JP2011198892A - 基板洗浄処理装置 - Google Patents
基板洗浄処理装置 Download PDFInfo
- Publication number
- JP2011198892A JP2011198892A JP2010062152A JP2010062152A JP2011198892A JP 2011198892 A JP2011198892 A JP 2011198892A JP 2010062152 A JP2010062152 A JP 2010062152A JP 2010062152 A JP2010062152 A JP 2010062152A JP 2011198892 A JP2011198892 A JP 2011198892A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- water
- nozzle
- cleaning
- washing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010062152A JP2011198892A (ja) | 2010-03-18 | 2010-03-18 | 基板洗浄処理装置 |
CN201010522628XA CN102194657B (zh) | 2010-03-18 | 2010-10-26 | 基板清洗处理装置 |
KR1020100110982A KR101073340B1 (ko) | 2010-03-18 | 2010-11-09 | 기판 세정 처리 장치 |
TW100100088A TWI428969B (zh) | 2010-03-18 | 2011-01-03 | Substrate cleaning treatment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010062152A JP2011198892A (ja) | 2010-03-18 | 2010-03-18 | 基板洗浄処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2011198892A true JP2011198892A (ja) | 2011-10-06 |
Family
ID=44602521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010062152A Pending JP2011198892A (ja) | 2010-03-18 | 2010-03-18 | 基板洗浄処理装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2011198892A (zh) |
KR (1) | KR101073340B1 (zh) |
CN (1) | CN102194657B (zh) |
TW (1) | TWI428969B (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103177986A (zh) * | 2011-12-22 | 2013-06-26 | 大日本网屏制造株式会社 | 涂布装置 |
WO2018216612A1 (ja) * | 2017-05-26 | 2018-11-29 | シャープ株式会社 | 基板処理装置 |
JP2019013897A (ja) * | 2017-07-10 | 2019-01-31 | パナソニックIpマネジメント株式会社 | 洗浄方法及び洗浄装置 |
CN109786290A (zh) * | 2017-11-14 | 2019-05-21 | 东京毅力科创株式会社 | 基板处理装置的清洗装置和清洗方法 |
CN111463152A (zh) * | 2020-04-17 | 2020-07-28 | 重庆芯洁科技有限公司 | 半导体衬底的高压水洗设备及其使用方法 |
CN112992731A (zh) * | 2021-02-05 | 2021-06-18 | 昆山基侑电子科技有限公司 | 一种晶圆往复循环清洗设备 |
JP7451781B2 (ja) | 2022-03-18 | 2024-03-18 | 芝浦メカトロニクス株式会社 | 基板処理装置 |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103065994B (zh) * | 2011-10-19 | 2015-01-21 | 中芯国际集成电路制造(上海)有限公司 | 清洗硅片的装置及使用该装置清洗硅片的方法 |
DE102011118441B8 (de) * | 2011-11-12 | 2018-10-04 | RENA Technologies GmbH | Anlage und Verfahren zur Behandlung von flachen Substraten |
JP2015023138A (ja) * | 2013-07-18 | 2015-02-02 | 株式会社ディスコ | スピンナ洗浄装置 |
KR102250366B1 (ko) * | 2014-05-28 | 2021-05-12 | 세메스 주식회사 | 기판 처리 장치 및 방법 |
KR102239520B1 (ko) * | 2014-05-30 | 2021-04-14 | 세메스 주식회사 | 기판 처리 장치 및 방법 |
CN104588351A (zh) * | 2014-12-02 | 2015-05-06 | 深圳市华星光电技术有限公司 | 基板清洗装置和使用其清洗基板的方法 |
