US20060092516A1 - Method for producing multilayer optical device - Google Patents

Method for producing multilayer optical device Download PDF

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Publication number
US20060092516A1
US20060092516A1 US11/299,481 US29948105A US2006092516A1 US 20060092516 A1 US20060092516 A1 US 20060092516A1 US 29948105 A US29948105 A US 29948105A US 2006092516 A1 US2006092516 A1 US 2006092516A1
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United States
Prior art keywords
thin film
aluminum
multilayer
film
multilayer optical
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Abandoned
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US11/299,481
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English (en)
Inventor
Kunihiko Yoshino
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Nikon Corp
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Nikon Corp
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Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Assigned to NIKON CORPORATION reassignment NIKON CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: YOSHINO, KUNIHIKO
Publication of US20060092516A1 publication Critical patent/US20060092516A1/en
Priority to US11/606,517 priority Critical patent/US7544392B2/en
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

Definitions

  • the present invention relates to a method for manufacturing a multilayer film optical element that is formed by laminating thin films consisting of substances having different refractive indices.
  • An optical element that is provided with specified optical characteristics such as filtering by laminating thin films consisting of substances with different refractive indices and utilizing interference of light reflected at the boundaries of the thin films is known as a multilayer film optical element, and is used in an interference filter or the like.
  • Such a multilayer film optical element has a structure in which thin films of nonmetal optical substances with different refractive indices are successively superimposed on a substrate consisting of glass or the like, and is ordinarily formed by successive film formation of these nonmetal optical substances on a substrate consisting of glass or the like by means of vacuum evaporation.
  • the substrate consisting of glass or the like play no role in determining the optical characteristics, but it also absorbs light, so that it is necessary that the substrate be as thin as possible. Accordingly, such substrates have conventionally been polished following the multilayer film formation to keep the thickness down to approximately several tens of microns.
  • Such a multilayer film optical thin film is manufactured as follows: For example, aluminum is deposited on a glass substrate, and silicon oxide thin films and titanium oxide thin films are alternately formed on top of this by means of ion sputtering. If the aluminum is dissolved by an aluminum etching liquid at the completion of the film formation, the glass substrate and the multilayer optical thin film are separated, so that a multilayer optical thin film having no glass substrate can be obtained.
  • the present invention was devised in light of such circumstances; it is an object of the present invention to provide a method for manufacturing a multilayer film optical element which makes it possible to prevent the clouding in the multilayer optical thin film and to cleanly separate the glass substrate and multilayer optical thin film.
  • the first invention that is used to achieve the object described above is a method for manufacturing a multilayer film optical element including steps of forming a thin film of a soluble on a substrate, forming a multilayer optical thin film on top of this soluble, and subsequently dissolving the thin film of the soluble so that the substrate and the multilayer optical thin film are separated, wherein the soluble is aluminum, and the thickness of this soluble is set at 10 to 90 nm.
  • the present inventor also found that the reason that the separation of the substrate and optical thin film cannot be accomplished cleanly is that if the thickness of the aluminum layer is excessively small, portions where no aluminum layer is formed are generated, and that there are cases in which the substrate and multilayer thin film are directly bonded in these portions. After much experimentation, it was discovered that as long as the thickness of the aluminum layer is 10 nm or more, such a problem does not occur.
  • the thickness of the aluminum layer serving as a soluble is limited to a range of 10 to 90 nm.
  • the thickness refers to an average value.
  • the second invention that is used to achieve the object described above is the first invention, wherein the step of forming the multilayer optical thin film is an ion sputtering step.
