JP2007526647A5 - - Google Patents

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Publication number
JP2007526647A5
JP2007526647A5 JP2007501361A JP2007501361A JP2007526647A5 JP 2007526647 A5 JP2007526647 A5 JP 2007526647A5 JP 2007501361 A JP2007501361 A JP 2007501361A JP 2007501361 A JP2007501361 A JP 2007501361A JP 2007526647 A5 JP2007526647 A5 JP 2007526647A5
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JP
Japan
Prior art keywords
surfactant
composition
cleaning solution
cleaning
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007501361A
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English (en)
Japanese (ja)
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JP2007526647A (ja
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Publication date
Priority claimed from US10/956,272 external-priority patent/US7087564B2/en
Application filed filed Critical
Publication of JP2007526647A publication Critical patent/JP2007526647A/ja
Publication of JP2007526647A5 publication Critical patent/JP2007526647A5/ja
Pending legal-status Critical Current

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JP2007501361A 2004-03-05 2005-01-24 Ｃｍｐ後洗浄用の改善された酸性化学剤 Pending JP2007526647A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US55099704P 2004-03-05 2004-03-05
US10/956,272 US7087564B2 (en) 2004-03-05 2004-10-01 Acidic chemistry for post-CMP cleaning
PCT/IB2005/000165 WO2005093031A1 (en) 2004-03-05 2005-01-24 Improved acidic chemistry for post-cmp cleaning

Publications (2)

Publication Number Publication Date
JP2007526647A JP2007526647A (ja) 2007-09-13
JP2007526647A5 true JP2007526647A5 (enExample) 2008-03-13

Family

ID=34915711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007501361A Pending JP2007526647A (ja) 2004-03-05 2005-01-24 Ｃｍｐ後洗浄用の改善された酸性化学剤

Country Status (9)

Country Link
US (3) US7087564B2 (enExample)
EP (1) EP1725647B1 (enExample)
JP (1) JP2007526647A (enExample)
KR (1) KR101140970B1 (enExample)
CN (1) CN1914309B (enExample)
AT (1) ATE429480T1 (enExample)
DE (1) DE602005014094D1 (enExample)
TW (1) TWI364455B (enExample)
WO (1) WO2005093031A1 (enExample)

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US11091727B2 (en) 2018-07-24 2021-08-17 Versum Materials Us, Llc Post etch residue cleaning compositions and methods of using the same
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