DE102010039924A1 - Einstellen der Tzc durch Aushärten von Glas mit ultraniedriger Expansion - Google Patents
Einstellen der Tzc durch Aushärten von Glas mit ultraniedriger Expansion Download PDFInfo
- Publication number
- DE102010039924A1 DE102010039924A1 DE102010039924A DE102010039924A DE102010039924A1 DE 102010039924 A1 DE102010039924 A1 DE 102010039924A1 DE 102010039924 A DE102010039924 A DE 102010039924A DE 102010039924 A DE102010039924 A DE 102010039924A DE 102010039924 A1 DE102010039924 A1 DE 102010039924A1
- Authority
- DE
- Germany
- Prior art keywords
- glass
- tzc
- range
- silica
- titanium dioxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011521 glass Substances 0.000 title claims abstract description 175
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 184
- 238000000034 method Methods 0.000 claims abstract description 48
- 239000013078 crystal Substances 0.000 claims abstract description 44
- 239000004408 titanium dioxide Substances 0.000 claims description 53
- 238000001816 cooling Methods 0.000 claims description 35
- 230000007423 decrease Effects 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 230000003044 adaptive effect Effects 0.000 claims description 4
- 239000000758 substrate Substances 0.000 abstract description 24
- 238000001900 extreme ultraviolet lithography Methods 0.000 abstract description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 32
- 238000004519 manufacturing process Methods 0.000 description 23
- 239000000203 mixture Substances 0.000 description 21
- 239000000377 silicon dioxide Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 11
- 238000011161 development Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000007496 glass forming Methods 0.000 description 2
- 238000005816 glass manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 238000003483 aging Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000013036 cure process Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- -1 titanium halide Chemical class 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 210000004127 vitreous body Anatomy 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/02—Annealing glass products in a discontinuous way
- C03B25/025—Glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/04—Annealing glass products in a continuous way
- C03B25/06—Annealing glass products in a continuous way with horizontal displacement of the glass products
- C03B25/08—Annealing glass products in a continuous way with horizontal displacement of the glass products of glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Glass Compositions (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US23839409P | 2009-08-31 | 2009-08-31 | |
| US61/238,394 | 2009-08-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102010039924A1 true DE102010039924A1 (de) | 2011-03-03 |
Family
ID=43525412
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102010039924A Withdrawn DE102010039924A1 (de) | 2009-08-31 | 2010-08-30 | Einstellen der Tzc durch Aushärten von Glas mit ultraniedriger Expansion |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US8713969B2 (https=) |
| JP (1) | JP2011073961A (https=) |
| DE (1) | DE102010039924A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014122111A3 (de) * | 2013-02-11 | 2014-10-23 | Heraeus Quarzglas Gmbh & Co. Kg | ROHLING AUS TiO2-SiO2-GLAS FÜR EIN SPIEGELSUBSTRAT FÜR DEN EINSATZ IN DER EUV-LITHOGRAPHIE SOWIE VERFAHREN FÜR DESSEN HERSTELLUNG |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5768452B2 (ja) | 2011-04-11 | 2015-08-26 | 信越化学工業株式会社 | チアニアドープ石英ガラスの製造方法 |
| US9034450B2 (en) | 2011-08-31 | 2015-05-19 | Corning Incorporated | Binary silica-titania glass articles having a ternary doped silica-titania critical zone |
| US20130047669A1 (en) | 2011-08-31 | 2013-02-28 | Sezhian Annamalai | Method of making a silica-titania glass having a ternary doped critical zone |
| DE102011085358B3 (de) * | 2011-10-28 | 2012-07-12 | Carl Zeiss Smt Gmbh | Optische Anordnung für die EUV-Lithographie und Verfahren zum Konfigurieren einer solchen optischen Anordnung |
| JP6020234B2 (ja) | 2012-02-21 | 2016-11-02 | 旭硝子株式会社 | チタニア含有シリカガラス体の製造方法 |
| US8987155B2 (en) * | 2012-08-30 | 2015-03-24 | Corning Incorporated | Niobium doped silica titania glass and method of preparation |
| US8901019B2 (en) | 2012-11-30 | 2014-12-02 | Corning Incorporated | Very low CTE slope doped silica-titania glass |
| US9505649B2 (en) | 2013-09-13 | 2016-11-29 | Corning Incorporated | Ultralow expansion glass |
| US9382151B2 (en) | 2014-01-31 | 2016-07-05 | Corning Incorporated | Low expansion silica-titania articles with a Tzc gradient by compositional variation |
| US20150239767A1 (en) * | 2014-02-26 | 2015-08-27 | Corning Incorporated | HEAT TREATING SILICA-TITANIA GLASS TO INDUCE A Tzc GRADIENT |
| US9382150B2 (en) * | 2014-03-14 | 2016-07-05 | Corning Incorporated | Boron-doped titania-silica glass having very low CTE slope |
