WO2005001526A1 - 多層膜光学素子の製造方法 - Google Patents
多層膜光学素子の製造方法 Download PDFInfo
- Publication number
- WO2005001526A1 WO2005001526A1 PCT/JP2004/008835 JP2004008835W WO2005001526A1 WO 2005001526 A1 WO2005001526 A1 WO 2005001526A1 JP 2004008835 W JP2004008835 W JP 2004008835W WO 2005001526 A1 WO2005001526 A1 WO 2005001526A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- multilayer optical
- thin film
- aluminum
- optical thin
- optical element
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 70
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000010409 thin film Substances 0.000 claims abstract description 61
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 38
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 238000004544 sputter deposition Methods 0.000 claims abstract description 8
- 230000003746 surface roughness Effects 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 150000002500 ions Chemical class 0.000 claims description 7
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 7
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 5
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 abstract description 15
- 239000010408 film Substances 0.000 abstract description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract description 6
- 238000000926 separation method Methods 0.000 abstract description 3
- 235000011121 sodium hydroxide Nutrition 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
Definitions
- the present invention relates to a method for manufacturing a multilayer optical element formed by laminating thin films made of substances having different refractive indexes.
- An optical element in which thin films made of materials having different refractive indices are stacked and given predetermined optical characteristics such as a filter by utilizing interference of light reflected at the boundary of the thin film is known as a multilayer optical element. Used for filters and the like.
- Such a multilayer optical element has a structure in which thin films of nonmetallic optical materials having different refractive indices are sequentially laminated on a substrate such as glass.
- the optical material was formed by sequentially forming a film by vacuum evaporation.
- a substrate made of glass or the like not only plays no role in determining optical characteristics but also absorbs light, and thus needs to be made as thin as possible. Therefore, conventionally, after forming a multilayer film, these substrates are polished to a thickness of about several tens of ⁇ m.
- a multilayer optical thin film having no substrate as disclosed in Japanese Patent Application Laid-Open No. 3-196001 is known.
- Such a multilayer optical thin film is manufactured as follows. For example, aluminum is deposited on a glass substrate, and a thin film of silicon oxide and a thin film of titanium oxide are alternately formed thereon by ion sputtering. When aluminum is dissolved with an aluminum etchant at the time of completion of film formation, the glass substrate and the multilayer optical thin film are separated, and a multilayer optical thin film without a glass substrate can be obtained.
- a first invention for achieving the above object is to form a thin film of a soluble carrier on a substrate, form a multilayer optical thin film on the soluble carrier,
- a method for producing a multilayer optical element comprising: dissolving a thin film of the soluble carrier to separate the substrate and the multilayer optical thin film, wherein the soluble carrier is aluminum, and the thickness thereof is 10 to It is characterized by being 90 nm.
- the present inventor further states that the separation between the substrate and the optical thin film cannot be clearly performed because if the thickness of the aluminum layer is too thin, a portion where the aluminum layer is not formed occurs, and the substrate and the multilayer thin film are formed at that location. It was found that they could be directly combined. Through repeated experiments, they found that such a problem would not occur if the thickness of the aluminum layer was 10 nm or more.
- the thickness of the aluminum layer serving as the soluble carrier is limited to the range of 10 to 90 mn.
- the thickness refers to the average value.
- a second invention for achieving the above object is the first invention, wherein the step of forming the multilayer optical thin film is an ion sputtering step.
- the effect of the first aspect of the present invention is particularly large because the temperature rise of the aluminum layer is particularly large.
- a third invention for achieving the above object is the first invention or the second invention, which comprises a niobium pentoxide thin film and a silicon oxide thin film in which the multilayer optical thin films are alternately stacked.
- a substance to be formed into a film directly on the soluble carrier Is a silicon oxide.
- a fourth invention for achieving the above object is a multilayer optical element in which layers having different refractive indices are alternately formed and a substrate is removed at the time of manufacturing, wherein opposing optical surfaces of the multilayer optical element
- the surface roughness of Ra is 3 nm or less.
- FIG. 1 is a diagram for explaining a method for producing a multilayer optical thin film in an example of the present invention.
