JP2010157494A5 - - Google Patents

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Publication number
JP2010157494A5
JP2010157494A5 JP2009266210A JP2009266210A JP2010157494A5 JP 2010157494 A5 JP2010157494 A5 JP 2010157494A5 JP 2009266210 A JP2009266210 A JP 2009266210A JP 2009266210 A JP2009266210 A JP 2009266210A JP 2010157494 A5 JP2010157494 A5 JP 2010157494A5
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JP
Japan
Prior art keywords
elastic substrate
metal layer
forming
organic material
substrate
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JP2009266210A
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English (en)
Japanese (ja)
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JP5292263B2 (ja
JP2010157494A (ja
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Priority to JP2009266210A priority Critical patent/JP5292263B2/ja
Priority claimed from JP2009266210A external-priority patent/JP5292263B2/ja
Publication of JP2010157494A publication Critical patent/JP2010157494A/ja
Publication of JP2010157494A5 publication Critical patent/JP2010157494A5/ja
Application granted granted Critical
Publication of JP5292263B2 publication Critical patent/JP5292263B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009266210A 2008-12-05 2009-11-24 成膜方法及び発光素子の作製方法 Expired - Fee Related JP5292263B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009266210A JP5292263B2 (ja) 2008-12-05 2009-11-24 成膜方法及び発光素子の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008310491 2008-12-05
JP2008310491 2008-12-05
JP2009266210A JP5292263B2 (ja) 2008-12-05 2009-11-24 成膜方法及び発光素子の作製方法

Publications (3)

Publication Number Publication Date
JP2010157494A JP2010157494A (ja) 2010-07-15
JP2010157494A5 true JP2010157494A5 (enExample) 2012-10-11
JP5292263B2 JP5292263B2 (ja) 2013-09-18

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Family Applications (1)

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JP2009266210A Expired - Fee Related JP5292263B2 (ja) 2008-12-05 2009-11-24 成膜方法及び発光素子の作製方法

Country Status (2)

Country Link
US (1) US8383193B2 (enExample)
JP (1) JP5292263B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7994021B2 (en) * 2006-07-28 2011-08-09 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
JP2010153813A (ja) 2008-11-18 2010-07-08 Semiconductor Energy Lab Co Ltd 発光装置及びその作製方法、並びに、携帯電話機
US8576209B2 (en) 2009-07-07 2013-11-05 Semiconductor Energy Laboratory Co., Ltd. Display device
JP6642999B2 (ja) * 2015-08-06 2020-02-12 株式会社ブイ・テクノロジー 有機ｅｌ素子の製造方法
WO2017160288A1 (en) * 2016-03-16 2017-09-21 Ncc Nano, Llc Method for depositing a functional material on a substrate
US11387384B2 (en) * 2019-04-16 2022-07-12 Samsung Electronics Co., Ltd. LED transferring method and display module manufactured by the same

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US5998085A (en) * 1996-07-23 1999-12-07 3M Innovative Properties Process for preparing high resolution emissive arrays and corresponding articles
KR100195175B1 (ko) 1996-12-23 1999-06-15 손욱 유기전자발광소자 유기박막용 도너필름, 이를 이용한 유기전자발광소자의 제조방법 및 그 방법에 따라 제조된 유기전자발광소자
US6562442B2 (en) * 1998-08-20 2003-05-13 Fijicopian Co., Ltd. Metallic thermal transfer recording medium
WO2000041893A1 (en) * 1999-01-15 2000-07-20 3M Innovative Properties Company Thermal transfer element and process for forming organic electroluminescent devices
JP2002272460A (ja) 2001-03-16 2002-09-24 Lead Medic Kk 衝撃波発生方法および装置、粒子加速方法、粒子加速器、薬剤導入装置ならびに遺伝子導入方法および装置
US6695029B2 (en) 2001-12-12 2004-02-24 Eastman Kodak Company Apparatus for permitting transfer of organic material from a donor to form a layer in an OLED device
US6688365B2 (en) 2001-12-19 2004-02-10 Eastman Kodak Company Method for transferring of organic material from a donor to form a layer in an OLED device
US6703179B2 (en) 2002-03-13 2004-03-09 Eastman Kodak Company Transfer of organic material from a donor to form a layer in an OLED device
JP2004103406A (ja) 2002-09-10 2004-04-02 Sony Corp 薄膜パターン形成方法および装置並びに有機ｅｌ表示装置の製造方法
KR100552964B1 (ko) * 2003-08-28 2006-02-15 삼성에스디아이 주식회사 평판표시소자용 도너필름 및 그를 이용한유기전계발광소자의 제조방법
US6929048B2 (en) 2003-09-05 2005-08-16 Eastman Kodak Company Laser transfer of organic material from a donor to form a layer in an OLED device
KR100611756B1 (ko) 2004-06-18 2006-08-10 삼성에스디아이 주식회사 유기 전계 발광 소자 및 그의 제조 방법
TWI337582B (en) * 2004-10-20 2011-02-21 Du Pont In-line donor element for thermal transfer
KR100700831B1 (ko) 2005-11-16 2007-03-28 삼성에스디아이 주식회사 레이저 열 전사법 및 이를 이용한 유기 발광소자의제조방법
US8080811B2 (en) 2007-12-28 2011-12-20 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing evaporation donor substrate and light-emitting device
WO2009099002A1 (en) 2008-02-04 2009-08-13 Semiconductor Energy Laboratory Co., Ltd. Deposition method and method for manufacturing light-emitting device
JP2009231277A (ja) 2008-02-29 2009-10-08 Semiconductor Energy Lab Co Ltd 製造装置
WO2009107548A1 (en) 2008-02-29 2009-09-03 Semiconductor Energy Laboratory Co., Ltd. Deposition method and manufacturing method of light-emitting device
JP5416987B2 (ja) 2008-02-29 2014-02-12 株式会社半導体エネルギー研究所 成膜方法及び発光装置の作製方法
JP5238544B2 (ja) 2008-03-07 2013-07-17 株式会社半導体エネルギー研究所 成膜方法及び発光装置の作製方法
JP5079722B2 (ja) 2008-03-07 2012-11-21 株式会社半導体エネルギー研究所 発光装置の作製方法
US8182863B2 (en) 2008-03-17 2012-05-22 Semiconductor Energy Laboratory Co., Ltd. Deposition method and manufacturing method of light-emitting device
US7932112B2 (en) 2008-04-14 2011-04-26 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing light-emitting device
JP5538642B2 (ja) 2008-04-15 2014-07-02 株式会社半導体エネルギー研究所 成膜方法および発光素子の作製方法
US8409672B2 (en) 2008-04-24 2013-04-02 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing evaporation donor substrate and method of manufacturing light-emitting device
JP5159689B2 (ja) 2008-04-25 2013-03-06 株式会社半導体エネルギー研究所 発光装置の作製方法
JP2010040380A (ja) * 2008-08-06 2010-02-18 Hitachi Displays Ltd 有機ｅｌパネルの製造方法

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