JP2011505589A5 - - Google Patents

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Publication number
JP2011505589A5
JP2011505589A5 JP2010534945A JP2010534945A JP2011505589A5 JP 2011505589 A5 JP2011505589 A5 JP 2011505589A5 JP 2010534945 A JP2010534945 A JP 2010534945A JP 2010534945 A JP2010534945 A JP 2010534945A JP 2011505589 A5 JP2011505589 A5 JP 2011505589A5
Authority
JP
Japan
Prior art keywords
layer
deposition
transparent support
color
color mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010534945A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011505589A (ja
Filing date
Publication date
Priority claimed from US11/986,169 external-priority patent/US8129098B2/en
Application filed filed Critical
Publication of JP2011505589A publication Critical patent/JP2011505589A/ja
Publication of JP2011505589A5 publication Critical patent/JP2011505589A5/ja
Pending legal-status Critical Current

Links

JP2010534945A 2007-11-20 2008-11-12 選択的領域堆積と組み合わせて着色マスクを使用する方法 Pending JP2011505589A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/986,169 US8129098B2 (en) 2007-11-20 2007-11-20 Colored mask combined with selective area deposition
PCT/US2008/012762 WO2009067162A1 (en) 2007-11-20 2008-11-12 Process using colored mask combined with selective area deposition

Publications (2)

Publication Number Publication Date
JP2011505589A JP2011505589A (ja) 2011-02-24
JP2011505589A5 true JP2011505589A5 (enExample) 2013-01-24

Family

ID=40447758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010534945A Pending JP2011505589A (ja) 2007-11-20 2008-11-12 選択的領域堆積と組み合わせて着色マスクを使用する方法

Country Status (5)

Country Link
US (1) US8129098B2 (enExample)
EP (1) EP2217969A1 (enExample)
JP (1) JP2011505589A (enExample)
CN (1) CN101868761A (enExample)
WO (1) WO2009067162A1 (enExample)

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US8221964B2 (en) * 2007-11-20 2012-07-17 Eastman Kodak Company Integrated color mask
DE102008054219A1 (de) * 2008-10-31 2010-05-06 Osram Opto Semiconductors Gmbh Organisches strahlungsemittierendes Bauelement und Verfahren zur Herstellung eines organischen strahlungsemittierenden Bauelements
KR101044279B1 (ko) * 2009-07-30 2011-06-28 서강대학교산학협력단 Ｃｍｐ 연마패드와 그의 제조방법
TWI449007B (zh) 2011-09-16 2014-08-11 E Ink Holdings Inc 可撓性顯示裝置的製造方法
US8791023B2 (en) * 2012-08-31 2014-07-29 Eastman Kodak Company Patterned thin film dielectric layer formation
US8927434B2 (en) * 2012-08-31 2015-01-06 Eastman Kodak Company Patterned thin film dielectric stack formation
CN105511227B (zh) * 2015-12-26 2019-08-02 杭州福斯特应用材料股份有限公司 一种具有良好孔掩蔽功能的干膜抗蚀剂及其层压体
CN106298070B (zh) * 2016-08-29 2017-09-15 上海交通大学 一种图形化导电薄膜的制备方法
CN108020991A (zh) * 2016-10-31 2018-05-11 无锡中微掩模电子有限公司 集成电路用掩模版背曝方法
CN108063089B (zh) * 2016-11-08 2020-07-17 中国科学院微电子研究所 一种mos器件原子层沉积原位制备方法
TWI877104B (zh) * 2018-01-22 2025-03-21 德商馬克專利公司 介電材料、其形成方法及其用途
WO2020008969A1 (ja) * 2018-07-05 2020-01-09 東レ株式会社 樹脂組成物、遮光膜、遮光膜の製造方法および隔壁付き基板
WO2024194942A1 (ja) * 2023-03-17 2024-09-26 株式会社レゾナック 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及び配線基板の製造方法
WO2024194943A1 (ja) * 2023-03-17 2024-09-26 株式会社レゾナック 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及び配線基板の製造方法

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DE2658400A1 (de) * 1976-12-23 1978-06-29 Ibm Deutschland Verfahren zur herstellung einer negativen maske auf einem substrat
US4345011A (en) * 1978-01-30 1982-08-17 Eastman Kodak Company Color imaging devices and color filter arrays using photo-bleachable dyes
US4247799A (en) * 1978-01-30 1981-01-27 Eastman Kodak Company Color imaging devices and color filter arrays using photo-bleachable dyes
FR2595155B1 (fr) 1986-02-28 1988-04-29 Commissariat Energie Atomique Procede de realisation de filtres colores en bandes et d'electrodes en bandes auto-alignes pour une cellule d'affichage polychrome a film liquide et cellule correspondante
JPH07120806B2 (ja) * 1988-03-16 1995-12-20 松下電器産業株式会社 薄膜電界効果トランジスターの製造方法
US5262893A (en) * 1991-11-04 1993-11-16 Massachusetts Institute Of Technology Method and apparatus for creating multiple phase level optical elements
US5391507A (en) * 1993-09-03 1995-02-21 General Electric Company Lift-off fabrication method for self-aligned thin film transistors
US6338988B1 (en) * 1999-09-30 2002-01-15 International Business Machines Corporation Method for fabricating self-aligned thin-film transistors to define a drain and source in a single photolithographic step
GB9927287D0 (en) * 1999-11-19 2000-01-12 Koninkl Philips Electronics Nv Top gate thin film transistor and method of producing the same
TW459214B (en) * 2000-03-10 2001-10-11 Citizen Watch Co Ltd A color liquid crystal display apparatus and a method for manufacturing a color filter
JP4916620B2 (ja) * 2000-05-12 2012-04-18 株式会社半導体エネルギー研究所 液晶表示装置及び電気光学装置
JP3507771B2 (ja) * 2000-07-03 2004-03-15 鹿児島日本電気株式会社 パターン形成方法及び薄膜トランジスタの製造方法
US6803160B2 (en) * 2001-12-13 2004-10-12 Dupont Photomasks, Inc. Multi-tone photomask and method for manufacturing the same
US7390597B2 (en) * 2002-06-13 2008-06-24 Dai Nippon Printing Co., Ltd. Method for manufacturing color filter
JP4236080B2 (ja) * 2002-06-13 2009-03-11 大日本印刷株式会社 カラーフィルタの製造方法
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US7259106B2 (en) * 2004-09-10 2007-08-21 Versatilis Llc Method of making a microelectronic and/or optoelectronic circuitry sheet
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US20060267136A1 (en) * 2005-05-24 2006-11-30 International Business Machines Corporation Integrated circuit (ic) with on-chip programmable fuses
JP5230597B2 (ja) * 2006-03-29 2013-07-10 プラスティック ロジック リミテッド 自己整合電極を有する電子デバイス
US20070269750A1 (en) * 2006-05-19 2007-11-22 Eastman Kodak Company Colored masking for forming transparent structures
US8500985B2 (en) * 2006-07-21 2013-08-06 Novellus Systems, Inc. Photoresist-free metal deposition
US8153352B2 (en) * 2007-11-20 2012-04-10 Eastman Kodak Company Multicolored mask process for making display circuitry
US8221964B2 (en) * 2007-11-20 2012-07-17 Eastman Kodak Company Integrated color mask

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