  • the temperature elevation of the aluminum layer is especially great, so that the effect of the first invention is particularly large.
  • the third invention that is used to achieve the object described above is the first invention or second invention, wherein the multilayer optical thin film consists of alternately laminated niobium pentoxide thin films and silicon oxide thin films, and the substance in the film formed directly above the soluble is silicon oxide.
  • the fourth invention that is used to achieve the object described above is a multilayer film optical element in which layers having different refractive indices are alternately formed, and the substrate is removed during manufacture, wherein the surface roughness of the optical surfaces of the multilayer film optical element is 3 nm or less in terms of Ra.
  • a filter without a substrate which is such that Ra is 3 nm or less can be acquired for the first time, so that a filter that has extremely low loss with respect to transmitted light can be provided.
  • FIG. 1 is a diagram that is used to illustrate a method for manufacturing a multilayer optical thin film in an embodiment of the present invention.
  • a film of aluminum 2 was formed on a glass substrate (BK 7 ) 1 by means of vacuum evaporation, and a multilayer optical thin film 3 consisting of a structure shown in Table 1 and having a total film thickness of approximately 30 ⁇ m was formed by an ion sputtering method on this aluminum film 2 (the description of the 7th layer to the 107th layer is omitted since the odd-number layers are the same as the fifth layer and the even-number layers are the same as the sixth layer). Afterwards, such a member was cut into small pieces by means of dicing, and the aluminum 2 was then etched by an NaOH solution, so that the glass substrate 1 and the multilayer optical thin film 3 were separated.
  • Table 2 shows the relationship between the occurrence of clouding in the multilayer optical thin film 3 obtained, the peeling characteristics of the multilayer optical thin film 3 and substrate 1 , and the thickness of the aluminum. TABLE 2 Al thickness Clouding Peeling characteristics 5 nm Absent Impossible 10 nm Absent Good 90 nm Absent Good 100 nm Present Good
  • the aluminum thickness is 10 to 90 nm, no clouding occurs in the multilayer optical thin film, and the separation characteristics of the multilayer optical thin film and substrate are good.
  • the surface roughness on the aluminum side of the multilayer optical thin film was 0.4 nm in terms of Ra when the aluminum thickness was 90 nm, and was 1 nm in terms of Ra when the aluminum thickness was 100 nm.
  • the etching time was 40 hours when the aluminum thickness was 10 nm, but when the aluminum thickness was 5 nm, complete peeling was not possible.
  • the roughness of the multilayer optical thin film formed on the aluminum layer with a surface roughness Ra of 0.4 nm was measured. As a result of this measurement, it was found that the surface roughness of the frontmost layer on the side opposite from the side of the aluminum layer was 3 nm. In general, in the film formed by a vacuum evaporation method, the surface roughness of the film increases as the total film thickness increases.
  • the multilayer optical thin film in the embodiment of the present invention not only is clouding not confirmed by visual observation, but a surface roughness comparable to that of a conventional filter having a substrate can also be achieved even on the surface whose roughness is thought to be the highest.
  • both the surface on the side of the aluminum layer and the surface of the frontmost layer on the side opposite from the side of the aluminum layer become optical surfaces through which light beams pass.
  • the surface roughness Ra in this embodiment is obtained by measuring a 10 ⁇ m ⁇ 10 ⁇ m region by means of an atomic force microscope.
  • the surface roughness of a filter with no substrate is 3 nm or less in terms of Ra within a 100 ⁇ m 2 range, a filter with no substrate having little loss with respect to the transmitted light can be obtained.
  • multilayer optical thin films were formed using a method similar to the method described above, but without forming the first layer film shown in Table 1, so that an Nb 2 O 5 thin film was formed on the aluminum, with the aluminum thickness being set at 10 nm and 90 nm, respectively.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Physical Vapour Deposition (AREA)
US11/299,481 2003-06-26 2005-12-12 Method for producing multilayer optical device Abandoned US20060092516A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US11/606,517 US7544392B2 (en) 2003-06-26 2006-11-30 Method for producing multilayer optical device

