers deposition
US11961723B2 (en) 2018-12-17 2024-04-16 Applied Materials, Inc. Process kit having tall deposition ring for PVD chamber
KR102913646B1 (ko) * 2018-12-19 2026-01-16 에바텍 아크티엔게젤샤프트 화합물 층을 증착하기 위한 진공 시스템 및 방법
US11486038B2 (en) 2019-01-30 2022-11-01 Applied Materials, Inc. Asymmetric injection for better wafer uniformity
JP7329940B2 (ja) * 2019-03-22 2023-08-21 株式会社アルバック 成膜装置及びその製造方法。
WO2020214327A1 (en) 2019-04-19 2020-10-22 Applied Materials, Inc. Ring removal from processing chamber
US12009236B2 (en) 2019-04-22 2024-06-11 Applied Materials, Inc. Sensors and system for in-situ edge ring erosion monitor
CN110066981B (zh) * 2019-06-17 2023-11-28 浙江晶驰光电科技有限公司 正装基片定位装置及基片装载方法
CN110273134B (zh) * 2019-07-25 2024-06-21 深圳清华大学研究院 全口径薄膜沉积夹具
TWM602283U (zh) * 2019-08-05 2020-10-01 美商蘭姆研究公司 基板處理系統用之具有升降銷溝槽的邊緣環
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
JP7376693B2 (ja) 2019-09-09 2023-11-08 アプライド マテリアルズ インコーポレイテッド 処理システムおよび反応体ガスを供給する方法
KR102776948B1 (ko) * 2019-11-20 2025-03-05 캐논 톡키 가부시키가이샤 성막 장치, 이를 사용한 성막 방법 및 전자 디바이스 제조 방법
CN111235535B (zh) 2020-01-22 2021-11-16 北京北方华创微电子装备有限公司 一种溅射反应腔室的工艺组件及其溅射反应腔室
US11339466B2 (en) * 2020-03-20 2022-05-24 Applied Materials, Inc. Heated shield for physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
KR102905595B1 (ko) 2020-03-23 2025-12-29 램 리써치 코포레이션 기판 프로세싱 시스템들에서의 중간-링 부식 보상
WO2021223953A1 (en) * 2020-05-06 2021-11-11 Asml Netherlands B.V. Contamination shield for mechanically insulating device
US11581166B2 (en) * 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
WO2022076227A1 (en) 2020-10-05 2022-04-14 Lam Research Corporation Moveable edge rings for plasma processing systems
US11670493B2 (en) * 2020-11-13 2023-06-06 Applied Materials, Inc. Isolator ring clamp and physical vapor deposition chamber incorporating same
USD1038049S1 (en) 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
US12100579B2 (en) * 2020-11-18 2024-09-24 Applied Materials, Inc. Deposition ring for thin substrate handling via edge clamping
US11996315B2 (en) * 2020-11-18 2024-05-28 Applied Materials, Inc. Thin substrate handling via edge clamping
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
CN114763602B (zh) * 2021-01-13 2023-09-29 台湾积体电路制造股份有限公司 晶圆处理设备与制造半导体装置的方法
USD1072774S1 (en) 2021-02-06 2025-04-29 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
CN115110042B (zh) * 2021-03-22 2024-03-01 台湾积体电路制造股份有限公司 物理气相沉积反应室及其使用方法
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11581167B2 (en) * 2021-06-18 2023-02-14 Applied Materials, Inc. Process kit having tall deposition ring and smaller diameter electrostatic chuck (ESC) for PVD chamber
US11915918B2 (en) 2021-06-29 2024-02-27 Applied Materials, Inc. Cleaning of sin with CCP plasma or RPS clean
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
CN114672780B (zh) * 2022-03-22 2023-09-19 颀中科技(苏州)有限公司 晶圆托盘及晶圆片溅渡设备
USD1053230S1 (en) 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
US20250327170A1 (en) 2022-07-08 2025-10-23 Tosoh Smd, Inc. Dynamic vacuum seal system for physical vapor deposition sputter applications
US20240021417A1 (en) * 2022-07-15 2024-01-18 Samsung Electronics Co., Ltd. Focus ring, substrate processing apparatus including the same, and semiconductor fabrication method using the same
US12371790B2 (en) * 2022-08-17 2025-07-29 Sky Tech Inc. Wafer carrier with adjustable alignment devices and deposition equipment using the same
CN116092910A (zh) * 2022-12-01 2023-05-09 长鑫存储技术有限公司 一种聚焦环及晶边刻蚀装置
KR102847491B1 (ko) * 2023-02-06 2025-08-20 주식회사 트리버스시스템 전자 소멸 방지 쉴드를 구비한 반도체 프로세스 챔버
USD1109856S1 (en) 2023-07-07 2026-01-20 Tosoh Smd, Inc. Dynamic vacuum seal system isolation ring for physical vapor deposition sputter applications
