JP2011100111A - 光学物品、光学物品の製造方法、電子機器 - Google Patents

光学物品、光学物品の製造方法、電子機器 Download PDF

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Publication number
JP2011100111A
JP2011100111A JP2010211690A JP2010211690A JP2011100111A JP 2011100111 A JP2011100111 A JP 2011100111A JP 2010211690 A JP2010211690 A JP 2010211690A JP 2010211690 A JP2010211690 A JP 2010211690A JP 2011100111 A JP2011100111 A JP 2011100111A
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Prior art keywords
layer
density
low
oxide layer
optical article
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JP2010211690A
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English (en)
Japanese (ja)
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JP2011100111A5 (enExample
Inventor
Hiroyoshi Furusato
大喜 古里
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Seiko Epson Corp
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Seiko Epson Corp
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Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2010211690A priority Critical patent/JP2011100111A/ja
Priority to US12/900,174 priority patent/US9134462B2/en
Priority to CN2010105032706A priority patent/CN102043173B/zh
Publication of JP2011100111A publication Critical patent/JP2011100111A/ja
Publication of JP2011100111A5 publication Critical patent/JP2011100111A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G02B1/116—Multilayers including electrically conducting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Filters (AREA)
  • Laminated Bodies (AREA)
JP2010211690A 2009-10-09 2010-09-22 光学物品、光学物品の製造方法、電子機器 Pending JP2011100111A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2010211690A JP2011100111A (ja) 2009-10-09 2010-09-22 光学物品、光学物品の製造方法、電子機器
US12/900,174 US9134462B2 (en) 2009-10-09 2010-10-07 Optical component having a low-density silicon oxide layer as the outermost layer of an inorganic thin-film, method of manufacturing optical component and electronic apparatus
CN2010105032706A CN102043173B (zh) 2009-10-09 2010-10-09 光学物品、光学物品的制造方法以及电子设备

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009234903 2009-10-09
JP2009234904 2009-10-09
JP2009234905 2009-10-09
JP2010211690A JP2011100111A (ja) 2009-10-09 2010-09-22 光学物品、光学物品の製造方法、電子機器

Related Child Applications (1)

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JP2011284463A Division JP2012118536A (ja) 2009-10-09 2011-12-26 光学物品、光学物品の製造方法、電子機器

Publications (2)

Publication Number Publication Date
JP2011100111A true JP2011100111A (ja) 2011-05-19
JP2011100111A5 JP2011100111A5 (enExample) 2011-07-21

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JP2010211690A Pending JP2011100111A (ja) 2009-10-09 2010-09-22 光学物品、光学物品の製造方法、電子機器

Country Status (3)

Country Link
US (1) US9134462B2 (enExample)
JP (1) JP2011100111A (enExample)
CN (1) CN102043173B (enExample)

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JP2014065281A (ja) * 2012-09-27 2014-04-17 Keio Gijuku 積層体とその製造方法
WO2014192670A1 (ja) * 2013-05-31 2014-12-04 旭硝子株式会社 光学フィルタ、光学フィルタの製造方法
JP2016061792A (ja) * 2014-09-12 2016-04-25 東海光学株式会社 光学製品及びレンズ用フィルタ
JP2017129791A (ja) * 2016-01-21 2017-07-27 株式会社日本触媒 光選択透過フィルターおよびその製造方法
JP2018194569A (ja) * 2017-05-12 2018-12-06 Hoya株式会社 防塵レンズ及びその製造方法

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FR2949776B1 (fr) 2009-09-10 2013-05-17 Saint Gobain Performance Plast Element en couches pour l'encapsulation d'un element sensible
FR2949775B1 (fr) * 2009-09-10 2013-08-09 Saint Gobain Performance Plast Substrat de protection pour dispositif collecteur ou emetteur de rayonnement
FR2973939A1 (fr) 2011-04-08 2012-10-12 Saint Gobain Element en couches pour l’encapsulation d’un element sensible
FR2973946B1 (fr) * 2011-04-08 2013-03-22 Saint Gobain Dispositif électronique a couches
US8791023B2 (en) * 2012-08-31 2014-07-29 Eastman Kodak Company Patterned thin film dielectric layer formation
US20140065838A1 (en) * 2012-08-31 2014-03-06 Carolyn R. Ellinger Thin film dielectric layer formation
US8927434B2 (en) * 2012-08-31 2015-01-06 Eastman Kodak Company Patterned thin film dielectric stack formation
US9611999B2 (en) * 2014-07-21 2017-04-04 GE Lighting Solutions, LLC Reflecting apparatus including enhanced aluminum optical coatings
MX2018000936A (es) * 2015-09-03 2018-06-07 Halliburton Energy Services Inc Herramienta de analisis de fluido de formacion que comprende un elemento informatico integrado y un filtro optico.
US10816703B2 (en) * 2015-09-28 2020-10-27 Tru Vue, Inc. Near infrared reflective coatings
AU2017254469B2 (en) 2016-04-19 2021-04-01 Apogee Enterprises, Inc. Coated glass surfaces and method for coating a glass substrate
KR101806698B1 (ko) * 2016-05-30 2017-12-07 현대자동차주식회사 적외선 광학 필터
CN108375893A (zh) * 2017-01-30 2018-08-07 精工爱普生株式会社 钟表用部件以及钟表
CN108375892B (zh) * 2017-01-30 2022-02-01 精工爱普生株式会社 钟表用部件以及钟表
CN108375894A (zh) * 2017-01-30 2018-08-07 精工爱普生株式会社 钟表用部件以及钟表
US10513459B2 (en) 2017-05-04 2019-12-24 Apogee Enterprises, Inc. Low emissivity coatings, glass surfaces including the same, and methods for making the same
US11231533B2 (en) * 2018-07-12 2022-01-25 Visera Technologies Company Limited Optical element having dielectric layers formed by ion-assisted deposition and method for fabricating the same
KR102582465B1 (ko) 2018-09-19 2023-09-25 삼성디스플레이 주식회사 표시 장치
JP2020083700A (ja) * 2018-11-26 2020-06-04 コニカミノルタ株式会社 光学部材及び光学部材の製造方法
CN109799557A (zh) * 2019-02-28 2019-05-24 南京前海有芯信息技术有限公司 一种能反射紫外光的薄膜