- a glass substrate (BK 7) 1 As shown in Fig. 1, aluminum 2 is deposited on a glass substrate (BK 7) 1 by vacuum evaporation, and a multilayer optical film with a total thickness of about 30 m consisting of the structure shown in Table 1
- the thin film 3 was formed by ion sputtering. (The description of the seventh to 107th layers is omitted because the odd-numbered layer is the same as the fifth layer and the even-numbered layer is the same as the sixth layer.) ). Then, by dicing, After such a member was cut into small pieces, the aluminum 2 was etched with a NaOH solution to separate the glass substrate 1 and the multilayer optical thin film 3.
- the glass substrate 1 used was a mirror-finished one, and the surface roughness was 0.2 to 0.4 nm in Ra.
- Table 2 shows the occurrence of white turbidity in the obtained multilayer optical thin film 3 and the relationship between the aluminum optical thickness and the releasability between the multilayer optical thin film 3 and the substrate 1.
- the roughness of the multilayer optical thin film formed on an aluminum layer with a surface roughness Ra of 0.4 nm was measured.
- the surface roughness of the outermost layer on the side opposite to the aluminum layer was 3 nm.
- a film formed by a vapor deposition method has a rough surface as the total film thickness increases.
- the multilayer optical thin film according to the embodiment of the present invention achieves surface roughness equivalent to that of a conventional filter having a substrate even on a surface where the surface roughness is considered to be the highest as well as no white turbidity is visually observed. Can do it.
- the surface on the outermost layer side opposite to the aluminum layer side and the surface on the aluminum layer side are both optical surfaces through which a light beam passes.
- the ability to achieve very low roughness on the optical surface further enhances the low-loss effect required for optical communication filters.
- the surface roughness in this embodiment is Ra is a value obtained by measuring an area of 10 ⁇ ⁇ m with an atomic force microscope. The good urchin, surface roughness force of the substrate-less filter S, 1 0 0 ⁇ range of 2
- a multilayer optical thin film was formed by the same method as described above with A1 thicknesses of 10 nm and 90 nm.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005511027A JP4419958B2 (ja) | 2003-06-26 | 2004-06-17 | 多層膜光学素子の製造方法 |
US11/299,481 US20060092516A1 (en) | 2003-06-26 | 2005-12-12 | Method for producing multilayer optical device |
US11/606,517 US7544392B2 (en) | 2003-06-26 | 2006-11-30 | Method for producing multilayer optical device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003182450 | 2003-06-26 | ||
JP2003-182450 | 2003-06-26 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/299,481 Continuation US20060092516A1 (en) | 2003-06-26 | 2005-12-12 | Method for producing multilayer optical device |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005001526A1 true WO2005001526A1 (ja) | 2005-01-06 |
Family
ID=33549553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/008835 WO2005001526A1 (ja) | 2003-06-26 | 2004-06-17 | 多層膜光学素子の製造方法 |
Country Status (5)
Country | Link |
---|---|
US (2) | US20060092516A1 (ja) |
JP (1) | JP4419958B2 (ja) |
CN (1) | CN100378475C (ja) |
TW (1) | TWI237130B (ja) |
WO (1) | WO2005001526A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009288424A (ja) * | 2008-05-28 | 2009-12-10 | Nikon Corp | 多層膜光学素子の製造方法および多層膜光学素子 |
JP2014190932A (ja) * | 2013-03-28 | 2014-10-06 | K Technology Corp | 金属単結晶薄膜の製造方法、光学デバイスの製造方法及び光学デバイス |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI422542B (zh) * | 2009-07-06 | 2014-01-11 | Univ Far East | A method of making a porous glass substrate using glass powder |
