JP2011082512A5 - - Google Patents
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- Publication number
- JP2011082512A5 JP2011082512A5 JP2010213450A JP2010213450A JP2011082512A5 JP 2011082512 A5 JP2011082512 A5 JP 2011082512A5 JP 2010213450 A JP2010213450 A JP 2010213450A JP 2010213450 A JP2010213450 A JP 2010213450A JP 2011082512 A5 JP2011082512 A5 JP 2011082512A5
- Authority
- JP
- Japan
- Prior art keywords
- methacrylic acid
- acidic polymer
- moiety
- transfer agent
- chain transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/586,642 US20110073800A1 (en) | 2009-09-25 | 2009-09-25 | Abrasive-free chemical mechanical polishing compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011082512A JP2011082512A (ja) | 2011-04-21 |
| JP2011082512A5 true JP2011082512A5 (enExample) | 2013-08-22 |
Family
ID=43779265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010213450A Pending JP2011082512A (ja) | 2009-09-25 | 2010-09-24 | 砥粒無含有化学機械研磨組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20110073800A1 (enExample) |
| JP (1) | JP2011082512A (enExample) |
| KR (1) | KR20110033786A (enExample) |
| CN (1) | CN102031065B (enExample) |
| TW (1) | TW201127924A (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013137192A1 (ja) * | 2012-03-16 | 2013-09-19 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
| DE112013004295B4 (de) * | 2012-08-31 | 2024-12-05 | Fujimi Incorporated | Polierzusammensetzung, deren Verwendung und Verfahren zur Herstellung eines Substrats |
| US20140308814A1 (en) * | 2013-04-15 | 2014-10-16 | Applied Materials, Inc | Chemical mechanical polishing methods and systems including pre-treatment phase and pre-treatment compositions |
| CN104002252B (zh) * | 2014-05-21 | 2016-06-01 | 华侨大学 | 超细磨料生物高分子柔性抛光膜及其制备方法 |
| US10181408B2 (en) * | 2017-01-31 | 2019-01-15 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing method for tungsten using polyglycols and polyglycol derivatives |
| CN113969173B (zh) * | 2021-09-23 | 2022-05-13 | 易安爱富(武汉)科技有限公司 | 一种ITO/Ag/ITO复合金属层薄膜的蚀刻液 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4270480B2 (ja) * | 1999-04-30 | 2009-06-03 | 綜研化学株式会社 | アクリル系重合体の製造法 |
| JP2001300285A (ja) * | 2000-04-18 | 2001-10-30 | Sanyo Chem Ind Ltd | 研磨用砥粒分散剤及び研磨用スラリー |
| JP2004517980A (ja) * | 2000-09-21 | 2004-06-17 | ローム アンド ハース カンパニー | 極性モノマーと多価カチオンとに関わる方法および組成物 |
| US6433061B1 (en) * | 2000-10-24 | 2002-08-13 | Noveon Ip Holdings Corp. | Rheology modifying copolymer composition |
| US7288616B2 (en) * | 2002-01-18 | 2007-10-30 | Lubrizol Advanced Materials, Inc. | Multi-purpose polymers, methods and compositions |
| US7435356B2 (en) * | 2004-11-24 | 2008-10-14 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Abrasive-free chemical mechanical polishing compositions and methods relating thereto |
-
2009
- 2009-09-25 US US12/586,642 patent/US20110073800A1/en not_active Abandoned
-
2010
- 2010-09-16 KR KR1020100090903A patent/KR20110033786A/ko not_active Withdrawn
- 2010-09-21 TW TW099131937A patent/TW201127924A/zh unknown
- 2010-09-21 CN CN2010102981564A patent/CN102031065B/zh not_active Expired - Fee Related
- 2010-09-24 JP JP2010213450A patent/JP2011082512A/ja active Pending
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