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JP2001074931A (ja) * 1999-08-31 2001-03-23 Nikon Corp 光学薄膜及び光学素子及び光学装置
JP2003227938A (ja) * 2001-11-28 2003-08-15 Sumitomo Chem Co Ltd 偏光変換素子及びそれを用いた反射型液晶プロジェクタ
JP2005276306A (ja) * 2004-03-24 2005-10-06 Hitachi Maxell Ltd 偏光ビームスプリッタ及びその製造方法並びに光ピックアップ装置
JP2006065038A (ja) * 2004-08-27 2006-03-09 Hoya Corp 光学部材及びその製造方法
JP2007043063A (ja) * 2005-06-28 2007-02-15 Kyocera Corp 固体撮像素子収納用パッケージおよび固体撮像素子搭載用基板ならびに固体撮像装置
JP2007093804A (ja) * 2005-09-27 2007-04-12 Epson Toyocom Corp 紫外線／赤外線カットフィルタ、及びその製造方法
JP2007264388A (ja) * 2006-03-29 2007-10-11 Nikon Corp 多層膜光学素子の製造方法
JP2009093067A (ja) * 2007-10-11 2009-04-30 Seiko Epson Corp 酸化ジルコニウム層、耐擦傷性物品および光学物品
JP2009139925A (ja) * 2007-11-16 2009-06-25 Epson Toyocom Corp 光学多層膜フィルタ、光学多層膜フィルタの製造方法および電子機器装置

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JP4207083B2 (ja) 2006-04-04 2009-01-14 セイコーエプソン株式会社 光学多層膜フィルタ、光学多層膜フィルタの製造方法および電子機器装置
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JP2001074931A (ja) * 1999-08-31 2001-03-23 Nikon Corp 光学薄膜及び光学素子及び光学装置
JP2003227938A (ja) * 2001-11-28 2003-08-15 Sumitomo Chem Co Ltd 偏光変換素子及びそれを用いた反射型液晶プロジェクタ
JP2005276306A (ja) * 2004-03-24 2005-10-06 Hitachi Maxell Ltd 偏光ビームスプリッタ及びその製造方法並びに光ピックアップ装置
JP2006065038A (ja) * 2004-08-27 2006-03-09 Hoya Corp 光学部材及びその製造方法
JP2007043063A (ja) * 2005-06-28 2007-02-15 Kyocera Corp 固体撮像素子収納用パッケージおよび固体撮像素子搭載用基板ならびに固体撮像装置
JP2007093804A (ja) * 2005-09-27 2007-04-12 Epson Toyocom Corp 紫外線／赤外線カットフィルタ、及びその製造方法
JP2007264388A (ja) * 2006-03-29 2007-10-11 Nikon Corp 多層膜光学素子の製造方法
JP2009093067A (ja) * 2007-10-11 2009-04-30 Seiko Epson Corp 酸化ジルコニウム層、耐擦傷性物品および光学物品
JP2009139925A (ja) * 2007-11-16 2009-06-25 Epson Toyocom Corp 光学多層膜フィルタ、光学多層膜フィルタの製造方法および電子機器装置

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014065281A (ja) * 2012-09-27 2014-04-17 Keio Gijuku 積層体とその製造方法
WO2014192670A1 (ja) * 2013-05-31 2014-12-04 旭硝子株式会社 光学フィルタ、光学フィルタの製造方法
JPWO2014192670A1 (ja) * 2013-05-31 2017-02-23 旭硝子株式会社 光学フィルタ、光学フィルタの製造方法
US10241245B2 (en) 2013-05-31 2019-03-26 AGC Inc. Optical filter and method for manufacturing optical filter
JP2016061792A (ja) * 2014-09-12 2016-04-25 東海光学株式会社 光学製品及びレンズ用フィルタ
JP2017129791A (ja) * 2016-01-21 2017-07-27 株式会社日本触媒 光選択透過フィルターおよびその製造方法
JP2018194569A (ja) * 2017-05-12 2018-12-06 Hoya株式会社 防塵レンズ及びその製造方法
CN110869818A (zh) * 2017-05-12 2020-03-06 Hoya株式会社 防尘透镜及其制造方法
JP7117081B2 (ja) 2017-05-12 2022-08-12 Hoya株式会社 防塵レンズ及びその製造方法
CN110869818B (zh) * 2017-05-12 2024-03-15 Hoya株式会社 防尘透镜及其制造方法

Also Published As

Publication number Publication date
US20110085233A1 (en) 2011-04-14
CN102043173A (zh) 2011-05-04
CN102043173B (zh) 2013-03-27
US9134462B2 (en) 2015-09-15

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