JP2011073961A - 超低膨張ガラスのアニールによるＴｚｃの調節 - Google Patents

超低膨張ガラスのアニールによるＴｚｃの調節 Download PDF

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Publication number
JP2011073961A
JP2011073961A JP2010193335A JP2010193335A JP2011073961A JP 2011073961 A JP2011073961 A JP 2011073961A JP 2010193335 A JP2010193335 A JP 2010193335A JP 2010193335 A JP2010193335 A JP 2010193335A JP 2011073961 A JP2011073961 A JP 2011073961A
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JP
Japan
Prior art keywords
glass
tzc
titania
temperature
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010193335A
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English (en)
Japanese (ja)
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JP2011073961A5 (https=
Inventor
Carlos Duran
デュラン カルロス
Kenneth E Hrdina
エドワード ハーディナ ケネス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of JP2011073961A publication Critical patent/JP2011073961A/ja
Publication of JP2011073961A5 publication Critical patent/JP2011073961A5/ja
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B25/00—Annealing glass products
    • C03B25/02—Annealing glass products in a discontinuous way
    • C03B25/025—Glass sheets
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B25/00—Annealing glass products
    • C03B25/04—Annealing glass products in a continuous way
    • C03B25/06—Annealing glass products in a continuous way with horizontal displacement of the glass products
    • C03B25/08—Annealing glass products in a continuous way with horizontal displacement of the glass products of glass sheets
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Glass Compositions (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2010193335A 2009-08-31 2010-08-31 超低膨張ガラスのアニールによるＴｚｃの調節 Pending JP2011073961A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23839409P 2009-08-31 2009-08-31

Publications (2)

Publication Number Publication Date
JP2011073961A true JP2011073961A (ja) 2011-04-14
JP2011073961A5 JP2011073961A5 (https=) 2013-10-03

Family

ID=43525412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010193335A Pending JP2011073961A (ja) 2009-08-31 2010-08-31 超低膨張ガラスのアニールによるＴｚｃの調節

Country Status (3)

Country Link
US (2) US8713969B2 (https=)
JP (1) JP2011073961A (https=)
DE (1) DE102010039924A1 (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013002802A1 (de) 2012-02-21 2013-08-22 Asahi Glass Company, Ltd. Verfahren zur Herstellung von Titandioxid-enthaltendem Quarzglas-Körper
JP2016511211A (ja) * 2013-02-11 2016-04-14 ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフトＨｅｒａｅｕｓ Ｑｕａｒｚｇｌａｓ ＧｍｂＨ ＆ Ｃｏ． ＫＧ ＥＵＶリソグラフィに使用されるミラー基板用のＴｉＯ２−ＳｉＯ２ガラスのブランク及びその製造方法
CN106061910A (zh) * 2014-02-26 2016-10-26 康宁股份有限公司 热处理二氧化硅‑氧化钛玻璃来诱导Tzc梯度
JP2017508713A (ja) * 2014-03-14 2017-03-30 コーニング インコーポレイテッド 非常に小さいｃｔｅ勾配を有するホウ素ドープチタニア−シリカガラス
JP2018199621A (ja) * 2013-09-13 2018-12-20 コーニング インコーポレイテッド 超低膨張ガラス

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5768452B2 (ja) 2011-04-11 2015-08-26 信越化学工業株式会社 チアニアドープ石英ガラスの製造方法
US9034450B2 (en) 2011-08-31 2015-05-19 Corning Incorporated Binary silica-titania glass articles having a ternary doped silica-titania critical zone
US20130047669A1 (en) 2011-08-31 2013-02-28 Sezhian Annamalai Method of making a silica-titania glass having a ternary doped critical zone
DE102011085358B3 (de) * 2011-10-28 2012-07-12 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Konfigurieren einer solchen optischen Anordnung
US8987155B2 (en) * 2012-08-30 2015-03-24 Corning Incorporated Niobium doped silica titania glass and method of preparation
US8901019B2 (en) 2012-11-30 2014-12-02 Corning Incorporated Very low CTE slope doped silica-titania glass
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
JP2017536323A (ja) 2014-11-26 2017-12-07 コーニング インコーポレイテッド 低膨張率を有するドープされたシリカ−チタニアガラスおよびその製造方法
US9822030B2 (en) 2015-02-13 2017-11-21 Corning Incorporated Ultralow expansion titania-silica glass
JP2018513093A (ja) 2015-03-26 2018-05-24 コーニング インコーポレイテッド 極紫外線リソグラフィーに使用するためのガラス複合体
CN115181502B (zh) 2016-12-21 2023-09-22 康宁股份有限公司 烧结系统和烧结制品
WO2024263324A2 (en) * 2023-06-19 2024-12-26 Corning Incorporated Titania-silica glass with plurality of compositional variation sections