JP2011100111A (ja) * | 2009-10-09 | 2011-05-19 | Seiko Epson Corp | 光学物品、光学物品の製造方法、電子機器 |
CN101915951A (zh) * | 2010-07-27 | 2010-12-15 | 平湖中天合波通信科技有限公司 | 一种无基底滤光片的制备方法 |
CN102682867B (zh) * | 2011-03-07 | 2015-04-08 | 同济大学 | 一种基于铂分离层的多层膜反射镜及其制造方法 |
WO2013077375A1 (ja) * | 2011-11-21 | 2013-05-30 | 旭硝子株式会社 | 光学多層膜付きガラス部材及び近赤外線カットフィルタガラス |
JP2016195185A (ja) | 2015-03-31 | 2016-11-17 | キヤノン株式会社 | 光学部品の製造方法、光学部品、光学装置 |
CN115074688A (zh) * | 2022-07-15 | 2022-09-20 | 中国科学院上海光学精密机械研究所 | 一种低应力自支撑金属薄膜滤片及其制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03233501A (ja) * | 1990-02-09 | 1991-10-17 | Copal Co Ltd | 光学多層膜フイルタ素子及びその製造方法 |
JPH03274506A (ja) * | 1990-03-26 | 1991-12-05 | Copal Co Ltd | 光学多層膜フイルタ素子の製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1198904A (en) * | 1967-05-19 | 1970-07-15 | Hitachi Ltd | Transmission Type Interference Filter |
US4373775A (en) * | 1980-06-23 | 1983-02-15 | International Telephone And Telegraph Corporation | Fiber dichroic coupler |
ES2077562T3 (es) * | 1987-07-22 | 1995-12-01 | Philips Electronics Nv | Filtro de interferencia optico. |
US4883561A (en) * | 1988-03-29 | 1989-11-28 | Bell Communications Research, Inc. | Lift-off and subsequent bonding of epitaxial films |
US4937134A (en) * | 1989-04-17 | 1990-06-26 | The Dow Chemical Company | Elastomeric optical interference films |
JPH03196001A (ja) | 1989-12-26 | 1991-08-27 | Nippon Shinku Kogaku Kk | 基板のない多層膜干渉フィルター及びその製造方法 |
US5241417A (en) * | 1990-02-09 | 1993-08-31 | Copal Company Limited | Multi-layered optical filter film and production method thereof |
US5044736A (en) * | 1990-11-06 | 1991-09-03 | Motorola, Inc. | Configurable optical filter or display |
JP3423147B2 (ja) | 1996-04-15 | 2003-07-07 | アルプス電気株式会社 | 光学多層膜フィルタの製造方法 |
JP3600732B2 (ja) | 1998-07-30 | 2004-12-15 | 日本電信電話株式会社 | 誘電体多層膜フィルタの製造方法 |
US6036809A (en) * | 1999-02-16 | 2000-03-14 | International Business Machines Corporation | Process for releasing a thin-film structure from a substrate |
TWI230002B (en) * | 2000-10-17 | 2005-03-21 | Nissha Printing | Antireflective molded product and its manufacture method, mold for antireflective molded product |
US6611378B1 (en) * | 2001-12-20 | 2003-08-26 | Semrock, Inc. | Thin-film interference filter with quarter-wavelength unit sub-layers arranged in a generalized pattern |
-
2004
- 2004-06-17 WO PCT/JP2004/008835 patent/WO2005001526A1/ja active Application Filing
- 2004-06-17 JP JP2005511027A patent/JP4419958B2/ja not_active Expired - Lifetime
- 2004-06-17 CN CNB2004800174972A patent/CN100378475C/zh not_active Expired - Lifetime
- 2004-06-25 TW TW093118406A patent/TWI237130B/zh active
-
2005
- 2005-12-12 US US11/299,481 patent/US20060092516A1/en not_active Abandoned
-
2006
- 2006-11-30 US US11/606,517 patent/US7544392B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03233501A (ja) * | 1990-02-09 | 1991-10-17 | Copal Co Ltd | 光学多層膜フイルタ素子及びその製造方法 |
JPH03274506A (ja) * | 1990-03-26 | 1991-12-05 | Copal Co Ltd | 光学多層膜フイルタ素子の製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009288424A (ja) * | 2008-05-28 | 2009-12-10 | Nikon Corp | 多層膜光学素子の製造方法および多層膜光学素子 |
JP2014190932A (ja) * | 2013-03-28 | 2014-10-06 | K Technology Corp | 金属単結晶薄膜の製造方法、光学デバイスの製造方法及び光学デバイス |
Also Published As
Publication number | Publication date |
---|---|
CN1809770A (zh) | 2006-07-26 |
US20070196586A1 (en) | 2007-08-23 |
TW200510780A (en) | 2005-03-16 |
CN100378475C (zh) | 2008-04-02 |
JPWO2005001526A1 (ja) | 2006-08-10 |
US7544392B2 (en) | 2009-06-09 |
JP4419958B2 (ja) | 2010-02-24 |
TWI237130B (en) | 2005-08-01 |
US20060092516A1 (en) | 2006-05-04 |
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