KR102649810B1 (ko) * 2023-08-30 2024-03-21 주식회사 코미코 증착 공정용 챔버의 코팅방법
CN121065637B (zh) * 2025-11-06 2026-02-27 陛通半导体设备(苏州)有限公司 沉积件及沉积设备

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784162B2 (ja) 1988-07-25 1995-09-13 東海興業株式会社 ウェザーストリップ、及びその成形方法
US5803977A (en) * 1992-09-30 1998-09-08 Applied Materials, Inc. Apparatus for full wafer deposition
JP3563095B2 (ja) * 1993-10-28 2004-09-08 株式会社ルネサステクノロジ 半導体装置の製造方法
US5632873A (en) * 1995-05-22 1997-05-27 Stevens; Joseph J. Two piece anti-stick clamp ring
US5690795A (en) * 1995-06-05 1997-11-25 Applied Materials, Inc. Screwless shield assembly for vacuum processing chambers
JP3545123B2 (ja) * 1996-01-26 2004-07-21 アプライド マテリアルズ インコーポレイテッド ウエハ加熱器用成膜防護具
US5914018A (en) * 1996-08-23 1999-06-22 Applied Materials, Inc. Sputter target for eliminating redeposition on the target sidewall
US5942042A (en) * 1997-05-23 1999-08-24 Applied Materials, Inc. Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system
US6051122A (en) * 1997-08-21 2000-04-18 Applied Materials, Inc. Deposition shield assembly for a semiconductor wafer processing system
US6034863A (en) * 1997-11-12 2000-03-07 Applied Materials, Inc. Apparatus for retaining a workpiece in a process chamber within a semiconductor wafer processing system
WO2000026939A1 (en) * 1998-10-29 2000-05-11 Applied Materials, Inc. Apparatus for coupling power through a workpiece in a semiconductor wafer processing system
US6398929B1 (en) * 1999-10-08 2002-06-04 Applied Materials, Inc. Plasma reactor and shields generating self-ionized plasma for sputtering
JP2001140054A (ja) 1999-11-15 2001-05-22 Nec Kagoshima Ltd 真空成膜装置のクリーニング方法及び真空成膜装置
KR100342395B1 (ko) * 2000-06-28 2002-07-02 황인길 반도체 소자 제조 장치
US6699375B1 (en) * 2000-06-29 2004-03-02 Applied Materials, Inc. Method of extending process kit consumable recycling life
US20020090464A1 (en) * 2000-11-28 2002-07-11 Mingwei Jiang Sputter chamber shield
US7041201B2 (en) * 2001-11-14 2006-05-09 Applied Materials, Inc. Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith
US6899798B2 (en) * 2001-12-21 2005-05-31 Applied Materials, Inc. Reusable ceramic-comprising component which includes a scrificial surface layer
US6743340B2 (en) * 2002-02-05 2004-06-01 Applied Materials, Inc. Sputtering of aligned magnetic materials and magnetic dipole ring used therefor
US6730174B2 (en) * 2002-03-06 2004-05-04 Applied Materials, Inc. Unitary removable shield assembly
US7026009B2 (en) * 2002-03-27 2006-04-11 Applied Materials, Inc. Evaluation of chamber components having textured coatings
US7041200B2 (en) * 2002-04-19 2006-05-09 Applied Materials, Inc. Reducing particle generation during sputter deposition
US6797131B2 (en) * 2002-11-12 2004-09-28 Applied Materials, Inc. Design of hardware features to facilitate arc-spray coating applications and functions
KR20050069452A (ko) * 2003-12-31 2005-07-05 동부아남반도체 주식회사 스퍼터링 장치의 실드구조
US20060054090A1 (en) 2004-09-15 2006-03-16 Applied Materials, Inc. PECVD susceptor support construction
US7670436B2 (en) * 2004-11-03 2010-03-02 Applied Materials, Inc. Support ring assembly
KR20070045060A (ko) * 2005-10-26 2007-05-02 삼성전자주식회사 증착 링 및 이를 세정하는 방법
US9127362B2 (en) * 2005-10-31 2015-09-08 Applied Materials, Inc. Process kit and target for substrate processing chamber
JP4954542B2 (ja) * 2005-12-09 2012-06-20 三菱マテリアル株式会社 掘削ロッド、掘削ビット及び掘削工具
US7520969B2 (en) * 2006-03-07 2009-04-21 Applied Materials, Inc. Notched deposition ring
US7981262B2 (en) * 2007-01-29 2011-07-19 Applied Materials, Inc. Process kit for substrate processing chamber

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