KR20160125585A (ko) * | 2015-04-21 | 2016-11-01 | 삼성전자주식회사 | 기판 처리 장치 및 기판 처리 방법 |
CN105618414A (zh) * | 2016-03-15 | 2016-06-01 | 李赵和 | 一种半导体硅片清洗机双头清洗枪 |
JP2018065109A (ja) * | 2016-10-20 | 2018-04-26 | 東京応化工業株式会社 | 洗浄装置および洗浄方法 |
CN108620239A (zh) * | 2017-03-24 | 2018-10-09 | 北京淘氪科技有限公司 | 喷嘴及应用其的自清洗免维护静电净化系统 |
CN107224879A (zh) * | 2017-06-30 | 2017-10-03 | 河南新投环保科技股份有限公司 | 一种平板膜擦洗装置 |
CN107552522A (zh) * | 2017-09-05 | 2018-01-09 | 深圳市华星光电技术有限公司 | 一种湿法剥离机的水洗装置及水洗方法 |
CN108325900B (zh) * | 2017-09-19 | 2021-02-02 | 福建晟哲自动化科技有限公司 | 一种液晶面板清洗设备 |
CN107755346B (zh) * | 2017-10-31 | 2024-02-27 | 上海格尔恒精材料科技有限公司 | 一种高效的工件表面清洗系统及其清洗方法 |
CN108526097A (zh) * | 2018-04-28 | 2018-09-14 | 武汉华星光电技术有限公司 | 基板清洗设备 |
CN110052449B (zh) * | 2019-05-24 | 2024-07-05 | 深圳市山木电子设备有限公司 | 一种吸嘴清洗机 |
TWI811885B (zh) * | 2021-12-10 | 2023-08-11 | 力晶積成電子製造股份有限公司 | 清洗裝置與清洗方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3552187B2 (ja) * | 1997-04-07 | 2004-08-11 | 大日本スクリーン製造株式会社 | 基板処理装置及び方法 |
JP3695917B2 (ja) * | 1997-11-27 | 2005-09-14 | 大日本スクリーン製造株式会社 | 基板処理装置 |
-
2010
- 2010-03-18 JP JP2010062152A patent/JP2011198892A/ja active Pending
- 2010-10-26 CN CN201010522628XA patent/CN102194657B/zh not_active Expired - Fee Related
- 2010-11-09 KR KR1020100110982A patent/KR101073340B1/ko not_active IP Right Cessation
-
2011
- 2011-01-03 TW TW100100088A patent/TWI428969B/zh not_active IP Right Cessation
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103177986A (zh) * | 2011-12-22 | 2013-06-26 | 大日本网屏制造株式会社 | 涂布装置 |
WO2018216612A1 (ja) * | 2017-05-26 | 2018-11-29 | シャープ株式会社 | 基板処理装置 |
JP2019013897A (ja) * | 2017-07-10 | 2019-01-31 | パナソニックIpマネジメント株式会社 | 洗浄方法及び洗浄装置 |
CN109786290A (zh) * | 2017-11-14 | 2019-05-21 | 东京毅力科创株式会社 | 基板处理装置的清洗装置和清洗方法 |
CN109786290B (zh) * | 2017-11-14 | 2024-03-12 | 东京毅力科创株式会社 | 基板处理装置的清洗装置和清洗方法 |
CN111463152A (zh) * | 2020-04-17 | 2020-07-28 | 重庆芯洁科技有限公司 | 半导体衬底的高压水洗设备及其使用方法 |
CN111463152B (zh) * | 2020-04-17 | 2023-03-14 | 重庆芯洁科技有限公司 | 半导体衬底的高压水洗设备及其使用方法 |
CN112992731A (zh) * | 2021-02-05 | 2021-06-18 | 昆山基侑电子科技有限公司 | 一种晶圆往复循环清洗设备 |
JP7451781B2 (ja) | 2022-03-18 | 2024-03-18 | 芝浦メカトロニクス株式会社 | 基板処理装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20110105327A (ko) | 2011-09-26 |
CN102194657A (zh) | 2011-09-21 |
TW201135819A (en) | 2011-10-16 |
CN102194657B (zh) | 2013-06-05 |
TWI428969B (zh) | 2014-03-01 |
KR101073340B1 (ko) | 2011-10-14 |
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