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003182450 2003-06-26
JP2003-182450 2003-06-26
PCT/JP2004/008835 WO2005001526A1 (ja) 2003-06-26 2004-06-17 多層膜光学素子の製造方法

Related Parent Applications (1)

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PCT/JP2004/008835 Continuation WO2005001526A1 (ja) 2003-06-26 2004-06-17 多層膜光学素子の製造方法

Related Child Applications (1)

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US11/606,517 Division US7544392B2 (en) 2003-06-26 2006-11-30 Method for producing multilayer optical device

Publications (1)

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US20060092516A1 true US20060092516A1 (en) 2006-05-04

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Family Applications (2)

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US11/299,481 Abandoned US20060092516A1 (en) 2003-06-26 2005-12-12 Method for producing multilayer optical device
US11/606,517 Active 2024-12-01 US7544392B2 (en) 2003-06-26 2006-11-30 Method for producing multilayer optical device

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Country Status (5)

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US (2) US20060092516A1 (ja)
JP (1) JP4419958B2 (ja)
CN (1) CN100378475C (ja)
TW (1) TWI237130B (ja)
WO (1) WO2005001526A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5098815B2 (ja) * 2008-05-28 2012-12-12 株式会社ニコン 多層膜光学素子の製造方法
TWI422542B (zh) * 2009-07-06 2014-01-11 Univ Far East A method of making a porous glass substrate using glass powder
JP2011100111A (ja) * 2009-10-09 2011-05-19 Seiko Epson Corp 光学物品、光学物品の製造方法、電子機器
CN101915951A (zh) * 2010-07-27 2010-12-15 平湖中天合波通信科技有限公司 一种无基底滤光片的制备方法
CN102682867B (zh) * 2011-03-07 2015-04-08 同济大学 一种基于铂分离层的多层膜反射镜及其制造方法
WO2013077375A1 (ja) * 2011-11-21 2013-05-30 旭硝子株式会社 光学多層膜付きガラス部材及び近赤外線カットフィルタガラス
JP2014190932A (ja) * 2013-03-28 2014-10-06 K Technology Corp 金属単結晶薄膜の製造方法、光学デバイスの製造方法及び光学デバイス
JP2016195185A (ja) 2015-03-31 2016-11-17 キヤノン株式会社 光学部品の製造方法、光学部品、光学装置
CN115074688A (zh) * 2022-07-15 2022-09-20 中国科学院上海光学精密机械研究所 一种低应力自支撑金属薄膜滤片及其制备方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3551017A (en) * 1967-05-19 1970-12-29 Hitachi Ltd Far infrared transmission type interference filter
US4373775A (en) * 1980-06-23 1983-02-15 International Telephone And Telegraph Corporation Fiber dichroic coupler
US4937134A (en) * 1989-04-17 1990-06-26 The Dow Chemical Company Elastomeric optical interference films
US4940636A (en) * 1987-07-22 1990-07-10 U.S. Philips Corporation Optical interference filter
US5044736A (en) * 1990-11-06 1991-09-03 Motorola, Inc. Configurable optical filter or display
US5241417A (en) * 1990-02-09 1993-08-31 Copal Company Limited Multi-layered optical filter film and production method thereof
US6611378B1 (en) * 2001-12-20 2003-08-26 Semrock, Inc. Thin-film interference filter with quarter-wavelength unit sub-layers arranged in a generalized pattern
US20040005436A1 (en) * 2000-10-17 2004-01-08 Nissha Printing Co., Ltd. Antireflective formed article and method for preparation thereof, and mold for an tireflective formed article

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US4883561A (en) * 1988-03-29 1989-11-28 Bell Communications Research, Inc. Lift-off and subsequent bonding of epitaxial films
JPH03196001A (ja) 1989-12-26 1991-08-27 Nippon Shinku Kogaku Kk 基板のない多層膜干渉フィルター及びその製造方法
JPH03233501A (ja) * 1990-02-09 1991-10-17 Copal Co Ltd 光学多層膜フイルタ素子及びその製造方法
JPH03274506A (ja) * 1990-03-26 1991-12-05 Copal Co Ltd 光学多層膜フイルタ素子の製造方法
JP3423147B2 (ja) 1996-04-15 2003-07-07 アルプス電気株式会社 光学多層膜フィルタの製造方法
JP3600732B2 (ja) 1998-07-30 2004-12-15 日本電信電話株式会社 誘電体多層膜フィルタの製造方法
US6036809A (en) * 1999-02-16 2000-03-14 International Business Machines Corporation Process for releasing a thin-film structure from a substrate

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3551017A (en) * 1967-05-19 1970-12-29 Hitachi Ltd Far infrared transmission type interference filter
US4373775A (en) * 1980-06-23 1983-02-15 International Telephone And Telegraph Corporation Fiber dichroic coupler
US4940636A (en) * 1987-07-22 1990-07-10 U.S. Philips Corporation Optical interference filter
US4937134A (en) * 1989-04-17 1990-06-26 The Dow Chemical Company Elastomeric optical interference films
US5241417A (en) * 1990-02-09 1993-08-31 Copal Company Limited Multi-layered optical filter film and production method thereof
US5044736A (en) * 1990-11-06 1991-09-03 Motorola, Inc. Configurable optical filter or display
US20040005436A1 (en) * 2000-10-17 2004-01-08 Nissha Printing Co., Ltd. Antireflective formed article and method for preparation thereof, and mold for an tireflective formed article
US6611378B1 (en) * 2001-12-20 2003-08-26 Semrock, Inc. Thin-film interference filter with quarter-wavelength unit sub-layers arranged in a generalized pattern

Also Published As

Publication number Publication date
CN1809770A (zh) 2006-07-26
US20070196586A1 (en) 2007-08-23
TW200510780A (en) 2005-03-16
CN100378475C (zh) 2008-04-02
WO2005001526A1 (ja) 2005-01-06
JPWO2005001526A1 (ja) 2006-08-10
US7544392B2 (en) 2009-06-09
JP4419958B2 (ja) 2010-02-24
TWI237130B (en) 2005-08-01

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AS Assignment

Owner name: NIKON CORPORATION, JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:YOSHINO, KUNIHIKO;REEL/FRAME:017310/0883

Effective date: 20051128

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION