JP2011512019A5 - - Google Patents

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Publication number
JP2011512019A5
JP2011512019A5 JP2010536930A JP2010536930A JP2011512019A5 JP 2011512019 A5 JP2011512019 A5 JP 2011512019A5 JP 2010536930 A JP2010536930 A JP 2010536930A JP 2010536930 A JP2010536930 A JP 2010536930A JP 2011512019 A5 JP2011512019 A5 JP 2011512019A5
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JP
Japan
Prior art keywords
template
force
substrate
pressure
contact boundary
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JP2010536930A
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English (en)
Japanese (ja)
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JP5433584B2 (ja
JP2011512019A (ja
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Priority claimed from US12/327,618 external-priority patent/US8945444B2/en
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Publication of JP2011512019A5 publication Critical patent/JP2011512019A5/ja
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JP2010536930A 2007-12-04 2008-12-04 接触線運動トラッキング制御に基づく高スループット・インプリント Active JP5433584B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US529707P 2007-12-04 2007-12-04
US61/005,297 2007-12-04
US12/327,618 2008-12-03
US12/327,618 US8945444B2 (en) 2007-12-04 2008-12-03 High throughput imprint based on contact line motion tracking control
PCT/US2008/013362 WO2009073200A1 (en) 2007-12-04 2008-12-04 High throughput imprint based on contact line motion tracking control

Publications (3)

Publication Number Publication Date
JP2011512019A JP2011512019A (ja) 2011-04-14
JP2011512019A5 true JP2011512019A5 (enExample) 2013-12-12
JP5433584B2 JP5433584B2 (ja) 2014-03-05

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JP2010536930A Active JP5433584B2 (ja) 2007-12-04 2008-12-04 接触線運動トラッキング制御に基づく高スループット・インプリント

Country Status (7)

Country Link
US (2) US8945444B2 (enExample)
EP (1) EP2227720B1 (enExample)
JP (1) JP5433584B2 (enExample)
KR (1) KR101519017B1 (enExample)
CN (1) CN101884019B (enExample)
TW (1) TWI391257B (enExample)
WO (1) WO2009073200A1 (enExample)

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JP6801349B2 (ja) * 2016-10-04 2020-12-16 大日本印刷株式会社 パターン構造体の製造方法およびインプリント用モールドの製造方法
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JP7233174B2 (ja) 2018-05-17 2023-03-06 キヤノン株式会社 インプリント装置、物品製造方法、平坦化層形成装置、情報処理装置、及び、決定方法
JP7305430B2 (ja) * 2018-06-29 2023-07-10 キヤノン株式会社 情報処理装置、プログラム、リソグラフィ装置、リソグラフィシステム、および物品の製造方法
JP7134055B2 (ja) * 2018-10-09 2022-09-09 キヤノン株式会社 成形装置、および物品の製造方法
US11243466B2 (en) 2019-01-31 2022-02-08 Canon Kabushiki Kaisha Template with mass velocity variation features, nanoimprint lithography apparatus that uses the template, and methods that use the template
US11442359B2 (en) 2019-03-11 2022-09-13 Canon Kabushiki Kaisha Method of separating a template from a shaped film on a substrate
US11759994B2 (en) 2019-07-24 2023-09-19 Canon Kabushiki Kaisha Imprint apparatus, imprint method, and article manufacturing method
US11480871B2 (en) 2020-03-30 2022-10-25 Canon Kabushiki Kaisha Apparatus and method for improving accuracy of imprint force application in imprint lithography
US11590687B2 (en) 2020-06-30 2023-02-28 Canon Kabushiki Kaisha Systems and methods for reducing pressure while shaping a film
JP7507641B2 (ja) * 2020-09-08 2024-06-28 キヤノン株式会社 成形装置及び物品の製造方法
US11587795B2 (en) 2020-09-28 2023-02-21 Canon Kabushiki Kaisha Planarization apparatus including superstrate chuck with bendable periphery
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