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005022954A (ja) * 2003-04-03 2005-01-27 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびその製造法
JP2005194118A (ja) * 2004-01-05 2005-07-21 Asahi Glass Co Ltd シリカガラス
JP2007186412A (ja) * 2005-12-21 2007-07-26 Corning Inc 脈理が低減された低膨張率ガラスおよび素子ならびにその製造方法
WO2009101949A1 (ja) * 2008-02-13 2009-08-20 Tohoku University シリカ・チタニアガラス及びその製造方法、線膨張係数測定方法
JP2009227573A (ja) * 2008-02-27 2009-10-08 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
JP2010163345A (ja) * 2008-02-26 2010-07-29 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP2011162359A (ja) * 2008-05-29 2011-08-25 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997010184A1 (en) 1995-09-12 1997-03-20 Corning Incorporated Boule oscillation patterns for producing fused silica glass
US5970751A (en) 1998-09-22 1999-10-26 Corning Incorporated Fused SiO2 -TiO2 glass method
US6931097B1 (en) * 1999-07-22 2005-08-16 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements
AU2001241459A1 (en) 2000-02-08 2001-08-20 Kovac×Ñ, Mario System and method for advertisement sponsored content distribution
US7053017B2 (en) 2002-03-05 2006-05-30 Corning Incorporated Reduced striae extreme ultraviolet elements
JP5367204B2 (ja) * 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
US7155936B2 (en) 2003-08-08 2007-01-02 Corning Incorporated Doped silica glass articles and methods of forming doped silica glass boules and articles
US20070137252A1 (en) 2005-12-21 2007-06-21 Maxon John E Reduced striae low expansion glass and elements, and a method for making same
DE102007019154B4 (de) * 2007-04-20 2012-07-26 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines optischen Bauteils aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit
WO2009070223A1 (en) 2007-11-30 2009-06-04 Corning Incorporated Low expansion glass material having low expansivity gradient
JP5365247B2 (ja) * 2008-02-25 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
US9505649B2 (en) * 2013-09-13 2016-11-29 Corning Incorporated Ultralow expansion glass

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005022954A (ja) * 2003-04-03 2005-01-27 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびその製造法
JP2005194118A (ja) * 2004-01-05 2005-07-21 Asahi Glass Co Ltd シリカガラス
JP2007186412A (ja) * 2005-12-21 2007-07-26 Corning Inc 脈理が低減された低膨張率ガラスおよび素子ならびにその製造方法
WO2009101949A1 (ja) * 2008-02-13 2009-08-20 Tohoku University シリカ・チタニアガラス及びその製造方法、線膨張係数測定方法
JP2010163345A (ja) * 2008-02-26 2010-07-29 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP2009227573A (ja) * 2008-02-27 2009-10-08 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
JP2011162359A (ja) * 2008-05-29 2011-08-25 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013002802A1 (de) 2012-02-21 2013-08-22 Asahi Glass Company, Ltd. Verfahren zur Herstellung von Titandioxid-enthaltendem Quarzglas-Körper
DE102013002802B4 (de) 2012-02-21 2024-08-08 AGC Inc. Verfahren zur Herstellung von Titandioxid-enthaltendem Quarzglas-Körper
JP2016511211A (ja) * 2013-02-11 2016-04-14 ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフトＨｅｒａｅｕｓ Ｑｕａｒｚｇｌａｓ ＧｍｂＨ ＆ Ｃｏ． ＫＧ ＥＵＶリソグラフィに使用されるミラー基板用のＴｉＯ２−ＳｉＯ２ガラスのブランク及びその製造方法
JP2018199621A (ja) * 2013-09-13 2018-12-20 コーニング インコーポレイテッド 超低膨張ガラス
CN106061910A (zh) * 2014-02-26 2016-10-26 康宁股份有限公司 热处理二氧化硅‑氧化钛玻璃来诱导Tzc梯度
JP2017507891A (ja) * 2014-02-26 2017-03-23 コーニング インコーポレイテッド Ｔｚｃ勾配を誘起するためのシリカ−チタニアガラスの熱処理
TWI658011B (zh) * 2014-02-26 2019-05-01 美商康寧公司 誘導零交越溫度梯度的氧化矽－氧化鈦玻璃之熱處理
CN106061910B (zh) * 2014-02-26 2019-05-10 康宁股份有限公司 热处理二氧化硅-氧化钛玻璃来诱导Tzc梯度
JP2017508713A (ja) * 2014-03-14 2017-03-30 コーニング インコーポレイテッド 非常に小さいｃｔｅ勾配を有するホウ素ドープチタニア−シリカガラス

Also Published As

Publication number Publication date
US20110048075A1 (en) 2011-03-03
US20140194271A1 (en) 2014-07-10
DE102010039924A1 (de) 2011-03-03
US8713969B2 (en) 2014-05-06

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