JP2008299178A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2008299178A5 JP2008299178A5 JP2007146714A JP2007146714A JP2008299178A5 JP 2008299178 A5 JP2008299178 A5 JP 2008299178A5 JP 2007146714 A JP2007146714 A JP 2007146714A JP 2007146714 A JP2007146714 A JP 2007146714A JP 2008299178 A5 JP2008299178 A5 JP 2008299178A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- polarizing element
- substrate
- metal
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002184 metal Substances 0.000 claims 21
- 229910052751 metal Inorganic materials 0.000 claims 21
- 239000000758 substrate Substances 0.000 claims 10
- 150000002739 metals Chemical class 0.000 claims 9
- 238000005530 etching Methods 0.000 claims 7
- 239000010410 layer Substances 0.000 claims 7
- 239000004973 liquid crystal related substance Substances 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 5
- 239000011247 coating layer Substances 0.000 claims 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 2
- 239000010931 gold Substances 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000001312 dry etching Methods 0.000 claims 1
- 229910010272 inorganic material Inorganic materials 0.000 claims 1
- 239000011147 inorganic material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007146714A JP5045249B2 (ja) | 2007-06-01 | 2007-06-01 | 偏光素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007146714A JP5045249B2 (ja) | 2007-06-01 | 2007-06-01 | 偏光素子の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008299178A JP2008299178A (ja) | 2008-12-11 |
| JP2008299178A5 true JP2008299178A5 (enExample) | 2010-07-01 |
| JP5045249B2 JP5045249B2 (ja) | 2012-10-10 |
Family
ID=40172732
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007146714A Active JP5045249B2 (ja) | 2007-06-01 | 2007-06-01 | 偏光素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5045249B2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010210706A (ja) * | 2009-03-06 | 2010-09-24 | Seiko Epson Corp | 偏光素子 |
| JP5552888B2 (ja) | 2009-10-30 | 2014-07-16 | セイコーエプソン株式会社 | 偏光素子、偏光素子の製造方法、液晶装置および電子機器 |
| JP5929881B2 (ja) * | 2013-12-11 | 2016-06-08 | ウシオ電機株式会社 | グリッド偏光素子 |
| JP5929886B2 (ja) * | 2013-12-24 | 2016-06-08 | ウシオ電機株式会社 | グリッド偏光素子 |
| KR101729683B1 (ko) * | 2015-09-16 | 2017-04-25 | 한국기계연구원 | 선격자 편광자의 제조 방법 |
| KR102126110B1 (ko) | 2016-01-27 | 2020-06-24 | 주식회사 엘지화학 | 필름 마스크, 이의 제조방법, 이를 이용한 패턴 형성 방법 및 이를 이용하여 형성된 패턴 |
| WO2017131498A1 (ko) | 2016-01-27 | 2017-08-03 | 주식회사 엘지화학 | 필름 마스크, 이의 제조방법, 이를 이용한 패턴 형성 방법 및 이를 이용하여 형성된 패턴 |
| WO2017131497A1 (ko) | 2016-01-27 | 2017-08-03 | 주식회사 엘지화학 | 필름 마스크, 이의 제조방법 및 이를 이용한 패턴 형성 방법 |
| CN110023799A (zh) * | 2016-12-06 | 2019-07-16 | Ｓｃｉｖａｘ株式会社 | 光学部件及使用该光学部件的液晶面板及它们的制造方法 |
| JP6410906B1 (ja) | 2017-09-26 | 2018-10-24 | デクセリアルズ株式会社 | 偏光素子及び光学機器 |
| CN115295574B (zh) * | 2022-08-31 | 2024-09-27 | 厦门天马微电子有限公司 | 发光面板和显示装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05289027A (ja) * | 1991-06-14 | 1993-11-05 | Tdk Corp | 偏光子、偏光子付光学素子及びそれらの製造方法 |
| TWI266899B (en) * | 2002-02-12 | 2006-11-21 | Unaxis Balzers Ltd | Component comprising submicron hollow spaces |
| JP2007010712A (ja) * | 2005-06-28 | 2007-01-18 | Seiko Epson Corp | 光学素子の製造方法、投射型表示装置 |
| JP4497041B2 (ja) * | 2005-07-08 | 2010-07-07 | セイコーエプソン株式会社 | ワイヤーグリッド偏光子の製造方法 |
| JP2007033558A (ja) * | 2005-07-22 | 2007-02-08 | Nippon Zeon Co Ltd | グリッド偏光子及びその製法 |
-
2007
- 2007-06-01 JP JP2007146714A patent/JP5045249B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2008299178A5 (enExample) | ||
| JP2010506400A5 (enExample) | ||
| JP2010507261A5 (enExample) | ||
| JP2008181112A5 (enExample) | ||
| JP2008304522A5 (enExample) | ||
| JP2002324666A5 (enExample) | ||
| JP2014503996A5 (enExample) | ||
| JP2009228135A5 (enExample) | ||
| TW200717083A (en) | Liquid crystal display and its manufacturing method | |
| CN107074635B (zh) | 带膜的玻璃板、触摸传感器、膜、以及带膜的玻璃板的制造方法 | |
| TWI456271B (zh) | 線柵偏光板及其製造方法 | |
| JP2014505369A5 (enExample) | ||
| CN105572780A (zh) | 线栅偏振器件及其制作方法、显示装置 | |
| CN105161514A (zh) | 一种有机电致发光显示面板、其制备方法及显示装置 | |
| CN105431797B (zh) | 多级掩模电路制造及多层电路 | |
| CN108287383B (zh) | 一种金属线栅偏振片、其制作方法、显示面板及显示装置 | |
| JP2009186813A5 (enExample) | ||
| CN103064248A (zh) | 薄膜图案的制作方法及基板结构 | |
| JP2008546197A5 (enExample) | ||
| JP2010157494A5 (enExample) | ||
| CN105502281A (zh) | 一种金属图形化方法 | |
| KR101880078B1 (ko) | 플라즈모닉 메타표면 제작방법 | |
| JP2010145609A5 (enExample) | ||
| TWI651698B (zh) | 可撓性顯示器及其製造方法 | |
| US20160161653A1 (en) | Wire grid polarizer and method of fabricating the same |