| JP2017536323A (ja) | 2014-11-26 | 2017-12-07 | コーニング インコーポレイテッド | 低膨張率を有するドープされたシリカ−チタニアガラスおよびその製造方法 |
| US9822030B2 (en) | 2015-02-13 | 2017-11-21 | Corning Incorporated | Ultralow expansion titania-silica glass |
| JP2018513093A (ja) | 2015-03-26 | 2018-05-24 | コーニング インコーポレイテッド | 極紫外線リソグラフィーに使用するためのガラス複合体 |
| CN115181502B (zh) | 2016-12-21 | 2023-09-22 | 康宁股份有限公司 | 烧结系统和烧结制品 |
| WO2024263324A2 (en) * | 2023-06-19 | 2024-12-26 | Corning Incorporated | Titania-silica glass with plurality of compositional variation sections |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5696038A (en) | 1995-09-12 | 1997-12-09 | Corning Incorporated | Boule oscillation patterns in methods of producing fused silica glass |
| US5970751A (en) | 1998-09-22 | 1999-10-26 | Corning Incorporated | Fused SiO2 -TiO2 glass method |
| US6988277B2 (en) | 2000-02-08 | 2006-01-17 | Mario Kovac | System and method for advertisement sponsored content distribution |
| US7155936B2 (en) | 2003-08-08 | 2007-01-02 | Corning Incorporated | Doped silica glass articles and methods of forming doped silica glass boules and articles |
| EP1608598B1 (en) | 2003-04-03 | 2007-07-18 | Asahi Glass Company Ltd. | Silica glass containing tio2 and process for its production |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6931097B1 (en) * | 1999-07-22 | 2005-08-16 | Corning Incorporated | Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements |
| US7053017B2 (en) | 2002-03-05 | 2006-05-30 | Corning Incorporated | Reduced striae extreme ultraviolet elements |
| JP5367204B2 (ja) * | 2003-04-03 | 2013-12-11 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材 |
| JP4492123B2 (ja) * | 2004-01-05 | 2010-06-30 | 旭硝子株式会社 | シリカガラス |
| US20070137253A1 (en) * | 2005-12-21 | 2007-06-21 | Beall Lorrie F | Reduced striae low expansion glass and elements, and a method for making same |
| US20070137252A1 (en) | 2005-12-21 | 2007-06-21 | Maxon John E | Reduced striae low expansion glass and elements, and a method for making same |
| DE102007019154B4 (de) * | 2007-04-20 | 2012-07-26 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines optischen Bauteils aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit |
| WO2009070223A1 (en) | 2007-11-30 | 2009-06-04 | Corning Incorporated | Low expansion glass material having low expansivity gradient |
| JP5314901B2 (ja) * | 2008-02-13 | 2013-10-16 | 国立大学法人東北大学 | シリカ・チタニアガラス及びその製造方法、線膨張係数測定方法 |
| JP5365247B2 (ja) * | 2008-02-25 | 2013-12-11 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材 |
| JP5365248B2 (ja) * | 2008-02-26 | 2013-12-11 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材 |
| JP5417884B2 (ja) * | 2008-02-27 | 2014-02-19 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材 |
| JP2011162359A (ja) * | 2008-05-29 | 2011-08-25 | Asahi Glass Co Ltd | ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材 |
| US9505649B2 (en) * | 2013-09-13 | 2016-11-29 | Corning Incorporated | Ultralow expansion glass |
-
2010
- 2010-08-26 US US12/868,934 patent/US8713969B2/en active Active
- 2010-08-30 DE DE102010039924A patent/DE102010039924A1/de not_active Withdrawn
- 2010-08-31 JP JP2010193335A patent/JP2011073961A/ja active Pending
-
2014
- 2014-03-13 US US14/208,568 patent/US20140194271A1/en not_active Abandoned
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5696038A (en) | 1995-09-12 | 1997-12-09 | Corning Incorporated | Boule oscillation patterns in methods of producing fused silica glass |
| US5970751A (en) | 1998-09-22 | 1999-10-26 | Corning Incorporated | Fused SiO2 -TiO2 glass method |
| US6988277B2 (en) | 2000-02-08 | 2006-01-17 | Mario Kovac | System and method for advertisement sponsored content distribution |
| EP1608598B1 (en) | 2003-04-03 | 2007-07-18 | Asahi Glass Company Ltd. | Silica glass containing tio2 and process for its production |
| US7410922B2 (en) | 2003-04-03 | 2008-08-12 | Asahi Glass Company, Limited | Silica glass containing TiO2 and process for its production |
| US7155936B2 (en) | 2003-08-08 | 2007-01-02 | Corning Incorporated | Doped silica glass articles and methods of forming doped silica glass boules and articles |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014122111A3 (de) * | 2013-02-11 | 2014-10-23 | Heraeus Quarzglas Gmbh & Co. Kg | ROHLING AUS TiO2-SiO2-GLAS FÜR EIN SPIEGELSUBSTRAT FÜR DEN EINSATZ IN DER EUV-LITHOGRAPHIE SOWIE VERFAHREN FÜR DESSEN HERSTELLUNG |
| CN104995557A (zh) * | 2013-02-11 | 2015-10-21 | 赫罗伊斯石英玻璃股份有限两合公司 | 用于EUV-光刻中的镜面基材的由TiO2-SiO2玻璃构成的坯料及其制造方法 |
| US9522840B2 (en) | 2013-02-11 | 2016-12-20 | Heraeus Quarzglas Gmbh & Co. Kg | Blank of TiO2-SiO2 glass for a mirror substrate for use in EUV lithography and method for the production thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011073961A (ja) | 2011-04-14 |
| US20110048075A1 (en) | 2011-03-03 |
| US20140194271A1 (en) | 2014-07-10 |
| US8713969B2 (en) | 2014-05-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R005 | Application deemed withdrawn due to failure to request examination |