JP2011238714A5 - - Google Patents
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- Publication number
- JP2011238714A5 JP2011238714A5 JP2010107764A JP2010107764A JP2011238714A5 JP 2011238714 A5 JP2011238714 A5 JP 2011238714A5 JP 2010107764 A JP2010107764 A JP 2010107764A JP 2010107764 A JP2010107764 A JP 2010107764A JP 2011238714 A5 JP2011238714 A5 JP 2011238714A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- precursor composition
- functional
- manufacturing
- functional device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002243 precursor Substances 0.000 claims 19
- 238000004519 manufacturing process Methods 0.000 claims 16
- 239000002184 metal Substances 0.000 claims 10
- 229910052751 metal Inorganic materials 0.000 claims 10
- 239000011343 solid material Substances 0.000 claims 10
- 238000010438 heat treatment Methods 0.000 claims 6
- 239000010409 thin film Substances 0.000 claims 6
- 239000011344 liquid material Substances 0.000 claims 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- 238000004049 embossing Methods 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- -1 organic acid salt Chemical class 0.000 claims 3
- 150000004703 alkoxides Chemical class 0.000 claims 2
- 239000000919 ceramic Substances 0.000 claims 2
- 239000004020 conductor Substances 0.000 claims 2
- 239000010419 fine particle Substances 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 2
- 150000002484 inorganic compounds Chemical class 0.000 claims 2
- 229910010272 inorganic material Inorganic materials 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 229910001507 metal halide Inorganic materials 0.000 claims 2
- 150000005309 metal halides Chemical class 0.000 claims 2
- 229910052987 metal hydride Inorganic materials 0.000 claims 2
- 150000004681 metal hydrides Chemical class 0.000 claims 2
- 239000002082 metal nanoparticle Substances 0.000 claims 2
- 229910044991 metal oxide Inorganic materials 0.000 claims 2
- 150000004706 metal oxides Chemical class 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 239000011224 oxide ceramic Substances 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 229910017053 inorganic salt Inorganic materials 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010107764A JP5198506B2 (ja) | 2010-05-07 | 2010-05-07 | 機能性デバイスの製造方法並びに薄膜トランジスタ及び圧電式インクジェットヘッド |
| PCT/JP2011/060581 WO2011138958A1 (ja) | 2010-05-07 | 2011-05-06 | 機能性デバイスの製造方法、強誘電体材料層の製造方法、電界効果トランジスタの製造方法、並びに薄膜トランジスタ、電界効果トランジスタ、及び圧電式インクジェットヘッド |
| KR1020127031785A KR101442943B1 (ko) | 2010-05-07 | 2011-05-06 | 기능성 디바이스의 제조방법, 강유전체 재료층의 제조방법, 전계 효과 트렌지스터의 제조방법, 및 박막 트랜지스터, 전계 효과 트렌지스터, 및 전압식 잉크젯 헤드 |
| TW100116093A TWI514585B (zh) | 2010-05-07 | 2011-05-06 | A manufacturing method of a functional element, a thin film transistor, and a piezoelectric ink jet head |
| US13/696,551 US9202895B2 (en) | 2010-05-07 | 2011-05-06 | Process for production of functional device, process for production of ferroelectric material layer, process for production of field effect transistor, thin film transistor, field effect transistor, and piezoelectric inkjet head |
| CN201180021920.6A CN102870245B (zh) | 2010-05-07 | 2011-05-06 | 功能设备的制造方法、场效应晶体管和薄膜晶体管 |
| US14/531,723 US9123752B2 (en) | 2010-05-07 | 2014-11-03 | Process for production of functional device, process for production of ferroelectric material layer, process for production of field effect transistor, thin film transistor, field effect transistor, and piezoelectric ink jet head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010107764A JP5198506B2 (ja) | 2010-05-07 | 2010-05-07 | 機能性デバイスの製造方法並びに薄膜トランジスタ及び圧電式インクジェットヘッド |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012280468A Division JP5615894B2 (ja) | 2012-12-25 | 2012-12-25 | 薄膜トランジスタの製造方法、アクチュエーターの製造方法及び光学デバイスの製造方法、並びに薄膜トランジスタ及び圧電式インクジェットヘッド |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011238714A JP2011238714A (ja) | 2011-11-24 |
| JP2011238714A5 true JP2011238714A5 (enrdf_load_stackoverflow) | 2012-10-11 |
| JP5198506B2 JP5198506B2 (ja) | 2013-05-15 |
Family
ID=45326385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010107764A Expired - Fee Related JP5198506B2 (ja) | 2010-05-07 | 2010-05-07 | 機能性デバイスの製造方法並びに薄膜トランジスタ及び圧電式インクジェットヘッド |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5198506B2 (enrdf_load_stackoverflow) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5901942B2 (ja) | 2011-11-09 | 2016-04-13 | 国立研究開発法人科学技術振興機構 | 機能性デバイスの製造方法及び機能性デバイスの製造装置 |
| JP6286636B2 (ja) * | 2012-07-19 | 2018-03-07 | 俊 保坂 | センサ・デバイスおよびその製造方法 |
| JP2014175453A (ja) * | 2013-03-08 | 2014-09-22 | Japan Science & Technology Agency | 酸化物層及び酸化物層の製造方法、並びにその酸化物層を備えるキャパシタ、半導体装置、及び微小電気機械システム |
| JP6247684B2 (ja) * | 2013-03-22 | 2017-12-13 | 国立研究開発法人科学技術振興機構 | 誘電体層及び誘電体層の製造方法、並びに固体電子装置及び固体電子装置の製造方法 |
| KR101511932B1 (ko) | 2013-11-12 | 2015-04-13 | 한국과학기술원 | 반도체 제조용 액상 조성물, 상기를 이용한 반도체 박막 및 박막 트랜지스터의 제조방법 |
| JP6347084B2 (ja) | 2014-02-18 | 2018-06-27 | アドバンストマテリアルテクノロジーズ株式会社 | 強誘電体セラミックス及びその製造方法 |
| JP6584881B2 (ja) | 2015-09-11 | 2019-10-02 | 株式会社東芝 | 半導体装置 |
| JP6708597B2 (ja) * | 2017-11-03 | 2020-06-10 | 俊 保坂 | センサ・デバイスおよびその製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07156414A (ja) * | 1993-12-03 | 1995-06-20 | Canon Inc | インクジェット記録ヘッドの製造方法、インクジェット記録ヘッド、および記録装置 |
| JP3442069B2 (ja) * | 2001-05-28 | 2003-09-02 | 松下電器産業株式会社 | プラズマディスプレイパネル、その製造方法及び転写フィルム |
| JP2003151362A (ja) * | 2001-08-31 | 2003-05-23 | Toppan Printing Co Ltd | 導電膜および導電膜の製造方法 |
| JP2006166385A (ja) * | 2004-11-10 | 2006-06-22 | Nakayo Telecommun Inc | 通話録音機能付きゲートウェイ装置 |
| JP4767616B2 (ja) * | 2005-07-29 | 2011-09-07 | 富士フイルム株式会社 | 半導体デバイスの製造方法及び半導体デバイス |
| US7989361B2 (en) * | 2006-09-30 | 2011-08-02 | Samsung Electronics Co., Ltd. | Composition for dielectric thin film, metal oxide dielectric thin film using the same and preparation method thereof |
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2010
- 2010-05-07 JP JP2010107764A patent/JP5198506B2/ja not_active Expired - Fee Related